JPS63177957U - - Google Patents
Info
- Publication number
- JPS63177957U JPS63177957U JP16986U JP16986U JPS63177957U JP S63177957 U JPS63177957 U JP S63177957U JP 16986 U JP16986 U JP 16986U JP 16986 U JP16986 U JP 16986U JP S63177957 U JPS63177957 U JP S63177957U
- Authority
- JP
- Japan
- Prior art keywords
- reactive gas
- upper electrode
- wafer
- cavity
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 1
- 230000014759 maintenance of location Effects 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 239000000376 reactant Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16986U JPS63177957U (fi) | 1986-01-07 | 1986-01-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16986U JPS63177957U (fi) | 1986-01-07 | 1986-01-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63177957U true JPS63177957U (fi) | 1988-11-17 |
Family
ID=30776905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16986U Pending JPS63177957U (fi) | 1986-01-07 | 1986-01-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63177957U (fi) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014154248A (ja) * | 2013-02-05 | 2014-08-25 | Mitsubishi Electric Corp | プラズマ処理装置 |
-
1986
- 1986-01-07 JP JP16986U patent/JPS63177957U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014154248A (ja) * | 2013-02-05 | 2014-08-25 | Mitsubishi Electric Corp | プラズマ処理装置 |