JPS6318051A - Cbn coating method - Google Patents
Cbn coating methodInfo
- Publication number
- JPS6318051A JPS6318051A JP16214386A JP16214386A JPS6318051A JP S6318051 A JPS6318051 A JP S6318051A JP 16214386 A JP16214386 A JP 16214386A JP 16214386 A JP16214386 A JP 16214386A JP S6318051 A JPS6318051 A JP S6318051A
- Authority
- JP
- Japan
- Prior art keywords
- film
- coating
- cbn
- pressure
- amorphous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 5
- 238000003746 solid phase reaction Methods 0.000 abstract description 4
- 229910000997 High-speed steel Inorganic materials 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000007733 ion plating Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 12
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000005422 blasting Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000000462 isostatic pressing Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は切削工具あるいは、紙工機械等の刃物類等に適
用される超硬質皮膜であるOBNコーティング、又、半
導体分野における絶縁膜としても利用可能な0BIIコ
ーテイングに関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention is applicable to OBN coating, which is a super hard coating applied to cutting tools and cutlery such as paper processing machines, and also as an insulating film in the semiconductor field. Concerning possible 0BII coatings.
0BN(立方晶窒化ホウ素)は、天然には存在しない人
工合成化合物であり、従来は六方晶窒化ホウ素(以下h
−BNと記す)ft超高温・高圧(温度1600に以上
、圧力40 Kbar 以上)処理することによって得
られていた。0BN (cubic boron nitride) is an artificially synthesized compound that does not exist in nature.
-BN) ft was obtained by processing at ultra-high temperature and high pressure (temperature 1600 or more, pressure 40 Kbar or more).
しかし、従来法では粉末あるいは粒状でしか製造できず
、これを研削砥石等の工具として使用する場合には、樹
脂あるいは金属を結合材として焼結して用いるか、ある
いは、CBN粒子を金属めっき膜中に分散させた電着工
具とじ一′用いるという方法が採られている。However, conventional methods can only produce powder or granules, and when used as tools such as grinding wheels, resin or metal is used as a binder by sintering, or CBN particles are coated with a metal plating film. A method has been adopted in which electrodeposited tool binders are dispersed in the material.
しかし、これらの方法では、(1)OBNが粒子である
ため寸法精度が不良(最小でも+3000 :平均粒径
5〜6μm )で精密加工に使用できない、(2)樹脂
や金属を結合材としているため付着力(OBN保持力)
が低い、(3)超高温・高圧処理のため生産性が低くコ
スト高となる、等の欠点を有している。However, with these methods, (1) OBN is a particle, so its dimensional accuracy is poor (minimum +3000: average particle size 5 to 6 μm) and cannot be used for precision processing; (2) resin or metal is used as a binder. Adhesion force (OBN retention force)
and (3) low productivity and high cost due to ultra-high temperature and high pressure treatment.
このため、CBN?コーティングすることができれば、
上記問題点が解消されるため、各種PVD (物理的蒸
着)法によるOBNコーティングが鋭意研究中であるが
、いまだ成功には到っていない。For this reason, CBN? If you can coat it,
In order to solve the above problems, OBN coatings using various PVD (physical vapor deposition) methods are being actively researched, but no success has been achieved so far.
従来の高温・高圧処理による粒子状OBNの利用に代わ
る新しいCBNの利用法としてコーティングがあり、特
にサブミクロンオーダーの超精密加工用工具としては、
OBNコーティングが必要不可欠であるとも云われてい
る。このCBNコーティングとしてPVD法、中でもイ
オンブレーティング、スパッタリング法による方法が研
究されているが、まだ完全なOEMコーティングは完成
されていない。すなわち、これらの方法はB又は大方晶
BMを原料として気相反応によりOBNを析出しようと
するものであるが、すでに述べたようにOBNは超高温
・高圧処理で合成されるものであハ、これらの方法は低
温処理であるため合成が固層であるためと思われる。又
このような気相コーティング法では、得られる皮膜は基
本的には非平衡状態の膜であ妙、元来非晶質膜になシや
すく、この点もCBN合成困難な理由と思われる。Coating is a new method of using CBN to replace the conventional use of particulate OBN processed at high temperatures and high pressures, and it is especially useful for ultra-precision machining tools on the submicron order.
