JPS63143706A - Transparent conducting coat liquid composition and base material having transparent conducting film - Google Patents

Transparent conducting coat liquid composition and base material having transparent conducting film

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Publication number
JPS63143706A
JPS63143706A JP28892486A JP28892486A JPS63143706A JP S63143706 A JPS63143706 A JP S63143706A JP 28892486 A JP28892486 A JP 28892486A JP 28892486 A JP28892486 A JP 28892486A JP S63143706 A JPS63143706 A JP S63143706A
Authority
JP
Japan
Prior art keywords
liquid composition
coating liquid
zro
oxide powder
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28892486A
Other languages
Japanese (ja)
Inventor
護郎 佐藤
通郎 小松
俊晴 平井
三原 恵一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JGC Catalysts and Chemicals Ltd
Original Assignee
Catalysts and Chemicals Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Catalysts and Chemicals Industries Co Ltd filed Critical Catalysts and Chemicals Industries Co Ltd
Priority to JP28892486A priority Critical patent/JPS63143706A/en
Publication of JPS63143706A publication Critical patent/JPS63143706A/en
Pending legal-status Critical Current

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  • Non-Insulated Conductors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、硝子又はプラスチック等の透明基材に対し基
材の持つ透明性を損わずに耐擦傷性・耐久性に優れギラ
ツキのない導電性被膜を低温で形成させる透明導電性塗
布液組成物及びそれを用いて透明導電性被膜を形成した
透明基材に関する。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention provides a method for producing transparent substrates such as glass or plastic that has excellent scratch resistance and durability without impairing the transparency of the substrate and is free from glare. The present invention relates to a transparent conductive coating liquid composition that forms a conductive film at low temperatures, and a transparent substrate on which a transparent conductive film is formed using the same.

〔従来の技術〕[Conventional technology]

硝子又はプラスチックは、透明性に特に優れた基材であ
る九め表示機器の材料、例えばブラウン管(cRT)・
液晶ディスプレイ(LCD)基板・ショーウィンドー等
に多用されている。
Glass or plastic is a base material with particularly excellent transparency, and is used as a material for display devices, such as cathode ray tubes (cRT).
It is widely used in liquid crystal display (LCD) substrates, show windows, etc.

しかし、硝子又はプラスチック自体は絶縁体で表面に静
電気を帯びやすいためゴミ・ホコリが付いて映像を見ず
らくしていた。又LCD等のエレクトロディスプレイは
、その静電気で誤動作を起こす事がめった。硝子又はプ
ラスチックに導電性を持たせ帯電防止を施す方法として
は、■溶剤に導電性粉末とバインダー樹脂とを分散した
導電性塗料を塗布する方法、■塩化錫や錫アルコキシド
等の有機錫をスプレーする方法、■PVD法・OVD法
等の気相法(以上電子導電性)、■界面活性剤・シリコ
ンアルコキシド等をスプレーする方法(イオン導電性)
がある。
However, glass or plastic itself is an insulator and tends to accumulate static electricity on its surface, making it difficult to view images due to the accumulation of dirt and dust. Furthermore, electro-displays such as LCDs rarely malfunction due to static electricity. Methods of making glass or plastic conductive and preventing static electricity include: ■ Applying conductive paint containing conductive powder and binder resin dispersed in a solvent; ■ Spraying organic tin such as tin chloride or tin alkoxide. ■Methods such as vapor phase methods such as PVD and OVD (electronic conductivity) ■Methods of spraying surfactants, silicon alkoxide, etc. (ionic conductivity)
There is.

ところが電子導電性のものは導電性は充分だが、■では
透明性・耐擦傷性・耐溶剤性(バインダー樹脂が溶剤に
侵され塗膜表面が白化する)・耐水性(膜が剥がれる)
が悪く、■・■では透明性は良いが、耐酸性・耐アルカ
リ性・耐水性(以上三項口とも膜が剥げる)が悪く、ま
た被膜を形成する物質自体の屈折率が高くさらに被膜表
面が平滑なためにギラツキ感があって映像が見すらい。
However, electronically conductive materials have sufficient conductivity, but in ■, they have poor transparency, scratch resistance, solvent resistance (the binder resin is attacked by solvents and the coating surface turns white), and water resistance (the film peels off).
For ■ and ■, the transparency is good, but the acid resistance, alkali resistance, and water resistance (the film peels off in all three categories) are poor, and the refractive index of the material itself that forms the film is high, and the film surface is Because it's smooth, there's a glare that makes it difficult to see the image.

さらに■ではパッシベーション膜を併用しないと焼成時
に硝子中のアルカリイオンが膜中に移動して導電性を低
下させ念り、焼成温度がSOO℃以下の場合には、耐ア
ルカリ性が低下して導電性が悪くなる。またガス(液滴
)の悪臭・腐蝕性・爆発性で作業環境に問題があり、■
では耐擦傷性が悪いうえにコストが高く、基材が曲面を
持ったり大面積のものでは大形の装置を必要とした。イ
オン導電性の■は、温度・湿度等の環境により導電性が
変化し、耐擦傷性・耐アルカリ性(膜が溶解する)・耐
水性(剥げる)が悪かった。
Furthermore, if a passivation film is not used in conjunction with ■, the alkali ions in the glass will move into the film during firing and reduce the conductivity.If the firing temperature is below SOO℃, the alkali resistance will decrease and the conductivity will decrease. becomes worse. In addition, there are problems in the working environment due to the odor, corrosiveness, and explosiveness of the gas (droplets).
However, it has poor scratch resistance and is expensive, and requires large equipment if the base material has a curved surface or a large area. The conductivity of the ionic conductive material (■) changed depending on the environment such as temperature and humidity, and its scratch resistance, alkali resistance (the film melted), and water resistance (peeled off) were poor.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

本発明は、上記の様な従来技術に伴う問題点を解決しよ
うとするものであって、硝子又はプラスチック等(以下
硝子等と言う。)の透明基材に対し基材の持つ透明性を
損わずに耐擦傷性及び耐酸性・耐アルカリ性・耐溶剤性
・耐水性(以上4点を以下耐久性と言う)に優れギラツ
キのない導電性被膜を低温で形成する透明導電性塗布液
組成物及びこれを塗布、硬化させて得られる透明導電性
被膜を有する透明基材を提供しようとするものである。
The present invention aims to solve the problems associated with the prior art as described above, and is aimed at reducing the transparency of a transparent base material such as glass or plastic (hereinafter referred to as glass). A transparent conductive coating liquid composition that forms a glare-free conductive film at low temperatures with excellent scratch resistance, acid resistance, alkali resistance, solvent resistance, and water resistance (the above four points are hereinafter referred to as durability). Another object of the present invention is to provide a transparent substrate having a transparent conductive film obtained by applying and curing the same.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、゛ジルコニウムのオキシ酸塩と非沈降性シリ
カ及び導電性酸化物粒子を水と成長防止剤及び希釈剤に
均一分散させて、硝子等の透明基材に対し基材の持つ透
明性を損わずに耐擦傷性・耐久性に優れギラツキのない
導電性被膜を低温で形成する透明導電性塗布液組成物及
びこれを塗布、硬化させて得られる透明導電性被膜を有
する透明基材である。
The present invention improves the transparency of a transparent substrate such as glass by uniformly dispersing zirconium oxyacid, non-precipitating silica, and conductive oxide particles in water, a growth inhibitor, and a diluent. A transparent conductive coating liquid composition that forms a non-glare conductive film with excellent abrasion resistance and durability at low temperatures without impairing the properties, and a transparent substrate having a transparent conductive film obtained by applying and curing the same. It is.

