JPS63168809A - Production of thin film magnetic head - Google Patents
Production of thin film magnetic headInfo
- Publication number
- JPS63168809A JPS63168809A JP149787A JP149787A JPS63168809A JP S63168809 A JPS63168809 A JP S63168809A JP 149787 A JP149787 A JP 149787A JP 149787 A JP149787 A JP 149787A JP S63168809 A JPS63168809 A JP S63168809A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic pole
- layer
- ion milling
- pole layer
- protective film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000010410 layer Substances 0.000 claims abstract description 117
- 238000000992 sputter etching Methods 0.000 claims abstract description 53
- 239000010408 film Substances 0.000 claims abstract description 50
- 238000000034 method Methods 0.000 claims abstract description 33
- 230000001681 protective effect Effects 0.000 claims abstract description 32
- 239000011229 interlayer Substances 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 5
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 4
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical group [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims description 9
- 238000010030 laminating Methods 0.000 claims description 3
- 239000000696 magnetic material Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 210000004709 eyebrow Anatomy 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 230000009194 climbing Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔概要〕
本発明は磁気ディスク装置に用いられる薄膜磁気ヘッド
の製造において、上部磁極層の先端部をイオンミリング
用マスクとして下部磁極層の先端部をイオンミリング加
工して、該上下部の磁極先端部の形状を規定の形状に一
括形成するに際し、コイル層を被覆した層間絶縁層及び
端子引き出し線をイオンミリングより保護するための保
護膜として、磁性膜を用いることにより、イオンミリン
グ加工の高速化とイオンミリング加工後の保護膜の除去
工程の省略を図り、磁極形成工程時間を短縮したもので
ある。[Detailed Description of the Invention] [Summary] The present invention, in manufacturing a thin-film magnetic head used in a magnetic disk device, involves processing the tip of the lower magnetic pole layer by ion milling using the tip of the upper magnetic pole layer as a mask for ion milling. By using a magnetic film as a protective film to protect the interlayer insulating layer covering the coil layer and the terminal lead wire from ion milling when forming the upper and lower magnetic pole tips into a specified shape all at once. , which aims to speed up the ion milling process and omit the step of removing the protective film after the ion milling process, thereby shortening the magnetic pole forming process time.
本発明は磁気ディスク装置に用いられる薄膜磁気ヘッド
の製造方法に係り、特に磁極の形成方法に関するもので
ある。The present invention relates to a method of manufacturing a thin film magnetic head used in a magnetic disk device, and particularly to a method of forming a magnetic pole.
磁気ディスク装置においては磁気ディスク媒体のトラッ
ク密度の向上に伴い、薄膜磁気ヘッドの磁極先端幅は益
々微細化される傾向にある。このため、薄膜磁気ヘッド
の磁極先端部を高精度に正確に形成し得る磁極形成技術
が必要とされる。In magnetic disk drives, as the track density of magnetic disk media increases, the width of the magnetic pole tip of a thin film magnetic head tends to become smaller and smaller. Therefore, there is a need for a magnetic pole forming technique that can accurately form the magnetic pole tip of a thin film magnetic head with high precision.
また薄膜磁気ヘッドを製造する工程では、蒸着、スパッ
タリング、イオンミリング、イオンエツチング等の真空
を利用した技術工程が数多く用いられているが、これら
の工程では一般に真空排気工程に長時間が費やされる傾
向がある。このため工程時間を合理的に短縮し得る製造
方法が必要とされている。In addition, in the process of manufacturing thin-film magnetic heads, many technological processes that utilize vacuum are used, such as evaporation, sputtering, ion milling, and ion etching, but these processes generally tend to require a long time in the evacuation process. There is. Therefore, there is a need for a manufacturing method that can reasonably shorten the process time.
