JPS63118150A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS63118150A JPS63118150A JP26266486A JP26266486A JPS63118150A JP S63118150 A JPS63118150 A JP S63118150A JP 26266486 A JP26266486 A JP 26266486A JP 26266486 A JP26266486 A JP 26266486A JP S63118150 A JPS63118150 A JP S63118150A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- component
- weight
- parts
- plate material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims description 20
- 229920005989 resin Polymers 0.000 claims abstract description 27
- 239000011347 resin Substances 0.000 claims abstract description 27
- 239000011230 binding agent Substances 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 claims description 14
- 238000009835 boiling Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 abstract description 28
- 239000002699 waste material Substances 0.000 abstract description 4
- 150000001356 alkyl thiols Chemical class 0.000 abstract description 2
- 230000007423 decrease Effects 0.000 abstract description 2
- 239000007788 liquid Substances 0.000 abstract description 2
- 150000003573 thiols Chemical class 0.000 abstract 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 235000019645 odor Nutrition 0.000 description 21
- 238000007639 printing Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- -1 methacryloyl group Chemical group 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 5
- 239000003504 photosensitizing agent Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 229920002554 vinyl polymer Polymers 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 150000005846 sugar alcohols Polymers 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 3
- 239000005062 Polybutadiene Substances 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 229920001400 block copolymer Polymers 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012760 heat stabilizer Substances 0.000 description 3
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 230000009965 odorless effect Effects 0.000 description 3
- 229920002857 polybutadiene Polymers 0.000 description 3
- 229920001195 polyisoprene Polymers 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 2
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 2
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 2
- IPRJXAGUEGOFGG-UHFFFAOYSA-N N-butylbenzenesulfonamide Chemical compound CCCCNS(=O)(=O)C1=CC=CC=C1 IPRJXAGUEGOFGG-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229920003051 synthetic elastomer Polymers 0.000 description 2
- 239000005061 synthetic rubber Substances 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- 229920006305 unsaturated polyester Polymers 0.000 description 2
- DDKMFQGAZVMXQV-UHFFFAOYSA-N (3-chloro-2-hydroxypropyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)CCl DDKMFQGAZVMXQV-UHFFFAOYSA-N 0.000 description 1
- POTYORUTRLSAGZ-UHFFFAOYSA-N (3-chloro-2-hydroxypropyl) prop-2-enoate Chemical compound ClCC(O)COC(=O)C=C POTYORUTRLSAGZ-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-NMQOAUCRSA-N 1,2-dideuteriooxyethane Chemical compound [2H]OCCO[2H] LYCAIKOWRPUZTN-NMQOAUCRSA-N 0.000 description 1
- 150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- PDXOPTFTOFXXSU-UHFFFAOYSA-N 1-sulfanylpentan-1-ol Chemical compound CCCCC(O)S PDXOPTFTOFXXSU-UHFFFAOYSA-N 0.000 description 1
- ULIKDJVNUXNQHS-UHFFFAOYSA-N 2-Propene-1-thiol Chemical compound SCC=C ULIKDJVNUXNQHS-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- NIHGMROQOXYKAP-UHFFFAOYSA-N 2-sulfanylhexan-1-ol Chemical compound CCCCC(S)CO NIHGMROQOXYKAP-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- UENWRTRMUIOCKN-UHFFFAOYSA-N benzyl thiol Chemical compound SCC1=CC=CC=C1 UENWRTRMUIOCKN-UHFFFAOYSA-N 0.000 description 1
