JPS6343965A - Non-precipitating silica composition for coating and production thereof - Google Patents
Non-precipitating silica composition for coating and production thereofInfo
- Publication number
- JPS6343965A JPS6343965A JP18783586A JP18783586A JPS6343965A JP S6343965 A JPS6343965 A JP S6343965A JP 18783586 A JP18783586 A JP 18783586A JP 18783586 A JP18783586 A JP 18783586A JP S6343965 A JPS6343965 A JP S6343965A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- silica
- growth inhibitor
- alkali
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 107
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 52
- 238000000576 coating method Methods 0.000 title claims abstract description 50
- 239000011248 coating agent Substances 0.000 title claims abstract description 44
- 239000000203 mixture Substances 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000003966 growth inhibitor Substances 0.000 claims abstract description 22
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims abstract description 20
- 230000001376 precipitating effect Effects 0.000 claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000003513 alkali Substances 0.000 claims abstract description 11
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims abstract description 8
- 239000003085 diluting agent Substances 0.000 claims abstract description 8
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000003729 cation exchange resin Substances 0.000 claims abstract description 7
- 239000000243 solution Substances 0.000 claims description 21
- 239000007864 aqueous solution Substances 0.000 claims description 13
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims description 8
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 6
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 3
- 238000005342 ion exchange Methods 0.000 claims description 3
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 claims description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 18
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 abstract description 14
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract description 9
- 239000004115 Sodium Silicate Substances 0.000 abstract description 8
- 229910052911 sodium silicate Inorganic materials 0.000 abstract description 8
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 6
- 239000001257 hydrogen Substances 0.000 abstract description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 description 47
- 238000000034 method Methods 0.000 description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 17
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 15
- 239000006185 dispersion Substances 0.000 description 13
- 150000001768 cations Chemical class 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- 239000000499 gel Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 239000008199 coating composition Substances 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 235000019353 potassium silicate Nutrition 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 239000004111 Potassium silicate Substances 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- -1 aliphatic amines Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229910052913 potassium silicate Inorganic materials 0.000 description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- VPSXHKGJZJCWLV-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-(1-ethylpiperidin-4-yl)oxypyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)OC1CCN(CC1)CC VPSXHKGJZJCWLV-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、基材に透明で密着性の良い硬い被膜を形成さ
せるコーティング用非沈降性シリカm成物及びその製造
法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a non-sedimentable silica composition for coating that forms a transparent, hard coating with good adhesion on a substrate, and a method for producing the same.
プラスチック、ガラス、セラミック、金属等の基材上に
無機酸化物をコーティングして被膜を形成させることが
、種々性なわれている。その被膜は、膜中の金属元素に
よる特有の電気的特性、光学的特性、化学的特性あるい
は機械的特性等の機能をNL、導電膜、絶縁膜、配向膜
、フォトマスク、アルカリ溶出防止膜、可視光線無反射
膜、赤外線反射膜、紫外線吸収膜、機械的な保a膜等の
エレクトロニクス分野、光字的機器分野を始めとする広
範な分野において利用されている。BACKGROUND ART Various methods have been used to form a film by coating an inorganic oxide on a base material such as plastic, glass, ceramic, or metal. The coating has functions such as unique electrical properties, optical properties, chemical properties, or mechanical properties due to the metal elements in the film. It is used in a wide range of fields including the electronics field and the optical equipment field, such as visible light non-reflective films, infrared reflective films, ultraviolet absorbing films, and mechanical aerosol preservation films.
その中で透明でハードコート性をもつ被膜を塗布法によ
ジ形成させる方法として、熱分解法、アルコキシド加水
分解法、ゾル−ゲル法、溶融法等があるが、熱分解法・
溶融法は、基材の耐熱性によって使用できる基材が制限
され、アルコキシド加水分解法では、アルコキシドの加
水分解条件(@度、湿度、塗工速度等)によって、ゾル
−ゲル法では、ゾルとゲルのバランス等によって被膜の
性状が左右される。又これらの原料はいづれも高価であ
った。その他に水ガラス等の珪酸アルカリを主成分とし
た塗布液もあるが、多くのアルカリ(陽イオン)が残留
し、使用できる用途に制限があった。又珪酸アルカリか
ら陽イオンを除いて得られる珪酸液は、製造の際珪酸の
他にそれが重合したコロイド粒子も同時に生成され、ま
た非常に不安定で短時間のうちにゲル化してし1うため
に塗布液として用いられることはなかった。さらに塗布
法は、全般として塗工法により被膜の性状が影響され、
また前記塗布法に使用される塗布液は、周囲の環境に影
響されやすくて保存性が悪く、その多くはポットライフ
(使用可能期間約1ケ刃)が短かった。Among them, methods for forming transparent films with hard coating properties include thermal decomposition methods, alkoxide hydrolysis methods, sol-gel methods, and melting methods.
In the melting method, the base materials that can be used are limited by the heat resistance of the base material; in the alkoxide hydrolysis method, the alkoxide hydrolysis conditions (degree, humidity, coating speed, etc.) The properties of the film are influenced by the balance of the gel and other factors. Furthermore, all of these raw materials were expensive. There are other coating liquids whose main component is alkali silicate, such as water glass, but they contain a large amount of alkali (cations) and are therefore limited in their use. In addition, the silicic acid solution obtained by removing cations from an alkali silicate produces not only silicic acid but also colloidal particles that are polymerized at the same time, and is extremely unstable and tends to gel in a short period of time. Therefore, it was never used as a coating liquid. Furthermore, the properties of the film are generally influenced by the coating method.
Furthermore, the coating liquid used in the coating method is easily affected by the surrounding environment and has poor storage stability, and most of them have a short pot life (usable period of about one blade).
本発明は、上記の様な従来技術に伴う問題点を解決し、
安価で基材の形状に制限されず容易に塗工することがで
き、また長期間保存可能な、透明で密着性の良い硬い塗
膜を形成可能なコーティング用非沈降性シリカ組成物及
びその製造法を提供しようとするものである。The present invention solves the problems associated with the prior art as described above,
A non-precipitating silica composition for coating that is inexpensive, can be easily applied regardless of the shape of the substrate, can be stored for a long period of time, and can form a transparent, hard coating film with good adhesion, and its production. It seeks to provide law.
本発明は、珪酸アルカリ水溶液から大部分のアルカリ(
陽イオン)を除去し得られる非沈降性シリカ水溶液に、
特定の成長防止剤を加えて液中の非沈降性シリカを安定
化させたコーティング組成物及び無機バインダー組成物
を得るものである。The present invention is capable of converting most alkalis (
In the non-precipitating silica aqueous solution obtained by removing cations),
A coating composition and an inorganic binder composition are obtained in which non-sedimentable silica in the liquid is stabilized by adding a specific growth inhibitor.
以下本発明に係るコーティング用組成物及びその製造法
について具体的に説明する。本発明に係る床叡アルカリ
は、珪酸リチウム、珪酸ナトリウム、珪酸カリウム及び
第四級アンモニウムシリケートなどの水溶性のものであ
り、これらを−徨又は二棟以上組合わせて用いることが
できる。さらにSi(% 7M20 (mol/ mo
l )においてMがNaのときα5〜4、MがKのとき
1へ4、MがLlのとき2へ9のものであり、第四級ア
ンモニウムシリケートは゛、X(NRI R2R3R4
)20愉YSiO*・ZH20においてX−1、Y=α
5〜20、z=0〜99、R1〜4:水素または炭素数
1〜20のアルキル基またはアルコキシ基がよい。この
珪酸アルカリ水溶液から非沈降性シリカを得るには、珪
酸アルカリ水溶液中のアルカリと水素を交換する事で得
られる。その方法としては公知の方法、例えばイオン又
換法あるいは透析法等を用いる事ができる。The coating composition and method for producing the same according to the present invention will be specifically explained below. The bedding alkali according to the present invention is water-soluble such as lithium silicate, sodium silicate, potassium silicate, and quaternary ammonium silicate, and these can be used in combination or in combination. Furthermore, Si (% 7M20 (mol/mo
l ), when M is Na, α5 to 4, when M is K, it is 1 to 4, and when M is Ll, it is 2 to 9, and the quaternary ammonium silicate is ゛, X (NRI R2R3R4
)20YSiO*・ZH20, X-1, Y=α
5-20, z=0-99, R1-4: Hydrogen or an alkyl group or alkoxy group having 1 to 20 carbon atoms. Non-precipitating silica can be obtained from this aqueous alkali silicate solution by exchanging the alkali and hydrogen in the aqueous alkali silicate solution. As the method, a known method such as an ion exchange method or a dialysis method can be used.
本発明に係る非沈降性シリカは、前記の方法によって得
られるが、その際珪酸アルカリ水浴液中の8102換算
嬢度が111〜7 wt%、温匣が0〜35℃にする。The non-sedimentable silica according to the present invention is obtained by the above-mentioned method, and the 8102 conversion temperature in the alkaline silicate water bath is adjusted to 111 to 7 wt%, and the heating temperature is adjusted to 0 to 35°C.
更に好1しくけ第1図の範囲になる様にする。8 wt
%以上又は35℃以上であるとアルカリと水素t−交換
中にゲル化を起こしたり、コロイド粒子が多量に生成さ
れるからである。また、0℃未満ではイオン交換速度が
遅いため工業的でなく、さらに凝固点以下ではゲル化し
てしまうからである。液中に残留するアルカリは、Si
O*/M20 (mob/ mol)が(M=Li。More preferably, the arrangement should be within the range shown in Figure 1. 8wt
% or higher than 35° C., gelation may occur during the alkali and hydrogen t-exchange, or a large amount of colloidal particles will be produced. Further, if the temperature is below 0°C, the ion exchange rate is slow, so it is not industrially practical, and furthermore, if it is below the freezing point, it will gel. The alkali remaining in the liquid is Si
O*/M20 (mob/mol) is (M=Li.
Na、 K、 NRIR2R3R4) 200以上、好
ましくは1000以上、巣に好ましくは10000以上
である。200未満であると成長防止剤の効果がなく室
温にて短時間で液がゲル化してしまう。Na, K, NRIR2R3R4) 200 or more, preferably 1000 or more, and preferably 10000 or more in nests. If it is less than 200, the growth inhibitor will have no effect and the liquid will gel in a short time at room temperature.
ここ10言う非沈降性シリカとは、2−0wt%(81
0゜換算)水溶g、を250.QOOG、1時間で遠心
沈降させた際、沈降物が水溶液中の全Sin、に対して
30重量部以下、好ましくFil 0重量部以下のもの
である。この様にして得られた非沈降性シリカは、不安
定でコロイド粒子が生成されたクゲル化し易いので、成
長防止剤を加えて非沈降性シリカを安定化させる。非沈
降性シリカが成長防止剤によって安定化されるのは、非
沈降性シリカの持つ水酸基が成長防止剤の持つ官能基と
水素結合することで非沈降性シリカの水酸基同士の接触
が防止されるためと推測される。The non-precipitating silica referred to here is 2-0 wt% (81
0° conversion) water soluble g, 250. QOOG, when centrifuged for 1 hour, the precipitate is 30 parts by weight or less, preferably 0 parts by weight or less, based on the total Sin in the aqueous solution. Since the non-precipitated silica thus obtained is unstable and easily undergoes gelatinization in which colloidal particles are produced, a growth inhibitor is added to stabilize the non-precipitated silica. Non-precipitating silica is stabilized by growth inhibitors because the hydroxyl groups of non-precipitating silica form hydrogen bonds with the functional groups of the growth inhibitor, which prevents the hydroxyl groups of non-precipitating silica from coming into contact with each other. It is presumed that this is because of this.
従って本発明に係る成長防止剤は、親水性有機溶剤又は
水溶性の結晶で非沈降性シリカの水酸基と水素結合を起
こす官能基を持つものであれハ良く、ψりえはエチレン
グリコール、グロビレングリコール、エチレングリコー
ル七ツメチルエーテル等のグリコール及びそのモノエー
テル・モノエステル誘導体、アミルアミン、エタノール
アミン等の脂肪族アミン、ホルムアミド又、N、 N−
ジメチルホルムアミド等のその誘導体、ブチロラクトン
、r−バレロラクトン、r−カプロラクトン等のラクト
ン及びその誘導体、モルホリン及びその誘導体、2−ピ
ロリドン及び゛その誘導体、ジメチルスルホキシド及び
その誘導体であり、その一種又キニ種以上組合わせて使
用できる。成長防止剤は、液中の非沈降性Sin、成分
1 !1101に対して少なくとも15m01であれば
良い。(15m01未満だと非沈降性シリカ成分の安定
性が悪くなる。成長防止剤の使用警を増大させることは
、本発明にとってなんら不都合をもたらさない。この安
定化された非沈降性シリカ成分を希釈剤に分散すれば本
発明のコ□−ティング用非沈、降性シリカ′Bi成物が
得られる・基材によっては水分により得られるm膜・成
型物に患影響(拘置性・密着性・強反)をおよぼすので
希釈剤を加える前に脱水しても良い。脱水には蒸溜法や
限外脱法等の公知の方法が利用できる。この際90℃以
下の温度で行わないと非沈降性シリカの安定性が悪くな
り、コロイド粒子の生成又は成長やゲル化が起こる。Therefore, the growth inhibitor according to the present invention may be a hydrophilic organic solvent or a water-soluble crystal that has a functional group that forms a hydrogen bond with the hydroxyl group of non-precipitating silica, and ψrie is ethylene glycol, globylene glycol. , glycols such as ethylene glycol methyl ether and their monoether/monoester derivatives, aliphatic amines such as amylamine and ethanolamine, formamide, N, N-
Derivatives thereof such as dimethylformamide, lactones and derivatives thereof such as butyrolactone, r-valerolactone, r-caprolactone, morpholine and derivatives thereof, 2-pyrrolidone and derivatives thereof, dimethyl sulfoxide and derivatives thereof, and one or more thereof. The above can be used in combination. The growth inhibitor is non-sedimentable Sin in the liquid, component 1! It is sufficient if it is at least 15m01 for 1101. (If it is less than 15m01, the stability of the non-precipitated silica component will deteriorate.Increasing the use of the growth inhibitor will not bring any disadvantages to the present invention.Dilute this stabilized non-precipitated silica component. When dispersed in a solution, a non-sedimentable, precipitated silica'Bi composition for coating of the present invention can be obtained. Depending on the base material, moisture may affect the film and molded product (retention property, adhesion, etc.). Dehydration may be carried out before adding the diluent as this causes a strong reaction.For dehydration, known methods such as distillation and ultra-dehydration can be used.In this case, non-sedimentation occurs unless the temperature is below 90°C. The stability of silica deteriorates, and colloidal particle formation or growth and gelation occur.