〔従来の技術〕
従来の薄膜磁気ヘッドの製造方法、特に磁極先端部を精
度良く、かつ正確な幅形状に形成する方法としては、第
６図（ａ）の要部平面図、第６図（ｂ）のＡ−Ａ’断面
図及び第６図（Ｃ）のＢ−Ｂ”断面図に示すように、例
えば絶縁非磁性基板１１上に薄膜プロセスによって規定
のコア幅Ｃ８よりも大きい磁極先端部１２ａを有するＮ
ｉ−Ｆｅからなる下部磁極層１２、Ｓｉｎｇからなるギ
ャップ層１３及び熱硬化性樹脂材からなる眉間絶縁層１
４により挟まれたコイル層１５を順に被着形成する。こ
の際、コイル層１５等の端子引き出し線１６も形成する
。[Prior Art] A conventional method of manufacturing a thin film magnetic head, particularly a method of forming the tip of a magnetic pole with high precision and an accurate width shape, is as follows. As shown in the AA' cross-sectional view in b) and the B-B'' cross-sectional view in FIG. N with 12a
A lower magnetic pole layer 12 made of i-Fe, a gap layer 13 made of Sing, and an insulating layer 1 between the eyebrows made of a thermosetting resin material.
The coil layers 15 sandwiched by the coil layers 4 are sequentially deposited. At this time, terminal lead wires 16 such as the coil layer 15 are also formed.
次に該層間絶縁層１４上に図示のように規定コア幅Ｃ１
の磁極先端部１７ａを有し、かつ前記下部磁極層１２の
膜厚よりも厚い膜厚の上部磁極層１７を積層形成した後
、該磁極先端部Ｌ７ａを除く上部磁極層１７上及び眉間
絶縁層１４、端子引き出し線１６上にイオンミリング保
護用のレジスト膜１８を塗着する。Next, on the interlayer insulating layer 14, a prescribed core width C1 is formed as shown in the figure.
After laminating an upper magnetic pole layer 17 having a magnetic pole tip 17a and having a thickness thicker than the lower magnetic pole layer 12, the upper magnetic pole layer 17 except for the magnetic pole tip L7a and an insulating layer between the eyebrows are formed. 14. Apply a resist film 18 for ion milling protection on the terminal lead wire 16.
次に第７図（ａ）の要部平面図、第７図（ｂ）のＡ−Ａ
’断面図及び第７図（Ｃ）のＢ−Ｂ’断面図に示すよう
に、前記上部磁極層１７の磁極先端部１７ａ及びイオン
ミリング保護用レジスト膜１８をマスクにして前記下部
磁極層１２のコア先端部１２ａのはみ出している余剰部
分をイオンミリング工程により削除して、上部磁極層１
７の規定コア幅Ｃｗと一致した形状の磁極先端部１２ａ
を形成する。この際、上部磁極層１７の磁極先端部１７
ａの膜厚も前記下部磁極層１２の膜厚骨だけ削減する。Next, a plan view of the main part in Fig. 7(a), and A-A in Fig. 7(b).
As shown in the sectional view and the BB' cross-sectional view in FIG. 7(C), the bottom magnetic pole layer 12 is The excess protruding portion of the core tip 12a is removed by an ion milling process to form the upper magnetic pole layer 1.
The magnetic pole tip 12a has a shape that matches the specified core width Cw of No. 7.
form. At this time, the magnetic pole tip 17 of the upper magnetic pole layer 17
The film thickness of a is also reduced by the thickness of the lower magnetic pole layer 12.
かかるイオンミリング工程後は前記イオンミリング保護
用レジスＩ・膜１８を剥離除去する。After the ion milling process, the ion milling protection resist I/film 18 is peeled off and removed.
かくすることによりコア幅の揃った下部及び上部磁極層
１２．１７の磁極先端部１２ａ、 １７ａを精度良く形
成している。In this manner, the magnetic pole tips 12a and 17a of the lower and upper magnetic pole layers 12.17 with the same core width are formed with high precision.
