JPS63125663A - Ｔａ−Ｗ系非晶質合金薄膜の製造方法 - Google Patents
Ｔａ−Ｗ系非晶質合金薄膜の製造方法Info
- Publication number
- JPS63125663A JPS63125663A JP27017986A JP27017986A JPS63125663A JP S63125663 A JPS63125663 A JP S63125663A JP 27017986 A JP27017986 A JP 27017986A JP 27017986 A JP27017986 A JP 27017986A JP S63125663 A JPS63125663 A JP S63125663A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- amorphous
- substrate
- thin film
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 27
- 239000000956 alloy Substances 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000004544 sputter deposition Methods 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 239000010409 thin film Substances 0.000 claims description 27
- 229910000808 amorphous metal alloy Inorganic materials 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 9
- 239000013077 target material Substances 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 12
- 238000002425 crystallisation Methods 0.000 abstract description 12
- 230000008025 crystallization Effects 0.000 abstract description 12
- 239000007788 liquid Substances 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 7
- 230000007797 corrosion Effects 0.000 abstract description 7
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 6
- 229910001080 W alloy Inorganic materials 0.000 abstract description 3
- 239000000498 cooling water Substances 0.000 abstract description 3
- 229910008938 W—Si Inorganic materials 0.000 abstract 2
- 238000007796 conventional method Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910000521 B alloy Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27017986A JPS63125663A (ja) | 1986-11-12 | 1986-11-12 | Ｔａ−Ｗ系非晶質合金薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27017986A JPS63125663A (ja) | 1986-11-12 | 1986-11-12 | Ｔａ−Ｗ系非晶質合金薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63125663A true JPS63125663A (ja) | 1988-05-28 |
| JPH0581668B2 JPH0581668B2 (cg-RX-API-DMAC7.html) | 1993-11-15 |
Family
ID=17482623
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27017986A Granted JPS63125663A (ja) | 1986-11-12 | 1986-11-12 | Ｔａ−Ｗ系非晶質合金薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63125663A (cg-RX-API-DMAC7.html) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01165761A (ja) * | 1987-12-22 | 1989-06-29 | Mitsui Eng & Shipbuild Co Ltd | 雰囲気中における低摩擦性、耐焼付性並びに低摩耗性部材 |
| JPH0253483A (ja) * | 1988-08-19 | 1990-02-22 | Teijin Ltd | 接着性動物細胞の培養方法 |
| US20170218492A1 (en) * | 2014-07-30 | 2017-08-03 | Hewlett- Packard Development Company, L.P . | Wear resistant coating |
| JP2023117618A (ja) * | 2022-02-14 | 2023-08-24 | 東京エレクトロン株式会社 | 成膜方法及び成膜システム |
-
1986
- 1986-11-12 JP JP27017986A patent/JPS63125663A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01165761A (ja) * | 1987-12-22 | 1989-06-29 | Mitsui Eng & Shipbuild Co Ltd | 雰囲気中における低摩擦性、耐焼付性並びに低摩耗性部材 |
| JPH0253483A (ja) * | 1988-08-19 | 1990-02-22 | Teijin Ltd | 接着性動物細胞の培養方法 |
| US20170218492A1 (en) * | 2014-07-30 | 2017-08-03 | Hewlett- Packard Development Company, L.P . | Wear resistant coating |
| US10676806B2 (en) | 2014-07-30 | 2020-06-09 | Hewlett-Packard Development Company, L.P. | Wear resistant coating |
| JP2023117618A (ja) * | 2022-02-14 | 2023-08-24 | 東京エレクトロン株式会社 | 成膜方法及び成膜システム |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0581668B2 (cg-RX-API-DMAC7.html) | 1993-11-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |