JPS63124243A - Stamper for optical recording medium and its manufacture - Google Patents
Stamper for optical recording medium and its manufactureInfo
- Publication number
- JPS63124243A JPS63124243A JP26861186A JP26861186A JPS63124243A JP S63124243 A JPS63124243 A JP S63124243A JP 26861186 A JP26861186 A JP 26861186A JP 26861186 A JP26861186 A JP 26861186A JP S63124243 A JPS63124243 A JP S63124243A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- stamper
- optical recording
- baking
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 15
- 238000011161 development Methods 0.000 claims abstract description 3
- 239000010410 layer Substances 0.000 claims description 11
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- 239000002344 surface layer Substances 0.000 claims description 3
- 238000000465 moulding Methods 0.000 abstract description 15
- 238000012545 processing Methods 0.000 abstract description 4
- 238000001746 injection moulding Methods 0.000 abstract description 3
- 239000011347 resin Substances 0.000 abstract description 3
- 229920005989 resin Polymers 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 20
- 239000010408 film Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000005323 electroforming Methods 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 206010024229 Leprosy Diseases 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、光ビームにより記録、再生を行うことが可能
な光学的記録媒体の基板を作るのに必要なスタンパ−と
呼ばれる型、及びその製造方法に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a mold called a stamper, which is necessary for manufacturing a substrate for an optical recording medium that can record and reproduce data using a light beam, and a mold thereof. Regarding the manufacturing method.
従来より、光学的記録媒体用スタンパ−の製造方法とし
ては、一般的に次の様な方法が知られている。Conventionally, the following methods are generally known as methods for manufacturing stampers for optical recording media.
第４図に示すガラス基板１の上に第５図のようにフォト
レジスト２をスピンコードしたものを用意する。このフ
ォトレジスト表面をレーザー光線で露光・現像をして第
６図のような原盤が出来上る。この上にＮｉ膜をスパッ
タリング法により形成しさらにＮｉ電鋳を行うことによ
りＮｉスタンパ−の原型を形成し、フォトレジスト２と
Ｎｉスタンバ−の原型が密着した状態でＮｉ側を研摩す
る（第７図）。研摩後Ｎｉスタンバ−の原型を第８図の
ように剥がし成形機にあった寸法に加工する。この様に
長い工程を経て第９図にあるＮｉスタンバ−３が出来上
る。A photoresist 2 is spin-coded as shown in FIG. 5 on a glass substrate 1 shown in FIG. 4 and prepared. The surface of this photoresist is exposed and developed with a laser beam, and a master as shown in FIG. 6 is completed. A Ni film is formed on this by sputtering and further Ni electroforming is performed to form a prototype of the Ni stamper. With the photoresist 2 and the prototype of the Ni stamper in close contact, the Ni side is polished (7th step). figure). After polishing, the original form of the Ni stambar is processed into dimensions suitable for a peel-forming machine as shown in FIG. Through such a long process, the Ni stand bar 3 shown in FIG. 9 is completed.
上記のような従来の方法による光学的記録媒体用スタン
バ−の製造工程では、工程が多く時間がかかるばかりで
なく次の様な問題点も残っていた。The manufacturing process of a stand bar for optical recording media by the conventional method as described above not only involves many steps and is time consuming, but also has the following problems.
第１に電鋳を用いて形成するためスタンパ−の厚さムラ
が発生しやすい。スタンパ−の厚さムラはそのまま成形
品の厚さムラになるため研摩を行うが、ならい研摩であ
るため厚さムラをなくすことはできない。First, since the stamper is formed using electroforming, unevenness in the thickness of the stamper is likely to occur. The uneven thickness of the stamper directly causes uneven thickness of the molded product, so polishing is performed, but since it is profile polishing, the uneven thickness cannot be eliminated.