ところでこのような従来の磁極先端部１２ａ、 １７ａ
の形成工程においては、イオンミリングによる加工時間
の短縮を図っているが、イオンミリング保護用のマスク
としてレジスト膜１８を用いていることから、その加工
速度を上げるために、該イオンミリング装置のイオン加
速電圧及び電流密度を大きくすると、前記レジスト膜１
８の表面が熱硬化され易く成り、イオンミリング加工後
の該レジスト膜の除去処理が困難となる欠点があった。By the way, such conventional magnetic pole tips 12a, 17a
In the formation process, the processing time is shortened by ion milling, but since the resist film 18 is used as a mask for protecting the ion milling, in order to increase the processing speed, the ion milling time of the ion milling device is When the accelerating voltage and current density are increased, the resist film 1
There was a drawback that the surface of No. 8 was easily hardened by heat, making it difficult to remove the resist film after ion milling.
本発明は上記従来の欠点に鑑み、イオン加速電圧や電流
密度を大きくしても変質がなく、イオンミリング加工速
度を太き（設定できるイオンミリング保護用のマスクを
用いて磁極先端部の形成時間の短縮を可能にした新規な
薄膜磁気ヘッドの製造方法を提供することを目的とする
ものである。In view of the above-mentioned conventional drawbacks, the present invention has been developed to increase the ion milling speed (using a settable ion milling protection mask to increase the formation time of the magnetic pole tip) without causing deterioration even if the ion accelerating voltage or current density is increased. It is an object of the present invention to provide a novel method for manufacturing a thin film magnetic head that makes it possible to shorten the time.
本発明は上記目的を達成するため、規定のコア幅よりも
大きい磁極先端部を有する下部磁極層が形成された基板
上に、ギャップ層、眉間絶縁層に挟まれたコイル層、端
子引き出し線及び規定幅の磁極先端部を有し、かつ前記
下部磁極層の膜厚よりも厚い膜厚の上部磁極層を順次積
層形成した後、或いは該上部磁極層をマスクにして前記
下部磁極層の磁極先端部をイオンミリング加工するに先
だって、前記層間絶縁層及び端子引き出し線の上面、ま
たは上部磁極層上の磁極先端部を除く領域と眉間絶縁層
及び端子引き出し線の上面にイオンミリング保護用のマ
スクとして、下部磁極層と同膜厚で、かつ同材質の磁性
膜からなる保護膜を被着形成する。In order to achieve the above object, the present invention has a gap layer, a coil layer sandwiched between glabella insulating layers, a terminal lead wire and After sequentially laminating an upper magnetic pole layer having a magnetic pole tip of a specified width and having a thickness thicker than that of the lower magnetic pole layer, or using the upper magnetic pole layer as a mask, the magnetic pole tip of the lower magnetic pole layer is formed. Before performing the ion milling process on the interlayer insulating layer and the terminal lead-out wire, or the area on the upper magnetic pole layer excluding the magnetic pole tip, and the top surface of the glabella insulating layer and the terminal lead-out wire, a mask for ion milling protection is applied. Then, a protective film made of a magnetic film having the same thickness and the same material as the bottom pole layer is deposited.
本発明の薄膜磁気ヘッドの製造における磁極層の形成方
法では、前記層間絶縁層及び端子引き出し線の上面、ま
たは上部磁極層上の磁極先端部を除く領域と眉間絶縁層
及び端子引き出し線の上面にイオンミリング保護用のマ
スクとして、下部磁極層と同膜厚で、かつ同材質の磁性
膜からなる保護膜が被着形成されているため、例えば上
部磁極層の磁極先端部と磁性膜からなる保護膜をマスク
にして下部磁極層の磁極先端部をイオン加速電圧及び電
流密度を大きくしたミリング条件でイオンミリング加工
を行っても該保護膜が熱変質することがなく、眉間絶縁
層及び端子引き出し線がイオンミリングより充分に保護
され、更に該保護膜もイオンミリングによって削減され
ていって、下部磁極層の磁極先端部のイオンミリング加
工の終了と略同時に削除され、イオンミリング加工後の
該保護膜の除去工程が省略される。In the method for forming a magnetic pole layer in manufacturing a thin film magnetic head of the present invention, the upper surface of the interlayer insulating layer and the terminal lead-out wire, or the area on the upper magnetic pole layer excluding the magnetic pole tip, and the upper surface of the glabella insulating layer and the terminal lead-out wire. As a mask for ion milling protection, a protective film made of a magnetic film of the same thickness and the same material as the bottom magnetic pole layer is deposited, so for example, a protection film made of the magnetic film and the tip of the top magnetic pole layer is formed. Even when ion milling is performed on the magnetic pole tip of the lower magnetic pole layer using the film as a mask under milling conditions where the ion accelerating voltage and current density are increased, the protective film does not undergo thermal deterioration, and the insulating layer between the eyebrows and the terminal lead-out wire can be easily removed. is sufficiently protected by ion milling, and the protective film is also reduced by ion milling, and is removed almost at the same time as the ion milling of the magnetic pole tip of the lower magnetic pole layer ends, and the protective film after ion milling is removed. The removal step is omitted.