- WQAQPCDUOCURKW-UHFFFAOYSA-N butanethiol Chemical compound CCCCS WQAQPCDUOCURKW-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000001877 deodorizing effect Effects 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 125000006182 dimethyl benzyl group Chemical group 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000005667 methoxymethylation reaction Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- WRIQZMMFAMFZSM-UHFFFAOYSA-N prop-2-enethioic s-acid Chemical compound SC(=O)C=C WRIQZMMFAMFZSM-UHFFFAOYSA-N 0.000 description 1
- KJRCEJOSASVSRA-UHFFFAOYSA-N propane-2-thiol Chemical compound CC(C)S KJRCEJOSASVSRA-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 150000003566 thiocarboxylic acids Chemical class 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- IPBROXKVGHZHJV-UHFFFAOYSA-N tridecane-1-thiol Chemical compound CCCCCCCCCCCCCS IPBROXKVGHZHJV-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、感光性樹脂版材において版材の臭気をなくし
、現像時の作業環境を改善し且つ、高度な画像再現性お
よび印刷適性を有する感光性樹脂組成物に関するもので
おる。[Detailed Description of the Invention] [Industrial Application Field] The present invention eliminates the odor of the photosensitive resin plate material, improves the working environment during development, and provides high image reproducibility and printability. This article relates to a photosensitive resin composition comprising:
金属またはプラスチックの基材上に光重合性の感光性樹
脂層を設けた構造をもつ凸版、平版および凹版印刷用の
感光性樹脂版材が最近実用化されている。これらの版材
は、透明部分をもつネガティブまたはポジティブの原図
フィルムを感光性樹脂層に密着させた後に、活性光線を
照射して原図フィルムの透明部分に対応する感光性樹脂
層に光重合を起こし、ついで未重合部分を適当な溶剤で
溶出することによって基材上にレリーフを形成するもの
である。このように光重合反応を利用した感光性樹脂組
成物は印刷版をはじめとして各種の用途に用いられてい
る。Photosensitive resin plate materials for letterpress, lithographic and intaglio printing, which have a structure in which a photopolymerizable photosensitive resin layer is provided on a metal or plastic base material, have recently been put into practical use. These plate materials are made by attaching a negative or positive original film with a transparent part to a photosensitive resin layer, and then irradiating it with actinic rays to cause photopolymerization of the photosensitive resin layer corresponding to the transparent part of the original film. Then, a relief is formed on the substrate by eluting the unpolymerized portion with a suitable solvent. Photosensitive resin compositions that utilize photopolymerization reactions are used in various applications including printing plates.
感光性樹脂版材は、ポリケイ皮敢ビニル系、ポリアミド
系、ポリビニルアルコール系、ポリアクリル酸メチル系
、ポリアクリルニトリル系の感光性樹脂層や、分子中に
二重結合をもつ不飽和ポリエステル系、不飽和ポリウレ
タン系、シリコーン系感光性樹脂版材等がある。さらに
ポリスチレン−ポリブタジェンのブロック共重合体、ポ
リスチレンーポリイソプレン共重合体、エチレン−酢酸
ビニル共重合体、天然ゴム、ニトリルゴムなどを用いた
感光性フレキソ版材もある。The photosensitive resin plate material has a photosensitive resin layer of polycrystalline vinyl, polyamide, polyvinyl alcohol, polymethyl acrylate, polyacrylonitrile, unsaturated polyester with double bonds in the molecule, There are unsaturated polyurethane-based and silicone-based photosensitive resin printing materials. Furthermore, there are photosensitive flexographic printing materials using polystyrene-polybutadiene block copolymers, polystyrene-polyisoprene copolymers, ethylene-vinyl acetate copolymers, natural rubber, nitrile rubber, and the like.
このような感光性樹脂組成物において使用されている光
重合性不飽和化合物としては、モノアクリレ−1〜やモ
ノメタクリレートの他にエチレングリコールなどの多価
アルコールとアクリル酸、メタクリル酸などの不飽和カ
ルボン酸の反応物、不飽和エポキシ化合物と不飽和カル
ボン酸の反応によって合成されるところの多価アクリレ
ート、多価メタクリレート、アクリルアミド誘導体、ア
クリルアミドX4体と多価アルコールとの縮合反応によ
って1qられる多価アクリルアミド、多価メタクリルア
ミド系の光重合性モノマなどが単独あるいは数種類で基
体樹脂に配合されている。In addition to monoacrylates and monomethacrylates, photopolymerizable unsaturated compounds used in such photosensitive resin compositions include polyhydric alcohols such as ethylene glycol and unsaturated carboxylic acids such as acrylic acid and methacrylic acid. Acid reactants, polyhydric acrylates synthesized by the reaction of unsaturated epoxy compounds and unsaturated carboxylic acids, polyhydric methacrylates, acrylamide derivatives, polyhydric acrylamides synthesized by the condensation reaction of acrylamide X4 and polyhydric alcohols. , polyvalent methacrylamide-based photopolymerizable monomers, etc. are blended singly or in combination with the base resin.
