JPS63154773A - Photo-curable electrically conductive fired paste - Google Patents
Photo-curable electrically conductive fired pasteInfo
- Publication number
- JPS63154773A JPS63154773A JP30219086A JP30219086A JPS63154773A JP S63154773 A JPS63154773 A JP S63154773A JP 30219086 A JP30219086 A JP 30219086A JP 30219086 A JP30219086 A JP 30219086A JP S63154773 A JPS63154773 A JP S63154773A
- Authority
- JP
- Japan
- Prior art keywords
- paste
- photo
- electrically conductive
- fine powder
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 acrylic ester Chemical class 0.000 claims abstract description 20
- 239000000843 powder Substances 0.000 claims abstract description 19
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 7
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 5
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 5
- 238000010304 firing Methods 0.000 claims description 25
- 239000011342 resin composition Substances 0.000 claims description 23
- 229920001577 copolymer Polymers 0.000 abstract description 9
- 239000011521 glass Substances 0.000 abstract description 5
- 239000000178 monomer Substances 0.000 abstract description 5
- 229920000642 polymer Polymers 0.000 abstract description 5
- 239000011347 resin Substances 0.000 abstract 3
- 229920005989 resin Polymers 0.000 abstract 3
- 239000004615 ingredient Substances 0.000 abstract 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 abstract 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 27
- 239000000919 ceramic Substances 0.000 description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- 239000002904 solvent Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000004020 conductor Substances 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 229910000416 bismuth oxide Inorganic materials 0.000 description 3
- 125000004386 diacrylate group Chemical group 0.000 description 3
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000010946 fine silver Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229940116411 terpineol Drugs 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- UIERETOOQGIECD-ARJAWSKDSA-M 2-Methyl-2-butenoic acid Natural products C\C=C(\C)C([O-])=O UIERETOOQGIECD-ARJAWSKDSA-M 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- UIERETOOQGIECD-UHFFFAOYSA-N Angelic acid Natural products CC=C(C)C(O)=O UIERETOOQGIECD-UHFFFAOYSA-N 0.000 description 1
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- OYHQOLUKZRVURQ-HZJYTTRNSA-N Linoleic acid Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(O)=O OYHQOLUKZRVURQ-HZJYTTRNSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- OYHQOLUKZRVURQ-IXWMQOLASA-N linoleic acid Natural products CCCCC\C=C/C\C=C\CCCCCCCC(O)=O OYHQOLUKZRVURQ-IXWMQOLASA-N 0.000 description 1
- 235000020778 linoleic acid Nutrition 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- PMJHHCWVYXUKFD-UHFFFAOYSA-N penta-1,3-diene Chemical compound CC=CC=C PMJHHCWVYXUKFD-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- UIERETOOQGIECD-ONEGZZNKSA-N tiglic acid Chemical compound C\C=C(/C)C(O)=O UIERETOOQGIECD-ONEGZZNKSA-N 0.000 description 1
- UAXOELSVPTZZQG-UHFFFAOYSA-N tiglic acid Natural products CC(C)=C(C)C(O)=O UAXOELSVPTZZQG-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Conductive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
くu東上の利用分野〉
本発明は光硬化型樹脂組成物をバインダとする光硬化型
導電性焼成ペーストに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Application] The present invention relates to a photocurable conductive firing paste using a photocurable resin composition as a binder.
〈従来の技術〉
従来、セラミック基板上に導体回路を形成する方法とし
ては、色銀、モリブデン、タングステンまたはパラジュ
ウムなどの導電性微粉末と低融点ガラス質フリット、金
属酸化物及び有機ビヒクルなどより成る焼成ペーストを
アルミナなどのセラミック基板上に直接回路パターンを
印刷し、乾燥後焼成する方法が一般的である。<Prior art> Conventionally, the method of forming a conductive circuit on a ceramic substrate is to use a conductive circuit made of conductive fine powder such as colored silver, molybdenum, tungsten or palladium, a low-melting glass frit, a metal oxide, an organic vehicle, etc. A common method is to print a circuit pattern directly on a ceramic substrate such as alumina with a firing paste, dry it, and then fire it.
〈発明が解決しようとする問題点〉
しかし、この様な焼成ペーストは高沸点の溶剤を含有し
ているために、(1)乾燥時間が長い、(2)スクリー
ン版の目詰まりによるピンホールや線巾のくずれなどが
生じやすい、(3)職場環境の汚染が著しい、(4)ペ
ーストの経時粘度変化が大きいため連続印刷が困難、な
どの多くの問題を抱えている。<Problems to be solved by the invention> However, since such firing pastes contain high-boiling point solvents, (1) drying time is long, (2) pinholes and other problems occur due to clogging of the screen plate. It has many problems such as easy line width distortion, (3) significant pollution of the workplace environment, and (4) difficulty in continuous printing due to large changes in the viscosity of the paste over time.
また、これらの問題を解決するために、例えば特公昭5
4−41491号公報などでは、光硬化型樹脂組成物を
バインダに用いる提案もなされているが、(1)硬化し
たバインダの熱分解温度が高く焼成性が良好でない、(
2)そのため焼成時に発生するピンホールやちぢれまた
はカーボン残存により不良導体を形成しやすい、(3)
導電性微粉末と光硬化型樹脂組成物との分散性が悪いた
め、保存安定性が悪い、(4)導電性微粉末と光硬化型
樹脂組成物との分散性が悪いため、印刷、焼成後、セラ
ミック基板と導体との接着強度が低いなどの問題点があ
る。In addition, in order to solve these problems, for example,
4-41491 etc., it has been proposed to use a photocurable resin composition as a binder; however, (1) the thermal decomposition temperature of the cured binder is high and the sinterability is not good;
2) Therefore, poor conductors are likely to be formed due to pinholes, curls, or carbon residue that occur during firing, (3)
(4) Poor dispersibility between the conductive fine powder and the photocurable resin composition, resulting in poor storage stability; (4) Poor dispersibility between the conductive fine powder and the photocurable resin composition, resulting in poor printing and baking Another problem is that the adhesive strength between the ceramic substrate and the conductor is low.
く問題点を解決するための手段〉
熱分解性の良好なバインダについては、既に本発明者ら
の一部により提案した(特開昭57−152993号)
。しかし、その提案では導電性微粉末の分散性は必ずし
も十分でないことが、その後の試験により判明した。Means for Solving the Problems> A binder with good thermal decomposition properties has already been proposed by some of the inventors (Japanese Patent Laid-Open No. 152993/1983).
. However, subsequent tests revealed that this proposal did not necessarily provide sufficient dispersibility of the conductive fine powder.
本発明者らはこの欠点を解消するため、鋭意研究した結
果、分子内に1個以上の不飽和二重結合を有する脂肪族
モノカルボン酸と無水マレイン酸ハ雀応じて得られる化
合物を添加すれば分散性が大巾に改良されることを見出
し本発明に到達した。In order to overcome this drawback, the present inventors conducted extensive research and found that a compound obtained by adding an aliphatic monocarboxylic acid having one or more unsaturated double bonds in the molecule and maleic anhydride. The present invention was achieved based on the discovery that the dispersibility was greatly improved.
すなわち、本発明は導電性微粉末(A)、ガラス質フリ
ッ) (B) 、金属酸化物(C)および光硬化型樹脂
組成物(D)を含有する光硬化型導電性焼成ペーストに
おいて、さらに該ペーストが分子内に1個以上の不飽和
二重結合を有する脂肪族モノカルボン酸と無水マレイン
酸との反応物(E)を含有することを特徴とする光硬化
型導電性焼成ペーストである。本発明で使用する導電性
微粉末(A)とは、例えば金、銀、パラジウム、白金な
どの貴金属粉末、銅、タングステン、モリブデン、ニッ
ケル、アルミニウムなどの卑金属粉末などである。その
含有率は本発明の焼成ペーストの40〜90重量%であ
る。含有率が40重量%未満の場合は、形成回路の導電
性が低下し安定した回路の形成が困難であり、一方90
重量%を超える場合は本発明の焼成ペーストの粘度が著
しく高くなり印刷が困難となる。That is, the present invention provides a photocurable conductive baking paste containing a conductive fine powder (A), a glassy frit (B), a metal oxide (C), and a photocurable resin composition (D), further comprising: The paste is a photocurable conductive fired paste characterized in that the paste contains a reaction product (E) of an aliphatic monocarboxylic acid having one or more unsaturated double bonds in the molecule and maleic anhydride. . The conductive fine powder (A) used in the present invention includes, for example, noble metal powder such as gold, silver, palladium, and platinum, and base metal powder such as copper, tungsten, molybdenum, nickel, and aluminum. Its content is 40-90% by weight of the fired paste of the invention. If the content is less than 40% by weight, the conductivity of the formed circuit will decrease and it will be difficult to form a stable circuit;
If it exceeds % by weight, the viscosity of the fired paste of the present invention becomes extremely high, making printing difficult.
本発明で使用するガラス質7リツ) (B)とは、例え
ば酸化鉛、酸化ホウ素、酸化ケイ素、酸化ナトリウム、
酸化カルシウムなどであり、その含有率は本発明の焼成
ペーストの0.1〜15重量%である。その含有率が0
.1重量%未満の場合は導体回路がセラミック基板との
接着性に劣り、一方15重量%を越える場合は、半田濡
れ性が悪くなる。The vitreous material (B) used in the present invention includes, for example, lead oxide, boron oxide, silicon oxide, sodium oxide,
Calcium oxide, etc., and its content is 0.1 to 15% by weight of the fired paste of the present invention. Its content is 0
.. If it is less than 1% by weight, the conductor circuit will have poor adhesion to the ceramic substrate, while if it exceeds 15% by weight, the solder wettability will be poor.
−力士つ」LJ−゛ ゴよ
塾、一
本発明に使用する金M酸化物(C)とは、例えば酸化ビ
スマス、酸化マグネシウム、酸化マンガン、酸化銅など
であり、その含有率は本発明の焼成ペーストの0.1〜
15重量%である。その含有率が0.1重量%未満の場
合は導体回路のセラミック基板との接着性に劣り、一方
15重量%を越える場合は、半田濡れ性や導電性が低下
する。- Sumo wrestlers LJ 0.1~ of baking paste
It is 15% by weight. If the content is less than 0.1% by weight, the adhesion of the conductor circuit to the ceramic substrate will be poor, while if it exceeds 15% by weight, the solder wettability and conductivity will be reduced.
次に、本発明で使用する光硬化型樹脂組成物(D)は必
須成分としてメタアクリル酸エステルまたは/およびア
クリル酸エステルの重合体または共重合体、光硬化型上
ツマ−および光開始剤を含有するものである。メタアク
リル酸ニスデルまたは/およびアクリル酸エステルの重
合体または共重合体としては、例えば(メタ)アクリル
酸メチル(アクリル酸メチルエステルおよびメタアクリ
フ酸メチルエステル歌示す。以下同様に略記する)、(
メタ)アクリル!! :%チル、(メタ)アクリル酸−
n−ブチルなどの(メタ)アクリル酸アルキルエステル
類、(メタ)アクリル酸シクロヘキシルなどの(メタ)
アクリル酸シクロアルキルエステル類、(メタ)アクリ
ル酸ベンジルなどの(メタ)アクリル酸アラルキルエス
テル類の重合体または共重合体である。共重合体成分と
しては、(メタ)アクリル酸エステル以外の重合性単量
体を少量含有していてもよい。Next, the photocurable resin composition (D) used in the present invention contains as essential components a polymer or copolymer of methacrylic ester or/and acrylic ester, a photocurable upper layer, and a photoinitiator. It contains. Examples of polymers or copolymers of Nisdel methacrylate and/or acrylic ester include methyl (meth)acrylate (indicated by acrylic acid methyl ester and methacrylic acid methyl ester, hereinafter similarly abbreviated), (
Meta) Acrylic! ! :% chill, (meth)acrylic acid-
(meth)acrylic acid alkyl esters such as n-butyl; (meth)acrylic acid alkyl esters such as cyclohexyl (meth)acrylate;
It is a polymer or copolymer of (meth)acrylic acid aralkyl esters such as acrylic acid cycloalkyl esters and (meth)acrylic acid benzyl esters. The copolymer component may contain a small amount of a polymerizable monomer other than (meth)acrylic ester.
光硬化型モノマーとは、(1)スチレン、α−メチルス
チレンなどのスチレン系化合物、(2)メチル(メタ)
アクリレート、エチル(メタ)アクリレート、テトラヒ
ドロフルフリル(メタ)アクリレートなどのモノ(メタ
)アクリレート化合物、(3)エチレングリコールジ(
メタ)アクリレート、1.6−ヘキサンシオールジ(メ
タ)アクリレートなどのアルキレングリコールジ(メタ
)アクリレート化合物、(4)トリメチロールプロバン
トIJ (メタ)アクリレート、ペンタエリスリトール
テトラ(メタ)アクリレートなどの多価(メタ)アクリ
レート化合物などである。Photocurable monomers include (1) styrene compounds such as styrene and α-methylstyrene, (2) methyl (meth)
acrylate, mono(meth)acrylate compounds such as ethyl(meth)acrylate, and tetrahydrofurfuryl(meth)acrylate; (3) ethylene glycol di(
meth)acrylate, alkylene glycol di(meth)acrylate compounds such as 1,6-hexanethiol di(meth)acrylate, (4) polyhydric compounds such as trimethylolprobant IJ (meth)acrylate, pentaerythritol tetra(meth)acrylate, etc. (meth)acrylate compounds, etc.
光開始剤とはベンゾイン系化合物、ベンゾフェノン系化
合物、チオキサントン系化合物などの光開始剤である。The photoinitiator is a photoinitiator such as a benzoin compound, a benzophenone compound, or a thioxanthone compound.
光硬化型樹脂組成物における(メタ)アクリル散エステ
ルの重合体又は共重合体の量は、5〜50重JB7に%
であり、光硬化型モノマーの量は95〜50重量%であ
ることが好ましい。光開始剤の量は光硬化型樹脂組成物
中、1〜10重量%であることが好ましい。The amount of the (meth)acrylic powder ester polymer or copolymer in the photocurable resin composition is 5 to 50% by weight JB7.
The amount of photocurable monomer is preferably 95 to 50% by weight. The amount of the photoinitiator is preferably 1 to 10% by weight in the photocurable resin composition.
光硬化型樹脂組成物(D)の含有率は本発明の焼成ペー
ストの5〜50重量%である。含有率が51i!%未満
の場合は、ペーストの粘度が高くなり印刷が困難であり
、一方、SOZ貴%を越えると導電性の点で良好な回路
を得ることが困難となる。The content of the photocurable resin composition (D) is 5 to 50% by weight of the fired paste of the present invention. The content rate is 51i! If it is less than %, the viscosity of the paste will become high and printing will be difficult, while if it exceeds SOZ %, it will be difficult to obtain a circuit with good conductivity.
光硬化型樹脂組成物(D)には公知の熱重合防止剤、レ
ベリング剤、消泡剤、増粘剤、揺変剤などを添加し、粘
度、保存安定性、印刷適性などを調節して使用されるの
が一般的である。Known thermal polymerization inhibitors, leveling agents, antifoaming agents, thickeners, thixotropic agents, etc. are added to the photocurable resin composition (D) to adjust viscosity, storage stability, printability, etc. It is commonly used.
次に、本発明の核心は分子内に1個以上の不飽和二重結
合を有する脂肪族モアカルボン酸と無水マレイン酸との
友応切(E)の添加にある。分子内に1個の不飽和二重
結合を有する脂肪族モノカルボン酸としては、例えば、
1)アクリル酸、メタクリル酸、ブテン酸、り、ロトン
酸、ビニル酢酸、チグリン酸、オレイン酸などがある。Next, the core of the present invention lies in the addition of a compound (E) between an aliphatic moacarboxylic acid having one or more unsaturated double bonds in the molecule and maleic anhydride. Examples of aliphatic monocarboxylic acids having one unsaturated double bond in the molecule include:
1) Acrylic acid, methacrylic acid, butenoic acid, rotonic acid, vinyl acetic acid, tiglic acid, oleic acid, etc.
分子内に2個の不飽和二重結合を有する脂肪族モノカル
ボン酸としては、例えば11)2.4−ペンタジェン醋
、ジアリル酸p、i、a−ドデカジエン酸、リノール醗
などがある。分子内に3個以上の不飽和二重結合を有す
る脂肪族モノカルボン酸としては、例えば、1it)2
,4.6−オクタトリエン酸、リルン酸、アラキト酸な
どがある。Examples of aliphatic monocarboxylic acids having two unsaturated double bonds in the molecule include 11) 2,4-pentadiene, diallylic acid p, i, a-dodecadienoic acid, and linoleic acid. Examples of aliphatic monocarboxylic acids having three or more unsaturated double bonds in the molecule include 1it)2
, 4.6-octatrienoic acid, lylunic acid, arachitic acid, etc.
本発明の分子内に1個以上の不飽和二重結合を有する脂
肪族モノカルボン酸と無水マレイン醗との友応物(E)
の含有率は、本発明の焼成ペーストの0.05〜10!
fi%である。その含有率がO,OS重量%未満である
場合は導電性微粉末と光硬化型樹脂組成物との分散性が
悪く、一方、10重計量を超えると光硬化性が悪くなる
。Friendship product (E) of an aliphatic monocarboxylic acid having one or more unsaturated double bonds in the molecule of the present invention and maleic anhydride
The content of the fired paste of the present invention is 0.05 to 10!
fi%. If the content is less than O,OS weight percent, the dispersibility of the conductive fine powder and the photocurable resin composition will be poor, while if it exceeds 10 weight percent, the photocurability will be poor.
本発明では前記導電性微粉末(A)、ガラス質フリット
(B)、金jI酸化物(C)、光硬化型樹脂組成物(D
)および分子内に1個以上の不飽和二重結合を有する脂
肪族モノカルボン酸と無水マレイン酸とのを反応物(E
)を必須成分とする光硬化型導電性焼成ペーストを用い
てアルミナなどのセラミック基板上に回路を印刷し、光
硬化後焼成して導体回路を得る。In the present invention, the conductive fine powder (A), the glassy frit (B), the gold jI oxide (C), and the photocurable resin composition (D
) and a reaction product (E
) is used as an essential component to print a circuit on a ceramic substrate such as alumina, and after photo-curing, it is fired to obtain a conductive circuit.
本発明では印刷に使用する焼成ペーストが光硬化型導電
性焼成ペーストであるため溶剤を全く含まず、従ってス
クリーン版の目詰りによるピンホールや線巾のくずれな
どを生じない。また導電性微粉末(4)の分散性が良好
なため長期にわたり安定して使用できるという大きな特
徴がある。In the present invention, since the firing paste used for printing is a photo-curable conductive firing paste, it does not contain any solvent and therefore does not cause pinholes or line width distortion due to clogging of the screen plate. Further, since the conductive fine powder (4) has good dispersibility, it has the great feature that it can be used stably for a long period of time.
本発明の焼成ペーストについては光硬化する条件は特に
制限はない。光照射に用いられる光源としては太陽光、
ケミカルランプ、低圧水銀灯、高圧水銀灯、メタルハラ
イド愉ランプ、キセノン・ランプなどが使用される。基
板としてはアルミナ基板、ホーロー基板、ベリリア基板
、窒化アルミニウム基板、炭化ケイ素基板などが用いら
れる。Regarding the fired paste of the present invention, there are no particular limitations on the conditions for photocuring. The light source used for light irradiation is sunlight,
Chemical lamps, low-pressure mercury lamps, high-pressure mercury lamps, metal halide lamps, xenon lamps, etc. are used. As the substrate, an alumina substrate, a hollow substrate, a beryllia substrate, an aluminum nitride substrate, a silicon carbide substrate, etc. are used.
〈発明の効果〉
本発明の光硬化型導電性焼成ペーストの優れた効果とし
て、次の点が挙げられる。<Effects of the Invention> The excellent effects of the photocurable conductive firing paste of the present invention include the following points.
(1) 使用する焼成ペーストが光硬化型導電性焼成
ペーストであるため全く溶剤を含有せず、スクリーン版
の目詰まりによるピンホール、線巾のくずれが生じない
。(1) Since the firing paste used is a photocurable conductive firing paste, it does not contain any solvent, and no pinholes or line width distortions occur due to clogging of the screen plate.
(2) そのため、精密なパターンの連続印刷が可能
である。(2) Therefore, continuous printing of precise patterns is possible.
(3)導電性微粉末との分散性が良好なため保存安定性
が良好である。(3) Good storage stability due to good dispersibility with conductive fine powder.
(4) 導電性微粉末の分散性が良好なため、印刷・
焼成後、セラミック基板と導体の接着強度が優れる。(4) Because the conductive fine powder has good dispersibility, printing and
After firing, the adhesive strength between the ceramic substrate and the conductor is excellent.
〈実施例〉
本発明を更に詳細に説明するために実施例を挙げるが、
本発明はこれらの実施例によって何ら限定されるもので
はない。実施例中、単に部または%とあるのはそれぞれ
重量部または重量%を示す。<Examples> Examples will be given to explain the present invention in more detail, but
The present invention is not limited in any way by these Examples. In the examples, parts or % indicate parts by weight or % by weight, respectively.
性能評価のための測定は次の方法によった。Measurements for performance evaluation were performed using the following method.
印刷適性:第1図に示した回路パターン(縦3.5αx
a a、o cm )を400メツシユのステンレス
−スクリーン版を用いて印刷し、ステンレス−スクリー
ン版の目詰まり、または細線が火線するまでの印刷枚数
により印刷適性を測定した。Printability: Circuit pattern shown in Figure 1 (vertical 3.5αx
aa, o cm) was printed using a 400-mesh stainless steel screen plate, and the printability was measured by the number of prints until the stainless steel screen plate became clogged or the fine lines burned.
導電性:セラミック基板上に形成された第1図の回路の
抵抗値を測定した。Conductivity: The resistance value of the circuit shown in FIG. 1 formed on a ceramic substrate was measured.
焼成性:第1図に示した回路パターンを印刷し、セラミ
ック基板を15分間で850℃まで昇温し、850℃で
10分間保持後、10分間で室温まで冷却し、ピンホー
ルと回路火線の有無を判定した。Firing properties: After printing the circuit pattern shown in Figure 1, the ceramic substrate was heated to 850°C for 15 minutes, held at 850°C for 10 minutes, and then cooled to room temperature for 10 minutes to eliminate pinholes and circuit caulking wires. The presence or absence was determined.
保存安定性:光硬化型導電性焼成ペースト5〇−をポリ
容器(100m7りに入れ、25℃暗所に1ケ月間放置
し、保存安定性を調べた。Storage stability: The photocurable conductive baking paste 50 was placed in a polyethylene container (100m7) and left in a dark place at 25°C for one month to examine storage stability.
接着強度:セラミック基板上に形成された!1図の正方
形パッド(2ta X 2 m+ )上に、直径0.6
5mの錫めっき銅線を共晶半田で半田付けを行ない、錫
めっき銅線をセラミック基板と垂直方向にσ1張りその
P小の接着強度を測定した。Adhesive strength: formed on a ceramic substrate! On the square pad (2ta x 2m+) shown in Figure 1, a diameter of 0.6
A 5 m tin-plated copper wire was soldered with eutectic solder, and the tin-plated copper wire was stretched perpendicularly to the ceramic substrate by σ1, and the bonding strength at P was measured.
製造例1
平均分子量75,000のメタクリル酸メチル(MMA
)−メタクリル酸−n−ブチル(n−BMA)共重合体
(M M A / n −HM A = 40 / 6
0 、重量比)30部、テトラヒドロフルフリルアクリ
レート50部、ラウリルアクリレート5部、ポリプロピ
レングリコール(プロピレンオキサイド9モル付加物)
ジアクリレート7部、光開始剤としてベンジルジメチル
ケタール2部と2−二チルアントラキノン2部およびリ
ノール酸−無水マレイン酸反応生成物4部を室温で混合
溶解し、光硬化型樹脂組成物(I)を得た。同様にして
共重合体と光硬化型モノマーが第1表に示される成分で
ある光硬化型樹脂組成物(If)と(m)を得た。なお
光開始剤は(I)と同じ化合物を同量使用した。Production Example 1 Methyl methacrylate (MMA) with an average molecular weight of 75,000
)-n-butyl methacrylate (n-BMA) copolymer (M M A / n -H M A = 40 / 6
0, weight ratio) 30 parts, tetrahydrofurfuryl acrylate 50 parts, lauryl acrylate 5 parts, polypropylene glycol (adduct of 9 moles of propylene oxide)
7 parts of diacrylate, 2 parts of benzyl dimethyl ketal and 2 parts of 2-dithylanthraquinone as photoinitiators, and 4 parts of a linoleic acid-maleic anhydride reaction product were mixed and dissolved at room temperature to form a photocurable resin composition (I). I got it. Similarly, photocurable resin compositions (If) and (m) containing copolymers and photocurable monomers as shown in Table 1 were obtained. As the photoinitiator, the same compound and the same amount as in (I) were used.
次いで、銀微粉末75%、ガラス質フリット〔ASF−
1380、旭硝子(株)製〕4%、酸化ビスマス6%お
よび上記光硬化型樹脂組成物(I) 15%をセラミッ
ク3本ロールを用いてよく混練し、光硬化型導電性焼成
ペース) (I)を得た。同様にして光硬化型樹脂組成
物(■)および(11)を用いて、それぞれ光硬化型導
電性焼成ペースト(■つおよび(■′)を漫だ。Next, 75% fine silver powder and glass frit [ASF-
1380 (manufactured by Asahi Glass Co., Ltd.), 6% bismuth oxide, and 15% of the photocurable resin composition (I) were thoroughly kneaded using a three-roll ceramic roll to obtain a photocurable conductive baking paste (I). ) was obtained. Similarly, photocurable conductive firing pastes (■ and (■')) were prepared using the photocurable resin compositions (■) and (11), respectively.
第1表
(*2)テトラヒドロフルフリルアクリレート(*3)
ラウリルアクリレート
参考製造例1
平均分子量75,000のメタクリル酸メチル−メタク
リル酸−n−ブチル共重合体(前出)30部、テトラヒ
ドロフルフリルアクリレ−)50部、ラウリルアクリレ
ート5部、ポリプロピレングリコール(プロピレンオキ
サイド9モル付加物)ジアクリレート7部、光開始剤と
してベンジルジメチルケタール2部と2−二チルアント
ラキノン2部およびドデシルベンゼンスルホン醗ナトリ
ウム4邪を室温で混合溶解し、光硬化型樹脂組成物(I
V)を得た。同様にして共重合体、共重合型モノマーが
第2表に示される成分である光硬化型樹脂組成物(IV
)および(Vl)を得た。尚、光開始剤は(IV)と同
じ化合物を同量使用した。Table 1 (*2) Tetrahydrofurfuryl acrylate (*3)
Lauryl acrylate reference production example 1 30 parts of methyl methacrylate-n-butyl methacrylate copolymer (mentioned above) having an average molecular weight of 75,000, 50 parts of tetrahydrofurfuryl acrylate), 5 parts of lauryl acrylate, polypropylene glycol ( Adduct of 9 moles of propylene oxide) 7 parts of diacrylate, 2 parts of benzyl dimethyl ketal and 2 parts of 2-dithylanthraquinone as photoinitiators, and 4 parts of sodium dodecylbenzenesulfone were mixed and dissolved at room temperature to form a photocurable resin composition. (I
V) was obtained. Similarly, a photocurable resin composition (IV
) and (Vl) were obtained. As the photoinitiator, the same compound and the same amount as in (IV) were used.
次いで、銀微粉末75%、ガラス質フリット〔ASF−
1380、旭硝子(株)製〕4%、酸化ビスマス6%お
よび光硬化型樹脂組成物(IV) 1 s%をセラミッ
ク3本ロールを用いてよく混練し、光硬化型導電性焼成
ペースト(■りを得た。同様にして光硬化型樹脂組成物
(V)および(■)を用い、それぞれ光硬化型導電性ペ
ース) (Vつおよび(■つを得た0
参考製造例2
平均分子175,000のメタクリル酸メチル−メタク
リル酸n−ブチル共重合体(前出)30部、溶剤(テル
ピネオール/トルエン=7 o/a O。Next, 75% fine silver powder and glass frit [ASF-
1380 (manufactured by Asahi Glass Co., Ltd.), 6% bismuth oxide, and 1 s% of photocurable resin composition (IV) were thoroughly kneaded using a three-roll ceramic roll to form a photocurable conductive firing paste (■ Similarly, using photocurable resin compositions (V) and (■), photocurable conductive pastes) (V and (■) were obtained.Reference Production Example 2 Average molecular weight: 175, 000 methyl methacrylate-n-butyl methacrylate copolymer (mentioned above), 30 parts, solvent (terpineol/toluene = 7 o/a O.
正鎗比)70部を室温で混合溶解し、溶剤型樹脂組成物
(■)を得た。次いで、銀微粉末75%、ガラス質フリ
ットCASF−1380、旭硝子(株)製〕4%、酸化
ビスマス6%および溶剤型樹脂組成物(〜′ll) 1
s%をセラミック3本ロールを用いてよく混練し、溶
剤型導電性焼成ペースト(〜]1つを得た。A solvent-type resin composition (■) was obtained by mixing and dissolving 70 parts of the mixture at room temperature. Next, 75% silver fine powder, 4% glassy frit CASF-1380 (manufactured by Asahi Glass Co., Ltd.), 6% bismuth oxide, and a solvent-based resin composition (~'ll) 1
s% was thoroughly kneaded using a three-roll ceramic roll to obtain one solvent-type conductive fired paste (~).
第2表
*6)テトラヒドロフルフリルアクリレート*7)ラウ
リルアクリレート
*8)ポリプロピレングリフール〔(プロピレンオキサ
イド(po)付加物)〕ジアクリレート
*9)テルピネオール/トルエン−70/30 (重量
比)実施例1
アルミナ基板(アルミナ含有率96%、縦5αX横5
cm X厚み0.6m)上に光硬化型導電性焼成ペース
ト(I’)をステンレス・スクリーン版ヲ用いて回路パ
ターン?連続印施した。この場合、印刷枚数が500枚
を越えてもスクリーン版の目詰りや細線の火線は全く発
生しなかった。この印刷されたアルミナ基板を5゜6
KW水冷式高圧水銀灯下、15Gの距離で10秒間照射
し焼成ペーストを硬化された。次いで、このアルミ欠基
板を前出の焼成条件で焼成したのち、焼成性、導電性及
び接着強度を測定した。その結果を第3表に示した。別
にこの光硬化型導電性焼成ペースト(■すの保存安定性
を調べた。その結果も第3辰に示した。Table 2 *6) Tetrahydrofurfuryl acrylate *7) Lauryl acrylate *8) Polypropylene glyfur [(propylene oxide (po) adduct)] diacrylate *9) Terpineol/toluene - 70/30 (weight ratio) Examples 1 Alumina substrate (alumina content 96%, vertical 5α x horizontal 5
cm x thickness 0.6 m), use a stainless steel screen plate to make a circuit pattern using photocurable conductive firing paste (I'). Continuous stamping. In this case, even if the number of printed sheets exceeded 500, no clogging of the screen plate or fine line burning occurred. This printed alumina substrate is 5゜6
The fired paste was cured by irradiation for 10 seconds at a distance of 15G under a KW water-cooled high-pressure mercury lamp. Next, this aluminum-deficient substrate was fired under the above-mentioned firing conditions, and then the firing properties, conductivity, and adhesive strength were measured. The results are shown in Table 3. Separately, the storage stability of this photocurable conductive firing paste (1) was investigated.The results are also shown in the third column.