It is also said that OBN coating is essential. PVD methods, especially ion blasting and sputtering methods, are being studied for this CBN coating, but a complete OEM coating has not yet been completed. That is, these methods attempt to precipitate OBN by gas-phase reaction using B or macrogonal BM as a raw material, but as already mentioned, OBN is synthesized by ultra-high temperature and high pressure treatment. This is thought to be because these methods involve low-temperature processing and are synthesized in a solid phase. Furthermore, in such a vapor phase coating method, the film obtained is basically a film in a non-equilibrium state, which is inherently amorphous and easily damaged, which is also considered to be the reason for the difficulty in synthesizing CBN.
本発明は上記従来法におけるような欠点を解消したCB
Nコーティングを形成させる方法を提供しようとするも
のである。The present invention is a CB that eliminates the drawbacks of the above conventional method.
The present invention seeks to provide a method for forming an N coating.
本発明は母材上にあらかじめ非晶質又は微結晶状のBM
皮膜をコーティングした後、同皮膜を高温・高圧処理し
、OBN’i形成させることを特徴とするOBNコーテ
ィング法である。In the present invention, amorphous or microcrystalline BM is formed on the base material in advance.
This is an OBN coating method characterized by coating a film and then treating the film at high temperature and high pressure to form OBN'i.
従来の方法では、非晶質BN膜になることが多いが、本
発明はこの非晶質膜の非平衡エネルギーを利用して、固
相反応によりOBN’i合成するものである。すなわち
、気相法によって非晶質膜を作成し、その後この皮膜を
高温高圧処理することにより固相反応を生じさせてOB
Nを合成するものである。又、このBE中にIPe。Conventional methods often result in an amorphous BN film, but the present invention utilizes the non-equilibrium energy of this amorphous film to synthesize OBN'i through a solid phase reaction. That is, an amorphous film is created by a vapor phase method, and then this film is treated at high temperature and high pressure to cause a solid phase reaction and form an OB.
It synthesizes N. Also, IPe during this BE.
Ni、Or等の触媒金it添加すると固相反応条件が緩
和されるためさらに有利となる。Addition of catalyst gold such as Ni or Or is more advantageous because the solid phase reaction conditions are relaxed.
非晶質膜には大きな非平衡エネルギーが存在するため、
通常の合成法に比べて、低温・低圧で処理可能である。Since there is a large nonequilibrium energy in an amorphous film,
Compared to normal synthesis methods, it can be processed at lower temperatures and pressures.
又、本発明方法によれば従来不可能であったOBNコー
ティングが可能となる。Furthermore, according to the method of the present invention, OBN coating, which was previously impossible, becomes possible.
〔実験例1〕
30mX30mX5m厚さの高速度鋼(5KH55)を
基板として、その表面に反応性高周波イオンブレーティ
ングおよび高周波スパッタリング法により、BEをコー
ティングした。膜厚は3μmであり、コーティング条件
は以下の通りである。[Experimental Example 1] A high-speed steel (5KH55) measuring 30 m x 30 m x 5 m thick was used as a substrate, and BE was coated on the surface by reactive high frequency ion blasting and high frequency sputtering. The film thickness was 3 μm, and the coating conditions were as follows.
1)反応性高周波イオンブレーティング電子銃出力 :
10KVXα2A
高周波出力 : 600W
バイアス電圧: 50Ov
反応ガス(N鵞)流量: 1 2cc/min基板温
度 : 常温
2)高周波スパッタリング
ターゲット = 100■φ×51t%BN純度99
憾
高周波電力 : 300W
雰囲気ガス : N! (20mTOrr )基板温
度 : 常温
以上の方法で得られた各BE膜のX線回折分析を実施し
た結果、いずれの皮膜からも回折ピークは認められず、
非晶質状であった。1) Reactive high frequency ion brating electron gun output:
10K V
High frequency power: 300W Atmosphere gas: N! (20 mTOrr) Substrate temperature: As a result of performing X-ray diffraction analysis of each BE film obtained by the method above room temperature, no diffraction peak was observed from any of the films.
It was amorphous.
〔実験912〕
実験例1で述べた高周波スパッタリング法において、タ
ーゲットとして、N1又はFe ′ft1.5面積係合
む複合ターゲラ)(BN+Ni又はBN+Fe)′ft
用い、実験例1の高周波スパッタリングと同じ条件でB
N + NiおよびBN + Fe複合膜を作成し、そ
の結晶構造をX線回折分析で調べた結果、いずれの皮膜
も非晶質状であった。[Experiment 912] In the high-frequency sputtering method described in Experimental Example 1, a composite target layer (BN+Ni or BN+Fe)′ft with an area of N1 or Fe′ft1.5 (BN+Ni or BN+Fe)′ft was used as the target.
B under the same conditions as the high frequency sputtering of Experimental Example 1.
N + Ni and BN + Fe composite films were prepared, and their crystal structures were examined by X-ray diffraction analysis. As a result, all films were found to be amorphous.
実験例1および実験例2で作成した4種類の皮膜1nx
p(高温静水圧成形装置)Kよ)高温・高圧処理した後
、X線回折分析を行い、皮膜の構造を調べた。H工P条
件およびX線回折分析結果を表1に示す。Four types of films 1nx created in Experimental Example 1 and Experimental Example 2
After high-temperature and high-pressure treatment (p (high-temperature isostatic pressing apparatus) K), X-ray diffraction analysis was performed to investigate the structure of the film. Table 1 shows the H engineering P conditions and the X-ray diffraction analysis results.
この結果、いずれの皮膜もOBNとなっていることが明
らかとなった。又、触媒金属を添加することにより、よ
シ低温・低圧でOBN合成ができることも明らかとなっ
た。As a result, it became clear that all the films were OBN. It has also been revealed that OBN synthesis can be performed at lower temperatures and pressures by adding catalytic metals.
表I HIP条件およびX線回折分析結果注1 h
BN : 六方晶BN
wBl+ : ウルツ鉱形BM
C!BN : 立方晶BM
注2 保持時間はいずれも15分間
〔発明の効果〕
以上、実施例で詳述したように、本発明方法によれば、
従来超高温・高圧でしか合成できなかったOBNが、低
温・低圧で合成でき、しかも、従来は粒状でしか合成で
きなかったものをコーティングの形で利用することがで
き、工業的に意義あるものである。Table I HIP conditions and X-ray diffraction analysis results Note 1 h
BN: Hexagonal BN wBl+: Wurtzite BM C! BN: Cubic BM Note 2 The holding time is 15 minutes in each case [Effects of the Invention] As described above in detail in the Examples, according to the method of the present invention,
OBN, which could previously only be synthesized at ultra-high temperatures and high pressures, can now be synthesized at low temperatures and low pressures. What's more, OBN, which could previously only be synthesized in granular form, can now be used in the form of a coating, which is industrially significant. It is.
復代理人 内 1) 明 復代理人 萩 原 亮 − 復代理人 安 西 篤 夫Sub-agent: 1) Akira Sub-agent Ryo Hagi Hara - Sub-agent Atsuo Yasunishi
Claims (1)
ーティングした後、同皮膜を高温、高圧処理しCBNを
形成させることを特徴とするCBNコーティング法。A CBN coating method characterized by coating a base material with an amorphous or microcrystalline BN film in advance and then subjecting the film to high temperature and high pressure treatment to form CBN.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61162143A JPH0762230B2 (en) | 1986-07-11 | 1986-07-11 | CBN coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61162143A JPH0762230B2 (en) | 1986-07-11 | 1986-07-11 | CBN coating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6318051A true JPS6318051A (en) | 1988-01-25 |
JPH0762230B2 JPH0762230B2 (en) | 1995-07-05 |
Family
ID=15748852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61162143A Expired - Fee Related JPH0762230B2 (en) | 1986-07-11 | 1986-07-11 | CBN coating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0762230B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57174453A (en) * | 1981-04-17 | 1982-10-27 | Sumitomo Electric Ind Ltd | Coated superhard alloy tool |
-
1986
- 1986-07-11 JP JP61162143A patent/JPH0762230B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57174453A (en) * | 1981-04-17 | 1982-10-27 | Sumitomo Electric Ind Ltd | Coated superhard alloy tool |
Also Published As
Publication number | Publication date |
---|---|
JPH0762230B2 (en) | 1995-07-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |