JPS62216227A - Mask holding device - Google Patents
Mask holding deviceInfo
- Publication number
- JPS62216227A JPS62216227A JP61057114A JP5711486A JPS62216227A JP S62216227 A JPS62216227 A JP S62216227A JP 61057114 A JP61057114 A JP 61057114A JP 5711486 A JP5711486 A JP 5711486A JP S62216227 A JPS62216227 A JP S62216227A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- yoke
- magnet
- permanent magnet
- frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000696 magnetic material Substances 0.000 claims abstract description 8
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000007789 gas Substances 0.000 description 12
- 230000004907 flux Effects 0.000 description 6
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000009955 peripheral mechanism Effects 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の属する分野]
本発明は、回路が高度に集積された半導体素子を製造す
るためのりソゲラフイエ程、特に転写工程で用いられる
マスク保持装置に関し、詳しくは、特別なガスを充満し
た雰囲気中または真空中において転写マスクを容易に着
脱でき、しかもマスクを高精度に保持し得るマスク保持
装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a mask holding device used in a bonding process, particularly a transfer process, for manufacturing semiconductor devices with highly integrated circuits. The present invention relates to a mask holding device capable of easily attaching and detaching a transfer mask in a gas-filled atmosphere or in a vacuum, and capable of holding the mask with high precision.
[従来技術の説明]
半導体回路素子上に転写する回路の集積度の向上に伴い
、回路パターンを構成する線の幅が挟まり、今日ではサ
ブミクロンのオーダが要求されるようになった。これを
達成するため、回路パターンの転写に用いるための照射
エネルギーも紫外線、遠紫外線、軟X線またはイオン若
しくは電子等の粒子線を用いる必要を生じた。このため
、光路の雰囲気を特別なガス、例えば窒素やヘリウムガ
スにしたり、あるいは、圧力で1xio Torrと
いった真空にする必要を生じている。[Description of the Prior Art] As the degree of integration of circuits transferred onto semiconductor circuit elements increases, the width of lines constituting a circuit pattern has become narrower, and today a submicron order is required. In order to achieve this, it has become necessary to use ultraviolet rays, deep ultraviolet rays, soft X-rays, or particle beams such as ions or electrons for the irradiation energy used to transfer the circuit pattern. For this reason, it is necessary to use a special gas, such as nitrogen or helium gas, for the atmosphere in the optical path, or to create a vacuum at a pressure of 1xio Torr.
従来、この種のマスク保持装置としては、第5図および
第6図のように構成されたものが知られている。Conventionally, as this type of mask holding device, one configured as shown in FIGS. 5 and 6 is known.
第5図は、真空吸着によるマスク保持装置の断面図を示
す。これは、ガス雰囲気中で真空吸着によりマスクを吸
着保持するものである。同図において、1はマスク、1
0は不図示の排気装置に接続するための排気管、11は
マスク保持板12に設けられた排気溝である。このよう
な装置においては、マスク1をマスク保持板12に接し
ながら、排気管10を介して排気溝11の中のガスを排
気する。このとき、周囲のガスと排気溝の中との圧力に
圧力差を生じ、マスクはいわゆる真空吸着される状態と
なる。しかし、この場合、吸着面から雰囲気ガスを吸収
し排気してしまうため、雰囲気ガス圧が低下したりガス
消費が増大するといった不具合があった。また、減圧ガ
ス雰囲気中や真空中では吸着保持力が低下してしまい使
用不可となる等の欠点もあった。FIG. 5 shows a cross-sectional view of a mask holding device using vacuum suction. This is for holding a mask by vacuum suction in a gas atmosphere. In the same figure, 1 is a mask, 1
0 is an exhaust pipe for connecting to an exhaust device (not shown), and 11 is an exhaust groove provided in the mask holding plate 12. In such an apparatus, gas in the exhaust groove 11 is exhausted through the exhaust pipe 10 while the mask 1 is in contact with the mask holding plate 12 . At this time, a pressure difference is created between the surrounding gas and the pressure inside the exhaust groove, and the mask is placed in a so-called vacuum suction state. However, in this case, atmospheric gas is absorbed and exhausted from the adsorption surface, resulting in problems such as a decrease in atmospheric gas pressure and an increase in gas consumption. In addition, there was also a drawback that the adsorption and holding power decreased in a reduced pressure gas atmosphere or in a vacuum, making it unusable.
第6図は、電磁力によるマスク保持装置の断面図を示す
。この種の装置は、特開昭60−77424等に開示さ
れている。同図において、3は磁力線を発生するための
ソレノイドコイル、4は磁路を形成するためのヨーク、
6はソレノイドコイル3に通電するためのリード線であ
る。13はソレノイドコイルで発生した熱を外部に取り
去るための冷却パイプである。第6図の状態で、マスク
1をヨーク4に接しながらソレノイドコイル3に通電す
ると、ヨーク4が励磁されマスク1はヨーク4に磁気的
に吸着される。次に、通電をやめるとマスク1はヨーク
4から外れる。しかし、このような装置の場合、ソレノ
イドコイルに通電するとジュール熱による発熱があり、
マスクに熱歪を起こすことがあるため、不図示の冷却装
置から冷却バイブ13に冷媒を流し、その熱を外部に流
し去る必要がある。すなわち、このような構成の磁性チ
ャックにおいては、励磁コイルの発熱が多く、上述従来
形のように冷却コイルの必要が生じたり、それがために
装置全体が大型化し複雑な配管類を必要とする。このた
め、取り扱いが煩雑となり製作コストも上昇するといっ
た欠点があった。FIG. 6 shows a cross-sectional view of the electromagnetic mask holding device. This type of device is disclosed in Japanese Patent Laid-Open No. 60-77424. In the figure, 3 is a solenoid coil for generating magnetic lines of force, 4 is a yoke for forming a magnetic path,
6 is a lead wire for energizing the solenoid coil 3. 13 is a cooling pipe for removing heat generated by the solenoid coil to the outside. In the state shown in FIG. 6, when the solenoid coil 3 is energized while the mask 1 is in contact with the yoke 4, the yoke 4 is energized and the mask 1 is magnetically attracted to the yoke 4. Next, when the electricity is turned off, the mask 1 is removed from the yoke 4. However, in the case of such devices, when the solenoid coil is energized, it generates heat due to Joule heat.
Since thermal distortion may occur in the mask, it is necessary to flow a coolant from a cooling device (not shown) into the cooling vibe 13 and to dissipate the heat to the outside. In other words, in a magnetic chuck with such a configuration, the excitation coil generates a lot of heat, which necessitates a cooling coil as in the conventional type described above, which increases the size of the entire device and requires complicated piping. . For this reason, there is a drawback that handling is complicated and manufacturing costs are also increased.
[発明の目的]
本発明は、上述従来形の問題点に鑑み、液体やガス雰囲
気中あるいは減圧や真空中、いずれの場合でも安定に作
動し、しかも安価に製作できるマスク保持装置を提供す
ることを目的とする。また、同時に、極めて微細で高精
度な転写マスクの保持が要求される半導体製造装置に用
いることができるマスク保持装置を提供することを目的
とする。[Object of the Invention] In view of the above-mentioned problems of the conventional type, an object of the present invention is to provide a mask holding device that operates stably in a liquid or gas atmosphere, or in a reduced pressure or vacuum, and can be manufactured at a low cost. With the goal. Another object of the present invention is to provide a mask holding device that can be used in semiconductor manufacturing equipment that requires extremely fine and highly accurate transfer mask holding.
[実施例の説明] 以下、図面を用いて本発明の詳細な説明する。[Explanation of Examples] Hereinafter, the present invention will be explained in detail using the drawings.
第1図は、本発明の一実施例に係るマスク保持装置の断
面図を示す。同図において、1はマスク膜、2はaを中
心軸とする円環状の永久磁石、3a、3bはそれぞれ中
心軸aの周りに巻回されたソレノイドコイル、4は永久
磁石およびソレノイドコイル3a 、3bとともに磁気
回路を構成するためのヨーク、5は磁性材料で構成され
たマスクフレーム、6はソレノイドコイル3a 、3b
に電流を通ずるためのリード線である。永久磁石2は、
鉛直方向(中心軸aに沿う方向)に分極着磁されている
。永久磁石2の上面から出た磁束は、ヨーク4を通って
永久磁石2の下面へと循環・している。上記構成におい
て、マスクフレーム5を永久磁石2に近付けると、永久
磁石2、ヨーク4、マスクフレーム5により磁気回路が
形成され、マスクフレーム5は永久磁石2およびヨーク
4に吸引され吸着される。FIG. 1 shows a cross-sectional view of a mask holding device according to an embodiment of the present invention. In the figure, 1 is a mask film, 2 is an annular permanent magnet with central axis a, 3a and 3b are solenoid coils each wound around central axis a, 4 is a permanent magnet and solenoid coil 3a, A yoke for forming a magnetic circuit together with 3b, 5 a mask frame made of magnetic material, and 6 solenoid coils 3a and 3b.