以下図面を用いて本発明に係る薄膜磁気ヘッドの製造方
法の一実施例を工程順に詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a method for manufacturing a thin film magnetic head according to the present invention will be described in detail below in order of steps with reference to the drawings.
先ず第１図（ａ）の要部平面図及び第１図（ｂ）のＢ−
Ｂ゛断面図に示すように、例えばセラミック等からなる
絶縁非磁性基板ｌｌ上に薄膜プロセスによって、規定の
コア幅Ｃ１よりも大きい磁極先端部１２ａを有するＮｔ
−Ｆｅからなる下部磁極層１２、ＳｉＯ□からなるギャ
ップ層１３及び熱硬化性樹脂材からなる層間絶縁層１４
により挟まれたコイル層１５等を順に被着形成する。こ
の時にコイル層１５等の端子引き出し線１６も同時に形
成する。First, the main part plan view in Fig. 1(a) and B- in Fig. 1(b)
As shown in the cross-sectional view B, Nt having a magnetic pole tip 12a larger than a prescribed core width C1 is formed by a thin film process on an insulating nonmagnetic substrate ll made of, for example, ceramic.
- A lower magnetic pole layer 12 made of Fe, a gap layer 13 made of SiO□, and an interlayer insulating layer 14 made of a thermosetting resin material
The coil layers 15 and the like sandwiched by the above are sequentially deposited. At this time, the terminal lead wires 16 such as the coil layer 15 are also formed at the same time.
次に該層間絶縁層１４上に図示のように規定コア幅Ｃｗ
の磁極先端部１７ａを有し、かつ前記下部磁極層１２の
膜厚よりも厚い膜厚、例えば２倍の膜厚の上部磁極層１
７を積層形成した後、該磁極先端部１７ａを除く上部磁
極層１７上及び眉間絶縁層１４、端子引き出し線１６上
に、下部磁極層１２及び上部磁極層１７と同材質で、か
つ少なくとも下部磁極層１２の膜厚と同膜厚のイオンミ
リング用の保護膜２１を被着形成する。Next, on the interlayer insulating layer 14, a prescribed core width Cw is formed as shown in the figure.
The upper magnetic pole layer 1 has a magnetic pole tip 17a and has a thickness thicker than the lower magnetic pole layer 12, for example, twice the thickness.
After layering 7, a layer of at least the lower magnetic pole layer made of the same material as the lower magnetic pole layer 12 and the upper magnetic layer 17 is placed on the upper magnetic pole layer 17 excluding the magnetic pole tip 17a, on the eyebrow insulating layer 14, and on the terminal lead wire 16. A protective film 21 for ion milling having the same thickness as the layer 12 is deposited.
次に第２図（ａ）の要部平面図、第２図（ｂ）のＢ−Ｂ
’断面図に示すように、前記上部磁極層１７の磁極先端
部１７ａ及びイオンミリング用保護膜２１をマスクにし
て、前記下部磁極層１２のコア先端部１２ａのはみ出し
余剰部分をイオンミリング工程により削除する。Next, a plan view of the main part in Fig. 2(a), and B-B in Fig. 2(b).
As shown in the cross-sectional view, using the magnetic pole tip 17a of the upper magnetic pole layer 17 and the protective film 21 for ion milling as a mask, the protruding excess portion of the core tip 12a of the lower magnetic pole layer 12 is removed by an ion milling process. do.
