JPS6314431A - Automatic resetting system of continuous automatic equipment - Google Patents

Automatic resetting system of continuous automatic equipment

Info

Publication number
JPS6314431A
JPS6314431A JP61157835A JP15783586A JPS6314431A JP S6314431 A JPS6314431 A JP S6314431A JP 61157835 A JP61157835 A JP 61157835A JP 15783586 A JP15783586 A JP 15783586A JP S6314431 A JPS6314431 A JP S6314431A
Authority
JP
Japan
Prior art keywords
error
picture drawing
resetting
per
continuous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61157835A
Other languages
Japanese (ja)
Inventor
Ikuo Takada
高田 郁夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP61157835A priority Critical patent/JPS6314431A/en
Publication of JPS6314431A publication Critical patent/JPS6314431A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To perform reliable unmanned continuous operation by a method wherein, when an error is commited during the continuous operation of a step and repeat type electron beam lithography equipment, etc., resetting or disconnecting process is automatically performed conforming to the resetting procedures per error kind specified in terms of the seriousness of error without waiting for the command of an operator. CONSTITUTION:Data for resetting to errors in picture drawing process are stored and then pictures are drawn within the beam deflection range and after normally finishing the process, error count areas per kind are cleared. All chips are picture-drawn in a wafer by repeating the picture drawing process one after another until the process is finished. If a picture drawing error is committed the per kind error is picked up to renew the error frequency per kind and the total error frequency. Whenever the control frequency of 114 per kind or the limit value of total error frequency is exceeded, the continuous picture drawing process is finished, otherwise the picture drawing unit is renewed conforming to the resetting procedures per kind. Furthermore, when a serious error is commited, the picture drawing process is finished.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、連続自動装置における自動復帰方式に係り、
例えばステップアンドリピート方式の電子線描画装置等
のエラーの重要度により、復帰処理の異なる装置に好適
な自動復帰方式に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an automatic return method in a continuous automatic device,
The present invention relates to an automatic return method suitable for a step-and-repeat type electron beam lithography apparatus, for example, which requires different return processing depending on the severity of an error.

〔従来の技術〕[Conventional technology]

従来のステップアンドリピート方式の電子線描画装置で
は、rHL600形日立電子線描画装置取扱説明書(E
B制制御ラフ8編」に記載のようにエラーが発生した場
合、オペレータの指示により、次の3つの処理、すなわ
ち■エラー発生場所から再実行、■エラーの次の処理か
ら実行、■処理終了のいずれかをエラーの重要度により
選択でき、軽度のエラーの場合、処理を継続できた。
Conventional step-and-repeat type electron beam lithography equipment uses rHL600 Hitachi electron beam lithography equipment instruction manual (E
When an error occurs as described in "B Control Rough Volume 8," the following three processes are performed according to the operator's instructions: ■ Re-execute from the location where the error occurred, ■ Execute from the process following the error, and ■ End the process. One of these could be selected depending on the severity of the error, and in the case of a minor error, processing could be continued.

しかし、これでは装置を無人運転する場合、軽度のエラ
ーであっても、オペレータが気づくまで処理が中断して
しまい、稼動率が低下するばかりでなくウェハーまたは
マスク状態も悪化させてしまうという点で問題があった
However, when the equipment is operated unattended, even a minor error causes processing to be interrupted until the operator notices it, which not only reduces the operating rate but also deteriorates the condition of the wafer or mask. There was a problem.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来技術は、エラー発生時オペレータの指示待とな
り、無人連続運転に対する配慮がされていないという問
題があった。
The above-mentioned conventional technology has a problem in that when an error occurs, the system waits for instructions from the operator, and no consideration is given to continuous unmanned operation.

本発明は目的は、連続運転時のエラー発生時にオペレー
タの指示を待つことなく、あらかじめエラーの重要度に
よって設定されたエラー種別毎のエラー復帰手順に従っ
て自動的に復帰、中断処理を実行すること、また、エラ
ーが頻発する場合には、根本的な問題が存在すると判断
することにより、軽度のエラーの場合には自動的に処理
を継続し、そうでない場合は処理を中断し、信頼性のあ
る無人連続運転を実現することにある。
An object of the present invention is to automatically perform recovery and interruption processing according to an error recovery procedure for each error type preset according to the importance of the error, without waiting for instructions from an operator when an error occurs during continuous operation. In addition, if errors occur frequently, by determining that there is a fundamental problem, the system automatically continues processing in the case of minor errors, and suspends processing in other cases. The goal is to realize continuous unmanned operation.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は、エラー種別毎にエラー復帰手順を記録媒体
に設定し、エラー発生毎に該エラーの復帰手順を記録媒
体より取り出し、かつ該エラーに対するエラー発生回数
及びトータルエラー発生回数を記録媒体に蓄積し、復帰
処理が正常に動作したときのみ直前エラー種別に対する
エラー発生回数をクリアし、該エラー種別に対する連続
エラー回数が設定値をこえたとき、またはトータルエラ
ー回数が設定値をこえたとき、処理を中断することによ
り、達成される。
The above purpose is to set error recovery procedures for each error type on a recording medium, retrieve the error recovery procedure from the recording medium every time an error occurs, and store the number of error occurrences and the total number of error occurrences for the error on the recording medium. Then, the number of error occurrences for the previous error type is cleared only when the recovery process operates normally, and when the number of consecutive errors for the error type exceeds the set value, or the total number of errors exceeds the set value, the process is This is achieved by interrupting the

〔実施例〕〔Example〕

以下、本発明の図に従って詳細に説明する。 Hereinafter, the present invention will be explained in detail according to the drawings.

