JPS63190620A - Method of removing trichloroethylene out of gas containing trichloroethylene - Google Patents

Method of removing trichloroethylene out of gas containing trichloroethylene

Info

Publication number
JPS63190620A
JPS63190620A JP62023357A JP2335787A JPS63190620A JP S63190620 A JPS63190620 A JP S63190620A JP 62023357 A JP62023357 A JP 62023357A JP 2335787 A JP2335787 A JP 2335787A JP S63190620 A JPS63190620 A JP S63190620A
Authority
JP
Japan
Prior art keywords
trichlorethylene
gas
c2hcl3
ozone
trichloroethylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62023357A
Other languages
Japanese (ja)
Inventor
Katsuhiro Saito
斎藤 克博
Yasushi Fukai
靖 深井
Yasutsugu Okuma
大熊 康嗣
Akira Suzuki
明 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanto Denka Kogyo Co Ltd
Original Assignee
Kanto Denka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanto Denka Kogyo Co Ltd filed Critical Kanto Denka Kogyo Co Ltd
Priority to JP62023357A priority Critical patent/JPS63190620A/en
Publication of JPS63190620A publication Critical patent/JPS63190620A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To remove C2HCl3 efficiently by treating gas containing C2HCl3 with O3 in the presence of O2, oxidative decomposing C2HCl3 and then carrying out absorption and adsorption treatments. CONSTITUTION:0.1-2mol of O3 to one (1) mol of C2HCl3 is added to gas containing C2HCl3 in the presence of O2, and said gas is oxidative decomposed at a temperature of 60-110 deg.C. HCl, CO2, phosgene and the like are contained in the oxidative decomposed gas as decomposition products, and gas is absorption treated with NaOH water solution or the like and adsorption treated with activated carbon or the like to remove decomposition products. Thus, C2HCl3 is removed efficiently.

Description

【発明の詳細な説明】 本発明はトリクロロエチレンを含むガス、殊に廃ガス、
の処理方法に関し、さらに詳しくはガス中に含まれるト
リクロロエチレンを分解し、次いで吸着及び/または吸
収処理により除去する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gas containing trichlorethylene, particularly a waste gas,
More specifically, it relates to a method for decomposing trichlorethylene contained in gas and then removing it by adsorption and/or absorption treatment.

従来の技術 トリクロロエチレン(C2HC13)は、その不燃性及
びすぐれた溶剤特性から、工業的溶剤として油脂の抽出
、金属部材の脱脂、ト9ライクリーニング等に広く用い
られている。それらの工業昧程からトリクロロエチレン
が大気中へ漏出するの全防止する必要があることは、明
らかである。
BACKGROUND OF THE INVENTION Trichlorethylene (C2HC13) is widely used as an industrial solvent for extraction of oils and fats, degreasing of metal parts, tri-cleaning, etc. due to its nonflammability and excellent solvent properties. It is clear that there is a need to prevent all leakage of trichlorethylene from these industrial facilities into the atmosphere.

トリクロロエチレンを含むガスの処理方法としては従来
より活性炭等の吸着剤によりトリクロロエチレンを吸着
し、しかる後脱着し回収する方法が行われている。しか
し、ガス中に含まれるトリクロロエチレン量が微少であ
る場合は吸着し、脱着して回収するよシも分解除去した
方がコストの而、特にエネルギーコストの面で有利とな
ることがある。
A conventional method for treating gas containing trichlorethylene is to adsorb trichlorethylene using an adsorbent such as activated carbon, and then desorb and recover it. However, if the amount of trichlorethylene contained in the gas is very small, it may be more advantageous in terms of cost, especially energy cost, to decompose and remove it, rather than collecting it by adsorption and desorption.

トリクロロエチレンは空気中においてはOf(ラジカル
及び太陽光によって分解することが知られているが、そ
の分解速度は比較的遅く太陽光12時間照射の場合で、
存在量の約17チが分解するのみである。従って、OH
ラジカルによる分解は工業的には適用しにくい。また空
気中でトリクロロエチレンを熱分解することもできるが
、この場合は高温が必要である上に完全に分解するには
長時間を要する。さらにエネルギーの非常に大きな熱源
がある場合には爆発を起す危険がある。
Trichlorethylene is known to be decomposed by radicals and sunlight in the air, but its decomposition rate is relatively slow when exposed to sunlight for 12 hours.
Only about 17 of the abundance is degraded. Therefore, OH
Decomposition by radicals is difficult to apply industrially. It is also possible to thermally decompose trichlorethylene in air, but in this case, high temperatures are required and it takes a long time to completely decompose. Furthermore, if there is a heat source with a very large amount of energy, there is a risk of an explosion.

