JPS63152675A - Electrically conductive film-forming coating solution - Google Patents

Electrically conductive film-forming coating solution

Info

Publication number
JPS63152675A
JPS63152675A JP29968686A JP29968686A JPS63152675A JP S63152675 A JPS63152675 A JP S63152675A JP 29968686 A JP29968686 A JP 29968686A JP 29968686 A JP29968686 A JP 29968686A JP S63152675 A JPS63152675 A JP S63152675A
Authority
JP
Japan
Prior art keywords
conductive
liquid
solution
coating
zirconium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29968686A
Other languages
Japanese (ja)
Other versions
JPH0798911B2 (en
Inventor
Goro Sato
護郎 佐藤
Michio Komatsu
通郎 小松
Toshiharu Hirai
俊晴 平井
Keiichi Mihara
三原 恵一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JGC Catalysts and Chemicals Ltd
Original Assignee
Catalysts and Chemicals Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Catalysts and Chemicals Industries Co Ltd filed Critical Catalysts and Chemicals Industries Co Ltd
Priority to JP61299686A priority Critical patent/JPH0798911B2/en
Publication of JPS63152675A publication Critical patent/JPS63152675A/en
Publication of JPH0798911B2 publication Critical patent/JPH0798911B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manufacturing Of Electric Cables (AREA)

Abstract

PURPOSE:To obtain the titled coating solution for forming, on base materials such as glass or plastics, electrically conductive transparent film resistant to scratch and outstanding in adhesiveness, by homogeneously mixing in a mixed solvent a zirconium oxy acid salt, silicon alkoxide and electrically conductive substance. CONSTITUTION:The objective coating solution can be obtained by homogeneously mixing (A) a zirconium oxy acid salt (e.g., zirconium oxychloride), (B) a silicon alkoxide or its derivative [e.g., a compound of formula Si(OR)4 (R is CH3, C2H5, n-C3H7, iso-C3H7, n-C4H8, iso-C4H8, sec-C4H8 or tert-C4H8)], (C) an electrically conductive substance, and, if needed, (D) non-precipitated silica in (E) a mixed solvent made up of water and an organic solvent. This coating solution is outstanding in terms of storage for a long period, not requiring addition of fresh acid when forming coating film therewith, and also not necessitating calcination at 450 deg.C of the coating film.

Description

【発明の詳細な説明】 以下本発明に係る導電tノ[被膜形成用塗(1i液につ
いて具体的に説明する。
DETAILED DESCRIPTION OF THE INVENTION The conductive film-forming coating (1i liquid) according to the present invention will be specifically explained below.

本発明に係る導電性被膜形成用塗布液は、ジルコニウム
オキシWmと、シリコンアルコキシドまたはぞの誘導体
と、導電性物質と、必要に応じて非沈降f〕1シリカ液
とか、水iI3よび有機溶媒からなる混合溶媒中に)H
解または均一に分散されて構成されているが、以下に各
成分について説明Jる。
The coating liquid for forming a conductive film according to the present invention is made of zirconium oxy Wm, silicon alkoxide or its derivative, a conductive substance, and optionally a non-sedimenting f]1 silica liquid, water iI3, and an organic solvent. )H in a mixed solvent
Each component will be explained below.

ジルコニウムオキシ酸塩としては、オキシ塩化ジルコニ
ウム、オキシtl[ジルコニウム、AキシIfジルコニ
ウム、オキシシュウ酸ジルコニウムなどが用いられ、こ
のうら特にオキシ塩化ジルコニウム、オキシ硝酸ジルコ
ニウムが好ましい。このようなジルコニウムオキシHz
は、水およびアル」−ルなとの有機溶媒に溶解し、溶液
中に水か存在づると酸性を示す。
As the zirconium oxyacid, zirconium oxychloride, oxytl[zirconium, AxIf zirconium, zirconium oxyoxalate, etc. are used, and among these, zirconium oxychloride and zirconium oxynitrate are particularly preferred. Such zirconium oxyHz
is dissolved in water and organic solvents such as alcohols, and becomes acidic when water is present in the solution.

シリコンアルコキシドまたはその誘導体としては、炭素
数1〜8のアルコキシ基1〜4個を有するS + l−
1a(OR) b (a=o〜3.b=1〜4゜a十り
=4.Rはアルギル a S j (OR>  、R−a S l (OR>
b(a 十b=4)で示される化合物または縮合体(5
吊体まで)あるいは上記式において1−1の一部をC1
3:たはビニル基等で置換した誘導体が用いられる。
As the silicon alkoxide or its derivative, S + l- having 1 to 4 alkoxy groups having 1 to 8 carbon atoms;
1a (OR) b (a=o~3.b=1~4°a+=4.R is argyl a S j (OR>, R-a S l (OR>
The compound or condensate (5
(up to the hanging body) or in the above formula, a part of 1-1 is C1
3: Or a derivative substituted with a vinyl group or the like is used.

このうら特にS!  (OR>4  (式中、RはCH
3、C2 fi5 、nおよびiso−C3H7、r)
−、iso−、se叶およびtert− C4 flB
 >で示される化合物の1種または2種以上の混合液が
好ましい。
This one especially S! (OR>4 (wherein, R is CH
3, C2 fi5 , n and iso-C3H7, r)
-, iso-, se leaf and tert- C4 flB
A mixture of one or two or more of the compounds represented by > is preferred.

非沈降性シリカ液は、必要に応じて、上記のようなジル
コニウムオキシ酸塩と、シリコンアルコキシドまたはそ
の誘導体とともに用いられる。この非沈降性シリカ液を
シリコンアルコキシドの一部に代えて用いると、jqら
れる導電性被膜の全光線透過率が高まり透明性が向上し
、しかも該被膜の耐久t/iもまた損なわれることかな
い。
The non-precipitating silica liquid is used together with the above-mentioned zirconium oxylate and silicon alkoxide or its derivative, if necessary. When this non-sedimenting silica liquid is used in place of a part of the silicon alkoxide, the total light transmittance of the conductive coating increases and the transparency improves, and the durability of the coating is not impaired. .

本発明で用いられる非沈降性シリカ液とは、Si02m
度2.0重量! % (7)水溶液を250、OOOG
で1時間遠心沈降させたとき、沈降物が全SiO□の3
0fflff1部以下であるものをいう。このような非
沈降゛](■シリカ液は、珪酸アルhり水溶液から大部
分のアルカリを除去しtこJ1ミ沈降↑4シリカ分散液
に成長防+L剤を加え、これが希釈剤に分散されてなる
ものである。成長防止剤としては、エチレングリコール
、N−メチル−2−ピロリドン、モルホリン、エチレン
グリコールモノ土デルニーデル、エヂレングリコール七
ツメチルエーテル、ジメチルホルムアミドなどが単独で
または組み合せて、非沈降性シリカ液 少なくとも0.54ル以[Lの吊で用いられる。
The non-precipitating silica liquid used in the present invention is Si02m
Degree 2.0 weight! % (7) Aqueous solution 250, OOOG
When the sediment was centrifuged for 1 hour at
0fflff 1 part or less. Such non-sedimentation] (■ Silica liquid is produced by removing most of the alkali from the aqueous solution of aluminum silicate, and then precipitating. Growth inhibitors include ethylene glycol, N-methyl-2-pyrrolidone, morpholine, ethylene glycol monodernidel, ethylene glycol 7-methyl ether, dimethyl formamide, etc. alone or in combination. The silica liquid is used at a suspension of at least 0.54 liters.

この非沈降性シリカ液においては、8102/′M20
(式中M 4iアルカリ金属を示づ)で示される残留ア
ルカリ量は200以上好ましくは1000以上であるこ
とか望ましい。
In this non-precipitating silica liquid, 8102/'M20
It is desirable that the amount of residual alkali represented by M 4i (in the formula represents an alkali metal) is 200 or more, preferably 1000 or more.

このような非沈降性シリカ液は、たとえば、珪M jt
ルカリ水溶液を水素型陽イオン交換樹脂と接触させて大
部分のjlアルカリ除去した後、成長防止剤を添加し、
次いで大部分の水を除去し、あるいは除去Uずに希釈剤
を添加して分散c5t!ることによって製造することが
できる。
Such a non-sedimentable silica liquid is, for example, silicon M jt
After contacting the aqueous alkali solution with a hydrogen type cation exchange resin to remove most of the jl alkali, a growth inhibitor is added,
Then most of the water is removed, or a diluent is added without removing it and the dispersion c5t! It can be manufactured by

非沈降↑ノ1シリカ液に用いられる希釈^11として(
ま、メタノール、エタノール、0−プロパツール、1−
プロパツール、[1−エタノール、i−ブタノール、t
−ブタノール等のアルコール、酢酸メチルエステル、醋
酸エチルエステル等の酸11エステル、ジエブール工ー
テル等のエーテル、アセトンなどが単独でまたは組み合
せて用いられる。
As a dilution ^11 used for non-sedimenting ↑no1 silica solution (
Well, methanol, ethanol, 0-propertool, 1-
propatool, [1-ethanol, i-butanol, t
-Alcohols such as butanol, acid 11 esters such as methyl acetate and ethyl acetate, ethers such as diebourg ether, acetone, etc. are used alone or in combination.

なお上記のような非沈降性シリカ液は、本出願人が先に
出願した1h願昭61−187835号に詳細に説明さ
れている。
The above-mentioned non-sedimenting silica liquid is described in detail in 1H Application No. 187835/1988, previously filed by the present applicant.

本発明で用いられる導電14物質としては、酸化スズ、
またはアンチモン、フッ索などかトープされた酸化スズ
、あるいは酸化インジウム、またはスズがドープされた
酸化インジウムなどの従来公知の導電性物質か用いられ
うる。これらの導電性物質は、平均粒(¥0.4μHL
以下の微粒子状であることがtITましい。
The 14 conductive substances used in the present invention include tin oxide,
Alternatively, conventionally known conductive materials such as antimony, fluorine, etc., doped tin oxide, indium oxide, or tin-doped indium oxide may be used. These conductive substances have an average particle size (¥0.4μHL
It is preferable that the particles be in the form of fine particles as shown below.

また、CRTやl− C D等の表示装着の全面刀うス
ヤ複写(実用ガラス等のHllIi(ヘーズ)の低い高
透明を要求される用)♀には、平均粒径0.01〜0.
1μγUの乙のか好ユしい。
In addition, for full-screen copying for display mounting on CRTs, L-CDs, etc. (for practical glass, etc., which requires high transparency with low HllIi (haze)), an average particle size of 0.01 to 0.
I like the 1μγU Otsu.

本発明くは、導電性物質としては、本出願人が先に出願
した「導電1′「微粉末の製造法」 (特願昭6l−5
0233)または[酸化スズゾルおよびぞの製)前方法
」 (特願昭6l−75283)に塁づい−((14ら
れる乙のを用いることが、特に好ましい。すなわら、第
1の導電[1物買としては、スズ化合物まl:はインジ
ウム化合物の水?d液を、8〜12の[)ト1条(′1
下に保1.’tして液中の化合物を徐々に加水づ)解す
ることにより、コロイド粒子を含りりるゾルを生成させ
、次いでこのゾルを乾燥、焼成した後粉砕覆ることによ
ってi57られる導電1生金属酸化物微14)末である
In the present invention, the conductive substance used is "Conductivity 1'""Method for Manufacturing Fine Powder" (Patent Application No. 6L-5), which the present applicant previously applied.
0233) or [Tin oxide sol and method] (Japanese Patent Application No. 61-75283), it is particularly preferable to use the first conductive [1 When purchasing, add a tin compound or an indium compound to 1 column ('1) of 8 to 12 [)].
Keep it below 1. By gradually hydrolyzing the compounds in the liquid, a sol containing colloidal particles is produced, and then this sol is dried, fired, and then crushed and covered. This is the end of physical science 14).

出発原料としては水溶1ノtでしかちp118〜12の
範囲で加水分解可能なスズ化合物または−rンシウム化
合物か使用され、具体的には、スズ酸カリウム、スズ酸
ナトリウムなどのスズ化合物あるいは硝配インジウム、
硫酸インジウムなとのインジウム化合物か使用可能であ
る。
As a starting material, a tin compound or a -ronsium compound which is 1 knot soluble in water and can be hydrolyzed in the range of p118 to 12 is used. Specifically, tin compounds such as potassium stannate and sodium stannate, or nitrate indium,
Indium compounds such as indium sulfate can be used.

スズ化合物またはインジウム化合物の水溶液(以下、原
ボ旧1にということかある)(こ含まれる全屈ヰ・訃か
スズよl二(ユインシウムのいずれか−(lfである場
合、得られる微粉末は、それぞれスズ酸化物またはイン
ジウム酸化物C構成されるが、原、I’l :々に少品
の異種丸木化合物を溶存さUることで、異種元素がドー
プされた導電性微粉末をjqることかできる。たとえば
、スズ化合物を含有する原料)12iに、少量の吐酒石
(酒?EiMアンチ七ニルカリウム)または弗化アンし
ニウムを溶解δIておくことにより、スズ酸化物にアン
チモンまた(1弗累かトー1された導電1)1(駈粉末
を得ることがてき、インジウム化合物を含?1する原料
液に、少量のスズ化合物を溶解さけることにより、イン
ジウム酸化物にスズかドープされた導電↑1微扮末を1
ワることかて゛きる。
An aqueous solution of a tin compound or an indium compound (hereinafter referred to as "Original Product 1") (if it contains any of the total oxides, tin, or indium (if lf), the resulting fine powder are composed of tin oxide or indium oxide, respectively; For example, by dissolving a small amount of tartarite (sake? EiM anti-sevenyl potassium) or ammonium fluoride in 12i (a raw material containing a tin compound), antimony can be added to tin oxide. In addition, it is possible to obtain (conductivity 1) 1 (conductivity 1) by dissolving a small amount of a tin compound in a raw material solution containing an indium compound. Doped conductive ↑1
I can tell you that it will work.

異種元素がドープされた導電性微粉末は、また、上記の
ようにしてjqられるスズ酸化物まI=はインジウム酸
化物に、異種元素の化合物を含む水溶液を含浸させて・
続成りることによっても得ることかできる。
The conductive fine powder doped with a different element can also be prepared by impregnating tin oxide or indium oxide, which is jq as described above, with an aqueous solution containing a compound of a different element.
It can also be obtained by diagenesis.

原料液に含まれるスズ化合物またはインジウム化合物の
温度は、([蚤に選ぶことかできるか、一般に5〜30
重量%の範囲にあることか好ましい。
The temperature of the tin compound or indium compound contained in the raw material liquid is generally 5 to 30
It is preferable that the amount is within the range of % by weight.

加水分イCの反応温度は通常30〜90’Cの範囲で任
意に選ぶことかできる。
The reaction temperature for the hydrolysis step C can be arbitrarily selected usually within the range of 30 to 90'C.

ゾル液調製後は、このゾル液を濾過して」[」イト杓子
を回収し、このコロイド粒子を洗l¥i−することじ」
、って杓子に(・1着りる副生塩その他を除去した後、
乾燥し、ざらに焼成した後粉砕りることによって、導電
1〕[微粉末を)qることかできる。このようにして得
られる微粉末は、焼成T程である程度焼結して、粉末の
平均粒(ギは20へ・50μrrt稈[αにイfるか、
粉砕により容易にその焼結状態を解き欣つことかでさ、
通常の粉砕手段によって塗相中ての平均粒子が約0.4
μm以下の本発明の[」的にかなったの導電1)を微粉
末を(昇ることかできる。
After preparing the sol solution, filter the sol solution, collect the ladle, and wash the colloid particles.
, after removing the by-product salt and other ingredients with a ladle.
By drying, roughly firing, and then pulverizing, conductivity can be obtained. The fine powder obtained in this way is sintered to some extent during firing T, and the average grain size of the powder (gi is 20, 50 μrrt [α],
The sintered state can be easily released by pulverization.
The average particle size in the coating phase is approximately 0.4 by ordinary grinding means.
The electrical conductivity 1) that meets the objectives of the present invention of less than μm can be produced using fine powder.

ぞして、こうして得ら゛れる微粉末には、たとえば0.
8μTrL以上の粗大粒子は少量しか含まれていない。
Therefore, the fine powder thus obtained has, for example, 0.
Only a small amount of coarse particles of 8 μTrL or more are contained.

なお、導電1)1物質の1分砕は、ジルコニウムオキシ
酸塩なとの他の成分との混合前に行なってもよく、ある
いはジコニウムオキシ酸塩などの他の成分との混合後に
行なってもよい。導電1′F物質の粉砕は、従来公′)
Jlの粉砕り法によって行なうことか(き、たとえば7
1〜ライター、リン1−ミル、ホールミル、三本ロール
などの)火器か利用できる。
Incidentally, conductivity 1) The pulverization of one substance may be performed before mixing with other components such as zirconium oxylate, or after mixing with other components such as zirconium oxylate. Good too. The pulverization of conductive 1'F materials is conventionally
Is it possible to do it by the grinding method of Jl (for example, 7
Firearms (such as 1-lighter, phosphorus 1-mill, whole mill, three-roll mill, etc.) can be used.

′、A2の好ましい導電i生物質としては、順化ススま
たは異種元素かドープされた酸化ススの微粉末を、酸水
溶液またはアルカリ水<’Ff液中で1111熱処理す
ること1こ五って1qられる;9電[1酸化スズ−(あ
る。
As a preferable electrically conductive biological material for A2, a fine powder of acclimatized soot or oxidized soot doped with a foreign element is heat treated in an acid aqueous solution or alkaline water<'Ff solution for 1 q. 9 electrons (tin oxide).

ここで用いられる酸化スズまたは異種元素1ヘーピング
酸化ススの微第3)末は、尋電″tノt :付りするた
めに高)福焼成されたしので、」−記第1 (7) h
法で1シ1られだしのでし良く、;にた従来公λ0の/
’J法でj″:?られたものでも良い。
The fine powder of tin oxide or foreign element 1 heaping soot oxide used here was fired in order to attach it to the soil, so it was fired in order to be attached to it. h
It is good to know that 1 shi 1 is given by the law;
It may be written as 'j':? in 'J method'.

この酸化ススツルを1.r7るには、士1)己配化スス
微扮未を鉱酸よたL:1 ?J機酸イXとの酸水溶液あ
るい(ユアルカリ金属水Aな化物または第ど1扱アン゛
しニウム塩などのアルカリン1(溶液中′c′hllλ
(1辺即刀る。71目!)湿度は約200 ’C1,ス
下か好ましい。また酸また(1アルカリの量は、処理す
べき微粉末の少なくとも5重量%が適当である。こうし
て1■られたnな化スズゾル中の分散粒子の平均粒径は
0.1μm以下で、全粒子の60%以上が0.1μm以
下の粒子で占められている。
1. To r7, 1) Self-coordination soot is mixed with mineral acid L: 1? An aqueous acid solution with acid A
(One side is immediately cut. 71st!) The humidity is preferably below 200'C1. The appropriate amount of acid or alkali is at least 5% by weight of the fine powder to be treated. More than 60% of the particles are 0.1 μm or less.

上記のゾルは通常水性ゾルであるが、必要に応じて水の
一部または全部をアルコール等の6機溶媒と置換した1
3機ゾルとして用いることもできる。
The above sol is usually an aqueous sol, but if necessary, some or all of the water may be replaced with a 6-organic solvent such as alcohol.
It can also be used as a 3-machine sol.

このようにしてjEIられた導電性物質は、粉末の場合
は、そのまま用いることもでき、あるいは水または有機
溶媒に分散させて用いることもできる。
When the conductive substance subjected to jEI in this manner is a powder, it can be used as it is, or it can be used after being dispersed in water or an organic solvent.

前記の導電性酸化スズゾルは水性ゾルとして用いること
しできるし、水の一部を有機溶媒で置換しlこ−6のを
用いることもて゛きる。
The conductive tin oxide sol described above can be used as an aqueous sol, or a part of the water can be replaced with an organic solvent.

本発明に係る導電性被膜形成用塗イI液中に用いられる
有機溶媒としては、メタノール、エタノール、n−ブ[
]/<ノール、i−プロパツール、0−ブタノール、i
−ブタノール、t−ブタノール等のアルコール類、1w
1メチルエステル、i[エチルエステル等のエステル類
、ジエチルエーテル等のエーテル類、アゼトン、メチル
エチルケトン等のケトン類、エヂレングリ」−ルモノメ
チルエーテルなどが単独または組み合せて用いられる。
Examples of organic solvents used in the coating liquid I for forming a conductive film according to the present invention include methanol, ethanol, n-bu[
]/<nol, i-propertool, 0-butanol, i
-Alcohols such as butanol and t-butanol, 1w
Esters such as 1-methyl ester and i[ethyl ester, ethers such as diethyl ether, ketones such as azetone and methyl ethyl ketone, and ethylene glycol monomethyl ether may be used alone or in combination.

本発明に係る導電性被膜形成用塗イ1j液では、ジルコ
ニウムオキシnlと、シリコンアルコキシドまたはその
誘導体とは、それぞれ酸化物換葬でZrO2/5i02
 (モル比)が0.05〜2.0好ましくは0.2〜1
.0の範囲と’cJ:るようなけで用いられる。このZ
rO2/5i02(−シル比)が0.05未満ては、(
qられる被膜の耐久性か充分でないため好ましくなく、
一方ZrO/5i02  Cモル比)が2.0を越Jと
、被膜の基材への密着・i4、被膜の光学的特性(へ−
ズ、全光線透過率)が低下するため好ましくない。
In the coating liquid No. 1J for forming a conductive film according to the present invention, zirconium oxynl and silicon alkoxide or its derivatives are respectively converted into ZrO2/5i02 by oxidation conversion.
(molar ratio) is 0.05 to 2.0, preferably 0.2 to 1
.. Used in the range 0 and 'cJ:'. This Z
If rO2/5i02 (-sill ratio) is less than 0.05, (
It is not preferable because the durability of the coated film is not sufficient.
On the other hand, when the ZrO/5i02C molar ratio exceeds 2.0, the adhesion of the coating to the substrate, i4, and the optical properties of the coating (to
This is undesirable because it lowers the overall light transmittance (light beams and total light transmittance).

