JPS63194331A - Mask holding apparatus - Google Patents

Mask holding apparatus

Info

Publication number
JPS63194331A
JPS63194331A JP62026456A JP2645687A JPS63194331A JP S63194331 A JPS63194331 A JP S63194331A JP 62026456 A JP62026456 A JP 62026456A JP 2645687 A JP2645687 A JP 2645687A JP S63194331 A JPS63194331 A JP S63194331A
Authority
JP
Japan
Prior art keywords
mask
flatness
membrane
holder
permanent magnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62026456A
Other languages
Japanese (ja)
Other versions
JPH07101663B2 (en
Inventor
Hidehiko Fujioka
秀彦 藤岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62026456A priority Critical patent/JPH07101663B2/en
Priority to GB8802217A priority patent/GB2201258B/en
Priority to FR8801455A priority patent/FR2610740B1/en
Priority to DE19883803738 priority patent/DE3803738A1/en
Publication of JPS63194331A publication Critical patent/JPS63194331A/en
Priority to US07/312,761 priority patent/US4963921A/en
Publication of JPH07101663B2 publication Critical patent/JPH07101663B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain a mask membrane having a flatness as desired, by changing attracting forces applied by solenoid coils to various parts of a mask frame to which the mask membrane is attached, so as to remove component materials deteriorating the flatness of the mask membrane. CONSTITUTION:A mask frame 2 is moved close to a mask holder 3, so that the mask holder is attracted by permanent magnets 4a, 4b, 4c and 4d. After being attracted, the flatness of a mask membrane 1 has a fixed value. If data of deflection configurations of the mask membrane 1 are previously obtained from a flatness measuring interferometer system, it can be known which parts of the mask membrane are projected and which parts are recessed when the holder 3 is attracted by the magnets. Thus, the flatness of the mask membrane can be corrected, based on these data, by supplying respective solenoid coils 5a, 5b, 5c and 5d with currents controlled indenpendently through respective leads 6a, 6b, 6c and 6d. By this correction, any component material deteriorating the flatness of the mask membrane are removed and the flatness as desired can be obtained.

Description

【発明の詳細な説明】 ［産業上の利用分野］ 本発明は高集積半導体回路素子の製造のためのりソゲラ
フイエ程、特に転写工程で用いるマスク保持装置に関す
るものであり、特にＸ線露光装置用のマスク保持装置に
関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a mask holding device used in a glue printing process for manufacturing highly integrated semiconductor circuit elements, particularly in a transfer process, and particularly relates to a mask holding device used in an X-ray exposure device. The present invention relates to a mask holding device.

［従来の技術］ 従来のマスク保持装置として、マスク保持は真空吸着に
よるものと磁力によって吸着するものとがある。磁力に
よって吸着、固定する方法には、永久磁石を使ったもの
とＭ　６８石を使ったものとがある。[Prior Art] As conventional mask holding devices, there are two types of mask holding devices: one using vacuum suction and the other using magnetic force. There are two methods for attracting and fixing objects using magnetic force: one using permanent magnets and the other using M68 stone.

ところで、マスクメンブレンの平面度はマスク保持装置
の吸着面の平面度、メンブレンを貼るためのマスクフレ
ーム（リップ面、吸着面）の平面度、マスクの自重たわ
みなどの総合精度として決まることが知られている。従
ってマスクをマスク保持装置に吸着、固定すると、ある
平面度が定゛まり、そしてその平面度を改善し、平面を
矯正することはできない。By the way, it is known that the flatness of a mask membrane is determined by the overall accuracy of the flatness of the suction surface of the mask holding device, the flatness of the mask frame (lip surface, suction surface) for attaching the membrane, and the deflection of the mask under its own weight. ing. Therefore, when a mask is suctioned and fixed to a mask holding device, a certain degree of flatness is fixed, and it is impossible to improve the flatness or correct the flatness.

［発明が解決しようとする問題点］ 本発明の目的は所要の平面度を得られるようマスクメン
ブレンの平面を矯正できるマスク保持装置を提供するこ
とである。[Problems to be Solved by the Invention] An object of the present invention is to provide a mask holding device that can correct the flatness of a mask membrane so as to obtain a required flatness.

