JPS6318050A - Cbn coating method - Google Patents
Cbn coating methodInfo
- Publication number
- JPS6318050A JPS6318050A JP16214286A JP16214286A JPS6318050A JP S6318050 A JPS6318050 A JP S6318050A JP 16214286 A JP16214286 A JP 16214286A JP 16214286 A JP16214286 A JP 16214286A JP S6318050 A JPS6318050 A JP S6318050A
- Authority
- JP
- Japan
- Prior art keywords
- film
- cbn
- coating
- amorphous
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 6
- -1 nitrogen ions Chemical class 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims abstract description 4
- 238000004544 sputter deposition Methods 0.000 abstract description 5
- 238000003746 solid phase reaction Methods 0.000 abstract description 4
- 229910000997 High-speed steel Inorganic materials 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000007733 ion plating Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 16
- 150000002500 ions Chemical class 0.000 description 7
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000009931 pascalization Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は切削工具あるいけ紙工機械等の刃物類等に適用
される超硬質皮膜であるCBNコーティング、又、半導
体分野Kj?ける絶縁膜としても利用可能なCBNコー
ティングに関する。[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to CBN coating, which is an ultra-hard coating applied to cutlery such as cutting tools and paper processing machines, and also to the semiconductor field. This invention relates to a CBN coating that can also be used as an insulating film.
CBN (立方晶窒化ホウ素)II′i、天然には存在
しない人工合成化合物であり、従来は六方晶窒化ホウ素
(以下h−BMと記す)1に超高温・高圧(温度160
DK以上、圧力40 Kbar 以上)処理することに
よって得られていた。CBN (cubic boron nitride) II'i is an artificially synthesized compound that does not exist in nature.
DK or higher, pressure 40 Kbar or higher).
しかし、従来法では粉末あるいは粒状でしか製造できず
、これを研削砥石等の工具として使用する場合には、樹
脂あるhは金属を結合材として焼結して用いるかあるい
はCBN粒子を金属めっき膜中に分散させた電着工具と
して用いるという方法が採られている。However, conventional methods can only produce powder or granules, and when using them as tools such as grinding wheels, the resin is either sintered with metal as a binder, or CBN particles are coated with a metal plating film. A method has been adopted in which the electrodeposition tool is used as an electrodeposition tool by dispersing it in the inside.
しかし、これらの方法では、(])CBNが粒子である
ため寸法精度が不良(最小でも+!1000 :平均粒
径5〜6μm )で精密加工に使用できない、(2)樹
脂や金属を結合材としているため付着力(CBN保持力
)が低い、(3)超高温高圧処理のため生産性が低くコ
スト高となる、等の欠点を有している。However, with these methods, (2) CBN cannot be used for precision machining due to poor dimensional accuracy since it is a particle (minimum +!1000: average particle size 5 to 6 μm); (2) CBN cannot be used as a binder; (3) Low productivity and high cost due to ultra-high temperature and high pressure treatment.
このため、CBNをコーティングすることができれば、
上記問題点が解消されるため、各種pvD(物理的蒸着
)法によるCBNコーティングが鋭意研究中であるがい
まだ成功には到っていない。Therefore, if CBN can be coated,
In order to solve the above problems, CBN coating using various PVD (physical vapor deposition) methods is under active research, but no success has been achieved yet.
従来の高温高圧処理による粒子状CBNの利用に代わる
新しいOBMの利用法としてコーティングがあり、特に
サブミクロンオーダーの超精密加工用工具としてはCB
Nコーティングが必要不可欠であるとも云われている。Coating is a new method of using OBM that replaces the use of particulate CBN through conventional high-temperature and high-pressure processing.
It is also said that N coating is essential.
