JPS63172201A - Two-layer antireflection coating - Google Patents
Two-layer antireflection coatingInfo
- Publication number
- JPS63172201A JPS63172201A JP62004558A JP455887A JPS63172201A JP S63172201 A JPS63172201 A JP S63172201A JP 62004558 A JP62004558 A JP 62004558A JP 455887 A JP455887 A JP 455887A JP S63172201 A JPS63172201 A JP S63172201A
- Authority
- JP
- Japan
- Prior art keywords
- film
- cerium oxide
- refractive index
- test
- adhesion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title abstract description 5
- 239000011248 coating agent Substances 0.000 title abstract description 4
- 229910000420 cerium oxide Inorganic materials 0.000 claims abstract description 11
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 abstract description 48
- 238000007740 vapor deposition Methods 0.000 abstract description 4
- 238000000151 deposition Methods 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- 238000010030 laminating Methods 0.000 abstract description 2
- 238000009825 accumulation Methods 0.000 abstract 1
- 238000007733 ion plating Methods 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ガラスおよびプラスチック製光学部品の２層
反射防止膜に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a two-layer antireflection coating for glass and plastic optical components.
ガラスおよびプラスチック製光学部品例えばレンズは、
一般に表面に反射防止膜を設け、これにより透過率を向
上させることが必要である。Glass and plastic optical components such as lenses are
Generally, it is necessary to provide an antireflection film on the surface to improve transmittance.
この場合、反射防止膜には密着性、耐熱性（８０°Ｃ）
、耐湿性（７５℃・９０％）が要求される。In this case, the anti-reflection film has adhesion and heat resistance (80°C).
, humidity resistance (75°C/90%) is required.
従来の反射防止膜は、耐熱性（８０’ｃ）、耐湿性（７
５°Ｃ・９０％）を向上させるため、少なくとも３層以
上の構成にしなければならなかった。例えば特開昭６０
−２２５１０１号公報、特開昭６０−２０２４０１号公
報を参照されたい。３Ｎ構造の反射防止膜は、２層構造
のそれに比べそれだけ製造コストの上昇を招く。Conventional anti-reflection coatings have heat resistance (80'c) and moisture resistance (70'c).
In order to improve the temperature (5°C/90%), it was necessary to have a structure of at least three layers. For example, JP-A-60
Please refer to JP-A-225101 and JP-A-60-202401. An antireflection film with a 3N structure causes a corresponding increase in manufacturing cost compared to a two-layer structure.
また、ガラス基板に比べて比較的密着の悪いガプラスチ
ック基板に反射防止膜を設ける場合、基板側の第１層に
Ｓｔｏｗ （酸化ケイ素：但し１＜Ｘ〈２）を設けるこ
とによって密着性を向上させることが提案されている（
例えば特開昭昭５１−５０７４８参照）。In addition, when providing an anti-reflection film on a plastic substrate, which has relatively poor adhesion compared to a glass substrate, adhesion can be improved by providing Stow (silicon oxide: where 1<X<2) on the first layer on the substrate side. It is proposed to let (
For example, see Japanese Patent Application Laid-Open No. 51-50748).
ところが５ｉＯＸは基板より低屈折率物質のため基板側
から第１層にＳｉＯヶを施し反射防止膜を形成するため
には、そのうえに少なくとも更に２層必要となってしま
う。従って、プラスチック基板に２層構成で密着のよい
反射防止膜を得ることはできなかった。However, since 5iOX is a material with a lower refractive index than the substrate, at least two additional layers are required in order to form an antireflection film by applying SiO to the first layer from the substrate side. Therefore, it has not been possible to obtain an antireflection film with a two-layer structure and good adhesion to a plastic substrate.
本発明の目的は、これらの欠点を解決し、密着性、耐熱
性（８０’ｃ） 、耐湿性（７５°Ｃ・９０％）を有す
る２層構成の反射防止膜を提供することを目的とする。The purpose of the present invention is to solve these drawbacks and provide a two-layer antireflection film having good adhesion, heat resistance (80'C), and moisture resistance (75°C, 90%). do.
本発明は、ガラスおよびプラスチック基板側から順に、
基板よりも高屈折率物質の第１層として酸化セリウム（
ＣｅＯ□）、基板よりも低屈折率物質の第２層としてＳ
ｉＯｘ （１＜ ｘ＜ ２）を積層したことを特徴とす
る２層構成の反射防止膜を提供する。In the present invention, in order from the glass and plastic substrate side,
Cerium oxide (
CeO□), S as a second layer of a material with a lower refractive index than the substrate
An antireflection film having a two-layer structure characterized by laminating iOx (1<x<2) is provided.
（作用）
本発明の２層反射防止膜を形成するには、ます、基板上
に酸化セリウムのＺλ。膜（λ０−基準波長）を形成す
る。形成法としては一般には真空蒸着・イオンブレーテ
ィング、スバ・ツタリングなどの薄膜堆積技術が使用さ
れる。(Function) To form the two-layer antireflection film of the present invention, first, Zλ of cerium oxide is deposited on the substrate. Form a film (λ0 - reference wavelength). As a forming method, thin film deposition techniques such as vacuum evaporation, ion blating, and sputtering are generally used.
次いで、ＳｉＯｘ （ただし１＜ｘ＜ ２）からなる×
λ０膜を形成する。この物質自身は既知であり、一般に
は茎着源としてＳｉＯを用い、真空チャンバー内に少量
の酸素ガスを導入して低真空中で蒸着することにより形
成される。この場合、細かい製造条件によりｘ＝ｌ〜２
（但し、両端を含まず）又はｘ＝１．３〜１．９又は
ｘ＝１．４〜１．９の透明な膜が得られる。この膜はＸ
の値に応じてｎｄ−’１．４０〜１．９０の屈折率を示
す。Next, × consisting of SiOx (where 1<x<2)
Form a λ0 film. This material itself is known, and is generally formed by vapor deposition in a low vacuum by introducing a small amount of oxygen gas into a vacuum chamber using SiO as a stem deposition source. In this case, x = l ~ 2 depending on detailed manufacturing conditions
(However, both ends are not included) or a transparent film with x=1.3 to 1.9 or x=1.4 to 1.9 is obtained. This film is
It shows a refractive index of nd-'1.40 to 1.90 depending on the value of nd-'.
蒸着に代えて高周波マグネＩ・ロン・スパッタリングを
用いてもよい。High frequency Magne I Ron sputtering may be used instead of vapor deposition.
以下、実施例により本発明を具体的に説明するが、本発
明はこれに限定されるものではない。EXAMPLES Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited thereto.
（実施例１）
屈折率１．４９のアクリル樹脂（ポリメチルメタクリレ
ート）製の基板を用い、基板表面に、酸化セリウム（Ｃ
ｅＯｚ）を蒸着源として、真空度１×１Ｏ−５Ｔｏｒｒ
の条件で蒸着を行ない、膜厚×２０（λ。−７８０ｎｍ
） の酸化セリウＪ、１莫（ＣｅＯ２； ｎ 、Ｉ＝
２．１０）を形成した。(Example 1) A substrate made of acrylic resin (polymethyl methacrylate) with a refractive index of 1.49 was used, and cerium oxide (C
eOz) as the evaporation source, vacuum level 1×1O-5 Torr
Vapor deposition was performed under the following conditions, and the film thickness was 20 (λ. -780 nm).
) of cerium oxide J, 1 mo (CeO2; n, I=
2.10) was formed.
次にチャンバ内に酸素を３〜６ Ｘ １０− ’Ｔｏｒ
ｒ導入し、酸化セリウム膜の上に、酸化ケイ素（Ｓｉｎ
）を楚着源として衆着し、膜厚Ｚλ。のＳｉＯｘ膜（ｎ
ａ＝１．４５ ）を積層させ、２層反射防止膜を形成し
た。Next, add oxygen to the chamber at 3-6 x 10-'Tor.
silicon oxide (Sin) is introduced on top of the cerium oxide film.
) as the deposition source, and the film thickness is Zλ. SiOx film (n
a=1.45) were laminated to form a two-layer antireflection film.
同様に基板の裏面にも同じ２層反射防止膜を形成した。Similarly, the same two-layer antireflection film was formed on the back side of the substrate.
この反射防止膜について、分光反射率Ｒを測定し、１０
０−２Ｒ＝Ｔの式により分光透過率Ｔを求めた。この結
果を第２図の曲線１に示す。The spectral reflectance R of this anti-reflection film was measured and 10
Spectral transmittance T was determined using the formula 0-2R=T. The results are shown in curve 1 of FIG.
また、反射防止膜を設けない基板について、同様に分光
透過率Ｔを求めたので、これを第２図に曲線２に示す。Further, the spectral transmittance T was determined in the same manner for a substrate without an antireflection film, and this is shown as curve 2 in FIG.