本発明に係る非沈降性シリカ取分・水分・成長防止剤の
組成比は、上記(成長防止剤/非沈降性シリカ成分)≧
05の条件を満した上で三成分の全体に対して非沈降性
シリカ成分がα5〜25 wt%、好ましくは15〜1
5 wt%、水分がα1〜? ?、 3 wt%、成長
防止剤が12%99.4wt%が良い。非沈降性シリカ
成分が15 wt%以上だと液の安定性が短くな’p
25 wt%以上になると更に短くなって容易にゲル化
してし1う〇成長防止剤がα2 wt%以下だと効果が
なくなシ非沈降性シリカ成分がゲル化しゃすくなる。The composition ratio of the non-precipitating silica fraction, water, and growth inhibitor according to the present invention is the above (growth inhibitor/non-precipitating silica component)≧
After satisfying the conditions of 05, the non-sedimentable silica component is α5 to 25 wt%, preferably 15 to 1
5 wt%, moisture is α1~? ? , 3 wt%, and the growth inhibitor is preferably 12% and 99.4 wt%. If the non-sedimentable silica component exceeds 15 wt%, the stability of the solution will be shortened.
If it exceeds 25 wt%, it becomes even shorter and gels easily. If the growth inhibitor is less than α2 wt%, it becomes ineffective and the non-sedimentable silica component tends to gel.
これら三成分を分散させる希釈剤は、非沈降性シリカ成
分に影響を与えないものであれば良い◇その希釈割合い
は、例えば塗工法に合せ念□粘度や膜厚を調節できるよ
うに任意に選ぶことができる6例、えば、メタノール、
エタノール、n−プロパ1ノール、1−グロパノール、
n−ブタノール、1−ブタノール、t−ブタノール等の
アルコール、酢酸メチルエステル、酢酸エチルエステル
等の酸性エステル、ジエチルエーテル等のエーテル、ア
セトンのうち一種又は二稽以上組合わせて使用できる。The diluent for dispersing these three components may be one that does not affect the non-sedimented silica component ◇ The dilution ratio or the diluent may be adjusted according to the coating method, for example Six examples to choose from, for example, methanol,
Ethanol, n-propanol, 1-glopanol,
Alcohols such as n-butanol, 1-butanol and t-butanol, acid esters such as methyl acetate and ethyl acetate, ethers such as diethyl ether, and acetone can be used alone or in combination.
本発明のコーティング用ff1g物は、スピンナー法・
スプレー法−デイツプ法・バーコード法・ロールコート
法・印刷済等公知の方法で塗工することができる。塗工
後は組成物中の希釈剤□・水・成長防止剤が蒸発又は分
解する温度で焼成すればよい。The ff1g product for coating of the present invention can be prepared using a spinner method.
Coating can be performed by a known method such as a spray method, dip method, bar code method, roll coating method, or printed method. After coating, it may be baked at a temperature at which the diluent, water, and growth inhibitor in the composition evaporate or decompose.
以下本発明を実施例により説明するが、本発明はこれら
実施例に限定されるものではない。EXAMPLES The present invention will be explained below with reference to Examples, but the present invention is not limited to these Examples.
実施例1
810、として5 wt%の珪酸ナトリウム水浴液(5
iOz/Nano” 3−mol/ mol、 ) 4
800 ’t f−15℃に保持した1ま陽イオン交換
樹脂カラム中に空間速度5V=Sで通過させて非沈降性
シリカ液(1)を得た。この液のうち100tにエチレ
ングリコール44gを添加して十分分散したのち、ロー
タリーエバポレーターにて減圧しながら70℃に加熱し
て水を94f留出させた。(分散液1)この液を冷却し
さらにエタノールを2001添加してコーテイング液を
得た。Example 1 810, 5 wt% sodium silicate water bath solution (5 wt%)
iOz/Nano” 3-mol/mol, ) 4
A non-sedimentable silica solution (1) was obtained by passing it through a cation exchange resin column maintained at 800't f-15°C for 1 hour at a space velocity of 5V=S. After adding 44 g of ethylene glycol to 100 t of this liquid and sufficiently dispersing it, the mixture was heated to 70°C under reduced pressure using a rotary evaporator to distill off 94 f of water. (Dispersion liquid 1) This liquid was cooled and 200 l of ethanol was added to obtain a coating liquid.
実施例2
実施例1で得られた非沈降性シリカ液中のうち100t
vcN−メチル‐2‐ピロリドン27fを添加して十分
分散した。(分散液…)この液にメタノール/n−ブタ
ノール(重量比1/1)ft123f添加してコーテイ
ング液を得た。Example 2 100t of the non-sedimentable silica liquid obtained in Example 1
27f of vcN-methyl-2-pyrrolidone was added and thoroughly dispersed. (Dispersion liquid...) To this liquid, 123 f methanol/n-butanol (weight ratio 1/1) was added to obtain a coating liquid.
実施例3
Sin、としてα5 vt%の珪酸ナトリウム水溶液(
810x/Nano ” 3 moVmob ) 24
0 fを25℃に保持したまま陽イオン変換樹脂カラム
中に空間速度8V=2で通過させて非沈降性シリカ液を
得た。この液のうち100fvcN−メチル‐2‐ピロ
リドン9tを添加して十分分散したのち、ロータリーエ
バポレーターにて減圧しながら70℃に加熱して水を9
92留田させた。(分散液■)この液を冷却しさらにエ
タノールを10?添加してコーテイング液を得た。Example 3 Sin, α5 vt% sodium silicate aqueous solution (
810x/Nano” 3 moVmob) 24
0 f was maintained at 25° C. and passed through a cation conversion resin column at a space velocity of 8 V=2 to obtain a non-sedimentable silica solution. After adding 9 tons of 100 fvc N-methyl-2-pyrrolidone to this liquid and thoroughly dispersing it, the water was heated to 70°C under reduced pressure using a rotary evaporator to dissolve 9 tons of water.