発明が解決しようとする問題点 本発明の目的は、ガス中に含まれるトリクロロエチレン
を効率良く分解し、分解生成物を吸収及び/または吸着
除去する方法を提供することにある。本発明の目的は、
ガス中に含まれるトリクロロエチレンを低温でオゾンし
及び酸素によシ酸化分解し、しかる後にこのガスを吸着
及び/または吸収処理に付してトリクロロエチレンが含
まれないいガスを得ることにある。
Problems to be Solved by the Invention An object of the present invention is to provide a method for efficiently decomposing trichlorethylene contained in gas and removing the decomposition products by absorption and/or adsorption. The purpose of the present invention is to
The purpose of this method is to ozone the trichlorethylene contained in the gas at low temperatures and oxidatively decompose it with oxygen, and then subject this gas to adsorption and/or absorption treatment to obtain a gas that does not contain trichlorethylene.

本発明の一目的はガス中に微量に含まれるトリクロロエ
チレンを効率良く経済的に除去することにある。
One object of the present invention is to efficiently and economically remove trichlorethylene contained in trace amounts in gas.

問題を解決するための手段 かくして本発明は、トリクロロエチレンを含むガスを酸
素の存在下にオゾンで処理してトリクロロエチレンを酸
化分解し、しかる後にそのガスをさらに吸収及び/また
は吸着処理に付すことを特徴とするトリクロロエチレン
を含むガスからトリクロロエチレンを除去する方法上提
供する。
Means for Solving the Problem The invention is thus characterized in that a gas containing trichlorethylene is treated with ozone in the presence of oxygen to oxidatively decompose the trichlorethylene, and then the gas is subjected to a further absorption and/or adsorption treatment. A method for removing trichlorethylene from a gas containing trichlorethylene is provided.

オゾンは、オゾン発生器により空気あるいは酸素の一部
をオゾン化する゛ことにより得、トリクロロエチレン金
含むガスに混合する。酸素は、トリクロロエチレンを含
むガスが空気である場合は、通常必要量以上の酸素が存
在するので混合する必要はないが、混合する必要がある
場合はオゾンと共に混合するのが好ましい。
Ozone is obtained by ozonizing a portion of air or oxygen using an ozone generator, and is mixed with trichlorethylene gold-containing gas. When the gas containing trichlorethylene is air, there is usually more than the required amount of oxygen, so there is no need to mix oxygen, but if mixing is necessary, it is preferably mixed with ozone.

混合するオゾンの量はトリクロロエチレン1モルニ対し
て工/、。〜2モルであることが好ましく、1/1゜モ
ル未満ではトリクロロエチレンの分解速度が遅くなり、
好ましくない。また酸素はトリクロロエチレン1モルに
対して5モル以上存在すれば良い。
The amount of ozone to be mixed is 1 mole of trichlorethylene. The amount is preferably ~2 mol, and if it is less than 1/1 mol, the decomposition rate of trichlorethylene will be slow;
Undesirable. Further, oxygen may be present in an amount of 5 moles or more per mole of trichlorethylene.

分解温度は60〜110℃、特に70〜90’Cが好ま
しく、印℃未満では分解速度が遅く、ま7?1.llO
’c以上ではオゾンの反応効率が低くなり、いずれも好
ましくない。接触時間はトリクロロエチレン、オゾン及
び酸素の濃度、温度によるが120秒あれば充分である
The decomposition temperature is preferably 60 to 110°C, particularly 70 to 90'C; below the mark, the decomposition rate is slow; llO
If the temperature exceeds 'c', the reaction efficiency of ozone decreases, and both are unfavorable. The contact time depends on the concentrations of trichlorethylene, ozone and oxygen, and temperature, but 120 seconds is sufficient.

広範囲の濃度のトリクロロエチレンを分解できるが、ガ
ス中に含まれるトリクロロエチレン濃度が高い場合は予
め活性炭吸着等により回収して処理量を減少させた方が
経済的に有利である。従って本発明を実施するのはトリ
クロロチレン濃度が2%以下、特に好ましいのは50〜
5000 P程度である場合が好ましい。
Although it is possible to decompose trichlorethylene in a wide range of concentrations, if the concentration of trichlorethylene contained in the gas is high, it is economically advantageous to recover it by activated carbon adsorption or the like in advance to reduce the amount to be processed. Therefore, in carrying out the present invention, the trichlorothylene concentration is 2% or less, particularly preferably 50 to 50%.
It is preferable that it is about 5000 P.