かくすれば、前記イオンミリング用保護膜２１は高速イ
オンミリング加工により変質しないので、該上部磁極層
１７の規定コア幅Ｃ０と一致した形状の下部磁極層１２
の磁極先端部１２ａを正確に、かつ精度良（迅速に形成
することができる。In this way, the protective film 21 for ion milling is not altered by high-speed ion milling, so that the lower magnetic pole layer 12 has a shape that matches the specified core width C0 of the upper magnetic pole layer 17.
The magnetic pole tip 12a can be formed accurately and accurately (quickly).
一方、この際に同時に上部磁極層１７の磁極先端部１７
ａの膜厚は、前記下部磁極層１２の膜厚骨だけ減少され
る。予め上部磁極層１７の膜厚を下部磁極層１２の膜厚
の２倍の膜厚で形成してあれば、該上部磁極層１７の磁
極先端部１７ａの膜厚は略１／２に削減されて前記下部
磁極層１２の膜厚と同膜厚とすることができる。また該
下部磁極層１２の膜厚と略同膜厚に設けられた保護膜２
１も削除され、かかるイオンミリング工程後に該保護膜
１２を除去する工程が省略される。On the other hand, at the same time, the magnetic pole tip 17 of the upper magnetic pole layer 17
The thickness of a is reduced by the thickness of the lower magnetic pole layer 12. If the thickness of the upper magnetic pole layer 17 is twice that of the lower magnetic pole layer 12 in advance, the thickness of the magnetic pole tip 17a of the upper magnetic pole layer 17 can be reduced to approximately 1/2. The thickness of the lower magnetic pole layer 12 can be the same as that of the lower magnetic pole layer 12. Further, a protective film 2 provided with approximately the same thickness as that of the lower magnetic pole layer 12
1 is also deleted, and the step of removing the protective film 12 after the ion milling step is omitted.
次に本発明に係る薄膜磁気ヘッドの製造方法の他の実施
例を第３図（ａ）、 （ｂ） 〜第５図（ａ）、 （ｂ
）ニよって工程順に説明する。前記第１図（ａｌ、 （
ｂ）〜第２図（８１，（ｂ）と同等部分には同一符号を
付している。Next, other embodiments of the method for manufacturing a thin film magnetic head according to the present invention are shown in FIGS. 3(a), (b) to 5(a), (b).
) The process will be explained in order. Said FIG. 1 (al, (
b) to FIG. 2 (81, parts equivalent to (b) are given the same reference numerals.
本実施例が前記第１図（ａ）、 （ｂ） 〜第２図（ａ
）、 （ｂ）（７）実施例と異なる点は、先ず第３図（
ａ）の要部平面図及び第３図山）のＢ−Ｂ’断面図に示
すように、例えばセラミック等からなる絶縁非磁性基板
１１上に、薄膜プロセスによって規定のコア幅Ｃ１，ｌ
よりも大きい磁極先端部１２ａを有するＮｉ−Ｆｅから
なる下部磁極層１２、Ｓｉｎ、からなるギャップ層１３
及び熱硬化性樹脂材からなる眉間絶縁層１４により挟ま
れたコイル層１５、コイル層１５等の端子引き出し線１
６を順に被着形成した後、該層間絶縁層１４及び端子引
き出し線１６の上面に該下部磁極層１２と同材質で、か
つその膜厚と同膜厚のイオンミリング用保護膜３１を被
着形成する。This embodiment is shown in FIGS. 1(a), (b) to 2(a).
), (b) (7) The difference from the example is firstly shown in Fig. 3 (
As shown in the main part plan view in a) and the BB' cross-sectional view in Figure 3, a prescribed core width C1, l is formed by a thin film process on an insulating non-magnetic substrate 11 made of, for example, ceramic.
The lower magnetic pole layer 12 is made of Ni-Fe and has a larger magnetic pole tip 12a, and the gap layer 13 is made of Sin.
and a coil layer 15 sandwiched between eyebrow insulating layers 14 made of a thermosetting resin material, a terminal lead wire 1 of the coil layer 15, etc.
6 is deposited in order, then a protective film 31 for ion milling made of the same material as the lower magnetic pole layer 12 and having the same film thickness is deposited on the upper surface of the interlayer insulating layer 14 and the terminal lead-out wire 16. Form.
次に第４図（ａ）の要部平面図及び第４図（ｂ）のＢ−
Ｂ゛断面図に示すように、前記ギャップ層１３及びイオ
ンミリング用保護膜３１上に前記下部磁極層１２の膜厚
よりも厚い膜厚の上部磁極層１７を形成した後、前記上
部磁極Ｎ１７及びイオンミリング用保護膜３１をマスク
にして、前記下部磁極層１２のコア先端部１２ａのはみ
出し余剰部分をイオンミリング工程により削除する。Next, the main part plan view of Fig. 4(a) and B- of Fig. 4(b)
As shown in the sectional view B, after forming an upper magnetic pole layer 17 having a thickness thicker than that of the lower magnetic pole layer 12 on the gap layer 13 and the protective film 31 for ion milling, the upper magnetic pole N17 and Using the ion milling protective film 31 as a mask, the protruding excess portion of the core tip 12a of the lower magnetic pole layer 12 is removed by an ion milling process.
かくすれば、第５図（ａ）の要部平面図及び第５図（ｈ
ｌのＢ−Ｂ’断面図に示すように本実施例によっても、
前記第１図（ａｌ、 （ｂ）〜第２図（ａ）９世）によ
る実施例と同様にイオンミリング用保護膜３１は高速イ
オンミリング加工により変質しないので、該上部磁極層
１７の規定コア幅Ｃ１と一致した形状の下部磁極層１２
の磁極先端部１２ａを正確に、かつ精度良く迅速に形成
することができる。In this way, the main part plan view of FIG. 5(a) and FIG. 5(h
As shown in the BB' cross-sectional view of 1, according to this embodiment,
Similar to the embodiments shown in FIGS. 1(al and 9) to 2(a), the protective film 31 for ion milling is not altered by high-speed ion milling, so that the specified core of the upper magnetic pole layer 17 is Lower magnetic pole layer 12 having a shape that matches the width C1
The magnetic pole tip 12a can be formed accurately, accurately and quickly.
なお、本実施例では図示のようにイオンミリング加工後
、眉間絶縁層１４上の一部及び端子引き出し線１６上の
前記保護膜３１は削除され、該層間絶縁層１４と上部磁
極ＦｉｉｌＴ間の保護膜３１が部分的に残存することに
なるが、該保護膜３１は上部磁極層１７の材質と同一で
あるため、磁気特性上から何等問題となることはない。In this embodiment, as shown in the figure, after the ion milling process, a part of the glabella insulating layer 14 and the protective film 31 on the terminal lead wire 16 are removed, and the protective film 31 between the interlayer insulating layer 14 and the upper magnetic pole FiilT is removed. Although the film 31 will partially remain, since the protective film 31 is made of the same material as the upper magnetic pole layer 17, there will be no problem in terms of magnetic properties.
更に、以上の実施例ではイオンミリング用保護膜を上部
磁極層及び下部磁極層の材質と同様な材質で形成した場
合の例について説明したが、本発明はこの例に限定され
るものではなく、例えばイオンミリング加工速度が上部
磁極層及び下部磁極層の材質と同様な磁性膜を適用する
ことも可能であり、同様の効果が得られる。Further, in the above embodiments, an example in which the protective film for ion milling was formed of the same material as the upper magnetic pole layer and the lower magnetic pole layer was explained, but the present invention is not limited to this example. For example, it is possible to apply a magnetic film whose ion milling speed is similar to that of the material of the upper magnetic pole layer and the lower magnetic pole layer, and the same effect can be obtained.
以上の説明から明らかなように、本発明に係る薄膜磁気
ヘッドの製造方法によれば、イオンミリング加工により
磁極を形成する際に用いる保護用のマスクとして、従来
のレジスト膜の代わりに磁性材からなる保護膜を用いる
ことにより、イオンミリング加工速度の高速化を図るこ
とが可能となり、しかもイオンミリング加工後の、該保
護膜を除去する工程が省略される等の優れた利点を有す
る。従って、磁極形成工程時間が大きく短縮され、製造
コストを低減できる顕著なる効果を奏する。As is clear from the above description, according to the method of manufacturing a thin film magnetic head according to the present invention, a magnetic material is used instead of a conventional resist film as a protective mask used when forming magnetic poles by ion milling. By using the protective film, it is possible to increase the speed of ion milling, and the process of removing the protective film after ion milling can be omitted. Therefore, the magnetic pole forming process time is greatly shortened, and the manufacturing cost can be reduced.
第１図ｆａｔ、 （ｂ）乃至第２図（ａ）、 （ｂ）は
本発明に係る薄膜磁気ヘッドの製造方法の一実施例
を工程順に示す図であり、各図（ａ）は要部平面図、各
図（ｂ）は各図（ａｌに示すＢ−Ｂ°切断線に沿った要
部断面図、
第３図（ａ）、 （ｂ）乃至第５図（ａ）、 （ｂ）は
本発明に係る薄膜磁気ヘッドの製造方法の他の実施
例を工程順に示す図であり、各図（ａｌは要部平面図、
各図（ｂ）は各図（ａ）に示すＢ−Ｂ’切断線に沿った
要部断面図、
第６図（ａ）、 （ｂ）、 （Ｃ）乃至第７図（ａ）、
（ｂ）、 （ｅ）は従来の薄膜磁気ヘッドの製造方法
を工程順
に説明するための図であり、各図（ａ）は要部平面図、
各図（ｂ）は各図（ａ）に示すＡ−Ａ’切断線に沿った
要部断面図、各
図（Ｃ）はＢ−Ｂ’切断線に沿った要部断面図である。
第１図（ａ）、 （ｂ）乃至第５図（ａ）、 （ｂ）に
おいて、１１は基板、１２は下部磁極、１２ａ、 １７
ａは磁極先端部、１３はギャップ層、１４は眉間絶縁層
、１５はコイル層、１６は端子引き出し線、１７は上部
磁極層、２１．３１は保護膜をそれぞれ示す。
斗発明の轄に情友ＴネＩ必 ８−Ｂ′酢命グ第２
図（Ｑ） 第２図＜ｂ。
／ｊＲ１Ｉｌｌｓ／１ｓｆｌｔ１％Ａ： ｒｌｔｒｌＪ
Ｂ −Ｂ ’ １ｌｉｄｎｒ”Ａ第３図ＬＱ
） 第３図（ｂ）
木登ｅ月め費り上音１蓄ネジ層靜△°Ｉすエコ
Ｂ−Ｂ’ｌｆｆ面ｍ第４図（Ｑｌ 第４
図（ｂ）ネ如ル煽拗肪封屯 Ｂ−８’跡面ｍ第５図
＋ＣＩ） 第５図（ｂ）ｔめメ給４イｆｔｈＪ
ｌｆ／ンハ゛１＝】ン【［ンフ第６図＜ａ＞
Ｂ−Ｅｌ’！ｆｒ＃図
第６図に］FIG. 1 (b) to FIG. 2 (a), (b) are diagrams illustrating an embodiment of the manufacturing method of a thin film magnetic head according to the present invention in the order of steps, and each figure (a) shows the main part. A plan view, each figure (b) is a sectional view of the main part along the B-B° cutting line shown in each figure (al), and Figures 3 (a), (b) to 5 (a), (b) 2A and 2B are diagrams illustrating another embodiment of the method for manufacturing a thin film magnetic head according to the present invention in the order of steps;
Each figure (b) is a sectional view of the main part along the line BB' shown in each figure (a), Figures 6 (a), (b), (C) to 7 (a),
(b) and (e) are diagrams for explaining the conventional thin-film magnetic head manufacturing method step by step, and each diagram (a) is a plan view of the main part,
Each figure (b) is a sectional view of a main part along the line AA' shown in each figure (a), and each figure (C) is a sectional view of the main part along the line BB'. 1(a), (b) to FIG. 5(a), (b), 11 is a substrate, 12 is a lower magnetic pole, 12a, 17
13 is a gap layer, 14 is an insulating layer between the eyebrows, 15 is a coil layer, 16 is a terminal lead wire, 17 is an upper magnetic pole layer, and 21.31 is a protective film. 8-B'Vinegar's Life Gu Part 2
Figure (Q) Figure 2<b. /jR1Ills/1sflt1%A: rltrlJ
B -B'1lidnr"AFigure 3LQ
