JPS6318053A - Formation of colored thin film - Google Patents
Formation of colored thin filmInfo
- Publication number
- JPS6318053A JPS6318053A JP16043786A JP16043786A JPS6318053A JP S6318053 A JPS6318053 A JP S6318053A JP 16043786 A JP16043786 A JP 16043786A JP 16043786 A JP16043786 A JP 16043786A JP S6318053 A JPS6318053 A JP S6318053A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- thin film
- film
- thin
- vacuum deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 33
- 230000015572 biosynthetic process Effects 0.000 title description 3
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 11
- 239000000843 powder Substances 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 3
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- 229910001873 dinitrogen Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 14
- 238000010438 heat treatment Methods 0.000 abstract description 11
- 238000010894 electron beam technology Methods 0.000 abstract description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000012495 reaction gas Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003852 thin film production method Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は真空反応槽内でＡｌ粉を処理物に蒸着させて有
色薄膜を生成する方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for producing a colored thin film by depositing Al powder onto a treated object in a vacuum reaction tank.
（従来の技術）
従来有色薄膜、例えば金色装飾膜を生成する方法として
は、第２図て示す成膜装置か用いられる。すなわち真空
反応槽ｌを真空ポンプ２によって排気して所定の真空蒸
着圧力と為し、加熱ボート３内のＴｉを抵抗若しくは電
子ビーム、レザー光によって加熱し蒸発させて処理物４
に蒸着させる。(Prior Art) Conventionally, as a method for producing a colored thin film, for example, a golden decorative film, a film forming apparatus shown in FIG. 2 is used. That is, the vacuum reaction tank 1 is evacuated by the vacuum pump 2 to achieve a predetermined vacuum deposition pressure, and the Ti in the heating boat 3 is heated and evaporated by a resistor, an electron beam, or a laser light, and the processed material 4 is heated.
Deposit on.
通常真空反応槽ｌ内には反応ガス導入口５を介してＮ２
等の低圧不活性ガスか導入され、又真空反応槽ｌ内では
直流電源６によってプラズマ放電を起して蒸発したＴｉ
を高エネルギー化してその気体イオンを処理物４に蒸着
させるものである。Normally, N2 is introduced into the vacuum reaction tank l through the reaction gas inlet 5.
A low-pressure inert gas such as
is made to have high energy and the gaseous ions are vapor-deposited onto the processing material 4.
１−記の如く蒸発したＴｉは、真空反応槽ｌ内の反応ガ
スＮ２と反応し、Ｔｉ等の蒸着層か処理物４上に形成さ
れ、所謂金色の装飾膜層が形成されることになる。1- The evaporated Ti reacts with the reaction gas N2 in the vacuum reaction tank 1, and a vapor deposited layer of Ti, etc. is formed on the processed material 4, resulting in the formation of a so-called golden decorative film layer. .
（問題点）
ト記従来の有色薄膜生成方法においては、真空反応槽ｌ
内を直流電源によって電圧をかけ、所謂直流電場と為し
、且つ真空反応槽ｌ内に反応ガスを導入するのて成膜装
置自体か大ががりとなり、又直流電源等の付加設備が製
造コスト等を上昇させている。(Problem) In the conventional colored thin film production method, the vacuum reaction tank l
A voltage is applied inside the chamber by a DC power supply to create a so-called DC electric field, and a reaction gas is introduced into the vacuum reactor, making the film forming apparatus itself bulky, and additional equipment such as a DC power supply increases manufacturing costs. etc. are increasing.
