JPS6315812Y2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for determining the orientation of a crystal by optical means.

In the past, the method used to measure the orientation of a crystal was to find the cleavage plane, but this is rarely used today because it is a destructive test and the measurement error is large. .
The most commonly used method at present is the X-ray Laue method. This method is a non-destructive test and there is no measurement error.
It has the advantage of being able to measure the in-plane orientation of the measurement surface at the same time, as well as being able to take records (photographs). However, the method using X-rays has problems in that the equipment itself is expensive and safety considerations must be taken, such as preventing exposure to X-rays. When measuring the orientation of a crystal produced by the pulling method or flux method, the rough orientation can be determined in advance from the external shape of the crystal, so it is relatively easy to measure the orientation using the Laue method. can. However, in the case of crystals that do not have features that allow orientation to be determined, such as crystals produced by the Bridgeman method, there are many difficulties in measuring orientation using X-rays.

On the other hand, the so-called optical imaging method, in which the chemical corrosion image of a crystal is irradiated with a light beam and the optical image is used to measure the crystal orientation, has the following characteristics. In other words, although the optical imaging method has the disadvantage that the crystal surface must be corroded, it has the advantage that the device has a simple configuration, is inexpensive, and can quickly and safely measure orientation. However, it is said that the error of the direction measurement method using the optical imaging method is usually about 1°. For this reason, it is difficult to measure the fine planes of crystals.

Therefore, the problem of the present invention is to provide a crystal orientation measuring device that can easily measure crystal orientation even on minute planes of crystals that are difficult to measure using conventional optical imaging methods.

According to the present invention, an incident light beam is projected onto a sample through a pinhole in a screen, a light image is obtained on the screen based on the reflected light beam from the sample, and the crystal orientation of the sample is measured using the light image. The crystal orientation measuring device includes: a half mirror disposed in the path of the reflected ray that has passed through the pinhole and which deflects the direction of the reflected ray from the path of the incident ray; A crystal orientation measuring device is obtained, which is characterized by being equipped with a photodetector that detects intensity.

This will be explained below with reference to the drawings.

FIG. 1 shows a principle configuration diagram of a crystal orientation measuring device using a known optical imaging method. In the figure, a light beam from a light source 1, that is, an incident light beam 2 passes through a pinhole in a screen 3 and enters a crystal sample 4 on a sample stage 5.
The reflected light beam 6 then reaches the screen 3. The pattern thus projected on the screen 3 corresponds to the crystal orientation and is called a so-called optical image.

In the case of the crystal orientation measuring apparatus shown in FIG. 1, the crystal orientation is measured by adjusting the direction of the sample stage 5 so that an optical image is reflected at the position of the pinhole and measuring the adjustment angle. That is, by adjusting the orientation of the crystal sample 4 with respect to the incident light beam 2, aligning one or more optical images with the pinhole portion of the screen 3 in sequence, and recording and calculating the angle in each case. You can measure direction for the first time.

However, the crystal orientation measuring device shown in Figure 1 requires an operation to adjust the crystal direction as described above, and this operation is performed individually for multiple optical images, so it is difficult to easily measure the orientation of the crystal. The premise is that the measurement surface is sufficiently wide. In other words, it is necessary to change the direction of the crystal and make the light beam incident.
Practical measurement becomes difficult unless the relevant surface of the crystal sample has a certain area or more (for example, 10 mm ² or more).

FIG. 2 shows a principle configuration diagram of an embodiment of the crystal orientation measuring device according to the present invention. In the figure, the principle and operation of projecting an optical image on the screen 3 are almost the same as those of the previously-mentioned known device. Further, among the reflected light beams 6 from the surface of the crystal sample 4, the light beams 6' that have passed through the pinhole of the screen 3 again are guided to a photodetector 9 by a half mirror 7 and a slit or diaphragm 8. There is. When measuring the crystal orientation, a light image is projected onto the screen 3, passes through the pinhole, is reflected on the half mirror 7, and is directed so that the intensity of the light that enters the photodetector 9 is maximized. Finely adjust the angle of the sample stage 5.

According to the crystal orientation measuring device shown in FIG. 2, the crystal orientation can be measured by the following procedure.
In other words, the light directly reflected by the crystal surface is detected by the photodetector 9.
By adjusting the direction of the crystal sample 4 so that the light is most strongly incident on the pinhole, and then reading the distance and direction between the light image projected on the screen 3 and the pinhole, the crystal orientation at the relevant point can be accurately determined. can be measured. In this way, it can be ensured that the minute spot of the crystal is perpendicular to the incident light beam 2, so that the crystal orientation of a minute spot on the same level as the incident light beam 2 can be easily measured.

As described above using examples, the present invention provides an orientation measuring device that can easily measure crystal orientation even on minute planes of crystals that are difficult to measure using conventional optical imaging methods. .

[Brief explanation of the drawing]

FIG. 1 is a diagram showing the basic structure of a crystal orientation measuring device using a conventional optical imaging method, and FIG. 2 is a diagram showing the basic structure of a crystal orientation measuring device according to an embodiment of the present invention. 1... Light source, 2... Incident light beam, 3... Screen, 4... Crystal sample, 5... Sample stage, 6, 6'...
...Reflected light beam, 7...Half mirror, 8...Slit or aperture, 9...Photodetector.

Claims (1)

[Scope of utility model registration request] In a crystal orientation measuring device, an incident light beam is projected onto a sample through a pinhole in a screen, an optical image is obtained on the screen based on the reflected light beam from the sample, and the crystal orientation of the sample is measured using the optical image. , a half mirror disposed in the path of the reflected light beam passing through the pinhole to deflect the direction of the reflected light beam from the path of the incident light beam; and a photodetector for detecting the intensity of the reflected light deflected by the half mirror. A crystal orientation measuring device characterized by being equipped with a device.