［問題点を解決するための手段］ この目的は本発明に従って、マスクホルダーと、マスク
フレームとを吸着保持する複数の電ｒＩｎ石のソレノイ
ドコイルの各々に所要の平面度を得られるよう制御され
た電流を供給するように構成したマスク保持装置により
達成される。[Means for Solving the Problems] According to the present invention, this object is controlled so that the required flatness is obtained for each of the plurality of solenoid coils made of argonite that attract and hold the mask holder and the mask frame. This is accomplished by a mask holding device configured to supply an electric current.

特に周縁に複数のソレノイドコイルを埋゛設したマスク
ホルダーと、このマスクホルダーに取付けるマスクフレ
ームと、これらのマスクホルダーとマスクフレームとを
吸着して保持する永久磁石手段と、各ソレノイドに制御
された異なる電流を供給する手段とを備えたマスク保持
装置が提案され、この場合マスクホルダーのソレノイド
コイルのコアとして永久磁石を配置し、その永久磁石に
吸着されるようマスクフレームの少なくとも一部を磁性
材料から構成することにより上記の永久もｕ石手段を構
成してもよいし、またはマスクホルダーのソレノイドコ
イルに磁性材コアまたはヨークを配置し、これに対向し
た位置にマスクフレームに永久磁石を配置することによ
り上記の永久ｈｎｎ平手段構成してもよい。In particular, a mask holder with a plurality of solenoid coils embedded in the periphery, a mask frame attached to this mask holder, permanent magnet means for attracting and holding these mask holders and mask frames, and In this case, a permanent magnet is arranged as the core of the solenoid coil of the mask holder, and at least a part of the mask frame is made of magnetic material so as to be attracted to the permanent magnet. Alternatively, the permanent magnet means may be constructed by arranging a magnetic material core or yoke in the solenoid coil of the mask holder, and a permanent magnet being arranged in the mask frame at a position opposite to this. The above-mentioned permanent hnn flat means may also be constructed.

［作用］ 上述の構成において、永久磁石によりマスクホルダーに
マスクフレームを吸着させ、その状態で得られるマスク
メンブレンの平面度を向上させるよう各ソレノイドに制
御された電流を流して吸着力を調整する。[Operation] In the above configuration, the mask frame is attracted to the mask holder by the permanent magnet, and the attraction force is adjusted by passing a controlled current through each solenoid so as to improve the flatness of the mask membrane obtained in this state.

［実施例コ 添付図を参照して本発明の詳細な説明する。[Example code] The present invention will now be described in detail with reference to the accompanying drawings.

第１ａ図と第１ｂ図とを参照する。Reference is made to Figures 1a and 1b.

第１ａ図はＸ線マスクチャックに応用した第１の実施例
のマスク保持装置の平面図であり、第１ｂ図はマスクフ
レームを取りつけたときのＡ−Ａ断面図を示す。同図に
おいて、１はマスクメンブレン、２はマスクメンブレン
１と永久磁石による磁力で保持するため磁性材料で作ら
れたマスクフレームである。３はマスクホルダー、４ａ
。FIG. 1a is a plan view of the first embodiment of the mask holding device applied to an X-ray mask chuck, and FIG. 1b is a sectional view taken along line A-A when a mask frame is attached. In the figure, 1 is a mask membrane, and 2 is a mask frame made of a magnetic material to be held together with the mask membrane 1 by the magnetic force of a permanent magnet. 3 is a mask holder, 4a
.

４ｂ、４ｃ、４ｄはマスクフレーム２を吸着するために
マスクホルダー３に固定された永久磁石、５ａ、５ｂ、
５ｃ、５ｄはマスクフレーム２の吸着力を可変にするた
めの磁力を発生させるソレノイドコイルである。６ａ、
６ｂ、６ｃ、６ｄは個々のソレノイドコイルに電流を流
すためのリード線である。この実施例では永久磁石、ソ
レノイドコイルおよびリード線のユニットがマスクホル
ダーに相互に９０度離して周縁に配置している。4b, 4c, 4d are permanent magnets fixed to the mask holder 3 to attract the mask frame 2, 5a, 5b,
5c and 5d are solenoid coils that generate magnetic force to make the attraction force of the mask frame 2 variable. 6a,
6b, 6c, and 6d are lead wires for passing current through the individual solenoid coils. In this embodiment, a unit of permanent magnets, solenoid coils and lead wires are arranged on the periphery of the mask holder, separated by 90 degrees from each other.