第２にフォトレジストからＮｉスタンバ−をはがす時に
かかる力でＮｉスタンバ−の平面度が悪くなる。これに
よって成形品の面プレ量が増加してしまう。Secondly, the flatness of the Ni stubber deteriorates due to the force applied when peeling the stubber from the photoresist. This increases the amount of surface play of the molded product.
第３にフォトレジストからＮｉスタンバ−を剥離した後
に加工をするためパターンと加工位置のズレが発生して
しまい、成形品の上でも同程度の位置ズレが発生してし
まい、特にディスクの場合には偏心量の増加につながる
。Thirdly, since processing is performed after the Ni stambar is peeled off from the photoresist, a misalignment between the pattern and the processing position occurs, and a similar misalignment occurs on the molded product, especially in the case of disks. leads to an increase in eccentricity.
本発明は以上の問題点に鑑み成されたものでありその目
的は、これらの問題点を解決し、面ブレや偏心がなく寸
法精度の良い成形品を作ることができる光学的記録媒体
用スタンバ−１及びそのようなスタンパ−を容易に製造
する方法を提供することにある。The present invention has been made in view of the above problems, and its purpose is to provide a standber for optical recording media that can solve these problems and produce molded products with good dimensional accuracy without surface wobbling or eccentricity. -1 and a method for easily manufacturing such a stamper.
本発明の上記目的は、基板上に塗布されたフォトレジス
トの層にレーザー光線露光・現像により光学的案内溝と
アドレスピットが形成され、その後の１６０℃以上の温
度でのベークにより得られる光学的記録媒体用スタンバ
−１及び基板上にフォトレジストを塗布し、該フォトレ
ジスト面にレーザー光線露光し現像することにより光学
的案内溝とアドレスピットを形成した後、１６０℃以上
の温度にてベークすることを特徴とする光学的記録媒体
用スタンバ−の製造方法によって達成される。The above-mentioned object of the present invention is to form optical guide grooves and address pits in a photoresist layer coated on a substrate by laser beam exposure and development, and then to obtain an optical record by baking at a temperature of 160° C. or higher. A photoresist is applied on the media stand bar 1 and the substrate, and the photoresist surface is exposed to a laser beam and developed to form optical guide grooves and address pits, and then baked at a temperature of 160°C or higher. This is achieved by a method for manufacturing a standber for optical recording media.
すなわち本発明は、原盤を直接スタンパ−として使用し
ようとするものである。従来のレジストでは強度が足り
ず、射出成形時に樹脂の圧力と熱にまけてレジストがく
ずれ剥がれてしまうため、本発明においては１６０℃以
上でベークすることによりレジストの強度を向上させた
。That is, the present invention attempts to use the master directly as a stamper. Conventional resists do not have enough strength, and the resist collapses and peels due to the pressure and heat of the resin during injection molding, so in the present invention, the strength of the resist is improved by baking at 160 ° C. or higher.
本発明の光学的記録媒体用スタンバ−の製造方法を第１
図〜第３図を用いて説明する。The first method for producing a standber for optical recording media of the present invention is as follows.
This will be explained using FIGS.
まず第１図に示すような成形機にあった形状の基板４を
用意して、その上に第２図に示すようにフォトレジスト
を塗布し、これをレーザー光線で露光現像してフォトレ
ジストにアドレスピットと光学的案内溝を形成する。そ
の後１６０℃以上でベークすることでフォトレジスト層
は強固な膜となり、射出成形の樹脂の熱と圧力に十分に
耐えるスタンパ−が出来上る（第３図）。当然、２Ｐ成
形用基板としても使用できる。First, prepare a substrate 4 with a shape suitable for the molding machine as shown in Fig. 1, apply photoresist on it as shown in Fig. 2, and develop it by exposing it to a laser beam to address the photoresist. Form pits and optical guide grooves. The photoresist layer is then baked at 160 DEG C. or higher to become a strong film, and a stamper that can withstand the heat and pressure of injection molding resin is completed (FIG. 3). Naturally, it can also be used as a substrate for 2P molding.
本発明において使用されるフォトレジストは従来より使
用されているＡＺ−１３５０（ヘキストジャパン製）
、 ０ＤＯＲ（東京応化製）等である。これらのフォト
レジストは１６０℃以上でベークすることでアルカリ性
の剥離液中に長時量大れておいても変化しない強固な膜
に変化する性質を有しており本発明においてはベーク時
間は３０分〜１２０分くらいが適当である。The photoresist used in the present invention is AZ-1350 (manufactured by Hoechst Japan), which has been used conventionally.
, 0DOR (manufactured by Tokyo Ohka), etc. These photoresists have the property of turning into a strong film that does not change even if a large amount is left in an alkaline stripping solution for a long time by baking at 160°C or higher.In the present invention, the baking time is 30°C. Approximately 120 minutes is appropriate.
また、フォトレジスト中にシランカップリング剤を混合
しておけば、フォトレジストと基板との密着性が向上す
るだけでなく、ＳｉＯ□の組成が架橋をしてシランカッ
プリング剤を含有するフォトレジスト層２′の強化をす
る。シランカップリング剤の含有量は０．１〜５ ｗｔ
９６＜らいが好ましい。Additionally, if a silane coupling agent is mixed into the photoresist, not only will the adhesion between the photoresist and the substrate be improved, but the SiO□ composition will crosslink, allowing the photoresist containing the silane coupling agent to Strengthen layer 2'. The content of silane coupling agent is 0.1 to 5 wt.
96< leprosy is preferred.
上記のようにシランカップリング剤が含有されている場
合には、ベークの処理としてフォトレジスト層２′の表
面層がフォトレジスト内部以上の高温になるように加熱
処理をすればフォトレジスト層２′の表面に５ｉ０２の
膜を形成し強化できる。この場合もフォトレジスト内部
が１６０℃以上に加熱されることは必要である。この加
熱処理の方法としてはプラズマ処理を用いることが好ま
しい。When a silane coupling agent is contained as described above, the surface layer of the photoresist layer 2' can be heated to a temperature higher than the inside of the photoresist as a baking process. A film of 5i02 can be formed on the surface of the material to strengthen it. In this case as well, it is necessary to heat the inside of the photoresist to 160° C. or higher. As a method for this heat treatment, it is preferable to use plasma treatment.
また、ベークした後にフォトレジスト層の表面に無機物
の薄膜を形成することで耐久性および離型性を向上させ
ることが可能である。この際用いられる無機物としては
例えばＣ「、Ｎｉまたはこれらの合金等が挙げられる。Further, by forming a thin film of an inorganic substance on the surface of the photoresist layer after baking, it is possible to improve durability and mold releasability. Examples of inorganic substances used in this case include carbon, nickel, and alloys thereof.
（実施例）
以下、本発明の具体的実施例を挙げて本発明を更に詳細
に説明する。(Example) Hereinafter, the present invention will be explained in more detail by giving specific examples of the present invention.
実施例１
第１図に示すような内径４０ｍｍ、外径１４７ｍｍ 、
厚さ０．３ｍｍの研摩したＮｉ板を用意した。この表面
にシランカップリング剤（にＢＭ−６０３：信越シリコ
ーン製）を２ｗｔ％混合したフォトレジスト（ＡＺ−１
３５０をＡＺシンナーで２０ｗｔ％に調整したもの：ヘ
キストジャバン製）を約１５００人スピンコードした。Example 1 As shown in Fig. 1, the inner diameter is 40 mm, the outer diameter is 147 mm,
A polished Ni plate with a thickness of 0.3 mm was prepared. A photoresist (AZ-1) containing 2 wt% of a silane coupling agent (BM-603, manufactured by Shin-Etsu Silicone) was added to this surface.
350 adjusted to 20 wt% with AZ thinner (manufactured by Hoechst Java) was spin-coded by about 1,500 people.
