JPS63151843A - Sample holder for x-ray analysis - Google Patents

Abstract

PURPOSE:To restrict the X-ray irradiation range, by arranging an X-ray non- reflection plate having a hole or groove to be used as a sample holder in contact with the surface of a sample to irradiate X rays through the hole or the groove. CONSTITUTION:An X-ray non-reflection plate 1, for example, a BT cut crystal plate and a silicon plate cut to parallel the (510) plane is used as mask substrate of a sample holder for X-ray analysis. With a small regulation hole 2 or groove formed therein, the X-ray non-reflection plate 1 is mounted on a holder body 3, which is arranged on the front of a sample S. Then, X rays B are irradiated to cover only the analysis range of the sample S through the regulation hole 2. Thus, the use of the non-reflection plate as the mask substrate enables X-ray diffraction analysis of a fine part or facilitates 1-D and 2-D scanning with the movement of the mask substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION A. Field of Industrial Application The present invention relates to a sample holder for X-ray analysis that limits the analysis area (X-ray irradiation surface) of a sample surface in X-ray analysis.

Conventional technology When a small, limited portion of a sample surface is irradiated with X-rays and analyzed by X-ray diffraction, conventional methods have been to use a slit in a cylindrical body that blocks the X-rays, or to use two A method has been used to limit the spread of the X-ray beam that irradiates the sample surface by using an appropriate slit system such as a slit with opposing plates. Conical cylindrical pinhole slit in X-ray diffraction method,
This includes a Schulz slit in which two plates facing each other with a slope are used in a vibrating sample stage, a pole figure measuring device, etc. as shown in FIG. These slit systems complicate the structure of the device, and in pole figure measurement devices,
There have been problems such as the measurable X-ray detection angle range α being limited due to the geometrical arrangement of the Schulz slit.

C1 Problems to be Solved by the Invention The present invention aims to limit the range of X-ray irradiation to a sample with a simple structure.

21 Means for Solving Problems As the mask substrate of the sample holder for X-ray analysis, an X-ray non-reflective plate such as a thin plate of crystal or silicon single crystal cut in a specific direction is used, and the plate has holes or A groove was provided, and this plate was placed in contact with the sample surface, so that the sample surface was irradiated with X-rays through the hole or groove.

It is known that BT-cut quartz crystal plates and silicon plates cut parallel to the (510) plane are non-reflective plates that do not reflect X-rays, and correspond to the irradiation range of the sample surface. By placing the above-mentioned non-reflection plate with an rM port on the front of the sample as an X-ray irradiation regulating plate, it is possible to irradiate X-rays only to a small part of the sample surface that is desired to be analyzed, and also prevent the surrounding non-reflection The X-rays irradiated to the plate are absorbed by the non-reflective plate,
Since no radiation is emitted from the plate, the detector can only detect radiation from the part of the sample that has been irradiated with X-rays. Therefore, various slit systems conventionally used for analysis of minute parts are no longer necessary.

The X-ray irradiation regulating plate using the above-mentioned non-reflection plate can be effective just by placing it in front of the sample, so there is no need for troublesome work such as aligning the optical axis as with conventional slit systems, and there is no need for a complicated structure. lost.

To, Example An embodiment of the present invention is shown in FIGS. 1 and 2. FIG.

In Figures 1 and 2, S is the sample, B is the X-ray, and 1 and 1' are the X-rays of a BT cut crystal plate or a silicon single crystal plate cut parallel to the (510) plane. This is a mask substrate made of a non-reflective plate that does not reflect light. The mask substrate 1 shown in FIG. 1 is attached to the front surface of a sample holder body 3 for microscopic part 'X&I analysis, and a regulation hole 2 is provided in the center of the mask substrate 1 as shown in FIG. 1A or B. ing. When a sample is loaded into this sample holder, the mask substrate 1 of the non-reflection plate is positioned in front of the sample S as shown in Figure 1C, making it possible to irradiate only the analysis range of the sample S with X-rays. It becomes possible to use 0X normally using a mask like this
If the ray irradiation range is restricted, the X-ray diffraction pattern of the mask itself will also be detected, but since the mask substrate 1 used in the present invention is a non-reflective plate, it does not reflect the irradiated X-rays.

Therefore, since no diffraction pattern of the mask is generated, only the radiation emitted from the sample S is detected by the detector.
Analysis of measurement results becomes easier.

Fig. 2 shows a mask substrate 1° made of a non-reflection plate made for a sample holder for pole figure measurement.
It has been established. In this case, the tilt angle α of the sample is
can be made larger by cutting a 1° groove on the mask substrate.

According to the present invention, it is only necessary to arrange the opening of the mask substrate made of an X-ray non-reflection plate at the analysis position of the sample, so a slit optical axis alignment mechanism is not required, and a standard X-ray diffraction apparatus can be used. This enabled X-ray diffraction analysis of microscopic areas. Even in pole figure measurements, there is no longer a need for something like a Schulz slit, and it is sufficient to cover the non-measuring area with a thin non-reflective plate, making it possible to increase the measurable X-ray extraction angle α. Furthermore, it has become possible to scan the sample surface one-dimensionally or two-dimensionally by simply moving the mask substrate.

[Brief explanation of the drawing]

Figure 1 shows an embodiment of the present invention, where A is a plan view and B is a plan view.
is a side sectional view, FIG. 2 is a side sectional view of an example of use, FIG. 3 is a side sectional view of the conventional example, and FIG. 4 is a side sectional view of the conventional example. S...sample, B...X-ray, 1...mask substrate, 2
...Regulation hole, 3...Sample holder body.

Claims (1)

[Claims] Using an X-ray non-reflective plate such as a thin plate of quartz or single crystal silicon cut in a specific direction, provide a hole or groove in the plate, place this plate in contact with the sample surface, and pass the plate through the hole or groove. A sample holder for X-ray analysis, characterized in that the sample surface is irradiated with X-rays.