上記構成において、マスクフレーム２をマスクホルダー
３に近ずけると永久磁石４ａ、４ｂ。In the above configuration, when the mask frame 2 is brought close to the mask holder 3, the permanent magnets 4a and 4b.

４ｃ、４ｄによりマスクホルダー３は吸着される。吸着
後のマスクメンブレン１の平面度はある値に定まる。あ
らかじめマスクメンブレン１のたわみ形状の情報を平面
度測定用干渉計システムにより得ていれば、マスクホル
ダー３の吸着時にマスクメンブレンのどこの部分がでば
っていて、どこの部分がくぼんでいるのかがわかる。そ
こで、このデータをもとにソレノイドコイルにリード線
を介して個々に制御した電流を流すことにより平面の矯
正を行なえる。極性を変えＴＬ流の流す方向を変えれば
、マスクメンブレン１を＠Ｌ着させることも永久磁石の
発生する磁力線を相殺する向との磁力線を発生させ離脱
させることができる。また吸着力の大きさは電流値によ
って変えることもできる。吸着力の大きい場所では、マ
スクフレーム２は２の吸着力により外形がマスクホルダ
ー３方向に微小変位し、この部分付近のマスクメンブレ
ン１のでばりはなくなる。吸着力の小さい場所では、マ
スクメンブレン１のくぼみはなくなる。このようにして
マスクメンブレン１の平面度を損なう成分は取り除かれ
、所要の平面に矯正することができる。このため例え平
面度が良くないマスクメンブレン１を使用しても十分な
平面度を得ることができる。The mask holder 3 is attracted by 4c and 4d. The flatness of the mask membrane 1 after adsorption is determined to a certain value. If information on the deflection shape of the mask membrane 1 is obtained in advance using an interferometer system for flatness measurement, it is possible to know which parts of the mask membrane are protruding and which parts are recessed when the mask holder 3 is sucked. . Therefore, the plane can be corrected by applying individually controlled currents to the solenoid coils via lead wires based on this data. By changing the polarity and changing the direction of the TL flow, it is possible to attach the mask membrane 1 to @L or to generate lines of magnetic force in a direction that offset the lines of magnetic force generated by the permanent magnets and to separate them. Moreover, the magnitude of the adsorption force can also be changed by changing the current value. At a location where the suction force is large, the external shape of the mask frame 2 is slightly displaced in the direction of the mask holder 3 due to the suction force of 2, and the burrs of the mask membrane 1 near this portion disappear. In places where the suction force is small, the mask membrane 1 will not have any depressions. In this way, components that impair the flatness of the mask membrane 1 are removed, and the mask membrane 1 can be corrected to a desired flatness. Therefore, even if the mask membrane 1 with poor flatness is used, sufficient flatness can be obtained.

マスクメンブレン１のたわみ形状を露光前に露光機外で
測定してもよいが、更に露光機上でマスクフレームの取
付は位置、個々のソレノイドに流す電流値および極性の
データを収集しておき、そのデータに従って矯正時のマ
スクメンブレンの平面度が得られるように構成しておけ
ば、所望のマスクメンブレンの平面度を再現できるよう
になる。The shape of the deflection of the mask membrane 1 may be measured outside the exposure machine before exposure, but in addition, data on the mounting position of the mask frame, the current value flowing through each solenoid, and polarity are collected on the exposure machine. By configuring the mask membrane so that the flatness of the mask membrane at the time of correction can be obtained according to the data, it becomes possible to reproduce the desired flatness of the mask membrane.

第２図は本発明の第２の実施例を示す第１ｂ図と同様な
断面図である。第１の実施例では、永久磁石、ソレノイ
ドコイル、およびリード線のユニットはマスクホルダー
内に設けているが、このユニットの一部もしくは全部を
マスクフレーム内に設けることもできる。FIG. 2 is a sectional view similar to FIG. 1b showing a second embodiment of the invention. In the first embodiment, the permanent magnet, solenoid coil, and lead wire unit are provided within the mask holder, but part or all of this unit may also be provided within the mask frame.

第２図において、永久磁石４ａ、４ｃはマスクフレーム
２の内部に設定してあり、７ａ、７ｃは磁路を分離する
ためのセパレータ、８ａ、８ｃはヨークである。その作
用は第１の実施例と全く同しである。いずれの実施例も
永久磁石を使用しているが、電磁石のみの使用でも所要
の平面度を得られる。In FIG. 2, permanent magnets 4a and 4c are set inside the mask frame 2, 7a and 7c are separators for separating magnetic paths, and 8a and 8c are yokes. Its operation is exactly the same as the first embodiment. Although permanent magnets are used in all of the embodiments, the required flatness can be obtained using only electromagnets.