これをＡ「レーザーで露光しＡＺディベロツバ−（ヘキ
ストジャパン製）で現像をして、第３図のような形状の
積層体を得た。その後１６０℃で、１時間ベークしたも
のをスタンバ−として成形機に取り付けて成形を行った
。This was exposed to A laser and developed with an AZ Developer Tuber (manufactured by Hoechst Japan) to obtain a laminate with the shape shown in Figure 3.Then, it was baked at 160°C for 1 hour and used as a stand bar. It was attached to a molding machine and molded.
実施例２
実施例１の１６０℃、１時間の加熱処理に換えて、露光
・現像後の積層体をプラズマ処理装置に投入して真空槽
内を４Ｘ１０’″’Ｐａ程度排気後、アルゴン（Ａ「）
ガスを４ Ｘ １Ｏ−ＩＰａ導入して無電極放電により
プラズマを発生させ３０分間フォトレジスト表面にプラ
ズマ処理をした。この処理によりフォトレジスト表面が
５ｉ０２の薄膜により強化されたスタンバ−を得られた
。このスタンバ−を成形機に取り付けて成形を行った。Example 2 Instead of the heat treatment at 160° C. for 1 hour in Example 1, the exposed and developed laminate was placed in a plasma processing device, the vacuum chamber was evacuated to about 4×10′″Pa, and then argon (A ")
A gas of 4×1 O-IPa was introduced, plasma was generated by electrodeless discharge, and the photoresist surface was subjected to plasma treatment for 30 minutes. Through this treatment, a stand bar was obtained in which the photoresist surface was strengthened by a thin film of 5i02. This stambar was attached to a molding machine and molding was performed.
実施例３
実施例１と同じ方法で作ったスタンバ−をＲＦスパッタ
装置に投入して、真空檀内をＩ Ｘ １（１’ Ｐａ程
度排気後、アルゴン（Ａｒ）ガスを４ Ｘ ｔｏ’ Ｐ
ａ導入してターゲットとしてクロム（Ｏｒ）を用いてス
パッタリングにより前記スタンバ−上に厚さ３００人の
クロム膜を成膜して強化した。このスタンバ−を成形機
に取り付けて成形を行った。Example 3 A stand bar made in the same manner as in Example 1 was placed in an RF sputtering device, and after the vacuum chamber was evacuated to about I X 1 (1' Pa), 4 X to' P of argon (Ar) gas was added.
A chromium film with a thickness of 300 mm was formed on the stub bar by sputtering using chromium (Or) as a target and strengthened. This stambar was attached to a molding machine and molding was performed.
比較例
内径１ＯＩＩ１１１．外径２５０ｍｍ 、厚さ１０ｍｍ
の研摩したガラス基板を用意し、この表面にシランカッ
プリング剤（にＢＭ−６０３、信越シリコーン製）の１
ｗｔ％エタノール溶液をスピンコードして、さらにフォ
トレジスト（八Ｚ−１３５０をへＺシンナーで２０ｗｔ
％に調整したちの：へキストジャバン製）を約１５００
人スピンコードした。これをへｒレーザーで露光し、Ａ
Ｚディベロツバ−（ヘキストジャバン製）で現像をした
。その後、スパッタ装置でＮｉ膜を約１０００人形成し
、ざらにＮｉ厚が０．３ｍｍになるまで電鋳を行なった
。このＮｉ側の表面を研摩した後、ガラス基板からはが
し内径４０ｍｍ、外径１４７ｍｍに切断してスタンバ−
とした。このスタンバ−を成形機に取り付けて成形を行
った。Comparative example inner diameter 1OII111. Outer diameter 250mm, thickness 10mm
Prepare a polished glass substrate, and coat the surface with silane coupling agent (BM-603, Shin-Etsu Silicone).
Spin code the wt% ethanol solution and further coat the photoresist (8 Z-1350 with 20 wt% Z thinner).