第1図は、本発明の処理手順の1実施例を示すフローチ
ャートであり、第2図は本発明に係るステップアンドリ
ピート方式の電子線描画装置のブロック図である。
FIG. 1 is a flowchart showing one embodiment of the processing procedure of the present invention, and FIG. 2 is a block diagram of a step-and-repeat type electron beam lithography apparatus according to the present invention.

第2図において、1は大容量Discであり、ウェハー
上へのLSiパターンの配置情報、描画条件及びLSi
パターンデータなどが格納されている。2はCPuであ
り、上記1内の情報に従って描画制御をする。3はデー
タ制御系であり、1゜2を経た情報からビーム偏向量を
決定する。4はステージ制御系であり、1.2を経た情
報から7のステージ位置を決定する。5は電子ビームを
発生する電子銃である。6は鏡体でありビームを偏向さ
せる。7はステージであり、ビームの偏向でカバーでき
ない範囲についてウェハー位置を移動させる。8はウニ
バーであり、9はウェハー上のチップ配置状態である。
In FIG. 2, numeral 1 is a large-capacity Disc, which contains information on the arrangement of LSi patterns on the wafer, drawing conditions, and LSi
Pattern data etc. are stored. 2 is a CPU, which controls drawing according to the information in 1 above. 3 is a data control system, which determines the amount of beam deflection from the information passed through 1°2. 4 is a stage control system, which determines the stage position 7 from the information passed through 1.2. 5 is an electron gun that generates an electron beam. 6 is a mirror body that deflects the beam. A stage 7 moves the wafer position over a range that cannot be covered by beam deflection. 8 is a univer, and 9 is a chip arrangement state on a wafer.

ここで、1,2を経た情報は、3によるビームの偏向と
4によるステージ移動により8のウェハー上に9のチッ
プとして描画される。
Here, the information that has passed through 1 and 2 is written as a chip 9 on a wafer 8 by beam deflection 3 and stage movement 4.

次に第1図のフローチャートについて説明する。Next, the flowchart shown in FIG. 1 will be explained.

連続描画がスタートした(l OO)直後、エラーカウ
ント用エリアをクリア(101)L、ビーム偏向範囲の
データを単位としてステージ移動及び描画準備をする(
102)、また描画処理中のエラーに対して復帰するた
めのデータを格納(103)した後ビーム偏向範囲の描
画(104)を実行する。ここで正常終了すれば(10
5)、種別毎のエラーカウントエリアをクリア(106
)、ただし前回にエラーが発生していなければ、本処理
は無効となる。1つの描画単位が終了すると次の描画単
位の処理へ移る(107)、これを全ての描画単位が終
了するまでくり返しく108)、ウェハー上に全てのチ
ップが描画され終了する(109)。
Immediately after continuous writing starts (lOO), clear the error count area (101)L, move the stage and prepare for writing using beam deflection range data as a unit (
102), and after storing data for recovering from an error during the drawing process (103), drawing of the beam deflection range is executed (104). If it ends normally here (10
5) Clear the error count area for each type (106
), but if no error occurred last time, this process will be invalid. When one drawing unit is completed, processing moves to the next drawing unit (107), and this is repeated until all drawing units are completed (108), and all chips are drawn on the wafer and the process ends (109).

この間に描画エラーが発生すると(105)。If a drawing error occurs during this time (105).

エラー表示をする(110)と共にエラー種別の取り出
しをしく111)、そのエラー種別に対するエラー回数
カウントを更新(112)、同時にトータルエラー回数
カウントも更新する(113)。
The error is displayed (110) and the error type is retrieved (111), the error count for that error type is updated (112), and the total error count is updated at the same time (113).

エラー種別毎の制御回数をオーバーした場合(114)
又はトータルエラー回数制限値をオーバーした場合は連
続描画を終了させる(109)、そうでない場合は、エ
ラー種別毎の復帰手順に従う。この例では、再試行であ
れば描画単位の更新は行なわず、次の処理へ移動するの
であれば描画単位の更新をする。また重大エラーの場合
終了処理へ移行する(117)、次の描面単位で正常終
了すれば。
When the control count for each error type is exceeded (114)
Alternatively, if the total number of errors exceeds the limit value, continuous drawing is terminated (109), otherwise, the recovery procedure for each error type is followed. In this example, if the process is to be retried, the drawing unit is not updated, but if the process is to proceed to the next process, the drawing unit is updated. In addition, if there is a serious error, the process moves to termination processing (117), and if the process terminates normally in the next drawing unit.