光重合性上ツマは、沸点が150℃以上であっても独特
の臭気を持つものが多い。特に不飽和基がアクリロイル
基または、メタクリロイル基の場合には、固有の刺激臭
があり、これらを多口に使用すると19られた感光性樹
脂組成物や版材が刺激臭を有したり、現像工程において
未重合部分を溶出した現像液の臭気で作業者に不快感を
与えたりする。Many photopolymerizable tops have a unique odor even if their boiling point is 150°C or higher. In particular, when the unsaturated group is an acryloyl group or a methacryloyl group, there is a unique irritating odor, and if these are used in large quantities, the photosensitive resin composition or plate material produced may have an irritating odor, or the developing During the process, the odor of the developer that has eluted the unpolymerized portion may cause discomfort to workers.
本発明はかかる従来技術の諸欠点に鑑み創案されたもの
で、その目的は版材の感光特性や現像性および印刷適性
を損ねることなく、版材自体およびそれを現象した廃液
の臭気を著しく軽減することのできる感光性樹脂組成物
を提供することにある。The present invention was devised in view of the various drawbacks of the prior art, and its purpose is to significantly reduce the odor of the plate material itself and the waste liquid produced from it, without impairing the photosensitive characteristics, developability, and printability of the plate material. An object of the present invention is to provide a photosensitive resin composition that can
本発明は、下記(a)〜(c)の成分を少なくとも含ん
で成ることを特徴とする感光性樹脂組成物。The present invention is a photosensitive resin composition comprising at least the following components (a) to (c).
(a>バインダとしての基体樹脂
100重量部
(b)末端にエチレン性二重結合を有し、沸点が150
℃以上の光重合性不飽和化合物20〜200重口部
(c)分子量が50〜2.000で、末端に一8H基を
有する化合物
0.01〜10重量部
本発明の(a>成分として使用されるバインダとしての
基体樹脂としては、通常一般的に使用されている感光性
樹脂版材の基体樹脂の全てが使用可能でおる。完全ケン
化および部分ケン化ポリ酢酸ビニル、ポリビニルピロリ
ドン、ポリエチレンオキシド、ポリビニルエーテル、ヒ
ドロキシエチルセルロース、ヒドロキシエチルセルロー
ス、ヒドロキシプロピルセルロース、水性アルキッド樹
脂、ポリアミド、ポリビニルシンナミリデンアセテート
、ポリビニルシンナメート・シンナミリデンアセテート
。p−ジアゾジフェニルアミン・パラボルムアルデヒド
縮重合物などのジアゾ樹脂、ボリアシト安息1ビニル、
ポリアジドフタル酸ビニルなどのアジドポリマ、ポリス
チレン−ポリイソプレンブロック共重合体、ポリスチレ
ン−ポリブタジェンのブロック共重合体、ポリイソプレ
ン、ニトリルゴム、ポリブタジェンなどの合成ゴム、分
子中に二重結合をもつ不飽和ポリエステル、不飽和ポリ
ウレタン、不飽和アリールウレタンオリゴマなどが挙げ
られる。(a>100 parts by weight of base resin as a binder (b) has an ethylenic double bond at the end and has a boiling point of 150
20 to 200 parts by weight of a photopolymerizable unsaturated compound (c) 0.01 to 10 parts by weight of a compound having a molecular weight of 50 to 2.000 and having a 18H group at the end (as component (a) of the present invention) As the base resin used as a binder, all of the base resins for photosensitive resin plates commonly used can be used.Completely saponified and partially saponified polyvinyl acetate, polyvinylpyrrolidone, Ethylene oxide, polyvinyl ether, hydroxyethyl cellulose, hydroxyethyl cellulose, hydroxypropyl cellulose, water-based alkyd resin, polyamide, polyvinyl cinnamylidene acetate, polyvinyl cinnamate/cinnamylidene acetate.Diazo such as p-diazodiphenylamine/paraborumaldehyde condensation product Resin, Boriasitoben 1 vinyl,
Azide polymers such as vinyl polyazidophthalate, polystyrene-polyisoprene block copolymers, polystyrene-polybutadiene block copolymers, polyisoprene, synthetic rubbers such as nitrile rubber, polybutadiene, and unsaturated polyesters with double bonds in the molecule. , unsaturated polyurethane, unsaturated aryl urethane oligomer, etc.