Adjusted to 1500% (manufactured by Hoechst Java)
People spin code. This was exposed to a laser beam, and A
Developed with Z Developer (manufactured by Hoechst Java). Thereafter, approximately 1000 Ni films were formed using a sputtering device, and electroforming was performed until the Ni thickness was approximately 0.3 mm. After polishing the surface on the Ni side, it was peeled off from the glass substrate and cut into pieces with an inner diameter of 40 mm and an outer diameter of 147 mm.
And so. This stambar was attached to a molding machine and molding was performed.
前述の実施例１と２、比較例で得られたスタンバ−を用
いて作成した成形品の面プレ量を測定した。そのうち実
施例１の結果を第１１図に、比較例の結果を第１Ｏ図に
示す。第１０図、第１１図において、横軸はディスクを
９００ｒｐｍで回転させた時の面ブレの周波数を示し、
周波数が高い方は面の細かな凹凸を示す。縦軸は、面プ
レ量の振幅の絶対値（単位：μ）を示す。また、光学ヘ
ッドの方で追従できるのは数百Ｈｚ以下で、それ以上は
レンズの焦点深度以内の面ブレ量しか許容できない。な
お、実施例２の結果は実施例１とほぼ同様であった。The amount of surface play of molded products made using the stub bars obtained in Examples 1 and 2 and Comparative Example described above was measured. The results of Example 1 are shown in FIG. 11, and the results of Comparative Example are shown in FIG. 1O. In FIGS. 10 and 11, the horizontal axis indicates the frequency of surface wobbling when the disk is rotated at 900 rpm,
Higher frequencies indicate fine irregularities on the surface. The vertical axis indicates the absolute value (unit: μ) of the amplitude of the amount of surface play. Furthermore, the optical head can only track frequencies of several hundred Hz or less, and beyond that it can only tolerate surface wobbling within the depth of focus of the lens. Note that the results of Example 2 were almost the same as those of Example 1.
第１０図、第１１図を見てわかる様に、本発明のフォト
レジスト層を強化してなるスタンバ−を用いると、得ら
れる成形品の面プレ量をいちじるしく向上させることが
できる。As can be seen from FIGS. 10 and 11, by using the stump bar formed by reinforcing the photoresist layer of the present invention, the amount of surface play of the resulting molded product can be significantly improved.
（発明の効果〕
以上説明したように、本発明の光学的記録媒体用スタン
バ−を用いれば、平面度の著しく向上した成形品を得る
ことができる。また本発明の製造方法によれば、そのよ
うなスタンバ−が非常に短縮した工程によって得られ、
材料も少なくてすむため経済的である。(Effects of the Invention) As explained above, by using the optical recording medium stand bar of the present invention, it is possible to obtain a molded product with significantly improved flatness.Furthermore, according to the manufacturing method of the present invention, Such a stump bar is obtained by a very shortened process,
It is economical because it requires less material.