実施例2
実施例1における光硬化型導電性焼成ペースト(■つの
代りに光硬化型導電性焼成ペース) (IIつおよび(
■つを用いアルミナ基板上に導体回路を形成した。その
結果を第3表に示した。Example 2 Photocurable conductive baking paste in Example 1 (photocurable conductive baking paste instead of ■) (II and (
A conductive circuit was formed on an alumina substrate using the following materials. The results are shown in Table 3.
比較例1
実箔例1のアルミナ基板上に光硬化型導電性焼成ペース
ト(IV’lをステンレス・スクリーン版を用いて回路
パターンを連続印刷した。印刷されたアルミナ基板を5
.6 KW水冷式高圧水銀灯下、15crnの距離で1
0秒間照射し硬化きせた。次いで、印刷されたアルミナ
基板を前出の焼成条件で焼成したのち、焼成性、導電性
及び接着強度を測定した。Comparative Example 1 A circuit pattern was continuously printed on the alumina substrate of Actual Foil Example 1 using a photocurable conductive firing paste (IV'l) using a stainless steel screen plate.The printed alumina substrate was
.. 6 Under KW water-cooled high-pressure mercury lamp, 1 at a distance of 15 crn
It was cured by irradiation for 0 seconds. Next, the printed alumina substrate was fired under the above-mentioned firing conditions, and then the firing properties, conductivity, and adhesive strength were measured.
別に使用した光硬化型導電性幌成ペースト(1Vつの保
存安定性を調べた。その結果を第4衣に示した。The storage stability of a separately used photocurable conductive hooding paste (1V) was investigated.The results are shown in Section 4.
比較例2
¥施例1のアルミナ基板上に溶剤型焼成ペースト(W)
を用いて回路パターンを連続印刷した。この印刷された
アルミナ基板を150℃×20分間で乾燥させた。次い
で、印刷されたアルミナ基板を前出の焼成条件で焼成し
たのち、焼成性、導電性および接着強度を測定した。別
に、使用した溶剤型導電性焼成ペースト(■′)の保存
安定性を調べた。Comparative Example 2 Solvent-based firing paste (W) on the alumina substrate of Example 1
The circuit pattern was printed continuously using This printed alumina substrate was dried at 150° C. for 20 minutes. Next, the printed alumina substrate was fired under the above-mentioned firing conditions, and then the firing properties, conductivity, and adhesive strength were measured. Separately, the storage stability of the solvent-based conductive firing paste (■') used was investigated.
その結果を第4表に示した。The results are shown in Table 4.
第1図は印刷回路パターンを示す。 特許出願人 東洋紡績株式会社 晃 lI!l FIG. 1 shows a printed circuit pattern. Patent applicant: Toyobo Co., Ltd. Akira lI! l
Claims (1)
化物(C)および光硬化型樹脂組成物(D)を含有する
光硬化型導電性焼成ペーストにおいて、さらに該ペース
トが、分子内に1個以上の不飽和二重結合を有する脂肪
族モノカルボン酸と無水マレイン酸との反応物(E)を
含有することを特徴とする光硬化型導電性焼成ペースト
。In the photocurable conductive firing paste containing conductive fine powder (A), glassy frit (B), metal oxide (C), and photocurable resin composition (D), the paste further contains 1. A photocurable conductive baking paste characterized by containing a reaction product (E) of an aliphatic monocarboxylic acid having one or more unsaturated double bonds and maleic anhydride.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30219086A JPS63154773A (en) | 1986-12-17 | 1986-12-17 | Photo-curable electrically conductive fired paste |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30219086A JPS63154773A (en) | 1986-12-17 | 1986-12-17 | Photo-curable electrically conductive fired paste |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63154773A true JPS63154773A (en) | 1988-06-28 |
Family
ID=17906016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30219086A Pending JPS63154773A (en) | 1986-12-17 | 1986-12-17 | Photo-curable electrically conductive fired paste |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63154773A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03205462A (en) * | 1989-08-21 | 1991-09-06 | E I Du Pont De Nemours & Co | Semi-water image developable photosensitive copper conductor compound |
JPH05271576A (en) * | 1992-01-24 | 1993-10-19 | Toray Ind Inc | Photosensitive electrically conductive paste |
JP2013036024A (en) * | 2011-07-11 | 2013-02-21 | Sanyo Chem Ind Ltd | Photosensitive resin composition |
-
1986
- 1986-12-17 JP JP30219086A patent/JPS63154773A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03205462A (en) * | 1989-08-21 | 1991-09-06 | E I Du Pont De Nemours & Co | Semi-water image developable photosensitive copper conductor compound |
JPH05271576A (en) * | 1992-01-24 | 1993-10-19 | Toray Ind Inc | Photosensitive electrically conductive paste |
JP2013036024A (en) * | 2011-07-11 | 2013-02-21 | Sanyo Chem Ind Ltd | Photosensitive resin composition |
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