このCBNコーティングとしてPVD法、中でもイオン
ブレーティング、スパッタリング法による方法が研究さ
れているが、まだ完全な0Bliコーテイングは完成さ
れていない。すなわち、これらの方法けB又は六方晶B
Nt−原料として気相反応によりCBNを析出しようと
するものであるが、すでに述べたようにCBNは超高温
・高圧処理で合成されるものであり、これらの方法は、
低温処理であるため合成が困難であるためと思われる。Although methods using PVD methods, especially ion blasting and sputtering methods, are being studied for this CBN coating, a complete 0Bli coating has not yet been completed. That is, these methods B or hexagonal crystal B
These methods attempt to precipitate CBN as an Nt raw material through a gas phase reaction, but as mentioned above, CBN is synthesized through ultra-high temperature and high pressure treatment.
This is probably because synthesis is difficult due to low-temperature processing.
又このような気相コーティング法は得られる皮膜性基本
的には非平衡状態の膜であシ、元来、非晶質膜になりや
すく、この点もOBM合成困層な理由と思われる。Furthermore, the film obtained by such a vapor phase coating method is basically a film in a non-equilibrium state and tends to become an amorphous film by nature, which is also considered to be the reason why OBM synthesis is difficult.
本発明は上記従来法におけるような欠点を解消した0B
BIコーテイングを形成させる方法を提供しようとする
ものである。The present invention solves the drawbacks of the above conventional method.
It is an object of the present invention to provide a method for forming a BI coating.
〔問題点を解決するための手段]
本発明は母材上にあらかじめ非晶質又は微結晶状のBM
皮膜をコーティングした後、同皮膜に窒素イオンを照射
しく1!BN’i形成することを特徴とするCBN被覆
法である。[Means for solving the problems] The present invention provides a method for forming amorphous or microcrystalline BM on a base material in advance.
After coating the film, irradiate the film with nitrogen ions! This is a CBN coating method characterized by forming BN'i.
従来の手法では非晶質BN膜になることが多いが、本発
明はこの非晶質膜の非平衡エネルギーを利用して固相反
応によfiCBNt−合成するものである。すなわち気
相法によって非晶質膜を作成しその後この皮膜をイオン
照射処理することにより固相反応を生じさせてCBNf
t合成するものである。又、このBN中にFe、Ni。Conventional methods often result in an amorphous BN film, but the present invention utilizes the non-equilibrium energy of this amorphous film to synthesize fiCBNt by solid phase reaction. That is, an amorphous film is created by a gas phase method, and then this film is ion irradiated to cause a solid phase reaction and CBNf
t synthesis. Also, this BN contains Fe and Ni.
Or 等の触媒金W4を添加すると固相反応条件が緩和
されるためさらに有利となる。Addition of catalytic gold W4, such as Or, is even more advantageous because the solid phase reaction conditions are relaxed.
さらに、厚膜が必要な場合には本発明方法を数回繰返す
ことによシ所望の厚みの膜を得ることができる。Furthermore, if a thick film is required, a film of the desired thickness can be obtained by repeating the method of the present invention several times.
非晶質膜には大きな非平衡エネルギーが存在するため、
通常の合成法に比べて低温−低圧で処理可能である。又
、本発明方法によれば従来不可能であったCBNコーテ
ィングが可能となる。Since there is a large nonequilibrium energy in an amorphous film,
Compared to normal synthesis methods, it can be processed at lower temperatures and pressures. Furthermore, according to the method of the present invention, CBN coating, which was previously impossible, becomes possible.
[実験例1]
30■×30■×5鱈厚さの高速度鋼(8KIi55)
を基板として、その表面に反応性高周波イオンブレーテ
ィングおよび高周波スパッタリング法により、BMをコ
ーティングした。膜厚は1 amであシコーティング条
件は以下の通シである。[Experiment Example 1] High-speed steel (8KIi55) with a thickness of 30×30×5
was used as a substrate, and BM was coated on the surface by reactive high frequency ion blating and high frequency sputtering methods. The film thickness was 1 am, and the coating conditions were as follows.
1)反応性高周波イオンブレーティング電子銃出力 :
1oxvxα2ム
高周波出力 : 6oow
バイアス電圧: 5oov
反応ガス(N宜)流量: 12cc/min基板温度
: 常温
2)高周波スパッタリング
ターゲット : 100■φ×5■t%El純度99憾
高周波電力 : 300W
雰囲気ガX : Nl (20mTorr )基板
温度 : 常温
以上の方法で得られた各BM膜のX線回折分析を実施し
た結果、いずれの皮膜からも回折ピークは認められず、
非晶質状であった。1) Reactive high frequency ion brating electron gun output:
1oxvxα2m High frequency output: 6oow Bias voltage: 5oov Reaction gas (Nyi) flow rate: 12cc/min Substrate temperature
: Room temperature 2) High frequency sputtering target: 100 φ x 5 t% El purity 99 High frequency power: 300 W Atmosphere gas: Nl (20 mTorr) Substrate temperature: X-ray diffraction of each BM film obtained by the method above room temperature As a result of the analysis, no diffraction peaks were observed from any of the films.
It was amorphous.
〔実験例2〕
実験例1で述べた高周波スパッタリング法において、タ
ーゲットとして、N1又はFeをt3面積係含む複合タ
ーゲラ) (BN −) Ni又はBM+Fe) を
用い、実験例1の高周波スパッタリングと同じ条件でB
N + NiおよびBN + Fe複合膜を作成し、そ
の結晶構造fX線回折分析で調べた結果、いずれの皮膜
も非晶質状であった。[Experimental Example 2] In the high-frequency sputtering method described in Experimental Example 1, a composite target layer containing N1 or Fe in the t3 area ratio (BN -) Ni or BM+Fe) was used as the target, and the same conditions as the high-frequency sputtering in Experimental Example 1 were used. DeB
N + Ni and BN + Fe composite films were prepared, and their crystal structures were examined by fX-ray diffraction analysis. As a result, all films were found to be amorphous.
〔実施例〕
実験例1および実験例2で作成した4種類の皮膜に窒素
イオン照射処理を実施した。イオン照射は、N意 中
のグロー放電によるイオン窒化処理とした。イオン窒化
条件および処理後の皮膜のX線回折分析結果を表1に示
す。[Example] The four types of films created in Experimental Examples 1 and 2 were subjected to nitrogen ion irradiation treatment. The ion irradiation was an ion nitriding process using a glow discharge in nitrogen. Table 1 shows the ion nitriding conditions and the results of X-ray diffraction analysis of the film after treatment.
この結果、いずれの皮膜もCBNとなっていることが明
らかとなり、又、触媒金[1−添加することにより、よ
り低温、低加速電圧下で合成可能となることが明らかと
なった。As a result, it became clear that all the films were made of CBN, and that by adding catalyst gold [1-], it became possible to synthesize the films at a lower temperature and under a lower accelerating voltage.
表1 条件およびX線回折分析結果
性1hBll:六方晶BN
wBN : ウルツ鉱形BN
CBN : 立方晶BN
注2 v :加速電圧
P:N!正圧
力発明の効果〕
以上、実施例で詳述したように、本発明方法によれば、
従来超高温・高圧でしか合成できなかったCBNが、低
温−低圧で合成でき、しかも、従来は粒状でしか合成で
きなかつ念ものを、コーティングの形で利用することが
でき、工業的に意義あるものである。Table 1 Conditions and X-ray diffraction analysis results 1hBll: Hexagonal BN wBN: Wurtzite BN CBN: Cubic BN Note 2 v: Accelerating voltage P: N! Effects of the positive pressure invention] As detailed above in the examples, according to the method of the present invention,
CBN, which could previously only be synthesized at ultra-high temperatures and high pressures, can now be synthesized at low temperatures and low pressures. What's more, CBN, which could previously only be synthesized in granular form, can now be used in the form of a coating, which has industrial significance. It is something.