（問題点を解決するための手段）
本発明は上記問題点を解決すべく為されたもので、真空
反応槽内において直流電場を形成することなく所謂プラ
ズマ発生の為の直流電源を要することなく、■つ又Ａｌ
のみで有色装飾膜を形成するのて反応ガス等の導入をも
必要としないものである。すなわち真空槽内を１０−′
″ＴｏｒｒＴｏｒｒ程度圧力にしてＡ５Ｌ蒸着を行う第
１の工程と、同真空蒸着圧力を１０−”Ｔｏｒｒ程度ま
で変化させてＡｌ薄膜を生成する第２の工程から成る有
色薄膜の生成方法を提供するものである。(Means for Solving the Problems) The present invention has been made to solve the above-mentioned problems, and it does not require the formation of a DC electric field in a vacuum reaction tank and does not require a DC power source for plasma generation. , ■ Tsumata Al
Since a colored decorative film can be formed by using only this method, it is not necessary to introduce a reactive gas or the like. In other words, the inside of the vacuum chamber is 10-'
To provide a method for producing a colored thin film, which comprises a first step of performing A5L evaporation at a pressure of about 10 Torr, and a second step of producing an Al thin film by changing the same vacuum evaporation pressure to about 10 Torr. It is.
（作用）
この有色薄膜の生成方法は、高真空内におけるへ交蒸着
によって銀色のＡ文薄膜下層を生成し、更に第２工程と
して低真空内においてＡｓＬ蒸着な徐々に行い茶色のＡ
ｓＬ薄膜上層を生成するものであり、銀色の薄膜下層と
茶色の薄膜下層相互の干渉作用によって全体として金色
の装飾薄膜が生成できるものである。(Function) This method of producing a colored thin film is to produce a silver A-shaped thin film lower layer by alternating vapor deposition in a high vacuum, and then gradually perform AsL vapor deposition in a low vacuum as a second step.
The sL thin film upper layer is produced, and a golden decorative thin film can be produced as a whole by mutual interference between the silver thin film lower layer and the brown thin film lower layer.
（実施例）
以下第１図の成膜装置により本発明の有色薄膜の生成方
法について説明する。尚上記従来例と相異ない構成部品
等については同一の番号を付して説明する。(Example) The method for producing a colored thin film of the present invention will be described below using the film forming apparatus shown in FIG. Components and the like that are different from those of the conventional example described above will be described using the same numbers.
成膜装置としては、真空ポンプ２の排気によって真空反
応槽ｌ内を所定の真空蒸着圧力とする。In the film forming apparatus, the inside of the vacuum reaction tank 1 is brought to a predetermined vacuum deposition pressure by exhausting the vacuum pump 2.
真空反応槽ｌの下部には加熱ボート３が配置され、加熱
ボート３内には所定量のＡＭ粉が投入され、このＡｌ粉
を抵抗、電子ビーム、レザー光線等によって加熱するこ
とにより蒸発させる。又加熱ボート３の略真上には有色
薄膜層が生成される処理物４が配置されている。更に真
空反応槽ｌの側部には内部の真空蒸着圧力を変化させる
為のリークバルブ７が設けられている。A heating boat 3 is arranged at the bottom of the vacuum reaction tank 1, and a predetermined amount of AM powder is put into the heating boat 3, and the Al powder is evaporated by heating with a resistor, an electron beam, a laser beam, or the like. Further, a processing object 4 on which a colored thin film layer is generated is placed almost directly above the heating boat 3. Furthermore, a leak valve 7 is provided on the side of the vacuum reaction tank 1 to change the internal vacuum deposition pressure.