酸化分解処理後のガス中に含まれる分解生成物として代
表的な化学種は、H(J、ホスゲン、CO□。
Typical chemical species as decomposition products contained in the gas after oxidative decomposition treatment are H(J, phosgene, CO□.

E(20等であり、極微量のCl2O,C12等が検出
されることもある。
E(20, etc.), and trace amounts of Cl2O, C12, etc. may be detected.

酸化分解処理後のガスは、吸収剤及び/または吸着剤と
接触させ、分解生成物を除去する。吸収または吸着に使
用する薬剤としては、水酸化ナトリウム、水酸化カリウ
ム、炭酸ナトリウム、炭酸カリウム等のアルカリ剤の固
体床もしくは水溶液、石灰乳等のスラリー、あるいはソ
ーダライム、活性炭等が具体例として挙げられる。
The gas after the oxidative decomposition treatment is brought into contact with an absorbent and/or adsorbent to remove decomposition products. Examples of agents used for absorption or adsorption include solid beds or aqueous solutions of alkaline agents such as sodium hydroxide, potassium hydroxide, sodium carbonate, and potassium carbonate, slurries such as milk of lime, or soda lime and activated carbon. It will be done.

実施例 以下、実施例及び比較例により本発明を具体的に説明す
る。
EXAMPLES Hereinafter, the present invention will be specifically explained using Examples and Comparative Examples.

実施例1 トリクロロエチレンk 1.8 vol %含んだ空気
をテフロン製の反応器(内径8RI、長さ6rrL)に
、滞留時間30〜40秒となる流速で供給し、オゾンを
0.497hで混合した。反応器は閉℃に保ち、処理ガ
スは10%水酸化ナトリウム水溶液で吸収処理した。
Example 1 Air containing 1.8 vol % of trichlorethylene k was supplied to a Teflon reactor (inner diameter 8RI, length 6rrL) at a flow rate such that the residence time was 30 to 40 seconds, and ozone was mixed in for 0.497 hours. . The reactor was kept closed at °C, and the treated gas was absorbed with a 10% aqueous sodium hydroxide solution.

実施例2 実施例1で用いた反応器にトリクロロエチレンを0,2
 vo1%含有し念空気とオゾンo、xg/hを、滞留
時間30〜40秒となる様に供給し、温度を(資)℃に
保った。処理ガスは5チ水酸化ナトリクム水溶液で吸収
処理した。
Example 2 Trichlorethylene was added to the reactor used in Example 1 at 0.2
Air containing 1% VO and ozone xg/h were supplied so that the residence time was 30 to 40 seconds, and the temperature was maintained at ℃. The treated gas was absorbed and treated with an aqueous solution of pentate sodium hydroxide.

実施例3 パイレックス製反応器(内径40咽、長さ400 tr
y )にトリクロロエチレンf 1.Ovow % 含
む空気とオゾンo、6g/h  や滞留時間30〜40
秒で供給し、温度を閉℃に保った。処理ガスは10%水
酸化ナトリウム水溶液で吸収処理した。
Example 3 Pyrex reactor (inner diameter 40 mm, length 400 tr
y) and trichlorethylene f1. Ovow % Containing air and ozone o, 6g/h and residence time 30-40
The temperature was kept at 0°C. The treated gas was absorbed and treated with a 10% aqueous sodium hydroxide solution.

実施例4 トリクロロエチレンk O,05vol %含有した空
気をテフロン製反応器(内径8咽、長さ2m)に滞留時
間30〜40秒で供給し、オゾン6o、x9/hで混合
した。温度を関℃に保った。処理ガスは5%水酸化ナト
リウム水溶液に吸収処理した。
Example 4 Air containing 05 vol % of trichlorethylene k was supplied to a Teflon reactor (inner diameter 8 mm, length 2 m) for a residence time of 30 to 40 seconds, and mixed with ozone at 6 o, x9/h. The temperature was maintained at 30°F. The treated gas was absorbed into a 5% aqueous sodium hydroxide solution.

比較例1 実施例1の操作を繰り返えしたが、オゾンの混合を省略
した。
Comparative Example 1 The operation of Example 1 was repeated, but ozone mixing was omitted.