［発明の効果コ 以上から明らかなように、マスクメンブレンを貼っであ
るマスクフレームに対しソレノイドコイルによる吸着力
を変化させてマスクメンブレンの平面性を損なう成分を
消滅させ所要の平面度を得ることができる。高精度が要
求される半導体製造装置用の転写マスク、特にＸ線マス
クのヂャッキング・に好適である。[Effects of the Invention] As is clear from the above, it is possible to obtain the required flatness by changing the adsorption force of the solenoid coil on the mask frame to which the mask membrane is pasted, thereby eliminating components that impair the flatness of the mask membrane. can. It is suitable for transfer masks for semiconductor manufacturing equipment that require high precision, especially for jacking X-ray masks.

【図面の簡単な説明】[Brief explanation of the drawing]

第１ａ図は本発明の第１の実施例の平面図、第１ｂ図は
第１ａ図のＡ−Ａ断面図である。第２図は本発明の第２
の実施例の第１ａ図と同様の縦断面図である。 図中、 １：マスクメンブレン、 ２：マスクフレーム、 ３：マスクホルダー、 ４ａ、４ｂ、４ｃ、４ｄ：永久磁石、 ５ａ、５ｂ、５ｃ、５ｄ：ソレノイドコイル、６ａ、６
ｂ、６ｃ、６ｄ：リード線、 ７ａ、７ｃ：セパレータ、 Ｂａ、８ｃ：ヨークまたはコア。FIG. 1a is a plan view of the first embodiment of the present invention, and FIG. 1b is a sectional view taken along the line AA in FIG. 1a. Figure 2 shows the second embodiment of the present invention.
FIG. 1a is a longitudinal sectional view similar to FIG. 1a of the embodiment; In the figure, 1: mask membrane, 2: mask frame, 3: mask holder, 4a, 4b, 4c, 4d: permanent magnet, 5a, 5b, 5c, 5d: solenoid coil, 6a, 6
b, 6c, 6d: lead wire, 7a, 7c: separator, Ba, 8c: yoke or core.

Claims (1)

【特許請求の範囲】 １、マスクホルダー このマスクホルダーに取付けるマスクフレーム、 マスクホルダーとマスクフレームとを吸着保持する複数
の電磁石を備える吸着手段、および 電磁石のソレノイドコイルの各々に制御された電流を供
給する制御手段 を備えたことを特徴とするマスク保持装置。 ２、マスクホルダーは周縁に埋設した複数のソレノイド
コイルを有し、前記の吸着手段は永久磁石手段を含み、
この永久磁石手段はマスクホルダーのソレノイドコイル
のコアとして配置されている永久磁石から成り、マスク
フレームの少なくとも一部が磁性材料から成る特許請求
の範囲第１項に記載のマスク保持装置。 ３、マスクホルダーは周縁に埋設した複数のソレノイド
コイルを有し、前記の吸着手段は永久磁石手段を含み、
この永久磁石手段はマスクホルダーのソレノイドコイル
の磁性材コアと、マスクフレームに前記の磁性材コアに
対向した位置に配置した永久磁石とから成る特許請求の
範囲第１項に記載のマスク保持装置。[Claims] 1. A mask holder; a mask frame attached to the mask holder; an adsorption means including a plurality of electromagnets for adsorbing and holding the mask holder and the mask frame; and supplying a controlled current to each of the solenoid coils of the electromagnets. A mask holding device characterized by comprising a control means for controlling the mask holding device. 2. The mask holder has a plurality of solenoid coils embedded in the periphery, and the attraction means includes a permanent magnet means,
2. A mask holding device according to claim 1, wherein the permanent magnet means comprises a permanent magnet arranged as the core of a solenoid coil of the mask holder, and at least a portion of the mask frame is made of magnetic material. 3. The mask holder has a plurality of solenoid coils embedded in the periphery, and the attraction means includes a permanent magnet means,
2. The mask holding device according to claim 1, wherein the permanent magnet means comprises a magnetic core of a solenoid coil of the mask holder, and a permanent magnet disposed on the mask frame at a position facing the magnetic core.
JP62026456A 1985-06-24 1987-02-09 Mask holding device Expired - Fee Related JPH07101663B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP62026456A JPH07101663B2 (en) 1987-02-09 1987-02-09 Mask holding device
GB8802217A GB2201258B (en) 1987-02-09 1988-02-02 A mask holding device
FR8801455A FR2610740B1 (en) 1987-02-09 1988-02-08 DEVICE FOR HOLDING A MASK, APPARATUS FOR EXPOSING A SENSITIVE PART TO A DRAWING OF A MASK, AND PLANEITY CORRECTION DEVICE
DE19883803738 DE3803738A1 (en) 1987-02-09 1988-02-08 MASK HOLDING DEVICE
US07/312,761 US4963921A (en) 1985-06-24 1989-02-21 Device for holding a mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62026456A JPH07101663B2 (en) 1987-02-09 1987-02-09 Mask holding device