本発明では、ジルコニウムのオキシ酸塩から得られるジ
ルコニアと非沈降性シリカから得られるシリカとの混合
物をマトリックスとし、そのマトリックス中に導電性酸
化物粒子を分散させることで、導電性を持った透明被膜
を形成する透明導電性塗布液組成物である。被膜のギラ
ツキは、その被膜の反射率に依存している。被膜の反射
率はその屈折率及び表面の形状に因って決り、更に屈折
率は被膜を構成する物質及び被膜の密度に依存する。従
って反射率を下げるには、屈折率の小さな物質だけを用
いるか、あるいけ屈折率の大きな物質では屈折率の小さ
な物質と混合するか又は被膜の密度を下げれば良い。次
に被膜表面の形状は、平滑性が高くなると反射率も高く
なるので平滑性を低下させてやれば良いが、平滑性が低
下しすぎると被膜の透明性も同時に低下してしまう。従
って本発明では、被膜のギラツキをなくす念めにジルコ
ニア(屈折率2.2)に7リカ(屈折率L5)を混合し
てマトリックス自体の屈折率を低下させ、さらに被膜を
多孔性にしてその見かけの屈折率を低下させ、その上透
明性を低下させない程度に被膜表面を凹凸にしてギラツ
キをなくしている。
In the present invention, a mixture of zirconia obtained from zirconium oxyacid salt and silica obtained from non-precipitated silica is used as a matrix, and conductive oxide particles are dispersed in the matrix, thereby creating a transparent and conductive material. This is a transparent conductive coating liquid composition that forms a film. The glare of a coating depends on the reflectance of the coating. The reflectance of a coating depends on its refractive index and the shape of its surface, which in turn depends on the material that makes up the coating and the density of the coating. Therefore, in order to lower the reflectance, it is sufficient to use only a substance with a small refractive index, or to mix a substance with a large refractive index with a substance with a small refractive index, or to reduce the density of the coating. Next, regarding the shape of the coating surface, the higher the smoothness, the higher the reflectance, so it is best to reduce the smoothness, but if the smoothness decreases too much, the transparency of the coating will also decrease at the same time. Therefore, in the present invention, in order to eliminate glare from the coating, zirconia (refractive index 2.2) is mixed with 7 Lika (refractive index L5) to lower the refractive index of the matrix itself, and the coating is made porous. The apparent refractive index is lowered, and the coating surface is made uneven to the extent that transparency is not reduced to eliminate glare.

ところが一般に被膜が多孔性になると平滑な被膜に比べ
その表面積が増すため耐久性が悪くなる。耐久性の強い
物質には、ジルコニアがあるが、一般にジルコンアルコ
キシドを用いてジルコニアの被膜を得ている。ところが
、ジルコンアルコキシドは、加水分解速度が速い念めに
その速度を制御することが困難であり、塗布液として透
明基材に塗布した際、湿度の影響を受は易く湿度によっ
て被膜の性状が左右され一定性状を有する被膜を連続的
に得ることは難しい。
However, in general, when a coating becomes porous, its surface area increases compared to a smooth coating, resulting in poor durability. Zirconia is a highly durable substance, and zirconia coatings are generally obtained using zircon alkoxide. However, since zircon alkoxide has a fast hydrolysis rate, it is difficult to control the rate, and when it is applied as a coating liquid to a transparent substrate, it is easily affected by humidity, and the properties of the film can be affected by humidity. It is difficult to continuously obtain a film with constant properties.

又微量の水分で加水分解する九め塗布液を長期保存でき
ない。さらにジルコンアルコキシドは、高価なため工業
製品の原料としてはコスト高となる。本発明ではジルコ
ニウム塩を使用することによって従来の問題点11決し
たものである。
In addition, the coating liquid, which is hydrolyzed by trace amounts of water, cannot be stored for a long period of time. Furthermore, zircon alkoxide is expensive, so it is expensive to use as a raw material for industrial products. In the present invention, 11 conventional problems have been solved by using a zirconium salt.

本発明に係るジルコニウム塩は、オキシ酸塩が用いられ
、特にオキシ塩化ジルコニウム・オキシ硝酸ジルコニウ
ムがよい。
As the zirconium salt according to the present invention, an oxyacid salt is used, and zirconium oxychloride and zirconium oxynitrate are particularly preferred.