非沈降性シリカ液を用いる場合には、非沈降訃シリカ液
中の8102と、シリコンアルコキシドまIこはその誘
導体中の換ns r o、との手損比である(非沈降性
シリカ液中の5102)/Iシリコンアルコキシドまた
はその誘導体中の挽砕5in(−)か9以下であること
か好ましい。この値が9を越えると、(qられる被膜の
透明↑1はざらに増すか、被膜の耐久性を向上させるた
めの塗布膜の焼成′fJA度を約300’C以Fにしな
ければならないという新たな問題点が生ずるため好まし
くない。
When using a non-precipitated silica solution, the ratio of 8102 in the non-precipitated silica solution to the conversion of silicon alkoxide or its derivatives (in the non-precipitated silica solution) is 5102)/I silicon alkoxide or its derivatives is preferably 5 inches (-) or less than 9 inches. If this value exceeds 9, the transparency of the coating (↑1) will increase dramatically, or the firing degree of the coating must be set to about 300°C or higher to improve the durability of the coating. This is not preferable because new problems arise.

非沈降性シリカ液置いた場合であっても、塗イ11液申
のZrOと全5102との比へどの条1′[は、前述の
シリコンアルコキシドまたはその誘導体のみを用いた場
合と同様である。
Even when a non-sedimenting silica solution is used, the ratio of ZrO to total 5102 is the same as when only silicon alkoxide or its derivatives are used as described above. .

な1f)i本弁明では成長前1[剤の含まれた非沈降性
シリカ液か用いられろか、J見合によっては、成長防止
4りが添加されていない非沈降性シリカ液を、ジル」ニ
ウムオキシl、シリコンアルコキシドまIこはその誘導
体、水、有機溶媒と混合した後、得られに混合液中にこ
の成長防止剤を添11(I してもよい。
1f) i In this defense, whether a non-precipitating silica solution containing a growth inhibitor is used before growth, depending on the situation, a non-precipitating silica solution without a growth inhibitor is used as After mixing silicon alkoxide or its derivative, water, and an organic solvent, the growth inhibitor may be added to the resulting mixture.

/1(発明に係る導電゛1′1被膜形成用塗イ1」液で
は、水131、シリコンアルコキシドの加水分解反応の
ために心髄である。塗イ1」液中の水の吊は、混合i侵
中ののシリコンアルコキシドまたはその誘導体の吊に応
じて決定されることか好ましく、混合液中の1120と
シリコンアル」キシドまたはその誘導体の換算S!02
とのモル比f−120/ S i 02か少なくとも2
以上とイ(るような量で水が塗イ1j液中に含まれてい
ることか好ましい。この値が2未満では、被膜形成後−
し未分解のシリコンアルコキシドまたはその誘導体か未
分解のまま残留するため被膜が得られない。
/1 (In the coating 1 solution for forming a conductive film 1'1 according to the invention, water 131 is the essence for the hydrolysis reaction of silicon alkoxide. It is preferable that it is determined according to the concentration of silicon alkoxide or its derivative during the infiltration, and the converted S!02 of 1120 and silicon alkoxide or its derivative in the mixed liquid is determined.
molar ratio f-120/S i 02 or at least 2
It is preferable that water be contained in the coating liquid in an amount equal to the above. If this value is less than 2, -
However, a film cannot be obtained because undecomposed silicon alkoxide or its derivative remains undecomposed.

本発明に係る導電性塗(1液中での導電1’l物%r4
の含4−Jmは、導電性物質を酸化物に換師したM O
Conductive coating according to the present invention (conductive 1'l material% r4 in 1 liquid)
4-Jm is M O in which the conductive substance is replaced with an oxide.
.

として表わした場合に、M Ox / (S i 02
十ハ・02)か0.5〜5.0であるような指であるこ
とが好ましい。この値が0.5未満では、F?られる導
電Vt被膜の導電↑(lか低すぎるため好ましくむい。
When expressed as M Ox / (S i 02
Preferably, the finger size is 0.5 to 5.0. If this value is less than 0.5, F? The conductivity ↑(l) of the conductive Vt film is too low, so it is not desirable.

一方この値が5.0を越えると、1qられる導電性被膜
の基材への密着[)↓が低下りるため好ましくない。
On the other hand, if this value exceeds 5.0, the adhesion of the conductive film to the substrate (1q) [)↓ decreases, which is not preferable.

導電・1([塗イ1」液中の固形分)門度(導電i・1
物質÷7、 r 02 十S i 02 >は、約20
弔吊%以下であれば本発明の目的にかなった被1模か冑
られる。しかし、20市量%を越)と塗布液の安定i′
[か低ドし、長期保存に耐えなくなる。また、あまり薄
くなると[1的の膜厚を得るのに数回の塗(1i操作を
くり返さなければならない等の不便が牛ザることから約
0.1重量%以上が実用的である。
Conductivity・1 (solid content in [coating 1” liquid)) degree (conductivity i・1
Substance ÷ 7, r 02 + S i 02 > is approximately 20
If it is less than %, it can be said that it is suitable for the purpose of the present invention. However, the stability of the coating solution i'
[The product's temperature decreases and it cannot withstand long-term storage.] Moreover, if it becomes too thin, the inconvenience of having to repeat several coatings (1i operation) to obtain a film thickness of 1% can be caused, so it is practical to use about 0.1% by weight or more.

また本発明に係る塗rli液中には上記のように水およ
びアルコールなどの41機溶媒か存在づるため、ジルコ
ニウム第4−シ酸塩がこれらに溶解し、塗411液はp
H2以下の酸性を示J」=うにイ【る。このため、塗イ
1j液中にシリコンアルコキシドまたはその誘導体を加
水分解させるための塩酸、硝酸などの酸触媒を特に添加
する必要がない。
In addition, since 41 organic solvents such as water and alcohol are present in the coating rli liquid according to the present invention as described above, zirconium quaternary-sicate is dissolved in these, and the coating liquid 411 is
Shows acidity below H2. Therefore, it is not necessary to add an acid catalyst such as hydrochloric acid or nitric acid to the coating liquid for hydrolyzing silicon alkoxide or its derivative.

次に本発明に係る導電性被膜形成用塗布液の製造方法に
ついて説明覆る。
Next, a method for producing a coating liquid for forming a conductive film according to the present invention will be explained.

ジルコニウムオキシ12塩と、シリコンアルコキシドま
たはその誘導体と、導電性物υ1と、必要に応じて非沈
降性シリカを水および有機)d媒中に均一に混合ざじる
。この際の?If解または分散順序は特に限定されるこ
とはなく、たとえばジルコニウムオキシ1FJilの水
溶液と、アルコールなどの有機溶媒とを混合し、得られ
た混合物にシリコンアルコキシドまたはその誘導体のア
ルコール溶液を添加してもJ、く、また上記のよう4【
)d液を一挙に混合してもよい。また混合に際して、界
面活[1剤を塗布液に含ませることによって分散粒子の
安定・1)1を増ずこと−5できる。
Zirconium oxy-12 salt, silicon alkoxide or its derivative, conductive material υ1, and non-precipitating silica as required are uniformly mixed in water and an organic (d) medium. On this occasion? The If solution or dispersion order is not particularly limited. For example, an aqueous solution of zirconium oxy 1FJil and an organic solvent such as alcohol may be mixed, and an alcohol solution of silicon alkoxide or its derivative may be added to the resulting mixture. J, Ku, also as above 4 [
) The liquid d may be mixed all at once. Also, during mixing, by including a surfactant [1] in the coating solution, it is possible to increase the stability of the dispersed particles.

このようにして得られた塗イ1i液は、ガラスまたはプ
ラスチックなどの基材上に従来公知の方法たとえばスピ
ンナー法、スプレー法、バーコード法、ロール」−夕法
などによって塗イ[iされる。次いで基材上に形成され
た塗イ1j膜を、常温〜120’C稈の)温度で乾燥硬
化さければ、累月との密着[4、it1察傷性、透明性
に優れた被膜が得られる。この被膜をさらに250’C
程ff¥まての温度で焼成すれば、耐アルカリ廿などの
耐久性がさらに向上された被膜か得られる。もらろん必
要ならば250 ’C以上の温度たとえば500 ’C
以上の温度で被膜を焼成することもできる。
The coating solution thus obtained is coated onto a substrate such as glass or plastic by a conventionally known method such as a spinner method, a spray method, a barcode method, a roll method, etc. . Next, if the coated film formed on the substrate is dried and cured at a temperature of room temperature to 120'C, it will be possible to form a film with excellent adhesion to the surface of the surface [4, it1] with excellent scratch sensitivity and transparency. can get. This coating was further heated to 250°C.
By firing at a temperature of about 100 ft. or less, a coating with improved durability such as alkali resistance can be obtained. Temperatures above 250'C if necessary, e.g. 500'C
It is also possible to sinter the film at a temperature higher than that.

このように本発明では、250 ’C程度以下の温度で
被膜を乾燥′よたは焼成するだけで曖れた持11を有す
る被膜を形成することができるため、プラスチックなど
の耐熱性に優れていない基材上にも被膜を形成刃ること
かできる。
In this way, in the present invention, it is possible to form a film with vague properties by simply drying or baking the film at a temperature of about 250'C or less, so it is possible to form a film with an ambiguous property 11, which is superior to plastics and other materials with excellent heat resistance. It is also possible to form a film on a substrate that does not have a blade.

本発明に係る塗イI+液をカラス等の透明基材に塗イ1
]シて冑られる導電性被膜は、5102源としてシリコ
ンアルコキシドまたはその誘導体を用いて被膜を形成す
ると、たとえば全光線透過率90%以上、光沢度(G値
)190%以下、ヘーズ2%以下ど惨めてjΔ明(’l
に(のれている。またこの導電1〕1被膜は、表面抵抗
値か105〜109Ω/口と導電・iノlにも優れてい
る。したがって、本発明によりjqられる導電″[)1
被膜を、CRTあるいはL−CD等の帯電防止ディスプ
レイ、複写機用ガラス板、削器表示パネル、透明テジタ
イザー、テレライティングターミナルなどへの適用が可
能で・ある。
Coating I+liquid according to the present invention onto a transparent substrate such as crow I1
] When the film is formed using silicon alkoxide or its derivative as the 5102 source, the conductive film has a total light transmittance of 90% or more, a glossiness (G value) of 190% or less, and a haze of 2% or less. Miserably jΔaki('l
Also, this conductivity 1]1 film has a surface resistance value of 105 to 109 Ω/hole and is excellent in conductivity and inol.
The coating can be applied to antistatic displays such as CRT or L-CD, glass plates for copiers, display panels for cutters, transparent digitizers, telewriting terminals, etc.

丘明の効果 本発明に係る導電V[被膜形成用塗4i液は、ジルコニ
ウムオキシ酸塩と、シリコンアル」キシドまたはその誘
導体と、導電性物質と、必要に応じて非)先部″[/4
シリカとか、水および有機溶媒からなる混合溶媒中に均
一に混合されているので、この塗イ11液は安定性に優
れて艮明間にわたって保存ケることができ、しかもこの
塗イロ液を用いて塁伺表面、トに形成される導電性被膜
は、透明t’tに優れるとともに耐擦傷性、基材との密
着性、耐久↑(1に溺れている。しかも被膜の形成時に
、塗イIi液に新たな酸を添加覆る必要かない。
The conductive film-forming coating 4i according to the present invention contains a zirconium oxylate, silicon alkoxide or a derivative thereof, a conductive substance, and optionally a non-conductive tip. 4
Since silica is uniformly mixed in a mixed solvent consisting of water and an organic solvent, this coating liquid has excellent stability and can be stored for a long period of time. The conductive film formed on the surface of the base has excellent transparency, scratch resistance, adhesion to the base material, and durability. There is no need to add new acid to the Ii solution.

以下本発明を実施例によって説明するか、本jTh明は
これら実施例に限定されるもので41ない。
The present invention will be explained below by way of Examples, but the present invention is not limited to these Examples.

実施例1 (導電性酸化スズゾルの調製) スズ酸カリウム316gと11[)へ石38.4Siと
を、水686gに溶解して原料液を調製した。
Example 1 (Preparation of conductive tin oxide sol) A raw material solution was prepared by dissolving 316 g of potassium stannate and 38.4 Si of 11[)hestone in 686 g of water.

50℃に加温されて攪拌下にある1 000 丁ノの水
に、前記の原料液を硝酸とともに12時間か()て添加
し、系内のD)−1を8.5に保持して加水分解させて
ゾル液をj’J4だ。このゾル液からコL]イ]・粒子
を濾別し、洗浄して副生塩を除去した後詩了を乾燥し、
空気中350 ’Cて3時間焼成し、さらに空気中65
0’Cで2時間焼成して微(力木8得た。
Add the above raw material solution together with nitric acid to 1,000 tons of water heated to 50°C and under stirring for 12 hours, and add water while maintaining D)-1 in the system at 8.5. It is decomposed and the sol liquid is j'J4. After filtering the particles from this sol solution and washing to remove by-product salts, dry the powder.
Bake for 3 hours at 350'C in air, then bake at 65'C in air.
It was baked at 0'C for 2 hours to obtain 8 pieces of solid wood.

得られた粉末400y8水酸化カリウム水溶)fl16
009 (KOH4CHJ含有)中に加え、この混合液
を30’Cに保持しながらサントミルで3時間攪拌しな
がら導電性酸化スズ」ロイドを得た。
Obtained powder 400y8 potassium hydroxide aqueous solution) fl16
009 (containing KOH4CHJ), and the mixture was kept at 30'C and stirred in Santo Mill for 3 hours to obtain conductive stannous oxide.

次いでこの導電1(1酸化スズコロイドをイオン交換樹
脂で処理することにより、脱アルカリされた導電性酸化
スズコロイドをf?だ(導電・11ゾル)1夕)。
Then, the conductive tin oxide colloid was treated with an ion exchange resin to form a dealkalized conductive tin oxide colloid (conductive 11 sol).

この脱アルカリされた導電性酸化スズコロイドは沈澱物
を含まず、固形分温度は20中量%−Cあって、コロイ
ド粒子の平均粒径は0.07μTrL−Cあった。そし
て0.1μTn以下の杓子の吊は、全粒子の87%であ
った。
This dealkalized conductive tin oxide colloid contained no precipitates, had a solid content temperature of 20% by weight -C, and an average particle size of colloid particles of 0.07 μTrL-C. 87% of all particles had a ladle diameter of 0.1 μTn or less.

なJ3、粒子の平均粒径は、超遠心粒度測定装置(漏湯
製作所製CAPA−5000>を用い、測定試料中の固
形分温度を0.5重量%に調整して、5000 rpm
の遠心沈降で測定した。
J3, the average particle size of the particles was measured using an ultracentrifugal particle size measuring device (CAPA-5000 manufactured by Yuyu Seisakusho), adjusting the solid content temperature in the measurement sample to 0.5% by weight, and measuring at 5000 rpm.
It was measured by centrifugal sedimentation.

(導電性塗布液の調製) −[チルシリケート2Bを100y、Zr o2として
25手量%のオキシ硝酸ジルコニウム水溶液112g、
純水849、エタノール824りを攪拌混合して、ベー
スとなる塗布液(A液)を調製しlこ 。
(Preparation of conductive coating liquid) - [100y of Chilsilicate 2B, 112g of 25% zirconium oxynitrate aqueous solution as Zro2,
A base coating solution (liquid A) was prepared by stirring and mixing 849 parts of pure water and 824 parts of ethanol.

前記の導電11酸化スズゾル5609をエタノール1,
680yに加えて攪拌混合して酸化スズ分散液(B液)
を調製した。
The above conductive 11 tin oxide sol 5609 was mixed with 1 ethanol,
In addition to 680y, stir and mix to make tin oxide dispersion (liquid B).
was prepared.

上記のようにして得られたA液とB液と4・混合して導
電t’J塗Vli液を得た。
Liquid A and liquid B obtained as described above were mixed to obtain a conductive t'J coating Vli liquid.

この導電t’+塗7i液の性質を表1に承り。The properties of this conductive t'+ coating 7i liquid are shown in Table 1.

実施例2 実施例1においで1A液の組成を、エチルシリゲート4
0.50g、Aキシ塩化ジルコニウム水)H液10y、
メタノール−ブタノール混合液(Φω比=1)688.
5q、純水1.5gとし、B液の組成を導電[1酸化ス
ズゾル562.5!?、メタノール−ブタノール混合液
3,187.57とした以外は、実施例1と同様のツノ
法で導電1)[塗イli液を19だ。
Example 2 The composition of the 1A solution in Example 1 was changed to ethyl siligate 4.
0.50g, A zirconium chloride water) H solution 10y,
Methanol-butanol mixture (Φω ratio = 1) 688.
5q, pure water 1.5g, and the composition of liquid B was conductive [tin monoxide sol 562.5! ? , Conductivity was carried out using the same horn method as in Example 1, except that the methanol-butanol mixed solution was 3,187.57 ml.

この導電性塗布液i液の性質を表1に示り゛。Table 1 shows the properties of this conductive coating liquid I.

実施例3 実施例1において、A液の組成を、エチルシリケー1〜
28.30tJ、、7jキシ硝酸ジルコニウム水溶液(
Zr02:25中量%>55y、メチルセルソルブ−酢
酸エチル混合液(重量化−1:1)137gとし、B液
の組成を導電・i4酸化スズゾル66.6u、メヂルセ
ルソルブーffiMエチル)捏合1ff166.4yと
した以タトは、実施例1と同様の1ノ法で導電14塗布
液を得た。
Example 3 In Example 1, the composition of liquid A was changed from ethyl silica 1 to
28.30tJ, 7j Zirconium oxynitrate aqueous solution (
Zr02:25 medium weight % > 55y, 137g of methylcellosolve-ethyl acetate mixture (weight - 1:1), and the composition of liquid B was conductive / i4 tin oxide sol 66.6u, methylcellosolveffiM ethyl) A coating liquid of Conductivity 14 was obtained using the same method as in Example 1 except that the kneading was performed at 1ff and 166.4y.

この導電fノ1塗を1)1なの1′1冒を表1に示す。Table 1 shows the conductivity of this conductive f-1 coating.

実施例4 (導電性酸化スズ微粉末分散)1にのilI!I製)ス
ズ酸カリウム316gと吐酒石38.1とを、水686
 spに溶解して原料液を調製した。
Example 4 (Dispersion of conductive tin oxide fine powder) ilI! I) 316g of potassium stannate and 38.1g of tartarite were added to 686g of water.
A raw material solution was prepared by dissolving in sp.

50 ’Cに1j11温されて攪拌下にある1000!
Jの水に、前記の原料液を硝酸とともに1211¥間か
けて添JJIIL、、系内のpi−1を8.5に保持し
て加水分解さけてゾル液を得た。このゾル液からコロイ
ド粒子を薊別し、洗浄して副生塩を除去した後粒子を乾
燥し、空気中350’Cで3時間焼成し、ざらに空気中
650’Cで2時間焼成しで導電計酸化スズ微粉末を1
qた。
1000 heated to 50'C and under stirring!
The above raw material solution was added to the water of JJIIL together with nitric acid over a period of 1211 yen, and the pi-1 in the system was maintained at 8.5 to avoid hydrolysis to obtain a sol solution. Colloidal particles were separated from this sol solution, washed to remove by-product salts, and then the particles were dried and calcined in air at 350'C for 3 hours, and then roughly calcined in air at 650'C for 2 hours. Conductivity meter tin oxide fine powder 1
It was.

この粉末を純水に分散ざぜ、リントミルで3時間処理し
、平均IBt仔0.2μm、固形分部数20Φ量%の導
電[i酸化スズの水分散液を得た。
This powder was dispersed in pure water and treated in a lint mill for 3 hours to obtain an aqueous dispersion of conductive tin oxide with an average IBt particle size of 0.2 μm and a solid content of 20% by weight.

(導電↑〕1塗イb液の調製) エチルシリケート28を50g、Aキシ塩化ジルコニウ
ム水溶液(Zr0225mffi%)137.8g、純
水16.8!?、エタノール763.49の混合液(A
液)を1qた。
(Conductivity ↑) Preparation of 1 coating B solution) 50 g of ethyl silicate 28, 137.8 g of A-oxy zirconium chloride aqueous solution (Zr0225mffi%), 16.8 g of pure water! ? , a mixture of ethanol 763.49 (A
1q of liquid).

別に前記の導電I’l酸化スズ分散液484シ、エタノ
ール19369の混合液(B液)を得た。
Separately, a mixed solution (liquid B) of the conductive I'l tin oxide dispersion 484 and ethanol 19369 was obtained.

このΔ液とB液とを、攪拌混合し、導電1ノl ’4自
J)11を(qた。
The Δ solution and the B solution were stirred and mixed to give a conductivity of 1 liter.

この導電性塗4i液の性質を表1に承り。The properties of this conductive coating 4i liquid are shown in Table 1.

実施例5 (導電↑〕1酸化インジウム微粉末5)散液の調製)6
1’l酸インシ「ツム79.9シを、水686Jに溶か
した)8)疫と、スズ酸カリ1クム12.7Uを10中
量%水酸化カリウム水溶液に)dかした溶液を調製した
。50℃に加温されて攪拌下にある1000gの水に、
前記の硝酸インジウム溶液とスズ酸カリウム溶液を21
11間か()て添加し、系内のI)Hを11に保持して
加水分子4¥を行ないゾル液を154だ。
Example 5 (Conductivity ↑) Indium monoxide fine powder 5) Preparation of dispersion) 6
A solution was prepared by dissolving 79.9 grams of 1'l acid in 686 J of water) and 1 cum of potassium stannate (12.7 U) in a 10% by weight aqueous potassium hydroxide solution. .To 1000 g of water heated to 50°C and under stirring,
The above indium nitrate solution and potassium stannate solution were
Add it for 11 minutes, maintain I)H in the system at 11, add 4 yen of hydrated molecules, and make a sol solution of 154 yen.

このゾル液からコロイド杓子をd、I¥i別し、洗浄し
て副生塩を除去後、粒子を乾燥し、空気中350°Cで
3時間焼成し、さらに空気中600 ’Cで2時間焼成
して導電性酸化インジウム微粉末を得た。
Colloid ladles are separated from this sol solution, washed to remove by-product salts, and the particles are dried and calcined in air at 350°C for 3 hours, and then in air at 600'C for 2 hours. By firing, conductive indium oxide fine powder was obtained.

こうして得られた粉末をメチルセルソルブに分散させ、
リントミルで3時間扮粋処理し、平均粒(Wo、3μm
、固形分温度30重♀%のメチルセルソルブ分散液(へ
液)をjqた。
The powder thus obtained is dispersed in methylcellosolve,
It was treated with a lint mill for 3 hours to obtain an average particle size (Wo, 3 μm).
, a methylcellosolve dispersion (liquid) with a solid content temperature of 30% by weight was prepared.

(導電性塗41i液の調製) エチルシリケート40を50y、オキシ硝酸ジル」ニウ
ム水溶液(Zr 0225重量%)295U、純水48
y、メチルセルツル72733.57の混合液(D液)
を調製した。上記の導電性酸化インジウム分散1(A液
)938yにさらにメチルセルソルブを8842g加え
よく混合したのら、これを前記の混合液(B ’tf&
 >に加えて攪拌混合し、導電[(1塗布液を得た。
(Preparation of conductive coating 41i liquid) 50y of ethyl silicate 40, 295U of zylnium oxynitrate aqueous solution (Zr 0225% by weight), 48g of pure water
y, mixed solution of methyl seltul 72733.57 (solution D)
was prepared. Add 8842g of Methyl Cellosolve to the above conductive indium oxide dispersion 1 (liquid A) 938y and mix well.
> and stirred to obtain a conductive coating solution.

この導電性塗布液の性質を表1に示す。Table 1 shows the properties of this conductive coating liquid.

実施例6 (非沈降↑(lシリカ溶液の調製) SiO2として55小吊%のケイ酸ナトリウム水溶液(
S i O2,’Na20=3モル/′七ル)を約15
°Cに保持し、水素型陽イオン交換樹脂カラムに空間速
反5で通し、非沈降すノlシリカ溶液を(9/:この液
に成長防庄剤としてN−メチル−2−ピロリドンを、非
沈降↑)1シリカ液100g当り44.5Sj加え、攪
拌混合したのら、ロータリーエバポレーターを用いて、
80’Cに加熱し、大部分の水を留ムし、安定化された
非沈降・1ノ1シリカ液(C液)を得た。この液のS 
+ 02濃度は10重量%、水分含イ百dは1.0重ω
%であった。
Example 6 (Preparation of non-precipitated silica solution) 55% sodium silicate aqueous solution as SiO2 (
S i O2,'Na20=3mol/'7l) about 15
The non-sedimenting silica solution (9/:) was passed through a hydrogen-type cation exchange resin column at a space velocity of 5°C, and N-methyl-2-pyrrolidone was added as a growth preventive agent to this solution. Non-sedimentation ↑) Add 44.5 Sj per 100 g of silica solution, stir and mix, then use a rotary evaporator to
The mixture was heated to 80'C and most of the water was distilled off to obtain a stabilized non-precipitated 1-no-1 silica solution (Liquid C). S of this liquid
+ 02 concentration is 10% by weight, water content is 1.0 weight ω
%Met.

(導電性塗布液1液の調′sA) エチルシリケート28を1009、オキシ6肖酸ジルコ
ニウム水溶液(Z r 022 b ffi量”o )
112U、エタノール939g、純水84!J、前記C
液319の混合液を調製した。(D液)。
(Preparation of conductive coating liquid 1) Ethyl silicate 28 to 1009, oxy6-phosphate zirconium aqueous solution (Z r 022 b ffi amount”o)
112U, ethanol 939g, pure water 84! J, above C
A mixture of liquid 319 was prepared. (Liquid D).

別に実施例1の導電↑’[化スズゾル591Uとエタノ
ール1773tJの混合液を調製した(E液)D液とE
液とを攪拌混合し、導電性塗イ「液をi9だ。
Separately, a mixed solution of 591 U of conductive ↑' [tin chloride sol and 1773 tJ of ethanol in Example 1 was prepared (solution E), solution D and E
Stir and mix the liquid and apply the conductive coating.

この導電性塗41液のl貿を表1に示す。Table 1 shows the volume of this conductive coating 41 liquid.

実施例7 実施例6において、D液の組成のうち、エタノールを1
104シとし、C液を280Vとし、E液の組成のうら
、導電性酸化スズゾルを840Uとし、エタノールを3
192 tJとした以タトは、実施例6と同様にして、
導電性塗布液を得た。
Example 7 In Example 6, ethanol was added to 1 part of the composition of liquid D.
104V, liquid C was 280V, the composition of liquid E was 840U, conductive tin oxide sol was 840U, and ethanol was 3
After setting it to 192 tJ, the same procedure as in Example 6 was carried out.
A conductive coating liquid was obtained.

この導電性塗4fi液のt/を質を表1に示1゜実施例
8 実施例6において、Dtiの組成のうら、エタノールを
3344y、C:t々を2520!Jとし、[液の組成
のうら、導電1)I酸化スズゾルを30807とし、エ
タノールを9240gとした以外は、実施例6と同様に
して、導電・[)U塗イ0液をIQだ。
The quality of t/ of this conductive coating 4fi liquid is shown in Table 1. Example 8 In Example 6, the composition of Dti was 3344y for ethanol and 2520y for C:t! J, [Back of liquid composition, conductivity 1)I tin oxide sol was changed to 30807 and ethanol was changed to 9240g, except that the conductivity and [)U coating I0 liquid was IQ.

この導電・1ノ1塗イli液の1ノ↓買を表1に示−づ
Table 1 shows the price of this conductive 1-1 coating lithium liquid.

実施例9 実施例1〜8r(*られた導電性塗イ[液をスピンブー
を使用して2.00Orpmでガラス仮に塗イ[!した
のら、110’Cr乾燥し、その後250℃で焼成して
、ガラス板上に導電性被膜を形成した。
Example 9 Examples 1 to 8r (*) The conductive coating solution was temporarily coated on the glass at 2.00 rpm using a spin-boo, dried with 110'Cr, and then fired at 250°C. A conductive film was formed on the glass plate.

得られた被膜について、下記の試験を行った。The following tests were conducted on the obtained film.

結果を表2に承り。The results are shown in Table 2.

・全光線透過率(丁t)およびヘーズ(Hlへ一ズコン
ピューター(スガ試験ll製)・光沢度(G値):、ノ
Is  K7105−81の光沢度測定法において測定
角 度60°で評価した。
・Total light transmittance (T) and haze (HI) Computer (manufactured by Suga Testimony) ・Gloss (G value): Evaluated at a measurement angle of 60° using the gloss measurement method of NoIS K7105-81 .

・密着1ノ1テスト二市販の12M幅セロテープの一部
を被膜にはりつけ、残り を被膜に対して直角に保ら、 瞬間的に引きはがしガラス上 の被膜の有無を目視した。
・Adhesion 1/1 Test 2 A part of commercially available 12M wide cellophane tape was attached to the film, the rest was kept perpendicular to the film, and it was instantly peeled off and the presence or absence of the film on the glass was visually observed.

・鉛筆硬度:JIS DO202−71に阜づぎ評価し
た。
-Pencil hardness: Evaluated based on JIS DO202-71.

・耐久↑1テスト:下記の試験を行ない、試験前後の密
着性、全光線透過率を 比較した。
- Durability↑1 test: The following test was conducted to compare the adhesion and total light transmittance before and after the test.

■耐アルカリ↑1:15重け%アンモニア水に室温で1
201t、’1間浸漬。
■Alkali resistance↑1:15% by weight ammonia water at room temperature
201t, immersed for '1.

■耐 塩水↑1:10重量%NaC+水溶液に室温で1
20115間浸漬。
■Resistance to salt water ↑1: 1 in 10 wt% NaC + aqueous solution at room temperature
Immersed for 20115.

表面抵抗、電極セル(Y l−I P製)で測定。Surface resistance, measured with an electrode cell (manufactured by Yl-IP).

手続補正歯 昭和63年 1月12日 特許庁長官  小 川 邦 夫  殿 +J−辷 1、事件の表示 昭和61年 特 許 願 第299,686号2、発明
の名称 導電性被膜形成用塗布液 明細書の「3、発明の詳細な説明」の欄□ 二 1 7、補正の内容 1)明細書第8頁第2〜3行目において、r(a+b=
4)Jとあるのを、 「(a−O〜3、b=1〜4、a+b=4、R′はアル
キル基)」と補正する。
Procedural amendment January 12, 1988 Kunio Ogawa, Commissioner of the Patent Office +J-Example 1, Indication of the case 1985 Patent Application No. 299,686 2, Title of invention Description of coating liquid for forming conductive film Column □ 2 1 7. Contents of amendment 1) In lines 2-3 of page 8 of the specification, r(a+b=
4) Correct J to "(a-O~3, b=1-4, a+b=4, R' is an alkyl group)".

2)回出第9頁第8行目において、 [、ジメチルホルムアミドなど」とあるのを、「、N、
N−ジメチルホルムアミドなど」と補正する。
2) In the 8th line of page 9 of the circular, [, dimethylformamide, etc.] was replaced with ``, N,
N-dimethylformamide, etc.”

3)同書第10頁第18行目において、「表示装置の全
面」とあるのを、 「表示装置の前面」と補正する。
3) In the same document, page 10, line 18, the phrase "the entire surface of the display device" is amended to read "the front surface of the display device."

4)同書第11頁第4行目において、 「酸化スズゾルおよび」とあるのを、 「酸化錫ゾルおよび」と補正する。4) In the same book, page 11, line 4, "Tin oxide sol and" Correct as "tin oxide sol and".

5)同書第13頁第16行目において、「かなったの導
電性微粉末」とあるのを、「かなった導電性微粉末」と
補正する。
5) In the same book, page 13, line 16, the phrase "Kanata's conductive fine powder" is corrected to "Kanata's conductive fine powder."

6)同書第15頁第13行目において、「水の一部を有
機溶媒で」とあるのを、「水の一部または全部を有機溶
媒で」と補正する。
6) In the same book, page 15, line 13, the phrase ``part of the water in an organic solvent'' is corrected to ``part or all of the water in an organic solvent.''

7)同書第18頁第12行目において、「〜5.0であ
るような量」とあるのを、「〜5. O(重ffi比)
であるような量」と補正する。
7) In the same book, page 18, line 12, "amount such that ~5.0" is replaced with "~5. O (gravitational ffi ratio)"
``the amount such that '' is corrected.

8)回出第21頁第6行目において、 「全光線透過率90%」とあるのを、 「全光線透過率85%」と補正する。8) In the circular, page 21, line 6, It says "total light transmittance 90%", Correct it to "total light transmittance 85%".

9)同書同頁第7行目において、 「ヘーズ2%」とあるのを、 「ヘーズ10%」と補正する。9) In the same book, same page, line 7, It says "haze 2%", Correct it to "Haze 10%".

10)同書同頁第9行目において、 「10〜109」とあるのを、 「10〜109」と補正する。10) In the same book, same page, line 9, It says "10-109", Correct it to "10-109".

11)同書第30頁表1を以下のとおり補正する。11) Table 1 on page 30 of the same book is amended as follows.

12)同門第33頁表2を以下のとおり補正する。12) Table 2 on page 33 of Domon is amended as follows.

Claims (1)

【特許請求の範囲】 1)ジルコニウムオキシ酸塩と、シリコンアルコキシド
またはその誘導体と、導電性物質とが、水および有機溶
媒からなる混合溶媒中に均一に混合されてなることを特
徴とする導電性被膜形成用塗布液。 2)ジルコニウムオキシ酸塩と、シリコンアルコキシド
またはその誘導体と、非沈降性シリカ液と、導電性物質
とが、水および有機溶媒からなる混合溶媒中に均一に混
合されてなることを特徴とする導電性被膜形成用塗布液
[Scope of Claims] 1) A conductive material characterized in that a zirconium oxylate, a silicon alkoxide or a derivative thereof, and a conductive substance are uniformly mixed in a mixed solvent consisting of water and an organic solvent. Coating liquid for film formation. 2) A conductive material characterized in that a zirconium oxylate, a silicon alkoxide or its derivative, a non-sedimentable silica liquid, and a conductive substance are uniformly mixed in a mixed solvent consisting of water and an organic solvent. Coating liquid for forming a sexual film.
JP61299686A 1986-12-16 1986-12-16 Coating liquid for conductive film formation Expired - Fee Related JPH0798911B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61299686A JPH0798911B2 (en) 1986-12-16 1986-12-16 Coating liquid for conductive film formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61299686A JPH0798911B2 (en) 1986-12-16 1986-12-16 Coating liquid for conductive film formation

Publications (2)

Publication Number Publication Date
JPS63152675A true JPS63152675A (en) 1988-06-25
JPH0798911B2 JPH0798911B2 (en) 1995-10-25

Family

ID=17875735

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990002157A1 (en) * 1988-08-24 1990-03-08 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming transparent conductive ceramic coating, base material coated with transparent conductive ceramic and production thereof, and application of base material coated with transparent conductive ceramic
US6072018A (en) * 1996-09-30 2000-06-06 Virginia Tech Intellectual Properties, Inc. High abrasion resistant coating material
US6145711A (en) * 1997-04-24 2000-11-14 Black & Decker Inc. Portable sprayer with power pump
JP2007005460A (en) * 2005-06-22 2007-01-11 Tdk Corp Electronic component and manufacturing method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57199102A (en) * 1981-06-03 1982-12-07 Taiyo Yuden Kk Conductive paste for forming conductive layer on surface of porcelain

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57199102A (en) * 1981-06-03 1982-12-07 Taiyo Yuden Kk Conductive paste for forming conductive layer on surface of porcelain

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990002157A1 (en) * 1988-08-24 1990-03-08 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming transparent conductive ceramic coating, base material coated with transparent conductive ceramic and production thereof, and application of base material coated with transparent conductive ceramic
US5382383A (en) * 1988-08-24 1995-01-17 Catalysts & Chemicals Industries Co., Ltd. Coating solutions for forming transparent conductive ceramic coatings, substrates coated with transparent conductive ceramic coatings and process for preparing same, and uses of substrates coated with transparent conductive ceramic coatings
US5424008A (en) * 1988-08-24 1995-06-13 Catalysts & Chemical Industries Co., Ltd. Coating solutions for forming transparent conductive ceramic coatings, substrates coated with transparent conductive ceramic coatings and process for preparing same, and uses of substrates coated with transparent conductive ceramic coatings
US6072018A (en) * 1996-09-30 2000-06-06 Virginia Tech Intellectual Properties, Inc. High abrasion resistant coating material
US6145711A (en) * 1997-04-24 2000-11-14 Black & Decker Inc. Portable sprayer with power pump
JP2007005460A (en) * 2005-06-22 2007-01-11 Tdk Corp Electronic component and manufacturing method thereof

Also Published As

Publication number Publication date
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