第１図から第３図までは、本発明のスタンバ−製造工程
を示す模°式図であり、第１図は成形機にあった寸法に
加工された金属板の縦断面図、第２図は金属板上にフォ
トレジストを塗布したものの縦断面図、第３図はフォト
レジスト面をレーザー光線により露光・現像をしてパタ
ーン形成したものを１６０℃以上でベーク後プラズマ処
理をしたものの縦断面図である。また第４図から第９図
までは従来方法によるスタンバ−製造工程を示す模式図
であり、第４図はガラス基板の縦断面図、第５図はガラ
ス基板にフォトレジストを塗布したものの縦断面図、第
６図はフォトレジスト面をレーザー光線により露光、現
像をしてパターン形成したものの縦断面図、第７図はフ
ォトレジストパターン上にＮｉ膜を形成しさらにＮｉの
電鋳を行った後Ｎｉ側を研摩したものの縦断面図、第８
図はガラス基板からＮｉ部分を剥離したものの縦断面図
、第９図は成形機にあった寸法に加工したＮｉスタンバ
−の縦断面図である。また第１Ｏ図、第１１図は成形品
の面プレ量の評価結果を示すグラフである。
１：基板（ガラス基板）
２：フォトレジスト
２′ニジランカツプリング剤を混合したフォトレジスト
３：Ｎｉスタンバ−
４：基板にッケル）
第１図
第３図
第４図
第５図
第７図
第８図
第９図Figures 1 to 3 are schematic diagrams showing the stump bar manufacturing process of the present invention, and Figure 1 is a vertical cross-sectional view of a metal plate processed to a size that fits the molding machine, and Figure 2 Figure 3 is a vertical cross-sectional view of a metal plate coated with photoresist, and Figure 3 is a vertical cross-sectional view of a photoresist surface that has been exposed and developed with a laser beam to form a pattern, then baked at 160°C or higher and then subjected to plasma treatment. It is. Furthermore, FIGS. 4 to 9 are schematic diagrams showing the process of manufacturing a stand bar using a conventional method. FIG. 4 is a vertical cross-sectional view of a glass substrate, and FIG. 5 is a vertical cross-section of a glass substrate coated with photoresist. Figure 6 is a longitudinal cross-sectional view of a photoresist surface exposed and developed to form a pattern, and Figure 7 is a vertical cross-sectional view of a photoresist pattern formed by forming a Ni film on the photoresist pattern and further electroforming Ni. Longitudinal cross-sectional view of the side polished, No. 8
The figure is a vertical cross-sectional view of the Ni portion removed from the glass substrate, and FIG. 9 is a vertical cross-sectional view of the Ni stub bar processed into dimensions suitable for the molding machine. Moreover, FIG. 1O and FIG. 11 are graphs showing the evaluation results of the amount of surface play of the molded product. 1: Substrate (glass substrate) 2: Photoresist 2' Photoresist mixed with Nijiran coupling agent 3: Ni standbar 4: Substrate) Fig. 1 Fig. 3 Fig. 4 Fig. 5 Fig. 7 Figure 8 Figure 9
Claims (8)
ザー光線露光・現像により光学的案内溝とアドレスピッ
トが形成され、その後の１６０℃以上の温度でのベーク
により得られる光学的記録媒体用スタンパー。(1) A stamper for optical recording media obtained by forming optical guide grooves and address pits on a photoresist layer coated on a substrate by laser beam exposure and development, and then baking at a temperature of 160°C or higher. .
が含有されている特許請求の範囲第１項記載の光学的記
録媒体用スタンパー。(2) The stamper for an optical recording medium according to claim 1, wherein the photoresist contains a silane coupling agent.
の表面層が昇温するように加熱処理がなされた特許請求
の範囲第２項記載の光学的記録媒体用スタンパー。(3) The stamper for an optical recording medium according to claim 2, wherein, as the baking process, a heat treatment is performed to raise the temperature of the surface layer of the photoresist layer.
機物の薄膜が形成された特許請求の範囲第１項乃至第３
項のいづれかに記載の光学的記録媒体用スタンパー。(4) Claims 1 to 3, wherein a thin film of an inorganic substance is formed on the surface of the photoresist layer after baking.
The stamper for optical recording media according to any one of the items.
ジスト面にレーザー光線露光し現像することにより光学
的案内溝とアドレスピットを形成した後、１６０℃以上
の温度にてベークすることを特徴とする光学的記録媒体
用スタンパーの製造方法。(5) A photoresist is coated on the substrate, and the photoresist surface is exposed to a laser beam and developed to form optical guide grooves and address pits, and then baked at a temperature of 160°C or higher. A method for manufacturing a stamper for an optical recording medium.
が含有されている特許請求の範囲第５項記載の光学的記
録媒体用スタンパーの製造方法。(6) The method for producing a stamper for an optical recording medium according to claim 5, wherein the photoresist contains a silane coupling agent.