ジルコニウムのオキシ酸塩を水溶液の形で、硝子等の基
材に塗布しても前記水溶液がはじかれて被膜ができない
。これ社ジルコニウムのオキシ酸塩の造膜性が低いのと
基板に対する前記水溶液の表面張力が高いために起るが
、まず造膜性を向上させるために非沈降性シリカを加え
念。表面張力を低下させるには、表面張力の低い有機溶
媒を混合するか又は混合しt後に水の一部を系内から脱
水する必要がらる。しかし、通常の有機溶剤では、水が
少なくなるとジルコニウムのオキシ酸塩及び非沈降性シ
リカが不安定になり、分解してゲル化を起こしなり重合
を促進することがある。本発明においては、種々の有機
溶剤のなかから上記の様なジルコニウムのオキシ酸塩及
び非沈降性シリカの分解・ゲル化等を防止し成長防止剤
となり得る有機溶剤について検討した結果、ジルコニウ
ムのオキシ酸塩と非沈降性シリカ及び導電性酸化物粉末
の混合溶液に特定の有機溶剤を混合するか、又は混合し
た様に水の一部を系内から脱水することによって上記の
問題点の解決を見出だした。この様にして調製した塗布
液組成物は、この有機溶剤が成長防止剤として作用する
念め、水が少なくなってもジルコニウムのオキシ酸塩及
び非沈降性シリカのゲル化や重合が起こらず安定であり
、又、同時に造膜性を向上させ塗布液組成物の表面張力
を低下させることができる。更に希釈剤で希釈して基材
に塗布したとき、希釈剤と水及び一部の成長防止剤が蒸
発しても、残りの成長防止剤によりジルコニウムのオキ
シ酸塩及び非沈降性シリカの分解・ゲル化及び重合が抑
えられ、その後残りの成長防止剤が徐々に蒸発していく
時点で、ジルコニウムのオキシ酸塩と非沈降性シリカの
重合が起こって被膜が形成される。造膜性が非沈降性シ
リカによって向上されるのは、おそらく成長防止剤が徐
々に蒸発していく時に非沈降性シリカの持つ水酸基だよ
ってジルコニウムのオキシ酸塩との重合が促進される念
めではないかと思われる。
Even when a zirconium oxyacid salt is applied in the form of an aqueous solution to a base material such as glass, the aqueous solution is repelled and no film is formed. This is caused by the low film-forming properties of the zirconium oxy-acid salt and the high surface tension of the aqueous solution to the substrate, but first, non-precipitating silica was added to improve film-forming properties. In order to lower the surface tension, it is necessary to mix an organic solvent with a low surface tension, or to remove part of the water from the system after mixing. However, with ordinary organic solvents, when the amount of water is reduced, the zirconium oxyacid salt and the non-precipitated silica become unstable, and may decompose, causing gelation and promoting polymerization. In the present invention, as a result of examining the above-mentioned zirconium oxyacid salts and organic solvents that can act as growth inhibitors by preventing the decomposition and gelation of non-precipitated silica, we found that The above problems can be solved by mixing a specific organic solvent with a mixed solution of acid salts, non-precipitating silica, and conductive oxide powder, or by dehydrating some of the water from the system as if mixed. I found a headline. The coating liquid composition prepared in this way is stable even when the amount of water is reduced because the organic solvent acts as a growth inhibitor, without causing gelation or polymerization of the zirconium oxyacid salt and non-precipitating silica. At the same time, it is possible to improve film-forming properties and reduce the surface tension of the coating liquid composition. Furthermore, when diluted with a diluent and applied to a substrate, even if the diluent, water, and some of the growth inhibitor evaporate, the remaining growth inhibitor decomposes and decomposes the zirconium oxyacid and non-precipitating silica. When gelation and polymerization are suppressed and the remaining growth inhibitor gradually evaporates, polymerization of the zirconium oxyalt salt and the non-precipitating silica occurs to form a film. The reason why the film-forming property is improved by non-precipitated silica is probably that when the growth inhibitor gradually evaporates, the hydroxyl groups of non-precipitated silica promote the polymerization with zirconium oxyacid. I think so.

本発明に係る導電性酸化物粉末とは、酸化錫又はsb 
、 p等をドープした酸化錫、あるいは酸化インジウム
又はSn 等をドープした酸化インジウム等従来公知の
物が使用できるが、好ましくは錫化合物又はインジウム
化合物の水溶液を、8〜12のpH条件下に保持して夜
中の化合物を徐々に加水分解することにより、金属酸化
物及び/又は含水酸化物のコロイド粒子を含有するゾル
を生成させ、しかる後このゾルを乾燥、焼成して得られ
る導電性微粉末を平均粒径が(L4μm以下に粉砕した
粉末を使用すると良い。これは本出願人が先に出願した
「導電性微粉末の製造法」(特願昭41−50253号
)の発明によって得られるものである。さらにCRT+
LOD等の表示装置の前面硝子やコピー機のコピー硝子
等の曇価(ヘーズ)の低い高透明を要求される用途には
、前記の導電性微粉末の平均粒径を1101〜α1μm
に粉砕し次粉末を使用すると良い。
The conductive oxide powder according to the present invention is tin oxide or sb
Conventionally known materials such as tin oxide doped with p, etc., indium oxide or indium oxide doped with Sn, etc. can be used, but preferably, an aqueous solution of a tin compound or an indium compound is maintained under a pH condition of 8 to 12. By gradually hydrolyzing the compound during the night, a sol containing colloidal particles of metal oxide and/or hydrous oxide is generated, and then this sol is dried and fired to obtain a conductive fine powder. It is preferable to use a powder that has been pulverized to an average particle size of (L4 μm or less). This can be obtained by the invention of ``Method for producing conductive fine powder'' (Patent Application No. 50253/1989) previously filed by the present applicant. Furthermore, CRT+
For applications that require high transparency with low haze, such as front glass of display devices such as LOD and copy glass of copy machines, the average particle size of the conductive fine powder is 1101 to α1 μm.
It is best to use the powder after pulverizing it.

(101μm未満では被膜を多孔性にできず、11μm
を越えると得られる被膜の曇価(以下ヘーズと言う)が
高くなって基材の透明性を損ねる。ただし平擲粒径が1
1μm以下であってもα1μm を越える粒子が多く含
まれていると被膜のヘーズが高くなって基材の透明性を
低下させるので、好ましくは粉砕粒において全粒子の6
0壬以上が111μm以下の粒径の粒子で占められるも
のが良い。
(If it is less than 101 μm, the film cannot be made porous, and if it is less than 11 μm,
If it exceeds this value, the haze value (hereinafter referred to as haze) of the resulting film increases, impairing the transparency of the substrate. However, the flat grain size is 1
Even if the particle size is 1 μm or less, if the particle size exceeds α1 μm, the haze of the coating will increase and the transparency of the substrate will decrease.
It is preferable that at least 0 mm be occupied by particles having a particle size of 111 μm or less.

なお導電性微粒子の粉砕は、ジルコニウムのオキシ酸塩
等の他の成分との混合前に行っても良く、あるいはジル
コニウムのオキシ酸塩等の他の成分との混合後に行って
も良い。粉砕方法Fi従来公知の粉砕方法によって行う
ことができ、たとえばアトライター、ボールミル、三本
ロール等の機器が利用できる。
The conductive fine particles may be pulverized before being mixed with other components such as zirconium oxyacid, or after being mixed with other components such as zirconium oxyacid. The pulverization method Fi can be carried out by a conventionally known pulverization method, and for example, equipment such as an attritor, a ball mill, and a three-roll mill can be used.

