JPS63185224U - - Google Patents
Info
- Publication number
- JPS63185224U JPS63185224U JP1987075706U JP7570687U JPS63185224U JP S63185224 U JPS63185224 U JP S63185224U JP 1987075706 U JP1987075706 U JP 1987075706U JP 7570687 U JP7570687 U JP 7570687U JP S63185224 U JPS63185224 U JP S63185224U
- Authority
- JP
- Japan
- Prior art keywords
- ray
- thin film
- exposure mask
- mask
- absorbing pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 claims description 5
- 239000010408 film Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987075706U JPH066504Y2 (ja) | 1987-05-20 | 1987-05-20 | Ｘ線露光用マスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987075706U JPH066504Y2 (ja) | 1987-05-20 | 1987-05-20 | Ｘ線露光用マスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63185224U true JPS63185224U (lv) | 1988-11-29 |
| JPH066504Y2 JPH066504Y2 (ja) | 1994-02-16 |
Family
ID=30922101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987075706U Expired - Lifetime JPH066504Y2 (ja) | 1987-05-20 | 1987-05-20 | Ｘ線露光用マスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH066504Y2 (lv) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60176751A (ja) * | 1984-02-23 | 1985-09-10 | セイコーエプソン株式会社 | マスク |
| JPS60257518A (ja) * | 1984-06-04 | 1985-12-19 | Hitachi Ltd | 転写マスク及びその製造方法 |
| JPS6132425A (ja) * | 1984-07-24 | 1986-02-15 | Nec Corp | Ｘ線露光マスク |
| JPS61198722A (ja) * | 1985-02-28 | 1986-09-03 | Nec Corp | Ｘ線露光マスク及びその製造方法 |
-
1987
- 1987-05-20 JP JP1987075706U patent/JPH066504Y2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60176751A (ja) * | 1984-02-23 | 1985-09-10 | セイコーエプソン株式会社 | マスク |
| JPS60257518A (ja) * | 1984-06-04 | 1985-12-19 | Hitachi Ltd | 転写マスク及びその製造方法 |
| JPS6132425A (ja) * | 1984-07-24 | 1986-02-15 | Nec Corp | Ｘ線露光マスク |
| JPS61198722A (ja) * | 1985-02-28 | 1986-09-03 | Nec Corp | Ｘ線露光マスク及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH066504Y2 (ja) | 1994-02-16 |