前回のエラー種別に対するエラーカウントはクリアされ
る(106)ため、エラーリカバリーが成功すれば、エ
ラー種別毎のカウンターが蓄積されることはない。
Since the error count for the previous error type is cleared (106), if error recovery is successful, the counter for each error type will not be accumulated.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、エラー発生種別毎にエラーの重要度を
自動的に判断して連続処理で可能となり。
According to the present invention, it is possible to automatically determine the importance of errors for each type of error occurrence and perform continuous processing.

また軽度のエラーでも連続的に発生した場合や、エラー
回数がトータルとして多い場合は、根本的なエラーとし
て処理を中断することができ、無人自動運転に対して、
信頼性のある連続運転に効果がある。
In addition, if even minor errors occur continuously or if the number of errors is large in total, processing can be interrupted as a fundamental error, and this can be used to improve unmanned autonomous driving.
Effective for reliable continuous operation.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の処理手順の1実施例を示すフローチ
ャート、第2図は、ステップアンドリピート方式の電子
線描画装置のブロック図。 1・・・大容量Disc、2・・・CPu、3・・・デ
ータ制御系、4・・・ステージ制御系、5・・・電子銃
、6・・・鏡体、7・・・ステージ、8・・・ウェハー
、9・・・チップ。
FIG. 1 is a flowchart showing one embodiment of the processing procedure of the present invention, and FIG. 2 is a block diagram of a step-and-repeat type electron beam lithography apparatus. DESCRIPTION OF SYMBOLS 1... Large capacity Disc, 2... CPU, 3... Data control system, 4... Stage control system, 5... Electron gun, 6... Mirror body, 7... Stage, 8...Wafer, 9...Chip.

Claims (1)

【特許請求の範囲】[Claims] 1、ステップアンドリピート方式の電子線描画装置等の
連続自動装置において、エラー種別毎に割り当てられた
復帰手段に関する情報を保持する記録媒体と、エラー種
別毎のエラー発生回数及びトータルエラー発生回数を蓄
積する記録媒体を設け、該エラー種別のエラー発生回数
が該エラーの種別の許容エラー回数をこえるかまたはト
ータルエラー回数が一定値をこえるまで、該エラーの復
帰手順に従つて自動復帰し、上記いずれかのエラー発生
回数をこえるとき、自動復帰を中止することを特徴とす
る連続自動装置における自動復帰方式。
1. In continuous automatic equipment such as step-and-repeat electron beam lithography equipment, a recording medium that holds information regarding the recovery means assigned to each error type, and the number of error occurrences for each error type and the total number of error occurrences are stored. A recording medium is provided to automatically recover according to the recovery procedure for the error until the number of error occurrences of the error type exceeds the allowable number of errors for the error type or the total number of errors exceeds a certain value. An automatic recovery method in a continuous automatic device, characterized in that automatic recovery is canceled when the number of occurrences of an error is exceeded.
JP61157835A 1986-07-07 1986-07-07 Automatic resetting system of continuous automatic equipment Pending JPS6314431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61157835A JPS6314431A (en) 1986-07-07 1986-07-07 Automatic resetting system of continuous automatic equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61157835A JPS6314431A (en) 1986-07-07 1986-07-07 Automatic resetting system of continuous automatic equipment

Publications (1)

Publication Number Publication Date
JPS6314431A true JPS6314431A (en) 1988-01-21

Family

ID=15658374

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61157835A Pending JPS6314431A (en) 1986-07-07 1986-07-07 Automatic resetting system of continuous automatic equipment

Country Status (1)

Country Link
JP (1) JPS6314431A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02230711A (en) * 1989-03-03 1990-09-13 Canon Inc Semiconductor exposing apparatus
JPH02270317A (en) * 1989-04-12 1990-11-05 Canon Inc Semiconductor exposing device
JP2001332471A (en) * 2000-05-19 2001-11-30 Canon Inc Aligner
JP2009016439A (en) * 2007-07-02 2009-01-22 Jeol Ltd Method and apparatus for correcting proximity effect correction rate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02230711A (en) * 1989-03-03 1990-09-13 Canon Inc Semiconductor exposing apparatus
JPH02270317A (en) * 1989-04-12 1990-11-05 Canon Inc Semiconductor exposing device
JP2001332471A (en) * 2000-05-19 2001-11-30 Canon Inc Aligner
JP4585649B2 (en) * 2000-05-19 2010-11-24 キヤノン株式会社 Exposure apparatus and device manufacturing method
JP2009016439A (en) * 2007-07-02 2009-01-22 Jeol Ltd Method and apparatus for correcting proximity effect correction rate

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