本発明に係る非沈降性シリカとは、珪酸アルカリ水溶液
をイオン交換法あるいは透析法等の方法でアルカリと水
素を交換することによって得られるものであって、2.
 Owt% (810,換算)水溶液を25QOQOG
、1時間で遠心沈降させた際、沈降物が水溶液中の全8
10! に対して30重量部、好ましくは10重量部以
下のものである。好ましくは、本出願人が先に出願した
「コーティング用非沈降性シリカ組成物及びその製造法
」(特開昭61−187835号)の発明によって得ら
れる非沈降性シリカが用いられる。この様にして得られ
る非沈降性シリカは、本来不安定でコロイド粒子が生成
され九シゲル化し易いが、塗布液組成物中の成長防止剤
によって安定化される。さらにこの非沈降性シリカは、
ジルコニウムのオキシ酸塩と混合してもゲル化すること
はなく、又ジルコニウムのオキシ酸塩もゲル化させない
The non-precipitable silica according to the present invention is obtained by exchanging alkali and hydrogen in an aqueous alkali silicate solution by a method such as an ion exchange method or a dialysis method, and 2.
Owt% (810, conversion) aqueous solution 25QOQOG
, when the sediment was centrifuged for 1 hour, the total 8% of the sediment in the aqueous solution was
10! 30 parts by weight, preferably 10 parts by weight or less. Preferably, non-sedimenting silica obtained by the invention of "Non-sedimenting silica composition for coating and method for producing the same" (Japanese Patent Application Laid-open No. 187835/1983) previously filed by the present applicant is used. The non-sedimentable silica obtained in this manner is inherently unstable and tends to form colloidal particles and gelatinize, but is stabilized by the growth inhibitor in the coating composition. Furthermore, this non-precipitating silica
Even when mixed with zirconium oxyacid, it does not gel, nor does zirconium oxyacid.

本発明に係る成長防止剤としては、シルコニ9ムのオキ
シ塩及び非沈降性シリカをゲル化させないもの、あるい
は重合を促進させないもので、好ましくh、n−メチル
−2−ピロリドン、11、Nジメチルホルムアミド、モ
ルホリン、エチレンクリフールモノエチルエーテル、エ
チレンクリフールモノエチルエーテル、エチレンクリコ
ール等、及びそれらの誘導体を一種又は二種以上組合わ
せて使用できる。
The growth inhibitor according to the present invention is one that does not gel or promote polymerization of silconium oxysalt and non-precipitated silica, preferably h,n-methyl-2-pyrrolidone, 11,N dimethyl Formamide, morpholine, ethylene clyful monoethyl ether, ethylene clyful monoethyl ether, ethylene glycol, etc., and their derivatives can be used singly or in combination of two or more types.

本発明に係る希釈剤は、ジルコニウムのオキシ酸塩及び
非沈降性シリカをゲル化させないものであればよく、例
えばメタノール、エタノール、n−プロパツール、i−
7’ロバノール、n−ブタノール、1−ブタノール、t
−ブタノール等ノアルコール、酢酸メチルエステル、酢
酸エチルエステル等の酸性エステル、ジエチルエーテル
等のエーテル、アセトン等の一種又は二種以上組合わせ
て使用できる。
The diluent according to the present invention may be any diluent that does not cause gelation of the zirconium oxyacid salt and non-precipitating silica, such as methanol, ethanol, n-propanol, i-
7' Lovanol, n-butanol, 1-butanol, t
-Alcohols such as butanol, acidic esters such as methyl acetate and ethyl acetate, ethers such as diethyl ether, and acetone can be used alone or in combination of two or more.

Zr01・810!・ 導電性酸化物粉末・水分・成長
防止剤・希釈剤の組成比は、第一に、成長防止剤は、Z
r01  と810! の合計に対するmol比として
1≦(成長防止剤) / (zro、+sto、)≦2
5が良い。好ましくは2以上にする。1未満では塗布液
のポットライフ(使用可能期間)が短くなり、長期保存
ができない。25を越えると塗布液組成物を塗布し、硬
化させていく際に硬化が不均一になって被膜の耐久性が
悪く々る。第二に、水分は、Zr01  との重量比に
おいて、α1≦H2O/ Z r OH≦40 の条件
を満たし喪上で、塗布液組成物の全体重量(以下全体重
量と言う)に対して50 wt4以下が良い。α1未満
ではジルコニウムのオキシ酸塩のゲル化が起り、重量比
が40、あるいは全体重量の50wtnを越えると成長
防止剤の効果が無くなり、透明基材上で塗布液組成物の
はじきが起こるからである。第三に、ZrO2とSin
鵞  と導電性酸化物粉末の合計重量は全体重量に対し
て、Q、1〜20 wt、%が好ましく、塗布液の長期
保存性の上では、α1〜10vrt%が良い、20wt
係会越えると塗布液の安定性が悪くなり容易にゲル化す
るからである。第四に、導電性酸化物粒子とジルコニウ
ムのオキシ酸塩と非沈降性シリカとの割合いは、1≦導
電性酸化物粉末/ (Zr01 +810り≦5 (重
量比)が良い。1未満では被膜の導電性が悪くなつ念り
、又被膜が多孔性にならず、5を越えると被膜の密着性
が低下する。
Zr01・810!・The composition ratio of the conductive oxide powder, water, growth inhibitor, and diluent is as follows: The growth inhibitor is Z
r01 and 810! As a molar ratio to the total of 1≦(growth inhibitor) / (zro, +sto,)≦2
5 is good. Preferably the number is 2 or more. If it is less than 1, the pot life (usable period) of the coating solution will be shortened, and long-term storage will not be possible. If it exceeds 25, the coating composition will not be uniformly cured when it is applied and cured, resulting in poor durability of the coating. Second, water satisfies the condition α1≦H2O/Z r OH≦40 in terms of weight ratio with Zr01, and is 50 wt4 relative to the total weight of the coating liquid composition (hereinafter referred to as the total weight). The following is good. If α is less than 1, gelation of the zirconium oxyacid will occur, and if the weight ratio exceeds 40 or 50 wtn of the total weight, the growth inhibitor will lose its effectiveness and the coating composition will repel on the transparent substrate. be. Third, ZrO2 and Sin
The total weight of the powder and the conductive oxide powder is preferably 1 to 20 wt% of the total weight, and from the viewpoint of long-term storage of the coating solution, it is preferably α1 to 10%, 20 wt.
This is because if the amount is exceeded, the stability of the coating solution deteriorates and it easily gels. Fourth, the ratio of conductive oxide particles, zirconium oxyacid salt, and non-precipitating silica is preferably 1≦conductive oxide powder/(Zr01 +810)≦5 (weight ratio). If the value exceeds 5, the adhesion of the film will decrease because the conductivity of the film will be poor and the film will not become porous.

第五に、非沈降性シリカとジルコニウムのオキシ酸塩の
割合いは、α05≦8101/ZrO當≦1(重量比)
が良い。005未満では被膜の密着性が悪くなり、1を
越えると被膜の耐久性が悪くなるからである。
Fifth, the ratio of non-precipitated silica and zirconium oxyacid is α05≦8101/ZrO≦1 (weight ratio)
is good. If it is less than 0.005, the adhesion of the film will be poor, and if it exceeds 1, the durability of the film will be poor.