This is a lead wire for passing current through. The permanent magnet 2 is
It is polarized and magnetized in the vertical direction (direction along the central axis a). The magnetic flux emitted from the upper surface of the permanent magnet 2 passes through the yoke 4 and circulates to the lower surface of the permanent magnet 2. In the above configuration, when the mask frame 5 is brought close to the permanent magnet 2, a magnetic circuit is formed by the permanent magnet 2, the yoke 4, and the mask frame 5, and the mask frame 5 is attracted and attracted to the permanent magnet 2 and the yoke 4.
−ら −
いま永久磁石4は上面がN極、下面がS極となるように
着磁されているとする(もちろん上下逆でもよい)。マ
スクフレーム5を離脱するためには、ソレノイドコイル
3aおよび3bに永久磁石2の上面からみてそれぞれ時
計回りと反時計回りの電流を流してやる。すると、永久
磁石2内を上面から下面に向う磁束が磁気回路に通り、
永久、磁石2の磁力が相殺されてヨーク4、マスクフレ
ーム5間にはは磁束が通らなくなる。従ってヨーク4と
マスクフレーム5間の吸着力がなくなってマスクフレー
ム5はヨーク4から離脱する。- et al. Now assume that the permanent magnet 4 is magnetized so that the upper surface is the N pole and the lower surface is the S pole (of course, it may be upside down). In order to remove the mask frame 5, currents are applied to the solenoid coils 3a and 3b in a clockwise direction and a counterclockwise direction, respectively, when viewed from the top surface of the permanent magnet 2. Then, the magnetic flux inside the permanent magnet 2 from the top surface to the bottom surface passes through the magnetic circuit,
The magnetic force of the magnet 2 is permanently canceled out, and no magnetic flux passes between the yoke 4 and the mask frame 5. Therefore, the adhesion force between the yoke 4 and the mask frame 5 is lost, and the mask frame 5 is separated from the yoke 4.
なお、ソレノイドコイルへの通電はマスクフレーム離脱
時だけでよく、しかも極短時間でよい。Note that the solenoid coil only needs to be energized when the mask frame is removed, and it only takes a very short time.
また、第2〜4図に示すように、第1図のマスク保持装
置の永久磁石およびソレノイドコイルの位置を適宜変更
してもよい。Further, as shown in FIGS. 2 to 4, the positions of the permanent magnet and the solenoid coil of the mask holding device shown in FIG. 1 may be changed as appropriate.
第2図は本発明の他の実施例で、永久磁石2は径方向(
中心線と直角の方向)に分極着磁され、マスクフレーム
5吸着時はヨーク4aおよび4b。FIG. 2 shows another embodiment of the present invention, in which the permanent magnet 2 is arranged in the radial direction (
When the mask frame 5 is attracted, the yokes 4a and 4b are polarized and magnetized in the direction perpendicular to the center line.
マスクフレーム5とで磁気回路を構成する。マス6一
クフレーム離脱時は第1図の装置におけると同様にソレ
ノイドコイル3によって永久磁石2の磁束を相殺する磁
束を与えればよい。A magnetic circuit is configured with the mask frame 5. When the mass 6 is detached from the frame, it is sufficient to apply a magnetic flux that offsets the magnetic flux of the permanent magnet 2 using the solenoid coil 3, as in the apparatus shown in FIG.
第3図も本発明の別の実施例で作用および用途は第1図
と同様である。FIG. 3 is another embodiment of the present invention, and its operation and application are similar to those in FIG. 1.
M4図も本発明のさらに別の実施例で永久磁石2が鉛直
方向く中心線の方向)に分極され、磁石の下面のみに磁
束が発生し、外周側(中心線から遠い側)と内周側(中
心線に近い側)で磁極が異なるように着磁されている以
外は作用、用途は第1図と同様である。Figure M4 is also another embodiment of the present invention, in which the permanent magnet 2 is polarized in the vertical direction (direction of the center line), and magnetic flux is generated only on the lower surface of the magnet, and on the outer circumference (the side far from the center line) and the inner circumference. The operation and application are the same as in FIG. 1, except that the magnetic poles are magnetized differently on the side (the side closer to the center line).