I made 92 Tomita. (Dispersion ■) Cool this liquid and add 10% ethanol to it. A coating liquid was obtained.
実施例4
Sillとして7 wt%の珪酸ナトリウム水溶液(5
iO1/Na1O= 3 mob/ mob ) 20
0 fを15℃に保持したまま陽イオン交換樹脂カラム
中に空間速度5V=6で通過させて非沈降性シリカ液を
得た。この液のうち100tにN−メチル‐2‐ピロリ
ドン600tを添加して十分分散した。Example 4 A 7 wt% sodium silicate aqueous solution (5 wt%) was used as Sill.
iO1/Na1O= 3 mob/ mob) 20
0 f was maintained at 15° C. and passed through a cation exchange resin column at a space velocity of 5 V=6 to obtain a non-sedimentable silica solution. 600 t of N-methyl-2-pyrrolidone was added to 100 t of this liquid and sufficiently dispersed.
(分散液■)この液にメタノール/n−ブタノール(重
量比1/1)を700を添加してコーテイング液を得た
。(Dispersion liquid ①) To this liquid, 700 g of methanol/n-butanol (weight ratio 1/1) was added to obtain a coating liquid.
実施例5
Sin、としてS wt%の珪酸ナトリウム水溶液(8
101/Na1O= 5 mob/mob ) 200
fを2℃に保持したまま陽イオン交換樹脂カラム中に
空間速度5V=4で通過させて非沈降性シリカt’に得
た。Example 5 Sin, S wt% sodium silicate aqueous solution (8
101/Na1O= 5 mob/mob) 200
While f was maintained at 2°C, it was passed through a cation exchange resin column at a space velocity of 5V=4 to obtain non-precipitated silica t'.
この液のうち100fにN−メチル‐2‐ピロリドン1
49fを添加して十分分散したのち、ロータリーエバポ
レーターにて減圧しながら70℃に加熱して水を949
9留出させた。(分散液■)この液を冷却しさらにエタ
ノールを802添加してコーテイング液を得た。Of this liquid, 100f contains 1 N-methyl-2-pyrrolidone.
After adding 49f and thoroughly dispersing it, heat it to 70°C while reducing the pressure in a rotary evaporator to reduce the water to 949f.
9 distillates were distilled out. (Dispersion ■) This liquid was cooled and further 802 ml of ethanol was added to obtain a coating liquid.
実施例6
Sin、として6 wt%の珪酸ナトリウム水溶液(5
iO1/Na1O= 5 moVmol )
2 0 0 f t−25℃ に保持したま
ま陽イオン変換樹脂カラム中に空間速度5V=aで通過
させて非沈降性シリカ液を得た。この液のうち100t
にN−メチル‐2‐ピロリドン900tを添加して十分
分散した。Example 6 Sin, 6 wt% sodium silicate aqueous solution (5
iO1/Na1O= 5 moVmol)
A non-sedimentable silica solution was obtained by passing through a cation conversion resin column at a space velocity of 5 V=a while maintaining the temperature at 200 ft-25°C. 100t of this liquid
900 t of N-methyl-2-pyrrolidone was added to the solution and thoroughly dispersed.
(分散ff1Vl)この液にメタノール/n−ブタノー
ル(重量比1/1)を10001F添加してコーテイン
グ液を得た。(Dispersion ff1Vl) 10001F of methanol/n-butanol (weight ratio 1/1) was added to this liquid to obtain a coating liquid.
実施例7
S10!として5 wt%の珪酸カリウム水溶液(Si
O1/に10=4 mob/ mol) 200 f
f 15℃に保持したま1陽イオン交換樹脂カラム中に
空間速Hsv=sで通過させて非沈降性シリカ液を得た
。Example 7 S10! 5 wt% potassium silicate aqueous solution (Si
O1/10=4 mob/mol) 200 f
f It was maintained at 15° C. and passed through a cation exchange resin column at a space velocity Hsv=s to obtain a non-sedimentable silica solution.
この液のうち100tにエチレングリコールモノエチル
エーテル600 f’i添加して十分分散したのち、限
外濾過膜(旭化成g、5IP−5013,15℃、ΔP
=1騙/cIn” ) t−用いて水f913を留出さ
せた。(分散液Vl )この液を冷却しさらにエタノー
ルt−300f添加してコーテイング液を得た。After adding 600 f'i of ethylene glycol monoethyl ether to 100 tons of this liquid and thoroughly dispersing it, an ultrafiltration membrane (Asahi Kasei g, 5IP-5013, 15℃, ΔP
Water f913 was distilled out using t-t (dispersion liquid Vl). This liquid was cooled and further ethanol t-300f was added to obtain a coating liquid.
