JPS63186765U - - Google Patents
Info
- Publication number
- JPS63186765U JPS63186765U JP7894687U JP7894687U JPS63186765U JP S63186765 U JPS63186765 U JP S63186765U JP 7894687 U JP7894687 U JP 7894687U JP 7894687 U JP7894687 U JP 7894687U JP S63186765 U JPS63186765 U JP S63186765U
- Authority
- JP
- Japan
- Prior art keywords
- power source
- discharge power
- substrate electrode
- electrode
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7894687U JPS63186765U (bg) | 1987-05-26 | 1987-05-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7894687U JPS63186765U (bg) | 1987-05-26 | 1987-05-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63186765U true JPS63186765U (bg) | 1988-11-30 |
Family
ID=30928354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7894687U Pending JPS63186765U (bg) | 1987-05-26 | 1987-05-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63186765U (bg) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54139892A (en) * | 1978-04-17 | 1979-10-30 | Varian Associates | Method and apparatus for regulating coated speed by computercontrol in sputtering apparatus |
| JPS5651218B2 (bg) * | 1973-03-12 | 1981-12-03 | ||
| JPS5927406A (ja) * | 1982-08-07 | 1984-02-13 | 富士通株式会社 | スパツタリングによる薄膜の形成方法 |
| JPS6115966A (ja) * | 1984-06-30 | 1986-01-24 | Shimadzu Corp | スパツタリング装置 |
| JPS6233765A (ja) * | 1985-08-02 | 1987-02-13 | Fujitsu Ltd | マグネトロンスパツタ装置 |
-
1987
- 1987-05-26 JP JP7894687U patent/JPS63186765U/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5651218B2 (bg) * | 1973-03-12 | 1981-12-03 | ||
| JPS54139892A (en) * | 1978-04-17 | 1979-10-30 | Varian Associates | Method and apparatus for regulating coated speed by computercontrol in sputtering apparatus |
| JPS5927406A (ja) * | 1982-08-07 | 1984-02-13 | 富士通株式会社 | スパツタリングによる薄膜の形成方法 |
| JPS6115966A (ja) * | 1984-06-30 | 1986-01-24 | Shimadzu Corp | スパツタリング装置 |
| JPS6233765A (ja) * | 1985-08-02 | 1987-02-13 | Fujitsu Ltd | マグネトロンスパツタ装置 |