本発明の(b)成分として使用される光重合性モノマと
しては、(a)成分と一定程度以上の相溶性のあるもの
は全て使用可能でおる。具体的には、2−ヒドロキシエ
チルアクリレート、2−ヒドロキシエチルメタクリレー
ト、2−ヒドロキシプロピルアクリレート、2−ヒドロ
キシプロピルメタクリレート、3−クロロ−2−ヒドロ
キシプロピルアクリレート、3−クロロ−2−ヒドロキ
シプロピルメタクリレートなどのモノアクリレート、お
よびモノメタクリレート。エチレングリコールなどの多
価アルコールとアクリル酸またはメタクリル酸などの不
飽和カルボン酸の反応によって17られる多価アクリレ
ートおよびメタクリレート。エチレングリコールジグリ
シジルエーテルなどの多価グリシジルエーテルとアクリ
ル酸やメタクリル酸などの不飽和カルボン酸の反応によ
って合成されるところの多価アクリレートおよびメタク
リレート。アクリルアミド、メタクリルアミド、N−メ
チロールアクリルアミド、ダイアセトンアクリルアミド
、メチレンビスアクリルアミド、N−メチロールアクリ
ルアミドまたはN−メチロールアクリルアミドと多価ア
ルコールの縮合反応によって合成される多価アクリルア
ミドおよび多価メタクリルアミド系の光重合性モノマが
挙げられる。ざらにジビニルベンゼンなどのビニル化合
物も使用できる。As the photopolymerizable monomer used as component (b) of the present invention, any monomer that has a certain level of compatibility with component (a) can be used. Specifically, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-chloro-2-hydroxypropyl acrylate, 3-chloro-2-hydroxypropyl methacrylate, etc. Monoacrylates and monomethacrylates. Polyhydric acrylates and methacrylates produced by the reaction of a polyhydric alcohol such as ethylene glycol with an unsaturated carboxylic acid such as acrylic acid or methacrylic acid. Polyvalent acrylates and methacrylates are synthesized by the reaction of polyvalent glycidyl ethers such as ethylene glycol diglycidyl ether and unsaturated carboxylic acids such as acrylic acid and methacrylic acid. Photopolymerization of polyacrylamide and polymethacrylamide synthesized by the condensation reaction of acrylamide, methacrylamide, N-methylolacrylamide, diacetone acrylamide, methylenebisacrylamide, N-methylolacrylamide or N-methylolacrylamide with a polyhydric alcohol. Examples include sexual monomers. Vinyl compounds such as divinylbenzene can also be used.
(b)成分は沸点が150℃以上であることが必要でお
る。沸点が150℃未満であると版材の成形中に光重合
性上ツマが飛散したり、生版保存中に光重合性モノマが
飛散して性能が不安定になるなどの問題が起こる。Component (b) needs to have a boiling point of 150°C or higher. If the boiling point is less than 150° C., problems such as the photopolymerizable monomer scattering during molding of the plate material and the photopolymerizable monomer scattering during storage of the green plate, resulting in unstable performance, occur.
(b)成分の使用口が(a)成分の基体樹脂100重量
部に対して20重量部未満でおると、光重合によって生
成する架橋構造の密度が不足するために十分な画像再現
性が1qられない。逆に(b)成分の使用量が200重
量部を越えると光重合によって生成する架橋構造の密度
が過剰となるために、得られるレリーフは非常に脆くな
る。そのため、印刷中にレリーフにクラックが入るなど
の問題が発生する。以上の理由から(b)成分の光m合
性モノマの使用口は(a)成分100重ff1部に対し
て20〜200重量部の範囲が必要でおり、好ましくは
50〜150重ff1部でおる。If the amount of component (b) used is less than 20 parts by weight per 100 parts by weight of the base resin of component (a), the density of the crosslinked structure produced by photopolymerization will be insufficient, resulting in insufficient image reproducibility of 1q. I can't do it. On the other hand, if the amount of component (b) used exceeds 200 parts by weight, the density of the crosslinked structure produced by photopolymerization becomes excessive, and the resulting relief becomes extremely brittle. This causes problems such as cracks in the relief during printing. For the above reasons, it is necessary to use the photomerizable monomer of component (b) in a range of 20 to 200 parts by weight per 1 part of component (a) 100 parts by weight, preferably 50 to 150 parts by weight. is.
本発明の(c)成分として使用される末端に−3H基を
有する化合物は、(a>成分の基体樹脂に(b)成分の
光重合性不飽和化合物を配合した感光性樹脂組成物中に
配合されることによって臭気を消すことができる。The compound having a -3H group at the end used as component (c) of the present invention is contained in a photosensitive resin composition in which a photopolymerizable unsaturated compound as component (b) is blended with a base resin as component (a). Odors can be eliminated by blending them.