希釈剤は、本発明の透明導電性塗布液組成物を塗工法に
合せ九粘度あるいは希望する膜厚となる様に添加ずれば
良い。
The diluent may be added in such a manner that the transparent conductive coating composition of the present invention has a viscosity or a desired film thickness depending on the coating method.

本発明の透明導電性塗布液組成物の製造方法は、特に限
定しないが好ましい方法として、予めジルコニウムのオ
キシ酸塩と非沈降性シリカ及び導電性酸化物粉末が水及
び成長防止剤に分散され九混合液から水の一部を脱水し
、又は脱水せずに希釈剤を添加すればよく、水を脱水す
るには蒸溜法又は限外p過失が使用できる。
The method for producing the transparent conductive coating liquid composition of the present invention is preferably, but not particularly limited to, a method in which zirconium oxyacid, non-precipitating silica, and conductive oxide powder are dispersed in water and a growth inhibitor in advance. A portion of the water may be dehydrated from the mixture, or a diluent may be added without dehydration, and a distillation method or an ultrapolar process can be used to dehydrate the water.

本発明に係る透明導電性塗布液組成物は、硝子等の基材
に従来公知の塗工法、例えばスピンナー法、バーコード
法、ティップ法、スプレー法、ロールフート法、印刷法
等の方法によって塗工され、次いで乾燥すれば耐へ性及
び機械強度の良い被膜が得られるが、さらに耐久性及び
機械強度の高い塗膜が必要な用途には300℃以上で基
材のガラス転移点以下の温度で焼成すれば良い。
The transparent conductive coating liquid composition according to the present invention can be applied to a substrate such as glass by a conventionally known coating method, such as a spinner method, a barcode method, a tip method, a spray method, a roll foot method, a printing method, etc. If the film is coated and then dried, a film with good cracking resistance and mechanical strength can be obtained. However, for applications that require a coating film with even higher durability and mechanical strength, it is necessary to dry the film at a temperature of 300°C or higher and below the glass transition point of the base material. All you have to do is bake it.

この様にして得られる被膜は全光線透過率(Tt)so
%、ヘーズ(H)が10以下なので透明基材の透明性を
損わず、表面抵抗が104〜109Ω/cm ”である
念め帯電防止効果に優れ、又ギラツキが防止されている
。また酸、アルカリに侵されず、水、塩水に耐え密着性
に優れ被膜の変化が無い。
The film obtained in this way has a total light transmittance (Tt) so
%, the haze (H) is 10 or less, so the transparency of the transparent substrate is not impaired, and the surface resistance is 104 to 109 Ω/cm, which has an excellent antistatic effect and prevents glare. It is not attacked by alkalis, is resistant to water and salt water, has excellent adhesion, and does not change its coating.

透明基材としては、硝子板及びCRT等の硝子加工品あ
るいはポリエチレンテレフタレート、ポリカーボネート
、ポリ(メタ)アクリレート等のシート及びその加工品
が適している。なお、有色基材に塗布するときには基材
の色調を変化させずに被膜を形成することができる。
Suitable transparent substrates include processed glass products such as glass plates and CRTs, sheets of polyethylene terephthalate, polycarbonate, poly(meth)acrylate, etc., and processed products thereof. In addition, when coating on a colored base material, a film can be formed without changing the color tone of the base material.

本発明の導電性塗布液組成物を用いて得られた導電性硝
子又はプラスチックは、帯電防止用ディスプレイパネル
、フビー硝子、計器表示パネル、透明デジタイザー、テ
ンライティングターミナル等への適用が可能である。
The conductive glass or plastic obtained using the conductive coating liquid composition of the present invention can be applied to antistatic display panels, plastic glass, instrument display panels, transparent digitizers, ten lighting terminals, and the like.

以下、本発明を実施列により説明するが、本発明はこれ
ら実施列に限定されるものではない。
Hereinafter, the present invention will be explained with reference to examples, but the present invention is not limited to these examples.

実施例1 錫酸カリウム316?と吐酒石5a49とを、水686
tに溶解して原料液を調製した。50℃に加温されて攪
拌下にある1000Fの水に、前記の原料液分硝酸とと
もに12時間かけて添加し、系内にpHia5に保持し
て加水分解させてゾル液を得た。このゾル液からコロイ
ド粒子をデ別し、洗浄して副生塩を除去した後粒子を乾
燥し、空気中350℃で3時間焼成し、さらに空気中6
50cで2時間焼成して微粉末(粉末I)を得た。得ら
れた粉末12000Fと水B o o yltサンドミ
ルに仕込み、1〜2■φのメジアで3時間粉砕した。(
粉砕液11粉砕液中の粒子の平均粒径はLL25μmで
あった。)SiO雪 として5 wt%の珪酸ナトリウ
ム(810鵞/Na、O= 3 mol/mo’l )
 2000 fを15℃に保持したまま水素型イオン交
換樹脂カラム中に空間速度日7=5で通過させた(非沈
降性シリカ液)。この非沈降性シリカ液のうち50fと
粉砕液1のうち50PK、N−メチル−2−ピロリドン
を20tとZr01 に換算して25 wt%オキシ塩
化ジルコニウム水溶液1r、10fとMeOH/EuO
H(重量比1/1)170P1添加し十分混合して透明
導電性塗布液組成物を得た。
Example 1 Potassium stannate 316? and tartar stone 5a49, water 686
A raw material solution was prepared by dissolving it in t. The raw material liquid was added to 1000F water heated to 50°C and stirred over 12 hours together with nitric acid, and the system was maintained at pHia 5 for hydrolysis to obtain a sol solution. Colloidal particles were separated from this sol solution, washed to remove by-product salts, dried, and calcined in air at 350°C for 3 hours.
A fine powder (powder I) was obtained by firing at 50c for 2 hours. The obtained powder 12,000F and water were placed in a B o o yl sand mill and ground for 3 hours using a 1 to 2 mm diameter media. (
The average particle diameter of the particles in the pulverizing liquid 11 was LL 25 μm. ) 5 wt% sodium silicate as SiO snow (810 mol/Na, O = 3 mol/mol'l)
2000 f was passed through a hydrogen form ion exchange resin column at a space velocity of 7=5 while being maintained at 15° C. (non-precipitating silica liquid). 50f of this non-precipitating silica liquid, 50PK of the pulverized liquid 1, 20t of N-methyl-2-pyrrolidone and 25 wt% zirconium oxychloride aqueous solution 1r converted to Zr01, 10f and MeOH/EuO
H (weight ratio 1/1) 170P1 was added and thoroughly mixed to obtain a transparent conductive coating liquid composition.

実施例2 実施例1で得られ念非沈降性シリカ液を502と粉砕液
■を2002に、エチレングリコールモノメチルエーテ
ル10fとZr0B に換算して25 wtlオキシ塩
化ジルコニウム水溶液を4OfとMaOH/ EtO)
I (重量比1/1)1400fを添加し十分分散して
透明導電性塗布液組成物を得た。
Example 2 The non-sedimentable silica solution obtained in Example 1 was mixed with 502, the pulverized liquid (■) was mixed with 2002, ethylene glycol monomethyl ether (10f) and Zr0B (converted into 25 wtl), and the aqueous solution of zirconium oxychloride (4Of and MaOH/EtO)
1400f of I (weight ratio 1/1) was added and sufficiently dispersed to obtain a transparent conductive coating liquid composition.

実施例3 実施例1で得られた粉末!のうち1μm以下に分級した
もの10?と水40fをサンドミルに仕込み、13〜1
飄φのメジアで3時間粉砕し、(粉砕機の液中の粒子の
平均粒径は、18μmであり、11μm以下の粒子の量
は全粒子の65優であった。)N−メチル−2−ピロリ
ドン10fとMeal! / BuOH(重量比t/1
)3802に代えた以外は実施例1と同一条件で透明導
電性塗布液組成物を得た。
Example 3 Powder obtained in Example 1! Of these, 10 are classified to 1 μm or less. and water 40f into a sand mill, 13~1
N-methyl-2 was crushed for 3 hours in a medium with a diameter of φ (the average particle size of the particles in the liquid of the crusher was 18 μm, and the amount of particles of 11 μm or less was more than 65 of the total particles). -Pyrrolidone 10f and Meal! / BuOH (weight ratio t/1
) A transparent conductive coating liquid composition was obtained under the same conditions as in Example 1 except that 3802 was used.

実施例4 硝酸インジウム79.9 fを水686?に溶かした溶
液と、錫酸カリウム12.7 Fを1o wtl水酸化
カリウム水溶液に溶かした溶液を調製した。50℃に加
温されて攪拌下にある1000fの水に、前記の硝酸イ
ンジウム溶液と錫酸カリウム溶液を2時間かけて添加し
、系内のpHを11に保持して加水分解を行いゾル液を
得た。
Example 4 Indium nitrate 79.9 f to water 686? A solution of potassium stannate (12.7 F) dissolved in 10 wtl potassium hydroxide aqueous solution was prepared. The above-mentioned indium nitrate solution and potassium stannate solution are added over 2 hours to 1000 f water heated to 50°C and stirred, and the pH in the system is maintained at 11 to perform hydrolysis and form a sol solution. I got it.

このゾル液からコロイド粒子を戸別し、洗浄して副生塩
を除去した後粒子を乾燥し、空気中350℃で3時間焼
成し、さらに空気中650℃で2時間焼成して微粉末(
粉末■)を得た。
The colloidal particles are separated from this sol solution, washed to remove by-product salts, dried, and calcined in the air at 350°C for 3 hours, and further calcined in the air at 650°C for 2 hours to form a fine powder.
Powder ■) was obtained.

得られ九粉末■10fと水40tを使用した以外は実施
例1と同一条件で透明塗布液組成物を得た。
A transparent coating liquid composition was obtained under the same conditions as in Example 1, except that 10 f of the obtained powder (1) and 40 tons of water were used.

実施例5 実施ffIJ 1で得られた非沈降性シリカ液を50t
と粉砕液lを220fに、N−メチル−2−ピロリドン
110tとZrOHに換算して25Wt憾オキシ塩化ジ
ルコニウム水溶液を1002とMeOH/ ItOH(
重量比1/1)345ft−添加し十分分散して透明導
電性塗布液組成物を得た。
Example 5 50t of non-sedimentable silica liquid obtained in Example ffIJ 1
and 220 f of the pulverizing liquid, 110 t of N-methyl-2-pyrrolidone, and 25 Wt in terms of ZrOH.
(weight ratio 1/1) 345 ft- was added and sufficiently dispersed to obtain a transparent conductive coating liquid composition.

実施例6 実施例1で得られ九非沈降性シリカ液を502と粉砕液
■を1002に、!!、laジメチルホルムアミド15
0tとZrOHに換算して25 wt96オキシ硝酸ジ
ルコニウム水溶液30Fを均−混合後、ロータリーエバ
ポレーターにて減圧しながら80℃に加熱して水を13
52溜出させた。
Example 6 The non-precipitating silica solution obtained in Example 1 was added to 502, and the grinding solution was added to 1002! ! , la dimethylformamide 15
After uniformly mixing 0t and 25wt96 zirconium oxynitrate aqueous solution 30F in terms of ZrOH, the water was heated to 80℃ under reduced pressure using a rotary evaporator to
52 was distilled out.

この液を冷却しさらにMeOH/ BuOIII (重
量比1/1)405Fを添加し十分分散して透明導電性
塗布液組成物を得た。
This liquid was cooled and further MeOH/BuOIII (weight ratio 1/1) 405F was added and sufficiently dispersed to obtain a transparent conductive coating liquid composition.

比較例1 実施例1で得られた非沈降性シリカ液を20口tと粉砕
液Iを125fに、N−メチル−2−ピロリドン50f
とZrO2に換算して25 wtJオキシ塩化ジルコニ
ウム水溶液102を均−混合後、ローターリ−エバポレ
ーターにて減圧しながら80℃に加熱して水1210F
溜出させた。この液を冷却しさらにMeOH/ EuO
H(重量比1/1)10752を添加し十分分散して透
明導電性塗布液組成物を得た。
Comparative Example 1 20 ports of the non-sedimented silica liquid obtained in Example 1, 125 ports of the pulverizing liquid I, and 50 ports of N-methyl-2-pyrrolidone.
After uniformly mixing 25 wtJ zirconium oxychloride aqueous solution 102 in terms of ZrO2, the mixture was heated to 80°C under reduced pressure in a rotary evaporator and water was heated to 1210°C.
I let it drain out. This liquid is cooled and further MeOH/EuO
H (weight ratio 1/1) 10752 was added and sufficiently dispersed to obtain a transparent conductive coating liquid composition.

比較例2 実施例1で得られた非沈降性シリカ液を1002と粉砕
液!を251に、N−メチル−2−ピロリドン40tと
ZrO意 に換算して2 s wtlオキシ塩化ジルコ
ニウム水溶液を2OfとMean/Eu0)!  (重
量比1/1)115tを添加し十分分散して透明導電性
塗布液組成物を得た。
Comparative Example 2 The non-precipitating silica liquid obtained in Example 1 was crushed with 1002! 251, 40t of N-methyl-2-pyrrolidone and 2s wtl aqueous zirconium oxychloride solution in terms of 2Of and Mean/Eu0)! (1/1 weight ratio) was added and sufficiently dispersed to obtain a transparent conductive coating liquid composition.