Publications (2)

Publication Number Publication Date
JPS63194331A true JPS63194331A (en) 1988-08-11
JPH07101663B2 JPH07101663B2 (en) 1995-11-01

Family

ID=12194007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62026456A Expired - Fee Related JPH07101663B2 (en) 1985-06-24 1987-02-09 Mask holding device

Country Status (4)

Country Link
JP (1) JPH07101663B2 (en)
DE (1) DE3803738A1 (en)
FR (1) FR2610740B1 (en)
GB (1) GB2201258B (en)

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JPH0992604A (en) * 1995-09-27 1997-04-04 Nikon Corp Reticle holder and holding method
JP2004103799A (en) * 2002-09-09 2004-04-02 Canon Inc Substrate holding unit, apparatus and method for manufacturing device
KR100495872B1 (en) * 2002-10-07 2005-06-16 주식회사 소로나 Shadowmask attaching method for organic light emitting device and apparatus adopting the same
JP2008199034A (en) * 1999-03-08 2008-08-28 Asml Netherlands Bv Off-axis leveling of lithographic projection apparatus
CN102566336A (en) * 2010-12-30 2012-07-11 上海微电子装备有限公司 Fixing device and fixing method for mask plate
KR20200011859A (en) * 2018-07-25 2020-02-04 주식회사 야스 Glass Mask

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Publication number Priority date Publication date Assignee Title
DE4304912C2 (en) * 1993-02-18 2003-03-06 Klaus Siebert Method and device for continuous automatic chip production under vacuum
DE19859172A1 (en) * 1998-12-21 2000-06-29 Uhp Corp Selective surface treatment with magnetic mask holder
EP1513021B1 (en) * 2003-09-04 2007-10-03 ASML Netherlands B.V. Lithographic apparatus and a method of compensating for thermal deformation in a lithographic apparatus
EP1513017A1 (en) 2003-09-04 2005-03-09 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2013174398A1 (en) * 2012-05-22 2013-11-28 Carl Zeiss Smt Gmbh Reticle, reticle-chuck, reticle positioning system and optical system
CN113687574A (en) * 2020-05-18 2021-11-23 长鑫存储技术有限公司 Photoetching equipment and light source position monitoring method thereof

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JPH0992604A (en) * 1995-09-27 1997-04-04 Nikon Corp Reticle holder and holding method
JP2008199034A (en) * 1999-03-08 2008-08-28 Asml Netherlands Bv Off-axis leveling of lithographic projection apparatus
JP2004103799A (en) * 2002-09-09 2004-04-02 Canon Inc Substrate holding unit, apparatus and method for manufacturing device
KR100495872B1 (en) * 2002-10-07 2005-06-16 주식회사 소로나 Shadowmask attaching method for organic light emitting device and apparatus adopting the same
CN102566336A (en) * 2010-12-30 2012-07-11 上海微电子装备有限公司 Fixing device and fixing method for mask plate
KR20200011859A (en) * 2018-07-25 2020-02-04 주식회사 야스 Glass Mask

Also Published As

Publication number Publication date
GB2201258A (en) 1988-08-24
FR2610740A1 (en) 1988-08-12
GB2201258B (en) 1991-04-24
FR2610740B1 (en) 1995-06-30
DE3803738A1 (en) 1988-08-25
DE3803738C2 (en) 1992-12-24
GB8802217D0 (en) 1988-03-02
JPH07101663B2 (en) 1995-11-01

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