有色薄膜の具体的生成方法について述べると、先ず真空
ポンプ２の排気作用によって真空反応槽【内をＩｎ−５
Ｔｏｒｒ程度の高真空とする。そして加熱ボート３を抵
抗、電子ビーム、レザー光線等によって加熱し、加熱ボ
ート３内に投入されたＡＵ粉を蒸発させる。蒸発したＡ
１分子は加熱ボート３の１方に配置された処理物４に蒸
着し所定のＡ文薄膜下層を生成する。所定時間経過後リ
ークバルブ７を開栓し、大気を導入して真空反応槽ｌ内
の真空蒸着圧力を１Ｏ−２Ｔｏｒｒ程度まで変化させる
。そして前記同様加熱ボート３を加熱してＡ１分子を処
理物４に蒸着させて、１記へ文薄膜下層の上に新たなＡ
文薄膜上層を生成する。To describe the specific method for producing a colored thin film, first, the inside of the vacuum reaction tank [In-5
The vacuum is set to be as high as Torr. Then, the heating boat 3 is heated by a resistor, an electron beam, a laser beam, etc., and the AU powder put into the heating boat 3 is evaporated. evaporated A
One molecule is deposited on the treatment object 4 placed on one side of the heating boat 3 to form a predetermined A-pattern thin film lower layer. After a predetermined period of time has elapsed, the leak valve 7 is opened and the atmosphere is introduced to change the vacuum deposition pressure in the vacuum reaction tank 1 to about 10-2 Torr. Then, as described above, the heating boat 3 is heated to deposit A1 molecules onto the treated material 4, and as described in step 1, new A1 molecules are deposited on the lower layer of the thin film.
Generate a thin film upper layer.
尚リークバルブによる真空蒸着圧力の変化は大気のみな
らずＮ２ガスを導入するものであってもよい。The vacuum deposition pressure may be changed by introducing not only the atmosphere but also N2 gas by the leak valve.
以上の如く、第１の工程ではＡｌ粉を高真空中にて蒸着
させるので／１ｋＪｌ薄膜下層は全体として銀色薄膜を
呈する。−上第２の工程ではＡ又蒸着が低真空中で徐々
に行われる為生成されるＡｓＬ薄膜七層は褐色薄膜とな
る。よって銀色薄膜と褐色薄膜とを積層した有色薄膜は
、銀色と褐色の干渉作用によって金色状を呈することに
なる。As described above, in the first step, the Al powder is deposited in a high vacuum, so that the lower layer of the 1 kJl thin film exhibits a silvery thin film as a whole. - In the second step above, vapor deposition is carried out gradually in a low vacuum, so the seven AsL thin films produced become a brown thin film. Therefore, a colored thin film formed by laminating a silver thin film and a brown thin film takes on a golden appearance due to the interference between the silver and brown.
（効果）
以上の様に本発明の有色薄膜の生成方法においては、真
空反応槽内において直流電場を形成することなく、又反
応ガスの導入も必要とせずに金色状の薄膜を生成するこ
とが出来る。よってプラズマ発生用の直流電源装置等を
必要とせず、又反応ガスを導入する必要もないので成膜
装置は簡易となり、コスト的にも大幅な低減が図られる
。(Effects) As described above, in the method for producing a colored thin film of the present invention, a golden-colored thin film can be produced without forming a DC electric field in a vacuum reaction chamber or without introducing a reaction gas. I can do it. Therefore, there is no need for a direct current power supply device for plasma generation, and there is no need to introduce a reactive gas, so the film forming apparatus is simplified and the cost can be significantly reduced.
第１図は、本発明に用いられる＃ｔ、膜装置を示す概略
図、
第２図は、従来の成膜装置を示す概略図である。
尚、図中１は真空反応槽、 ２は真空ポンプ。
３は加熱ボート、 ４は処理物、 ７はリークバルブで
ある。FIG. 1 is a schematic diagram showing a #t film forming apparatus used in the present invention, and FIG. 2 is a schematic diagram showing a conventional film forming apparatus. In the figure, 1 is a vacuum reaction tank and 2 is a vacuum pump. 3 is a heating boat, 4 is a processed material, and 7 is a leak valve.
Claims (2)
に有色薄膜を生成するものであって、真空反応槽内を１
０＾−＾５Ｔｏｒｒ程度の真空蒸着圧力にしてＡｌ蒸着
を行いＡｌ薄膜下層を生成する第１の工程と、次いで真
空反応槽内の真空蒸着圧力を１０＾−＾２Ｔｏｒｒ程度
まで変化させて上記Ａｌ薄膜下層の上にＡｌ薄膜上層を
生成する第２の工程から成る有色薄膜の生成方法。(1) A method that heats and evaporates Al powder in a vacuum reaction tank to generate a colored thin film on the processed material, and the inside of the vacuum reaction tank is
The first step is to perform Al evaporation at a vacuum evaporation pressure of about 0^-^5 Torr to form an Al thin film lower layer, and then to change the vacuum evaporation pressure in the vacuum reaction tank to about 10^-^2 Torr to deposit the Al. A method for producing a colored thin film comprising a second step of producing an upper Al thin film layer on the lower thin film layer.