本発明の(c)成分として使用される化合物としては、
エヂルチオール、プロビルヂオール、イソプロピルチオ
ール、n−ブチルチオール、アリルチオール、n−ペプ
チルチオール、n−へキシルチオール、n−ペプチルチ
オール、n−オクチルチオール、n−ノニルチオール、
n−デシルチオール、n−ウンデシルチオール、n−ド
デシルチオール、n−トリデシルチオール、n−オクタ
デシルチオールなどのアルキルチオール。チオフェノー
ル、ベンジルチオールなどの芳香族チオール。2−メル
カプトエタノール、2−メルカプトプロパツール、2−
メルカプトペンタノール、2−メルカプトヘキサノール
ツール
ンチオグリコール、チオグリセリンなどのアルカノール
ヂオール。ヂオ酢浪、チオグリコール酸、チオアクリル
酸などのチオカルボン酸。末端に一S H基をもつポリ
スルフィドで分子ff150〜2。Compounds used as component (c) of the present invention include:
Edylthiol, provildiol, isopropylthiol, n-butylthiol, allylthiol, n-peptylthiol, n-hexylthiol, n-peptylthiol, n-octylthiol, n-nonylthiol,
Alkylthiols such as n-decylthiol, n-undecylthiol, n-dodecylthiol, n-tridecylthiol, n-octadecylthiol. Aromatic thiols such as thiophenol and benzylthiol. 2-mercaptoethanol, 2-mercaptopropertool, 2-
Alkanol diols such as mercaptopentanol, 2-mercaptohexanol, thioglycol, and thioglycerin. Thiocarboxylic acids such as dioxic acid, thioglycolic acid, and thioacrylic acid. Polysulfide with one SH group at the end, molecule ff150-2.
000のものなどであるが、これらに限定されるもので
はない。n−デシルチオール、n−ウンデシルチオール
、n−ドデシルチオール、n−、トリデシルチオール、
エヂレンヂオグリコールおよびチオグリセリンは特に好
ましく用いられる。000, but is not limited to these. n-decylthiol, n-undecylthiol, n-dodecylthiol, n-, tridecylthiol,
Edilenedioglycol and thioglycerin are particularly preferably used.
(c)成分の分子口は50〜2,000の範囲におるこ
とが必要でおる。分子口が50未満であると揮発性が著
しく高いために感光性樹脂組成物の調整時や版材成形時
にその大部分が飛散してしまう。逆に、分子口が2.0
00を越えると感光性組成物との相溶性が低下するため
使用できないことが多い。以上の理由から、(c)成分
の分子口は50〜2,000の範囲にあることが必要で
あり、より好ましくは70〜1,000である。The molecular weight of component (c) must be in the range of 50 to 2,000. If the number of molecules is less than 50, the volatility is extremely high, and most of it will be scattered during preparation of the photosensitive resin composition or molding of the plate material. Conversely, the molecular mouth is 2.0
If it exceeds 00, the compatibility with the photosensitive composition decreases, so it is often unusable. For the above reasons, the molecular weight of component (c) needs to be in the range of 50 to 2,000, more preferably 70 to 1,000.
(、C)成分の使用口は(a>成分の基体樹脂100重
量部に対して0.01〜10重但部が必要である。(c
)成分の使用量が0.01重量部未満であると、(c)
成分添加による脱臭能力が小さく効果が発現しない。ま
た使用量が10@但部を越えると光重合反応を阻害した
り、(c)成分自体のもつ臭気が著しくなることが多い
。このような理由から(c)成分の一S H基を末端に
もつ化合物の使用量は、( a. )成分の基体樹脂1
00重量部に対して0.01〜10重量部の範囲におる
ことが必要でおり、好ましくは0.05〜5重量部でお
る。また(c)成分として2種類以上のものを混合して
使用することも可能で必る。Component (C) should be used in an amount of 0.01 to 10 parts by weight per 100 parts by weight of the base resin of component (a). (c)
) When the amount of the component used is less than 0.01 part by weight, (c)
The deodorizing ability due to the addition of ingredients is small and the effect is not expressed. Moreover, if the amount used exceeds 10 parts, the photopolymerization reaction is often inhibited, and the odor of component (c) itself becomes significant. For these reasons, the amount of the compound having an S H group at the end of component (c) is the same as the base resin of component (a.).
0.00 parts by weight, it is necessary to be in the range of 0.01 to 10 parts by weight, preferably 0.05 to 5 parts by weight. It is also possible and necessary to use a mixture of two or more types as component (c).