実施例8
Sin、としてS wt%のテトラエチルアンモニウム
シリケート水溶液((N(C2H5)4ン20・I A
3810. )200tを15℃に保持したまま陽イオ
ン交換樹脂カラム中に空間速度SV = Sで通過させ
て非沈降性シリカ液を得た。この液のうち1002にモ
ルホリン441に添加して十分分散した以外は実施例1
と同一条件でコーテイング液を得たO
実施例9
実施例1で得られた非沈降性シリカ液(1ンのうち10
0fにN−メチル‐2‐ピロリドン5?を添加して十分
分散したのち、ロータ替−エノくボレーターにて減圧し
ながら70℃に加熱して水を55f留出させた0(分散
液IX)この液を冷却しさらにメタノール/n−ブタノ
ール(真量比1/1)を200f添加してコーテイング
液を得た。Example 8 Sin, S wt% tetraethylammonium silicate aqueous solution ((N(C2H5)4-20・I A
3810. ) 200t was passed through a cation exchange resin column at a space velocity of SV=S while being maintained at 15°C to obtain a non-sedimentable silica solution. Example 1 except that morpholine 441 was added to 1002 of this liquid and sufficiently dispersed.
A coating solution was obtained under the same conditions as Example 9. Non-sedimentable silica solution obtained in Example 1 (10 out of 1
N-methyl-2-pyrrolidone 5 at 0f? After adding and sufficiently dispersing, the rotor was heated to 70°C while reducing the pressure using a borator to distill off 55f of water (Dispersion IX). This liquid was cooled and further mixed with methanol/n-butanol. A coating liquid was obtained by adding 200f of (true weight ratio 1/1).
実施例10
実施例1で得られた非沈降性シリカ液(1)のうち10
0gにN−メチル‐2‐ピロリドン209を添加して十
分分散したのち、ロータリーエバポレーターにて減圧し
ながら70℃に加熱して水f70f留出させた。(分散
fiX)この液を冷却しさらにエタノール/n−ブタノ
ール(重量比1/1)t−20of添加してコーテイン
グ液を得た。Example 10 10 of the non-sedimentable silica liquid (1) obtained in Example 1
After adding N-methyl-2-pyrrolidone 209 to 0g and sufficiently dispersing it, the mixture was heated to 70°C under reduced pressure using a rotary evaporator to distill off 70f of water. (Dispersion fiX) This liquid was cooled and further t-20 of ethanol/n-butanol (weight ratio 1/1) was added to obtain a coating liquid.
実施例11
Sin、として5 wt%の珪酸ナトリウム水溶液(8
107Na!O= 5 noVmob ) 4 B O
f f 5℃に保持したまま陽イオン変換樹脂カラム中
に空間速度8V= 15で通過させて非沈降性シリカ液
を得た。この液のうち100fKN−メチル‐2‐ピロ
リドン/エチレングリコール(重量比1/1)150f
i添加して十分分散した。(分散fiXl)この液にエ
タノール’i250 f添加してコーテイング液を得た
◎
実施例12
Sin、として5 wt%の珪酸ナトリウム水溶液(5
iO1/Na1O= 5 mol/In01 ) 4
B OfをIOCに保持したまま陽イオン変換樹脂カラ
ム中に空間速度8V=10で通過させて非沈降性シリカ
gをた0この液のうち100fKN−メチル‐2‐ピロ
リド7150fを添加して十分分散した(分散液XI
)以外は実施例11と同一条件でコーテイング液を得た
。Example 11 Sin, 5 wt% sodium silicate aqueous solution (8
107 Na! O = 5 noVmob ) 4 B O
f f It was passed through a cation conversion resin column at a space velocity of 8V=15 while being maintained at 5°C to obtain a non-sedimentable silica solution. Of this liquid, 100f KN-methyl-2-pyrrolidone/ethylene glycol (weight ratio 1/1) 150f
i was added and sufficiently dispersed. (Dispersion fiXl) To this liquid, ethanol'i250f was added to obtain a coating liquid.
iO1/Na1O= 5 mol/In01) 4
While keeping B Of at IOC, it was passed through a cation conversion resin column at a space velocity of 8 V = 10 to remove non-sedimentable silica. 100 f of this solution was added with 7150 f of KN-methyl-2-pyrrolid to sufficiently disperse it. (Dispersion XI
) A coating liquid was obtained under the same conditions as in Example 11 except for the following conditions.
比較例1
S101として5 wtチのthli−酸ナトリウム水
溶液(5ins/ Nano ” 5 mob/ mo
x ) 480 fを5℃に保持したまま陽イオン変換
樹脂カラム中に空間速度8V=10で通過させて非沈降
性シリカ液を得た。この液のうち100 fKN −)
lfpw‐2‐ピロリドン400ft−添加して十分分
散した力ζ分散液は数分でゲル化した。Comparative Example 1 As S101, 5 wt thli-acid sodium aqueous solution (5ins/Nano” 5 mob/mo
x) 480 f was passed through a cation conversion resin column at a space velocity of 8V=10 while being maintained at 5°C to obtain a non-sedimentable silica solution. Of this liquid, 100 fKN -)
A well-dispersed force ζ dispersion with 400 ft of lfpw-2-pyrrolidone gelled in a few minutes.
比較例2
実施例1で得られた非沈降性シリカ液(l)のうち10
01にエタノールを15Of添加し十分分散させてコー
テイング液を得た。Comparative Example 2 10 of the non-precipitating silica liquid (l) obtained in Example 1
15Of ethanol was added to 01 and sufficiently dispersed to obtain a coating liquid.