復代理人 内 1) 明 復代理人 萩 原 亮 − 復代理人 安 西 篤 夫Sub-agent: 1) Akira Sub-agent Ryo Hagi Hara - Sub-agent Atsuo Yasunishi
Claims (1)
ーティングした後、同皮膜に窒素イオンを照射しCBN
を形成することを特徴とするCBN被覆法。After coating the base material with an amorphous or microcrystalline BN film, the film is irradiated with nitrogen ions to form CBN.
A CBN coating method characterized by forming.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61162142A JPH0742571B2 (en) | 1986-07-11 | 1986-07-11 | CBN coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61162142A JPH0742571B2 (en) | 1986-07-11 | 1986-07-11 | CBN coating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6318050A true JPS6318050A (en) | 1988-01-25 |
JPH0742571B2 JPH0742571B2 (en) | 1995-05-10 |
Family
ID=15748832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61162142A Expired - Lifetime JPH0742571B2 (en) | 1986-07-11 | 1986-07-11 | CBN coating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0742571B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63262457A (en) * | 1987-04-20 | 1988-10-28 | Nissin Electric Co Ltd | Preparation of boron nitride film |
JPH0216847U (en) * | 1988-07-20 | 1990-02-02 | ||
JPH0272846U (en) * | 1988-11-25 | 1990-06-04 | ||
US5655875A (en) * | 1995-01-20 | 1997-08-12 | Nok Corporation | Plastic torque converter stator with insert-molded one-way clutch outer race |
WO1999054520A1 (en) * | 1998-04-22 | 1999-10-28 | Valmet Corporation | Parts of a paper/board or finishing machine that are subjected to intensive wear and method for manufacture of such parts |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57174453A (en) * | 1981-04-17 | 1982-10-27 | Sumitomo Electric Ind Ltd | Coated superhard alloy tool |
JPS5980775A (en) * | 1982-11-01 | 1984-05-10 | Sumitomo Electric Ind Ltd | Manufacture of hard thin film |
JPS6063372A (en) * | 1983-09-19 | 1985-04-11 | Agency Of Ind Science & Technol | Manufacture of thin boron nitride film of high hardness |
JPS60181262A (en) * | 1984-02-29 | 1985-09-14 | Agency Of Ind Science & Technol | Production of boron nitride film having high hardness |
JPS6176662A (en) * | 1984-09-21 | 1986-04-19 | Nippon Telegr & Teleph Corp <Ntt> | Method and device for forming thin film |
-
1986
- 1986-07-11 JP JP61162142A patent/JPH0742571B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57174453A (en) * | 1981-04-17 | 1982-10-27 | Sumitomo Electric Ind Ltd | Coated superhard alloy tool |
JPS5980775A (en) * | 1982-11-01 | 1984-05-10 | Sumitomo Electric Ind Ltd | Manufacture of hard thin film |
JPS6063372A (en) * | 1983-09-19 | 1985-04-11 | Agency Of Ind Science & Technol | Manufacture of thin boron nitride film of high hardness |
JPS60181262A (en) * | 1984-02-29 | 1985-09-14 | Agency Of Ind Science & Technol | Production of boron nitride film having high hardness |
JPS6176662A (en) * | 1984-09-21 | 1986-04-19 | Nippon Telegr & Teleph Corp <Ntt> | Method and device for forming thin film |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63262457A (en) * | 1987-04-20 | 1988-10-28 | Nissin Electric Co Ltd | Preparation of boron nitride film |
JPH0216847U (en) * | 1988-07-20 | 1990-02-02 | ||
JPH0272846U (en) * | 1988-11-25 | 1990-06-04 | ||
US5655875A (en) * | 1995-01-20 | 1997-08-12 | Nok Corporation | Plastic torque converter stator with insert-molded one-way clutch outer race |
WO1999054520A1 (en) * | 1998-04-22 | 1999-10-28 | Valmet Corporation | Parts of a paper/board or finishing machine that are subjected to intensive wear and method for manufacture of such parts |
Also Published As
Publication number | Publication date |
---|---|
JPH0742571B2 (en) | 1995-05-10 |
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