JPS63136327U - - Google Patents
Info
- Publication number
- JPS63136327U JPS63136327U JP2818987U JP2818987U JPS63136327U JP S63136327 U JPS63136327 U JP S63136327U JP 2818987 U JP2818987 U JP 2818987U JP 2818987 U JP2818987 U JP 2818987U JP S63136327 U JPS63136327 U JP S63136327U
- Authority
- JP
- Japan
- Prior art keywords
- wafer holder
- reaction tube
- cylindrical
- wafer
- etch tunnel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 3
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2818987U JPS63136327U (ru) | 1987-02-27 | 1987-02-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2818987U JPS63136327U (ru) | 1987-02-27 | 1987-02-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63136327U true JPS63136327U (ru) | 1988-09-07 |
Family
ID=30830920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2818987U Pending JPS63136327U (ru) | 1987-02-27 | 1987-02-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63136327U (ru) |
-
1987
- 1987-02-27 JP JP2818987U patent/JPS63136327U/ja active Pending