JPS6316733B2 - - Google Patents

Info

Publication number
JPS6316733B2
JPS6316733B2 JP52160622A JP16062277A JPS6316733B2 JP S6316733 B2 JPS6316733 B2 JP S6316733B2 JP 52160622 A JP52160622 A JP 52160622A JP 16062277 A JP16062277 A JP 16062277A JP S6316733 B2 JPS6316733 B2 JP S6316733B2
Authority
JP
Japan
Prior art keywords
deposition
photoreceptor
substrate
photoconductive
substrate temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52160622A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5492241A (en
Inventor
Tadaharu Fukuda
Teruo Misumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP16062277A priority Critical patent/JPS5492241A/ja
Priority to US05/972,280 priority patent/US4241158A/en
Priority to FR7836555A priority patent/FR2413696A1/fr
Priority to DE19782856494 priority patent/DE2856494A1/de
Publication of JPS5492241A publication Critical patent/JPS5492241A/ja
Publication of JPS6316733B2 publication Critical patent/JPS6316733B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08207—Selenium-based

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP16062277A 1977-12-28 1977-12-28 Electrophotographic photoreceptor Granted JPS5492241A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP16062277A JPS5492241A (en) 1977-12-28 1977-12-28 Electrophotographic photoreceptor
US05/972,280 US4241158A (en) 1977-12-28 1978-12-22 Vacuum deposited electrophotographic photosensitive member
FR7836555A FR2413696A1 (fr) 1977-12-28 1978-12-27 Organe photosensible pour operations electrophotographiques
DE19782856494 DE2856494A1 (de) 1977-12-28 1978-12-28 Lichtempfindliches element fuer die elektrofotografie

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16062277A JPS5492241A (en) 1977-12-28 1977-12-28 Electrophotographic photoreceptor

Publications (2)

Publication Number Publication Date
JPS5492241A JPS5492241A (en) 1979-07-21
JPS6316733B2 true JPS6316733B2 (enFirst) 1988-04-11

Family

ID=15718902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16062277A Granted JPS5492241A (en) 1977-12-28 1977-12-28 Electrophotographic photoreceptor

Country Status (4)

Country Link
US (1) US4241158A (enFirst)
JP (1) JPS5492241A (enFirst)
DE (1) DE2856494A1 (enFirst)
FR (1) FR2413696A1 (enFirst)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0011083B1 (en) * 1978-07-26 1982-08-04 TDK Corporation Photoelectric device
DE3020940C2 (de) * 1980-06-03 1982-12-23 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Elektrophotographisches Aufzeichnungsmaterial
JPS57191649A (en) * 1981-05-21 1982-11-25 Ricoh Co Ltd Electrophotographic receptor
US5589000A (en) * 1995-09-06 1996-12-31 Minnesota Mining And Manufacturing Company Fixture for deposition
CN108103439B (zh) * 2017-12-27 2020-01-21 天津科技大学 利用真空蒸发镀膜可控制备结构梯度定向生长Sb-Bi-Te膜的方法
CN108220879B (zh) * 2018-01-08 2020-01-21 天津科技大学 采用蒸发镀膜制备倾斜纳米线阵列结构碲化锑基膜的方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2753278A (en) * 1951-04-14 1956-07-03 Haloid Co Method for the production of a xerographic plate
US3598644A (en) * 1964-10-12 1971-08-10 Xerox Corp Imaging member fabrication
US3617265A (en) * 1966-08-29 1971-11-02 Xerox Corp Method for preparing a resin overcoated electrophotographic plate
JPS5522783B1 (enFirst) * 1967-08-29 1980-06-19
FR2002898A1 (enFirst) * 1968-02-29 1969-10-31 Katsuragawa Denki Kk
GB1208239A (en) * 1968-05-01 1970-10-07 Ricoh Kk Improvements in and relating to photoconductive arrangements
JPS4838425B1 (enFirst) * 1969-05-22 1973-11-17
US3666554A (en) * 1970-12-10 1972-05-30 Ibm Manufacture of electrophotographic plate
US4008082A (en) * 1973-02-19 1977-02-15 Licentia Patent-Verwaltungs-G.M.B.H. Method for producing an electrophotographic recording material
US4126457A (en) * 1973-05-30 1978-11-21 Xerox Corporation Evaporation technique for producing high temperature photoreceptor alloys
US4094675A (en) * 1973-07-23 1978-06-13 Licentia Patent-Verwaltungs-G.M.B.H. Vapor deposition of photoconductive selenium onto a metallic substrate having a molten metal coating as bonding layer
DE2339115C2 (de) * 1973-08-02 1980-04-10 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Herstellen eines elektrophotographischen Aufzeichnungsmaterials

Also Published As

Publication number Publication date
JPS5492241A (en) 1979-07-21
US4241158A (en) 1980-12-23
FR2413696B1 (enFirst) 1983-04-01
FR2413696A1 (fr) 1979-07-27
DE2856494A1 (de) 1979-07-05
DE2856494C2 (enFirst) 1988-08-11

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