力の変化は大気若しくは窒素ガスの導入により行うこと
を特徴とする特許請求の範囲第１項記載の有色薄膜の生
成方法。(2) The method for producing a colored thin film according to claim 1, wherein the vacuum deposition pressure from the first step to the second step is changed by introducing air or nitrogen gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16043786A JPS6318053A (en) | 1986-07-08 | 1986-07-08 | Formation of colored thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16043786A JPS6318053A (en) | 1986-07-08 | 1986-07-08 | Formation of colored thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6318053A true JPS6318053A (en) | 1988-01-25 |
Family
ID=15714914
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16043786A Pending JPS6318053A (en) | 1986-07-08 | 1986-07-08 | Formation of colored thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6318053A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0299054A (en) * | 1988-10-06 | 1990-04-11 | Toshiro Nakamura | Soft attachment |
| US5343783A (en) * | 1991-11-07 | 1994-09-06 | Unisia Jecs Corporation | Speed change controller for a vehicle automatic transmission |
| WO1999004057A1 (en) * | 1997-07-14 | 1999-01-28 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for forming thin functional film |
-
1986
- 1986-07-08 JP JP16043786A patent/JPS6318053A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0299054A (en) * | 1988-10-06 | 1990-04-11 | Toshiro Nakamura | Soft attachment |
| US5343783A (en) * | 1991-11-07 | 1994-09-06 | Unisia Jecs Corporation | Speed change controller for a vehicle automatic transmission |
| WO1999004057A1 (en) * | 1997-07-14 | 1999-01-28 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for forming thin functional film |
| US6337105B1 (en) | 1997-07-14 | 2002-01-08 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for forming thin functional film |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4867859A (en) | Apparatus for forming a thin film | |
| JPS582022A (en) | Thin film formation | |
| JPS62284076A (en) | Formation of thin film and its device | |
| JP4197204B2 (en) | Magnesium oxide production equipment | |
| JPS6318053A (en) | Formation of colored thin film | |
| JPH08115912A (en) | Manufacture of silicon nitride film | |
| JPS63317676A (en) | Production of thin metallic compound film having non-grained structure | |
| JP2776807B2 (en) | Method for manufacturing semiconductor device | |
| JPH03122266A (en) | Production of thin nitride film | |
| JP4038473B2 (en) | Arc discharge type vacuum film forming apparatus and film forming method | |
| JPH08209329A (en) | Winding-up vapor-deposition device and cvd device | |
| JPS6362862A (en) | Ceramic coated ti and ti alloy product and its production | |
| JPH02270974A (en) | Surface coloring method | |
| JP7116248B2 (en) | Plasma processing apparatus and plasma processing method | |
| JPS63161156A (en) | Thin hard blue film and its production | |
| JPS6355929A (en) | Manufacture of semiconductor thin film | |
| JPS63114966A (en) | Apparatus for producing thin film | |
| JPS5952526A (en) | Method for sputtering metal oxide film | |
| JPS62229841A (en) | Vacuum treatment apparatus | |
| JPS63156325A (en) | Manufacture of thin film and apparatus therefor | |
| JPH0250950A (en) | Manufacture of vapor-deposited film | |
| JP2005220445A (en) | Winding type vapor deposition system and cvd system | |
| JPH03131024A (en) | Semiconductor etching | |
| JPH05255859A (en) | Thin film forming equipment | |
| JPS5983762A (en) | Evacuating method of apparatus for vacuum vapor deposition |