本発明の組成物の光重合反応を速やかに行なわせるため
の光増感剤としては、従来公知の化合物を全て使用でき
る。例えば、ベンゾインアルキルエーテル類、ベンゾフ
ェノン類、アントラキノン類、ベンジル類、アセトフェ
ノン類、ジアセチル類などが挙げられる。As the photosensitizer for rapidly carrying out the photopolymerization reaction of the composition of the present invention, all conventionally known compounds can be used. Examples include benzoin alkyl ethers, benzophenones, anthraquinones, benzyls, acetophenones, and diacetyls.
これらの光増感剤は、全組成物に対して0.01〜10
@ffi%の範囲で使用できる。These photosensitizers should be added in an amount of 0.01 to 10 to the total composition.
Can be used within the range of @ffi%.
本発明の感光性樹脂組成物の熱安定性を増すために従来
公知の重合禁止剤は全て使用することができる。好まし
い熱重合禁止剤としては、フェノール類、ハイドロキノ
ン類、カテコール類などが挙げられる。これらの熱安定
剤は、組成物仝但に対して0.001〜5@m%の範囲
で使用することができる。また染料、顔料、界面活性剤
、消泡剤、紫外線吸収剤、香料などを添加することがで
きる。All conventionally known polymerization inhibitors can be used to increase the thermal stability of the photosensitive resin composition of the present invention. Preferred thermal polymerization inhibitors include phenols, hydroquinones, catechols, and the like. These heat stabilizers can be used in an amount of 0.001 to 5 m% based on the composition. Further, dyes, pigments, surfactants, antifoaming agents, ultraviolet absorbers, fragrances, etc. can be added.
本発明の感光性樹脂組成物を製造する方法としては、(
a)成分の基体樹脂を単独または混合溶媒に加熱溶解し
た後に(b)成分の光重合性モノマ、(c)成分の−S
H結合をもつ化合物および光増感剤、熱安定剤などを添
加し、攪拌して十分に混合することが一般的である。こ
のようにして感光性樹脂溶液が得られる。The method for producing the photosensitive resin composition of the present invention includes (
After heating and dissolving the base resin as the component (a) alone or in a mixed solvent, the photopolymerizable monomer as the component (b) and -S as the component (c) are added.
Generally, a compound having an H bond, a photosensitizer, a heat stabilizer, and the like are added and thoroughly mixed by stirring. In this way, a photosensitive resin solution is obtained.
上記の混合溶液から感光層を形成せしめるには、例えば
溶剤の大部分を留去した後に加熱して溶融状態にして支
持体上に押出して成形することができる。また軟式製膜
法で感光性シートを作り、このシートを支持体上に接着
して感光層を形成することも可能でおる。ざらに支持体
に直接に乾式製膜して感光層を1qることもできる。In order to form a photosensitive layer from the above-mentioned mixed solution, for example, most of the solvent can be distilled off, and then the mixture can be heated to a molten state and extruded onto a support to be molded. It is also possible to make a photosensitive sheet by a flexible film forming method and adhere this sheet onto a support to form a photosensitive layer. It is also possible to directly form a dry film on the support to form a photosensitive layer of 1 q.
支持体としては、スチール、ステンレス、アルミニウム
、銅などの金属板、ポリエステルフィルムなどのプラス
チックシート、スチレン−ブタジェン共重合体などの合
成ゴムシートが用いられる。As the support, metal plates such as steel, stainless steel, aluminum, and copper, plastic sheets such as polyester films, and synthetic rubber sheets such as styrene-butadiene copolymer are used.
感光層は、0.1〜1Qmmの厚さに形成することが好
ましい。The photosensitive layer is preferably formed to have a thickness of 0.1 to 1 Qmm.
本発明の感光性樹脂組成物を用いて印刷用レリーフ像を
形成するには、上記のようにして作成した感光層上にネ
ガティブまたはポジティブの原図フィルムを密着し、通
常300〜400nmの波長を中心とする高圧水銀灯、
超高圧水銀灯、メタルハライドランプ、キセノン灯、カ
ーボンアーク灯、ケミカル灯などからの紫外線を照射し
、光重合により光重合により硬化せしめる。次いて未重
合部分をスプレー現像装置またはブラシ式現像装置など
を用いて溶媒中に溶出させることにより、レリーフが支
持体上に形成される。In order to form a relief image for printing using the photosensitive resin composition of the present invention, a negative or positive original film is closely adhered to the photosensitive layer prepared as described above, and the wavelength is usually centered at 300 to 400 nm. high-pressure mercury lamp,
It is cured by photopolymerization by irradiating ultraviolet light from an ultra-high pressure mercury lamp, metal halide lamp, xenon lamp, carbon arc lamp, chemical lamp, etc. Next, a relief is formed on the support by dissolving the unpolymerized portion into a solvent using a spray developing device, a brush developing device, or the like.