なお、上述において、永久磁石2およびヨーク4をプラ
スチックマグネットで一体成形することもできる。In addition, in the above description, the permanent magnet 2 and the yoke 4 can also be integrally molded with a plastic magnet.
さらに、ヨーク4を省略することもできる。Furthermore, the yoke 4 can also be omitted.
[発明の効果]
以上説明したように、本発明によれば、少なくとも一部
が磁性材料で構成されたマスクフレームと、該磁性体を
直接またはヨークを介して吸着可能な永久磁石と通電に
より該永久磁石の磁力を相殺するコイルとを備えたマス
ク保持装置本体と、から構成されているため、以下のよ
うな効果がある。[Effects of the Invention] As explained above, according to the present invention, a mask frame at least partially made of a magnetic material, a permanent magnet capable of attracting the magnetic material directly or through a yoke, and a magnetic material that is attracted by energization. The main body of the mask holding device includes a coil that cancels out the magnetic force of the permanent magnet, so it has the following effects.
■稼動部分が無いので高い信頼性が得られる。■High reliability is achieved as there are no moving parts.
■ソレノイドへの通電時間が短いので発熱量が少なく、
熱変形による精度劣化が少ない。■Since the energization time to the solenoid is short, the amount of heat generated is low.
Less accuracy deterioration due to thermal deformation.
■ガス中、液体中、真空中等あらゆる作動雰囲気中で動
作が可能であり、軟X線等の比較的長い波長の光源を用
いたときも光線強度を減衰させな□ いような雰囲気中
で安定に動作させることが可能である。■It can operate in any operating atmosphere such as gas, liquid, or vacuum, and is stable in an atmosphere that does not attenuate the light intensity even when using relatively long wavelength light sources such as soft X-rays. It is possible to operate the
■構造が簡単で偏平形状が可能であるため、露光や位置
決めに必要なセンサ類の装着・離脱が容易であり、周辺
メカニズムの簡略化、小形化が可能である。■Since the structure is simple and can be formed into a flat shape, it is easy to attach and detach sensors necessary for exposure and positioning, and the peripheral mechanisms can be simplified and downsized.
第1図は、本発明の一実施例に係るマスク保持装置の断
面図、
第2〜4図は、本発明の他の実施例に係るマスク保持装
置の断面図、
第5図は、従来の真空吸着によるマスク保持装置の断面
図、
第6図は、従来の電磁力によるマスク保持装置の断面図
である。
1:マスク膜、 2:永久磁石、3:ソレノイド
コイル、4:ヨーク、FIG. 1 is a cross-sectional view of a mask holding device according to an embodiment of the present invention, FIGS. 2 to 4 are cross-sectional views of a mask holding device according to other embodiments of the present invention, and FIG. Cross-sectional view of a mask holding device using vacuum suction FIG. 6 is a cross-sectional view of a conventional mask holding device using electromagnetic force. 1: Mask film, 2: Permanent magnet, 3: Solenoid coil, 4: Yoke,
Claims (1)
、該マスクに形成されたパターンを該感応体上に転写す
る転写装置のマスク保持装置であって、 少なくとも一部が磁性体で構成されたマスクまたはマス
クフレームと、該磁性体を直接またはヨークを介して吸
着可能な永久磁石と、通電により該永久磁石の磁力を相
殺するコイルとを具備するマスク保持装置。[Scope of Claims] 1. A mask holding device of a transfer device that irradiates irradiation energy onto a sensitive body through a mask and transfers a pattern formed on the mask onto the sensitive body, the mask holding device comprising at least one A mask holding device comprising a mask or a mask frame whose portion is made of a magnetic material, a permanent magnet capable of attracting the magnetic material directly or via a yoke, and a coil that cancels out the magnetic force of the permanent magnet by being energized.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61057114A JPS62216227A (en) | 1986-03-17 | 1986-03-17 | Mask holding device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61057114A JPS62216227A (en) | 1986-03-17 | 1986-03-17 | Mask holding device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62216227A true JPS62216227A (en) | 1987-09-22 |
Family
ID=13046502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61057114A Pending JPS62216227A (en) | 1986-03-17 | 1986-03-17 | Mask holding device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62216227A (en) |
-
1986
- 1986-03-17 JP JP61057114A patent/JPS62216227A/en active Pending
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