比較例3
実施例1で得られた非沈降性シリカ液(1)のうち10
00fKN−メチル‐2‐ピロリドン72.5fを添加
して十分分散したのち、ロータリーエバポレーターにて
減圧しながら70℃に加熱して水を947.5 f留出
させたが、分散液は数分でグル化した。Comparative Example 3 10 of the non-precipitating silica liquid (1) obtained in Example 1
After adding 72.5f of 00fKN-methyl-2-pyrrolidone and sufficiently dispersing it, it was heated to 70°C under reduced pressure using a rotary evaporator to distill out 947.5f of water, but the dispersion was dissolved in a few minutes. It became a group.
結果t−*−1に示す〇
塗膜試験
以上、実施例・比較例で得られたコーテイング液を用い
て、下記の基板、塗工法、乾燥・焼成条件下で塗膜を得
た。得られた塗膜は、外観・密着性・膜硬度を評価した
。Results t-*-1 Coating film test Using the coating liquids obtained in the Examples and Comparative Examples above, coating films were obtained using the following substrates, coating methods, and drying/baking conditions. The resulting coating film was evaluated for appearance, adhesion, and film hardness.
■ 基板: PETフィルム、アクリル板、ガラス板、
アルミ板、(形状、103×
■ 塗工法:スピンナー法(2000r、p、m、)、
バーコード法(バーはφOt−便用)
■ 乾燥・焼成8条件: PITフィルム・アクリル板
は110℃@20分。ガラス板
・アルミ板は、110℃・1時間
乾燥した後200℃・1時間焼成
した。■ Substrate: PET film, acrylic board, glass board,
Aluminum plate, (shape, 103× ■ Coating method: spinner method (2000r, p, m,),
Barcode method (bars are for φOt) ■ 8 drying/baking conditions: PIT film/acrylic plate: 110°C @ 20 minutes. The glass plate and aluminum plate were dried at 110°C for 1 hour and then fired at 200°C for 1 hour.
く評価法〉
■ ′外観二目視により膜のまだらやワレの有無を観察
し1ケ所でも発生しているも
のを×、発生してないもの6oとし
たO
■ 透明性:全党線透過率(丁りおよびヘーズ(6)を
ヘーズコンヒ二−ター(スカ試
験機裏)で測定した。Evaluation method〉 ■ ``The presence or absence of mottling or cracks on the membrane was observed with a second glance, and those with even one spot were given a ×, and those with none were given a score of O. ■ Transparency: Total line transmittance ( Dust and haze (6) were measured using a haze condenser (behind the scar tester).
■ 密着性: JI8DO202−71の基盤目テスト
で測定した。■ Adhesion: Measured using the JI8DO202-71 substrate test.
このテストでは塗膜を1−間隔で100個のゴパン目に
カッターナイフで切り、市販の12餌巾のセロテープの
一部をはりつけ残りを塗膜に直角に保ち、瞬間的に引き
はがし、基板に残った切片の数を数えたO
■ 硬度: JIS DO202−71の鉛筆硬度テス
トで両足した。In this test, the paint film was cut into 100 pieces at 1-interval intervals with a utility knife, a part of commercially available cellophane tape with a width of 12 strips was attached, the remaining part was kept perpendicular to the paint film, and the film was instantly peeled off and placed on the board. The number of remaining sections was counted. ■Hardness: Both sides passed the JIS DO202-71 pencil hardness test.
このテストでは塗膜に対して45°の角度に市販の鉛筆
を押き、鉛筆を押して塗膜のきすを目視した。In this test, a commercially available pencil was pressed against the paint film at an angle of 45°, and scratches on the paint film were visually observed by pressing the pencil.
結果1!:表−2に示す。Result 1! : Shown in Table-2.
表 −2 てない。Table-2 Not yet.
本発明に係るコーティング用非沈降性シリカ組成物は、
珪酸アルカリ水溶液から大部分のアルカリ(陽イオン)
t−除去し得られる非沈降性シリカ水溶液に、特定の成
長防止剤を加えて液中の非沈降性シリカを安定化させて
いるので、安価でポットライフが長く(室温で3ケ月以
上)基材の形状に制限されず容易に塗工することができ
る。The non-precipitating silica composition for coating according to the present invention includes:
Most alkalis (cations) from silicate alkali aqueous solution
A specific growth inhibitor is added to the non-sedimenting silica aqueous solution obtained by T-removal to stabilize the non-sedimenting silica in the solution, making it an inexpensive and long pot life (3 months or more at room temperature) base. It can be easily applied regardless of the shape of the material.