比較例3 実施例1で得られた非沈降性シリカを100rと粉砕液
11に550fに、1l−1f&−2−ピロリドンaa
tとZrO2に換算して25 wtlオキシ硝酸ジルコ
ニウム水溶液20fを均−混合後、ローターリ−エバポ
−ターにて減圧しながら80Cに加熱して水を25Of
溜出させた。
Comparative Example 3 The non-sedimented silica obtained in Example 1 was added to 100r and the grinding liquid 11 was added to 550f, and 1l-1f & -2-pyrrolidone aa
After homogeneously mixing 20 f of zirconium oxynitrate aqueous solution (25 wt in terms of t and ZrO2), heat the water to 80 C while reducing the pressure using a rotary evaporator to reduce the water to 25 wtl.
I let it drain out.

この液を冷却しさらにMsOH/ EuOH(重量比1
/1)1340fを添加し十分分散して透明導電性塗布
液組成物を得た。
This liquid was cooled and further mixed with MsOH/EuOH (weight ratio 1
/1) 1340f was added and sufficiently dispersed to obtain a transparent conductive coating liquid composition.

比較例4 実施例1で得られ九非沈降性シリカ液を5002と粉砕
液■のうち500fに、N−メチル−2−ピロリドン6
2とZr01 に換算して25wt1lオキシ硝酸ジル
コニウム水溶液100f’i均−混合後、ローターリ−
エバポ−ターにて減圧しながら80℃に加熱して水を9
00?溜出させたところゲル化した。
Comparative Example 4 N-methyl-2-pyrrolidone 6 was added to 5002 of the non-precipitating silica solution obtained in Example 1 and 500f of the grinding solution
After uniformly mixing 100f'i of 25wt1L zirconium oxynitrate aqueous solution in terms of Zr01 and Zr01, rotary
Heat the water to 80℃ while reducing the pressure with an evaporator and add 9.
00? When distilled, it turned into a gel.

比較例5 実施例1で得られた非沈降性シリカ液を1002と粉砕
液Iを100fに、N−メチル−2−ピロリドン25f
とZr01 に換算して5 wt*オキシ塩化ジルコニ
ウム水溶液1100fとMeOH/ BuOH(重量比
1/1)75Fを添加し十分分散して透明導電性塗布液
組成物を得た。
Comparative Example 5 The non-precipitating silica liquid obtained in Example 1 was added to 1002, the pulverized liquid I was added to 100f, and N-methyl-2-pyrrolidone was added to 25f.
1100 f of a 5 wt* zirconium oxychloride aqueous solution and 75 F of MeOH/BuOH (weight ratio 1/1) were added and sufficiently dispersed to obtain a transparent conductive coating liquid composition.

実施例及び比較例の液組成及び組成比を表−1に示した
Table 1 shows the liquid compositions and composition ratios of Examples and Comparative Examples.

実施例1〜5・比較例1〜3,5で得られた塗布液組成
物を硝子板に、実施fI16で得られた透明導電性塗布
液組成物をアクリル板にスピナーを使用し2000 r
、p、m、で塗布した。硝子板は、110℃10分間乾
燥後、300℃30分間焼成し、アクリル板は、110
℃30分間乾燥して被膜を得た。得られ九被膜について
下記の評価を行った。結果を表−2,3に示す。
The coating liquid compositions obtained in Examples 1 to 5 and Comparative Examples 1 to 3 and 5 were applied to a glass plate, and the transparent conductive coating liquid composition obtained in Example fI16 was applied to an acrylic plate using a spinner at 2000 r.
, p, m. The glass plate was dried at 110°C for 10 minutes and then fired at 300°C for 30 minutes, and the acrylic plate was dried at 110°C for 30 minutes.
A film was obtained by drying at ℃ for 30 minutes. The nine films obtained were evaluated as follows. The results are shown in Tables 2 and 3.

■透明性:全光線透過率(TI、)およびヘーズ(H)
をヘーズコンピューター(スガ 試験機製)で測定した。
■Transparency: Total light transmittance (TI, ) and haze (H)
was measured using a haze computer (manufactured by Suga Test Instruments).

■光沢度:J工817105−81の光沢度の測定法に
おいて測定角度60°で光沢度(G) を評価した。
■ Glossiness: Glossiness (G) was evaluated at a measurement angle of 60° according to the glossiness measurement method of J Engineering 817105-81.

■密着性:市販の12−幅のセロテープの一部を被膜に
貼り付け、残シを被膜に対 して直角に保ち、瞬間的に引き剥が し、硝子上の被膜の有無を目視した。
(2) Adhesion: A part of a commercially available 12-width cellophane tape was attached to the film, and while keeping the residue at right angles to the film, it was instantly peeled off and the presence or absence of the film on the glass was visually observed.

■硬 1i : 、Tl8DO202−71の鉛筆硬度
テストで測定した。
■Hardness 1i: Measured by the pencil hardness test of Tl8DO202-71.

0表面抵抗:電極セル(YHP製)で測定した。0 Surface resistance: Measured with an electrode cell (manufactured by YHP).

■耐久性二下記4種類の液に漬けた後、密着性(■と同
じ)評価し、試験前後の光 沢度・表面抵抗(■・■と同じ)を 比較した。
■Durability 2 After soaking in the following four types of liquids, adhesion (same as ■) was evaluated, and glossiness and surface resistance (same as ■ and ■) before and after the test were compared.

1)15wt%アンモニア水に室温で 120時間。1) 15wt% ammonia water at room temperature 120 hours.

2)  10 wt96 NaC!を水溶液に室温で1
20時間。
2) 10 wt96 NaC! into an aqueous solution at room temperature
20 hours.

3)煮沸している水の中に30分間。3) Submerge in boiling water for 30 minutes.

4)sowtsの酢酸水溶液中に室温 で120時間。4) Sowts acetic acid aqueous solution at room temperature. 120 hours.

〔発明の効果〕〔Effect of the invention〕

本発明の塗布液組成物は、ジルコニウムのオキシ酸塩と
導電性酸化物粒子が水と安定剤及び希釈剤に均一分散し
た塗布液組成物なので、硝子等の透明基材に対し基材の
持つ透明性を損わずに耐擦傷性・耐久性に優れギラツキ
のない導電性被膜を低温で形成させる事ができる。また
本発明の塗布液組成物のポットライフ(使用可能期間)
は、室温、暗所中で3ケ月以上である。
The coating liquid composition of the present invention is a coating liquid composition in which a zirconium oxyacid salt and conductive oxide particles are uniformly dispersed in water, a stabilizer, and a diluent. A conductive film with excellent scratch resistance, durability, and no glare can be formed at low temperatures without compromising transparency. In addition, the pot life (usable period) of the coating liquid composition of the present invention
Stored at room temperature in the dark for 3 months or more.

