JPS63151452U - - Google Patents

Info

Publication number
JPS63151452U
JPS63151452U JP4447687U JP4447687U JPS63151452U JP S63151452 U JPS63151452 U JP S63151452U JP 4447687 U JP4447687 U JP 4447687U JP 4447687 U JP4447687 U JP 4447687U JP S63151452 U JPS63151452 U JP S63151452U
Authority
JP
Japan
Prior art keywords
wafer carrier
wafer
drive shaft
vacuum chamber
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4447687U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4447687U priority Critical patent/JPS63151452U/ja
Publication of JPS63151452U publication Critical patent/JPS63151452U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の一実施例を示す成膜装置の部
分断面図であり、第２図はその要部の拡大断面図
である。 １……真空室、２……反応室、５……ウエハキ
ヤリア、６……ウエハ搬送機構、８……ウエハホ
ルダ、９……ウエハ、１０……昇降台、１１……
駆動軸、１２……真空シール、１４……駆動機構
、１５……ナツト、１６……ボールネジ、１７…
…ベース、２０……ステツピングモータ。 FIG. 1 is a partial sectional view of a film forming apparatus showing an embodiment of the present invention, and FIG. 2 is an enlarged sectional view of the main parts thereof. DESCRIPTION OF SYMBOLS 1...Vacuum chamber, 2...Reaction chamber, 5...Wafer carrier, 6...Wafer transfer mechanism, 8...Wafer holder, 9...Wafer, 10...Elevating table, 11...
Drive shaft, 12... Vacuum seal, 14... Drive mechanism, 15... Nut, 16... Ball screw, 17...
...Base, 20...Stepping motor.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空室内に、ウエハを水平姿勢で多段に載置す
るウエハキヤリアを昇降自在に配置し、このウエ
ハキヤリアを昇降する駆動軸を真空シールを介し
外部に延出し、該駆動軸の駆動機構を大気中に設
置するとともに、真空室内における前記ウエハキ
ヤリアの初期位置を、最下段のウエハから出入れ
可能な上昇位置に設定したことを特徴とするウエ
ハキヤリアの昇降装置。 A wafer carrier on which wafers are placed horizontally in multiple stages is arranged in a vacuum chamber so that it can be raised and lowered freely, and a drive shaft for raising and lowering this wafer carrier is extended outside via a vacuum seal, and the drive mechanism of the drive shaft is exposed to the atmosphere. A lifting device for a wafer carrier, characterized in that the initial position of the wafer carrier in the vacuum chamber is set to an elevated position where the wafer at the lowest stage can be taken in and out.
JP4447687U 1987-03-25 1987-03-25 Pending JPS63151452U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4447687U JPS63151452U (en) 1987-03-25 1987-03-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4447687U JPS63151452U (en) 1987-03-25 1987-03-25

Publications (1)

Publication Number Publication Date
JPS63151452U true JPS63151452U (en) 1988-10-05

Family

ID=30862325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4447687U Pending JPS63151452U (en) 1987-03-25 1987-03-25

Country Status (1)

Country Link
JP (1) JPS63151452U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001262375A (en) * 2000-03-22 2001-09-26 Shibaura Mechatronics Corp Dry etching apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62259932A (en) * 1986-05-06 1987-11-12 Japan Steel Works Ltd:The In-out carrying device for wafer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62259932A (en) * 1986-05-06 1987-11-12 Japan Steel Works Ltd:The In-out carrying device for wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001262375A (en) * 2000-03-22 2001-09-26 Shibaura Mechatronics Corp Dry etching apparatus

Similar Documents

Publication Publication Date Title
JP2001291755A (en) Method for improved handling of substrate and substrate handling device
JPS63151452U (en)
JPS6130236U (en) plasma processing equipment
JPH0247044U (en)
JPH0258334U (en)
JPH11265927A (en) Push-up device for chip
JPS61190517U (en)
JPS61226939A (en) Wafer transfer machine
JPS62114438U (en)
JPS60169841U (en) Automatic supply and storage device for semiconductor wafers
JPS6278752U (en)
JPS6214434A (en) Wafer chuck
JPH0736446U (en) Wafer lifetime measuring device
JP2870794B2 (en) Vertical heat treatment furnace equipment
JPS63154665U (en)
JPS63145329U (en)
JPH01173940U (en)
JPH02139947A (en) Substrate loading/carrying device to heat processing furnace
JPS6395241U (en)
JPS63145328U (en)
JPS6252929U (en)
JPS59151439U (en) Wafer plasma etching equipment
JPH06176407A (en) Film forming device
JPS60174249U (en) Semiconductor wafer setting equipment
JPH09115847A (en) Heat treatment device for semiconductor wafer