表面層が昇温するように加熱処理をする特許請求の範囲
第６項記載の光学的記録媒体用スタンパーの製造方法。(7) The method for manufacturing a stamper for an optical recording medium according to claim 6, wherein the baking process is a heat treatment to raise the temperature of the surface layer of the photoresist layer.
機物の薄膜を形成する特許請求の範囲第５項乃至第７項
のいづれかに記載の光学的記録媒体用スタンパーの製造
方法。(8) The method for manufacturing a stamper for an optical recording medium according to any one of claims 5 to 7, wherein a thin film of an inorganic substance is formed on the surface of the photoresist layer after baking.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26861186A JPS63124243A (en) | 1986-11-13 | 1986-11-13 | Stamper for optical recording medium and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26861186A JPS63124243A (en) | 1986-11-13 | 1986-11-13 | Stamper for optical recording medium and its manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63124243A true JPS63124243A (en) | 1988-05-27 |
Family
ID=17460945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26861186A Pending JPS63124243A (en) | 1986-11-13 | 1986-11-13 | Stamper for optical recording medium and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63124243A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03176841A (en) * | 1989-12-05 | 1991-07-31 | Matsushita Electric Ind Co Ltd | Production of stamper for optical disk |
| WO2005088628A1 (en) * | 2004-03-12 | 2005-09-22 | Matsushita Electric Industrial Co., Ltd. | Process for producing stamper for direct mastering, and stamper produced by such process and optical disc |
-
1986
- 1986-11-13 JP JP26861186A patent/JPS63124243A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03176841A (en) * | 1989-12-05 | 1991-07-31 | Matsushita Electric Ind Co Ltd | Production of stamper for optical disk |
| WO2005088628A1 (en) * | 2004-03-12 | 2005-09-22 | Matsushita Electric Industrial Co., Ltd. | Process for producing stamper for direct mastering, and stamper produced by such process and optical disc |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH1158401A (en) | Manufacture of mold for producing resin plate and production of resin plate | |
| JPH04205936A (en) | Formed medium for transfer and production thereof | |
| JPS63124243A (en) | Stamper for optical recording medium and its manufacture | |
| JPH09138981A (en) | Production of stamper for optical disk | |
| JPH0243380A (en) | Metallic mold for forming optical disk substrate and production thereof | |
| JPS59224320A (en) | Manufacture of mold | |
| JPH0337842A (en) | Production of stamper for information recording medium | |
| JPWO2003088235A1 (en) | Stamper master and manufacturing method thereof, stamper and manufacturing method thereof, and optical disc | |
| JPS59180801A (en) | Production of stamper disk | |
| JPWO2003088235A6 (en) | Stamper master and manufacturing method thereof, stamper and manufacturing method thereof, and optical disc | |
| JPH01316231A (en) | Manufacture of substrate for information recording medium | |
| JPS6055534A (en) | Production of optical recording medium | |
| EP0986813B1 (en) | Semi-manufactured stamper | |
| JP3018470B2 (en) | Manufacturing method of stamper | |
| JPH01235044A (en) | Optical disk substrate and its production | |
| JPH01251448A (en) | Optical disk molding die | |
| JPH02305629A (en) | Preparation of stamper | |
| JPH04229211A (en) | Manufacture of stamper | |
| JPH01171910A (en) | Manufacture of substrate for information recording medium and cast molding tool for same | |
| JPS61163342A (en) | Method for removing photoresist | |
| JPH04351731A (en) | Production of stamper | |
| JPS62189645A (en) | Production of transcription mold for optical disk | |
| JPH02198808A (en) | Method for preparing substrate for data recording medium and apparatus for cast-molding of said substrate | |
| JPH08255383A (en) | Direct recording medium for optical disk and its production | |
| JPS59209834A (en) | Matrix for duplicating |