（実施例２）
屈折率１．５０のガラスレンズを基板として用い、実施
例１と同様に、膜厚２λ０（λ。−７８０ｎｍ）の酸化
セリウム膜（ｎａ ＝２．１０） と、膜厚Ａλ。の
ＳｉＯｘ膜（ｎｄ＝１．４５ ）を順に蒸着し、基板の
表裏両面に２層反射防止膜を形成した。(Example 2) A glass lens with a refractive index of 1.50 was used as a substrate, and in the same way as in Example 1, a cerium oxide film (na = 2.10) with a film thickness of 2λ0 (λ. -780 nm) and a film thickness Aλ . SiOx films (nd=1.45) were sequentially deposited to form a two-layer antireflection film on both the front and back surfaces of the substrate.
（実施例３）
屈折率１．５８のポリカーボネート・レンズを基板とし
て、実施例１と同様に、膜厚騒λ。（λ。−７８０ｎｍ
）の酸化セリウム（ｎａ ＝２．１０） と、膜厚Ａ
λ０のＳｉＯｘ膜（ｎｄ＝１．４５ ）を順に蒸着し、
基板の表面に２Ｎ反射防止膜を形成した。(Example 3) Using a polycarbonate lens with a refractive index of 1.58 as a substrate, the film thickness was changed to λ in the same manner as in Example 1. (λ.-780nm
) of cerium oxide (na = 2.10) and film thickness A
A SiOx film (nd=1.45) of λ0 was sequentially deposited,
A 2N antireflection film was formed on the surface of the substrate.
（物性試験）
前記実施例で得られた２層反射防止膜について次の試験
に供した。(Physical Property Test) The two-layer antireflection film obtained in the above example was subjected to the following test.
（試験１）密着性：
実施例１〜３で製作した反射防止膜にセロハンテープを
張り付けた後、テープの一端を手に持って素早＜ ＃、
＋１がず。(Test 1) Adhesion: After pasting cellophane tape on the anti-reflection film produced in Examples 1 to 3, hold one end of the tape in your hand and quickly
+1 gazu.
その結果、いずれの反射防止膜も剥離することはなかっ
た。As a result, none of the antireflection films peeled off.
（試験２）耐熱性：
実施例１〜３で製作した反射防止膜を有するレンズを、
８０°Ｃの恒温槽内に２００時間放置した後、試験１の
密着性と光学特性を測定した。(Test 2) Heat resistance: The lenses with antireflection films produced in Examples 1 to 3 were
After being left in a constant temperature bath at 80°C for 200 hours, the adhesion and optical properties of Test 1 were measured.
その結果、いずれの反射防止膜も剥離することはなかっ
た。また、光学特性も試験前と変化なかった。As a result, none of the antireflection films peeled off. Furthermore, the optical properties did not change from before the test.
更に、反射防止膜の表面を顕微鏡で観察したがクラック
は発見できなかった。Furthermore, the surface of the antireflection film was observed under a microscope, but no cracks were found.
（試験３）耐湿性：
実施例１〜３で製作した反射防止膜を有するしンズを、
７５℃・９０％の恒温恒湿槽内に５００時間放置した後
、試験１の密着性と光学特性を測定した。(Test 3) Moisture resistance: The resin with the antireflection film produced in Examples 1 to 3 was
After being left in a constant temperature and humidity chamber at 75° C. and 90% for 500 hours, the adhesion and optical properties of Test 1 were measured.
その結果、密着性、光学特性とも、試験前と変化がなか
った。また、反射防止膜の表面を顕微鏡で観察したがク
ラックは発見できなかった。As a result, both adhesion and optical properties were unchanged from before the test. Furthermore, the surface of the antireflection film was observed under a microscope, but no cracks were found.
（試験４）耐溶剤性：
実施例１〜３で製作した反射防止膜の表面を、エチルエ
ーテルとメチルアルコールの混合波（混合比８：２）を
浸み込ませた綿棒で音が出るまで擦ったが、傷付かなか
った。その後、密着性、光学特性を測定したが、試験前
と変化なかった。(Test 4) Solvent resistance: The surface of the anti-reflection film produced in Examples 1 to 3 was coated with a cotton swab impregnated with a mixture of ethyl ether and methyl alcohol (mixing ratio 8:2) until a sound was heard. I rubbed it, but it didn't hurt. Thereafter, the adhesion and optical properties were measured, and there was no change from before the test.
（試験５）耐久性：
実施例１〜３で製作した反射防止膜を有するレンズを、
４０℃・９０％の恒温恒湿槽内に５０００時間放置後、
試験１の密着性と試験４の耐溶剤性を測定したが、試験
前と変化はなかった。(Test 5) Durability: The lenses with antireflection films produced in Examples 1 to 3 were
After being left in a constant temperature and humidity chamber at 40℃ and 90% for 5000 hours,
Adhesion in Test 1 and solvent resistance in Test 4 were measured, and there was no change from before the test.
（試験６）耐熱耐湿試験後の耐溶剤性；実施例１〜３で
製作した反射防止膜を有するレンズを、試験２の耐熱試
験とその後試験３の耐湿試験にそれぞれ供した後、試験
４の耐溶剤性を測定したが、試験前と変化がなかった。(Test 6) Solvent resistance after heat resistance and humidity resistance test: The lenses with antireflection films produced in Examples 1 to 3 were subjected to the heat resistance test in Test 2 and then the humidity resistance test in Test 3, and then The solvent resistance was measured and there was no change from before the test.
以上の通り、本発明による２層反射防止膜は、２層とい
う最も簡単な構造でそのため製造コストが安価で、かつ
薄くて済み、それでいて密着性、耐熱性（８０°Ｃ）、
耐湿性（７５°Ｃ・９０％）、耐溶剤性、耐久性及び耐
熱耐湿試験後の耐溶剤性の各特性に優れている。As described above, the two-layer anti-reflection film according to the present invention has the simplest structure of two layers, and therefore has low manufacturing cost and is thin, yet has good adhesion, heat resistance (80°C),
It has excellent moisture resistance (75°C/90%), solvent resistance, durability, and solvent resistance after heat and humidity tests.
従って、本発明の反射防止膜は、経時変化がなく、反射
防止効果を長時間保持することができるので本発明は当
該技術の発展に多大な貢献をすることが期待される。Therefore, since the antireflection film of the present invention does not change over time and can maintain its antireflection effect for a long time, the present invention is expected to make a significant contribution to the development of this technology.
第１図は、本発明の実施例１にかかる２層反射防止膜を
有する基板の垂直断面を説明する概念図である。
第２図は、分光透過率Ｔを示すグラフであり、曲ｖＡ１
は、前記実施例１で形成した２層反射防止膜を表裏両面
に有するアクリル樹脂基板の分光透過率Ｔを示し、曲線
２は、反射防止膜を存しない同じアクリル樹脂基板の分
光透過率Ｔを示す。FIG. 1 is a conceptual diagram illustrating a vertical cross section of a substrate having a two-layer antireflection film according to Example 1 of the present invention. FIG. 2 is a graph showing the spectral transmittance T, and the curve vA1
curve 2 shows the spectral transmittance T of the acrylic resin substrate having the two-layer antireflection film formed in Example 1 on both the front and back surfaces, and curve 2 shows the spectral transmittance T of the same acrylic resin substrate without the antireflection film. show.
Claims (1)
を、低屈折率物質の第２層としてＳｉＯ＿ｘ（ただし１
＜ｘ＜２）を順に積層したことを特徴とする２層構成の
反射防止膜。From the substrate side, cerium oxide is used as the first layer of high refractive index material, and SiO_x (however, 1
An antireflection film having a two-layer structure, characterized in that <x<2) are laminated in order.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62004558A JPS63172201A (en) | 1987-01-12 | 1987-01-12 | Two-layer antireflection coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62004558A JPS63172201A (en) | 1987-01-12 | 1987-01-12 | Two-layer antireflection coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63172201A true JPS63172201A (en) | 1988-07-15 |
Family
ID=11587375
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62004558A Pending JPS63172201A (en) | 1987-01-12 | 1987-01-12 | Two-layer antireflection coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63172201A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5172269A (en) * | 1989-06-26 | 1992-12-15 | Matsushita Electric Industrial Co., Ltd. | Anti-reflection film for plastic optical component |
| JP2007025201A (en) * | 2005-07-15 | 2007-02-01 | Toppan Printing Co Ltd | Reflection preventive material and its manufacturing method |
-
1987
- 1987-01-12 JP JP62004558A patent/JPS63172201A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5172269A (en) * | 1989-06-26 | 1992-12-15 | Matsushita Electric Industrial Co., Ltd. | Anti-reflection film for plastic optical component |
| JP2007025201A (en) * | 2005-07-15 | 2007-02-01 | Toppan Printing Co Ltd | Reflection preventive material and its manufacturing method |
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