また、表面の平滑性が要求される用途、表面摩擦係数を
小さくしたい場合には、本発明による被膜上にポリエス
テル、アクリル、シリコーン、ポリプロピノン、ポリエ
チレ/、ボリスチVン、エポキシ等の樹脂、あるいはシ
リカ等の無機物の透明保護膜を設ければ良い。
In addition, for applications where surface smoothness is required, or when it is desired to reduce the surface friction coefficient, resins such as polyester, acrylic, silicone, polypropynon, polyethylene, volistine, epoxy, etc. may be used on the coating of the present invention. A transparent protective film of inorganic material such as silica may be provided.

Claims (1)

【特許請求の範囲】 (1)ジルコニウムのオキシ酸塩と非沈降性シリカと導
電性酸化物粉末を水と成長防止剤と希釈剤とからなる分
散媒中に均一分散した事を特徴とする透明導電性塗布液
組成物。 (2)成長防止剤として、N−メチル−2−ピロリドン
、N,Nジメチルホルムアミド、モルホリン、エチレン
グリコールモノメチルエーテル、エチレングリコールモ
ノエチルエーテル、エチレングリコール及びそれらの誘
導体の中の一種又は二種以上組合せて使用する事を特徴
とする特許請求の範囲第一項記載の透明導電性塗布液組
成物。 (3)錫化合物又はインジウム化合物の水溶液を、8〜
12のpH条件下に保持して液中の化合物を徐々に加水
分解することにより、金属酸化物及び/又は含水酸化物
のコロイド粒子を含有するゾルを生成させ、その後この
ゾルを乾燥、焼成して得た生成物を粉砕した微粉末を導
電性酸化物粉末として用いることを特徴とする特許請求
の範囲第一項又は第二項記載の透明導電性塗布液組成物
。 (4)ジルコニウムのオキシ酸塩をZrO_2に換算し
、非沈降性シリカをSiO_2に換算し、導電性酸化物
粉末、水分、成長防止剤及び希釈剤との組成比を、 1≦(成長防止剤)/(ZrO_2+SiO_2)≦2
5(mol比) 0.1≦H_2O/ZrO_2≦40(重量比) H_2O/(塗布液組成物の全体重量)≦0.5(重量
比) 0.001≦(ZrO_2+SiO_2+導電性酸化物
粉末)/(塗布液組成物の全体重量)≦0.2(重量比
) 1≦(導電性酸化物粉末)/(ZrO_2+SiO_2
)≦5(重量比) 0.05≦SiO_2/ZrO_2≦1(重量比) とする事を特徴とする特許請求の範囲第一項又は第二項
又は第三項に記載の透明導電性塗布液組成物。 (5)ジルコニウムのオキシ酸塩と非沈降性シリカと導
電性酸化物粉末を水と成長防止剤と希釈剤とからなる分
散媒中に均一に分散した塗布液を基材に塗布後、硬化さ
せてなる透明導電性被膜を有する基材。
[Claims] (1) A transparent product characterized by uniformly dispersing zirconium oxyacid, non-precipitating silica, and conductive oxide powder in a dispersion medium consisting of water, a growth inhibitor, and a diluent. Conductive coating liquid composition. (2) As a growth inhibitor, one or a combination of two or more of N-methyl-2-pyrrolidone, N,N dimethylformamide, morpholine, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol, and their derivatives. The transparent conductive coating liquid composition according to claim 1, which is used in the present invention. (3) Add an aqueous solution of a tin compound or an indium compound to 8 to
A sol containing colloidal particles of metal oxides and/or hydrous oxides is produced by gradually hydrolyzing the compounds in the solution while maintaining the solution at a pH of 12, and then this sol is dried and calcined. The transparent conductive coating liquid composition according to claim 1 or 2, characterized in that a fine powder obtained by pulverizing the product obtained by pulverizing the product is used as the conductive oxide powder. (4) Convert zirconium oxyacid to ZrO_2, convert non-precipitated silica to SiO_2, and set the composition ratio of conductive oxide powder, moisture, growth inhibitor, and diluent to 1≦(growth inhibitor )/(ZrO_2+SiO_2)≦2
5 (mol ratio) 0.1≦H_2O/ZrO_2≦40 (weight ratio) H_2O/(total weight of coating liquid composition)≦0.5 (weight ratio) 0.001≦(ZrO_2+SiO_2+conductive oxide powder)/ (Total weight of coating liquid composition)≦0.2 (weight ratio) 1≦(conductive oxide powder)/(ZrO_2+SiO_2
)≦5 (weight ratio) 0.05≦SiO_2/ZrO_2≦1 (weight ratio) Composition. (5) A coating solution in which zirconium oxysalt, non-precipitating silica, and conductive oxide powder are uniformly dispersed in a dispersion medium consisting of water, a growth inhibitor, and a diluent is applied to the substrate and then cured. A base material with a transparent conductive coating.
JP28892486A 1986-12-05 1986-12-05 Transparent conducting coat liquid composition and base material having transparent conducting film Pending JPS63143706A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28892486A JPS63143706A (en) 1986-12-05 1986-12-05 Transparent conducting coat liquid composition and base material having transparent conducting film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28892486A JPS63143706A (en) 1986-12-05 1986-12-05 Transparent conducting coat liquid composition and base material having transparent conducting film

Publications (1)

Publication Number Publication Date
JPS63143706A true JPS63143706A (en) 1988-06-16

Family

ID=17736561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28892486A Pending JPS63143706A (en) 1986-12-05 1986-12-05 Transparent conducting coat liquid composition and base material having transparent conducting film

Country Status (1)

Country Link
JP (1) JPS63143706A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06179839A (en) * 1992-03-27 1994-06-28 Shin Etsu Polymer Co Ltd Conductive composition for coating plastics
CN1112415C (en) * 1995-05-10 2003-06-25 三星电管株式会社 Transparent electric-conductive coating composition
JP2009096842A (en) * 2007-10-15 2009-05-07 Konica Minolta Holdings Inc Coating liquid for forming semiconductor membrane, semiconductor membrane using the same, and dye-sensitized solar cell

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06179839A (en) * 1992-03-27 1994-06-28 Shin Etsu Polymer Co Ltd Conductive composition for coating plastics
JPH06104794B2 (en) * 1992-03-27 1994-12-21 信越ポリマー株式会社 Conductive composition for plastic coating
CN1112415C (en) * 1995-05-10 2003-06-25 三星电管株式会社 Transparent electric-conductive coating composition
JP2009096842A (en) * 2007-10-15 2009-05-07 Konica Minolta Holdings Inc Coating liquid for forming semiconductor membrane, semiconductor membrane using the same, and dye-sensitized solar cell

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