比較例2 実施例3で用いた反応器にトリクロロエチレンをl、Q
volチ含む窒素とオゾン0.6g/ht滞留時間30
〜40秒で供給し、温度全開℃に保った。処理ガスは1
0% 水酸化ナトリウム水溶液で吸収処理した。
Comparative Example 2 Trichlorethylene was added to the reactor used in Example 3.
Nitrogen and ozone containing vol. 0.6g/h Residence time 30
It was fed for ~40 seconds and the temperature was kept at full temperature. Processing gas is 1
Absorption treatment was carried out with 0% aqueous sodium hydroxide solution.

以上の実施例1〜4及び比較例1〜2の結果を。The results of Examples 1 to 4 and Comparative Examples 1 to 2 above.

下表に示す。これらの結果の比較より、本発明の効果は
明らかである。
Shown in the table below. From a comparison of these results, the effects of the present invention are clear.

Claims (5)

【特許請求の範囲】[Claims] (1)トリクロロエチレンを含むガスを酸素の存在下に
オゾンで処理してトリクロロエチレンを酸化分解し、し
かる後にそのガスをさらに吸収及び/または吸着処理に
付すことを特徴とするトリクロロエチレンを含むガスか
らトリクロロエチレンを除去する方法。
(1) Trichlorethylene is removed from a trichlorethylene-containing gas by treating the trichlorethylene-containing gas with ozone in the presence of oxygen to oxidize and decompose the trichlorethylene, and then subjecting the gas to further absorption and/or adsorption treatment. How to remove.
(2)オゾン及び酸素の量がトリクロロエチレン1モル
に対して各々1/10〜2モル及び5モル以上である特
許請求の範囲第1項に記載の方法。
(2) The method according to claim 1, wherein the amounts of ozone and oxygen are 1/10 to 2 mol and 5 mol or more, respectively, per 1 mol of trichlorethylene.
(3)酸化分解処理温度が60〜110℃である特許請
求の範囲第1または2項に記載の方法。
(3) The method according to claim 1 or 2, wherein the oxidative decomposition treatment temperature is 60 to 110°C.
(4)酸化分解処理前のガス中のトリクロロエチレン濃
度が2容量%以下である特許請求の範囲第1〜3項のい
ずれかに記載の方法。
(4) The method according to any one of claims 1 to 3, wherein the trichlorethylene concentration in the gas before the oxidative decomposition treatment is 2% by volume or less.
(5)吸収処理はアルカリ剤を用いて実施する特許請求
の範囲第1〜4項のいずれかに記載の方法。
(5) The method according to any one of claims 1 to 4, wherein the absorption treatment is performed using an alkaline agent.
JP62023357A 1987-02-03 1987-02-03 Method of removing trichloroethylene out of gas containing trichloroethylene Pending JPS63190620A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62023357A JPS63190620A (en) 1987-02-03 1987-02-03 Method of removing trichloroethylene out of gas containing trichloroethylene

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62023357A JPS63190620A (en) 1987-02-03 1987-02-03 Method of removing trichloroethylene out of gas containing trichloroethylene

Publications (1)

Publication Number Publication Date
JPS63190620A true JPS63190620A (en) 1988-08-08

Family

ID=12108320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62023357A Pending JPS63190620A (en) 1987-02-03 1987-02-03 Method of removing trichloroethylene out of gas containing trichloroethylene

Country Status (1)

Country Link
JP (1) JPS63190620A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02115096A (en) * 1988-10-24 1990-04-27 Ultrox Internatl Decomposition of volatile organohalogen compound contained in gas and aqueous solution
US6503469B2 (en) * 1998-06-22 2003-01-07 Mitsubishi Heavy Industries, Ltd. Method for processing polluted fluid containing pollutants

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5110174A (en) * 1974-07-15 1976-01-27 Sumitomo Chemical Co Haigasuchuno harogenkafuhowatankasuisono jokyoho

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5110174A (en) * 1974-07-15 1976-01-27 Sumitomo Chemical Co Haigasuchuno harogenkafuhowatankasuisono jokyoho

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02115096A (en) * 1988-10-24 1990-04-27 Ultrox Internatl Decomposition of volatile organohalogen compound contained in gas and aqueous solution
US6503469B2 (en) * 1998-06-22 2003-01-07 Mitsubishi Heavy Industries, Ltd. Method for processing polluted fluid containing pollutants

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