また本発明に係るコーティング用組成物を、プラスティ
ック、ガラス、セラミック、金461に塗工することに
より、透明で密倉性の良いノ・−ドコートを有した塗膜
を低温で容易に得ることができる。更に本発明は、無機
バインダー組成物としても用いることができ無機あるい
はM機の金属塩・コロイド粒子・無機繊維・平板状粒子
等を混入して塗膜に新たな機能を付与させることも出来
る。例えば、5nC14,5bC15,InCl3を混
入すれば導電性を備えた塗膜が得られ、酸化チタンのコ
ロイド粒子を混入すれば紫外線反射機能を備えた塗膜が
得られる。Furthermore, by applying the coating composition of the present invention to plastic, glass, ceramic, and gold 461, it is possible to easily obtain a coating film having a transparent node coat with good sealability at low temperatures. can. Furthermore, the present invention can be used as an inorganic binder composition, and new functions can be imparted to the coating film by mixing inorganic or organic metal salts, colloidal particles, inorganic fibers, tabular particles, etc. For example, if 5nC14, 5bC15, or InCl3 is mixed in, a coating film with electrical conductivity can be obtained, and if colloidal particles of titanium oxide are mixed in, a coating film with an ultraviolet reflection function can be obtained.
第1図は非沈降性シリカの好ましい生成条件を示すグラ
フである。FIG. 1 is a graph showing preferred conditions for producing non-precipitating silica.
Claims (7)
した非沈降性シリカ分散液に成長防止剤を加え、これを
希釈剤に分散したことを特徴とするコーティング用非沈
降性シリカ組成物。(1) A non-precipitating silica composition for coating, characterized in that a growth inhibitor is added to a non-precipitating silica dispersion obtained by removing most of the alkali from an aqueous alkali silicate solution, and this is dispersed in a diluent.
2‐ピロリドン、モルホリン、エチレングリコールモノ
エチルエーテルの中の1または2以上のものである特許
請求の範囲第1項記載のコーティング用非沈降性シリカ
組成物。(2) The growth inhibitor is ethylene glycol, N-methyl-
The non-precipitating silica composition for coating according to claim 1, which is one or more of 2-pyrrolidone, morpholine, and ethylene glycol monoethyl ether.
て少なくとも0.5molである特許請求の範囲第1項
又は第2項記載のコーティング用非沈降性シリカ組成物
。(3) The non-precipitating silica composition for coating according to claim 1 or 2, wherein the growth inhibitor is present in an amount of at least 0.5 mol per 1 mol of the non-precipitating silica component.
以上、好ましくは1000以上である特許請求の範囲第
1項又は第2項又は第3項記載のコーテイング用非沈降
性シリカ組成物。(4) Residual alkali is 200% for SiO_2/M_2O
The non-sedimentable silica composition for coating according to claim 1, 2 or 3, which has a molecular weight of at least 1,000, preferably at least 1,000.
接触させて大部分のアルカリを除去した後、成長防止剤
を添加し、次いで大部分の水を除去し、あるいは除去せ
ずに希釈剤を添加して分散させたことを特徴とするコー
ティング用非沈降性シリカ組成物の製造法。(5) After bringing an aqueous silicate aqueous solution into contact with a hydrogen-type cation exchange resin to remove most of the alkali, a growth inhibitor is added, and then most of the water is removed, or a diluent is added without removing it. A method for producing a non-sedimentable silica composition for coating, characterized in that it is added and dispersed.
2−ピロリドン、モルホリン、エチレングリコールモノ
エチルエーテルの中の1または2以上のものである特許
請求の範囲第5項記載の製造法。(6) The growth inhibitor is ethylene glycol, N-methyl-
6. The manufacturing method according to claim 5, wherein one or more of 2-pyrrolidone, morpholine, and ethylene glycol monoethyl ether are used.
〜7重量%であり、イオン交換処理温度が0〜35℃で
ある特許請求の範囲第5項又は第6項記載の製造法。(7) Silica equivalent concentration in aqueous alkali silicate solution is 0.1
7% by weight, and the ion exchange treatment temperature is 0 to 35°C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61187835A JPH0786177B2 (en) | 1986-08-12 | 1986-08-12 | Non-sedimentable silica composition for coating and method for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61187835A JPH0786177B2 (en) | 1986-08-12 | 1986-08-12 | Non-sedimentable silica composition for coating and method for producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6343965A true JPS6343965A (en) | 1988-02-25 |
JPH0786177B2 JPH0786177B2 (en) | 1995-09-20 |
Family
ID=16213067
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61187835A Expired - Lifetime JPH0786177B2 (en) | 1986-08-12 | 1986-08-12 | Non-sedimentable silica composition for coating and method for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0786177B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5607503A (en) * | 1993-09-03 | 1997-03-04 | Refract-A-Gard Pty Limited | Silica-based binder |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4963696A (en) * | 1972-06-21 | 1974-06-20 | ||
JPS51108696A (en) * | 1975-03-20 | 1976-09-27 | Kowa Chem Ind Ltd | ANTEINASHIRIKAZORUNO SEIZOHOHO |
-
1986
- 1986-08-12 JP JP61187835A patent/JPH0786177B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4963696A (en) * | 1972-06-21 | 1974-06-20 | ||
JPS51108696A (en) * | 1975-03-20 | 1976-09-27 | Kowa Chem Ind Ltd | ANTEINASHIRIKAZORUNO SEIZOHOHO |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5607503A (en) * | 1993-09-03 | 1997-03-04 | Refract-A-Gard Pty Limited | Silica-based binder |
Also Published As
Publication number | Publication date |
---|---|
JPH0786177B2 (en) | 1995-09-20 |
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