JPS6316902B2 - - Google Patents

Info

Publication number
JPS6316902B2
JPS6316902B2 JP56097739A JP9773981A JPS6316902B2 JP S6316902 B2 JPS6316902 B2 JP S6316902B2 JP 56097739 A JP56097739 A JP 56097739A JP 9773981 A JP9773981 A JP 9773981A JP S6316902 B2 JPS6316902 B2 JP S6316902B2
Authority
JP
Japan
Prior art keywords
liquid phase
growth
epitaxial growth
temperature
phase epitaxial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56097739A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57211725A (en
Inventor
Michiharu Ito
Mitsuo Yoshikawa
Takeshi Akamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56097739A priority Critical patent/JPS57211725A/ja
Publication of JPS57211725A publication Critical patent/JPS57211725A/ja
Publication of JPS6316902B2 publication Critical patent/JPS6316902B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/02Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
    • C30B19/04Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux the solvent being a component of the crystal composition
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/46Sulfur-, selenium- or tellurium-containing compounds
    • C30B29/48AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP56097739A 1981-06-23 1981-06-23 Liquid epitaxial growth method Granted JPS57211725A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56097739A JPS57211725A (en) 1981-06-23 1981-06-23 Liquid epitaxial growth method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56097739A JPS57211725A (en) 1981-06-23 1981-06-23 Liquid epitaxial growth method

Publications (2)

Publication Number Publication Date
JPS57211725A JPS57211725A (en) 1982-12-25
JPS6316902B2 true JPS6316902B2 (enrdf_load_stackoverflow) 1988-04-11

Family

ID=14200259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56097739A Granted JPS57211725A (en) 1981-06-23 1981-06-23 Liquid epitaxial growth method

Country Status (1)

Country Link
JP (1) JPS57211725A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1210812B (it) * 1987-06-16 1989-09-29 Selenia Ind Elettroniche Procedimento per la fabbricazione di strati monocristallini di tellururo di cadmio e mercurio

Also Published As

Publication number Publication date
JPS57211725A (en) 1982-12-25

Similar Documents

Publication Publication Date Title
US6187089B1 (en) Tungsten doped crucible and method for preparing same
US3507625A (en) Apparatus for producing binary crystalline compounds
US3493431A (en) Vapor-liquid-solid crystal growth technique
Deitch Liquid-phase epitaxial growth of gallium arsenide under transient thermal conditions
Rudolph et al. The horizontal Bridgman method
Yablonovitch et al. Wetting angles and surface tension in the crystallization of thin liquid films
US4923561A (en) Crystal growth method
JPS6316902B2 (enrdf_load_stackoverflow)
WO1996000317A1 (en) Improvements in crystal growth
US3290181A (en) Method of producing pure semiconductor material by chemical transport reaction using h2s/h2 system
US3501406A (en) Method for producing rod-shaped silicon monocrystals with homogeneous antimony doping over the entire rod length
US20020092465A1 (en) Binary and ternary crystal purification and growth method and apparatus
JP2599767B2 (ja) 溶液成長装置
JP2005089257A (ja) Iii族窒化物の結晶成長方法及び結晶成長装置
JP4222630B2 (ja) 物体をエピタキシャル成長させるための方法及びそのような成長を行うための装置
JPH11513352A (ja) 物体をエピタキシャル成長させる方法及びそのような成長のための装置
JPS5946096B2 (ja) 液相エピタキシヤル成長装置
JPH0411514B2 (enrdf_load_stackoverflow)
US20230099939A1 (en) Controlling the thickness and width of a crystalline sheet formed on the surface of a melt using combined surface cooling and melt heating
JP2000026190A (ja) 化合物単結晶の成長装置及び成長方法
JP2697327B2 (ja) 化合物半導体単結晶の製造装置
JPH06263580A (ja) 半導体結晶の製造方法及び製造装置
JP2004277228A (ja) 結晶成長方法
JPH0139997B2 (enrdf_load_stackoverflow)
Tsaur Czochralski growth of gallium indium antimonide alloy crystals