) Fig. 3 (b) Tree climbing e moon mekori upper sound 1 storage screw layer silence △°Isu eco
B-B'lff plane m Fig. 4 (Ql 4th
Diagram (b) Neyuru Akiru Fat Enclosure B-8' trace surface m Figure 5 + CI) Figure 5 (b) tme supply 4fthJ
lf/N 1=]n [[Nf Figure 6 <a>B-El'!fr# Figure 6]
Claims (2)
を有する下部磁極層（１２）が形成された基板（１１）
上に、ギャップ層（１３）、層間絶縁層（１４）に挟ま
れたコイル層（１５）、端子引き出し線（１６）及び規
定幅の磁極先端部（１７ａ）を有し、かつ前記下部磁極
層（１２）の膜厚よりも厚い膜厚の上部磁極層（１７）
を順次積層形成した後、該上部磁極層（１７）をマスク
にして前記下部磁極層（１２）の磁極先端部（１２ａ）
をイオンミリング工程により上部磁極層（１７）の規定
のコア幅と一致する形状に形成する方法において、上記
上部磁極層（１７）の形成、または下部磁極層（１２）
の磁極先端部（１２ａ）をイオンミリング加工を行うに
先だって、前記層間絶縁層（１４）及び端子引き出し線
（１６）の上面に、磁性材からなるイオンミリング用保
護膜（２１）を形成したことを特徴とする薄膜磁気ヘッ
ドの製造方法。(1) Magnetic pole tip (12a) larger than the specified core width
a substrate (11) on which a lower magnetic pole layer (12) is formed;
It has a gap layer (13), a coil layer (15) sandwiched between an interlayer insulating layer (14), a terminal lead wire (16), and a magnetic pole tip (17a) of a specified width on the lower magnetic pole layer. The upper magnetic pole layer (17) has a thickness thicker than that of (12).
After sequentially laminating the upper magnetic pole layer (17), the magnetic pole tip (12a) of the lower magnetic pole layer (12) is formed using the upper magnetic pole layer (17) as a mask.
In the method of forming the upper magnetic pole layer (17) into a shape that matches the specified core width of the upper magnetic pole layer (17) by an ion milling process, the formation of the upper magnetic pole layer (17) or the lower magnetic pole layer (12)
A protective film for ion milling (21) made of a magnetic material is formed on the upper surface of the interlayer insulating layer (14) and the terminal lead wire (16) before performing ion milling on the magnetic pole tip (12a). A method for manufacturing a thin film magnetic head characterized by:
び上部磁極層（１７）と同材質であり、かつ少なくとも
下部磁極層（１２）の膜厚と同膜厚に形成したことを特
徴とする特許請求の範囲第（１）項に記載した薄膜磁気
ヘッドの製造方法。(2) The protective film (21) is made of the same material as the lower magnetic pole layer (12) and the upper magnetic pole layer (17), and is formed to have at least the same thickness as the lower magnetic pole layer (12). A method for manufacturing a thin film magnetic head as set forth in claim (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP149787A JPS63168809A (en) | 1987-01-06 | 1987-01-06 | Production of thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP149787A JPS63168809A (en) | 1987-01-06 | 1987-01-06 | Production of thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63168809A true JPS63168809A (en) | 1988-07-12 |
Family
ID=11503095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP149787A Pending JPS63168809A (en) | 1987-01-06 | 1987-01-06 | Production of thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63168809A (en) |
-
1987
- 1987-01-06 JP JP149787A patent/JPS63168809A/en active Pending
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