本発明の感光性樹脂組成物は、版材自体やそれを現像し
た現像液中に認められる臭気をなくし、製版および現像
作業者の作業環境を改善することができる。これは(c
)成分の−SH基をもつ化合物を適当量添加することで
もたらされるものである。この機構については明らかで
ないが、(c)成分の末端におるーSH基は反応性に富
むので(b)成分の光重合性ツマに含まれる刺激臭の原
図となっているアルデヒド類のような不純物と反応して
無臭化するのではないかと考えられる。しかしながら、
(c)成分の化合物は一般にそれ自体が臭気が強く、光
集合を阻害する性質もある。The photosensitive resin composition of the present invention eliminates the odor observed in the plate material itself and the developer used to develop it, and can improve the working environment for plate making and development operators. This is (c
) is obtained by adding an appropriate amount of a compound having a --SH group. The mechanism for this is not clear, but since the -SH group at the end of component (c) is highly reactive, it is likely that aldehydes, which are the source of the irritating odor contained in the photopolymerizable resin of component (b), It is thought that it reacts with impurities and becomes odorless. however,
The compound of component (c) generally has a strong odor itself and also has the property of inhibiting light gathering.
したがって、(c)成分の添加量は慎重に決定する必要
がある。すなわち、(c)成分の添加量は、臭気を改善
するための必要最小限に抑えなければならず、それ以上
の添加は臭気および画像再現性を低下させる。Therefore, the amount of component (c) to be added needs to be determined carefully. That is, the amount of component (c) added must be kept to the minimum necessary to improve odor, and addition beyond that will reduce odor and image reproducibility.
本発明の感光性樹脂組成物は、凸版印刷材として用いら
れる時に最もその効果を発揮するが、平版印刷材、凹版
印刷材、孔版印111材、フォトレジストとして使用す
ることも可能でおる。The photosensitive resin composition of the present invention is most effective when used as a letterpress printing material, but it can also be used as a lithographic printing material, an intaglio printing material, a stencil stamp 111 material, and a photoresist.
[実施例] 以下に実施例で本発明をさらに詳しく説明する。[Example] The present invention will be explained in more detail with reference to Examples below.
実施例1
ケン化度80モル%、平均重合度900の部分ケン化ポ
リ酢酸ビニル100重屯部をエタノール/水=40/6
0 (重量比)の混合溶剤250重量部に70℃で2時
間溶解した。次いで光重合性モノマとして、エチレング
リコールジグリシジルエーテル1モルとアクリル醗2モ
ルの付加反応で得られた化合物を70重口部添加して十
分に攪拌した。Example 1 100 tonne parts of partially saponified polyvinyl acetate with saponification degree of 80 mol% and average polymerization degree of 900 was mixed with ethanol/water = 40/6
0 (weight ratio) in 250 parts by weight of a mixed solvent at 70°C for 2 hours. Next, as a photopolymerizable monomer, 70 weight parts of a compound obtained by an addition reaction of 1 mole of ethylene glycol diglycidyl ether and 2 moles of acrylic alcohol were added and thoroughly stirred.
さらに、チオグリセリン1重量部、可塑剤としてジエチ
レングリコール15重量部、光増感剤としてジメチルベ
ンジルケタール2重量部、熱安定剤としてハイドロキノ
ンモノメチルエーテル0゜1重・置部を加え十分に攪拌
混合した。このようにして得られた感光性樹脂溶液では
、刺激臭は全く感じられなかった。Further, 1 part by weight of thioglycerin, 15 parts by weight of diethylene glycol as a plasticizer, 2 parts by weight of dimethylbenzyl ketal as a photosensitizer, and 0.1 part by weight of hydroquinone monomethyl ether as a heat stabilizer were added and mixed with thorough stirring. The photosensitive resin solution thus obtained had no irritating odor at all.
次いで、この感光性組成物を予めエポキシ系接着剤が塗
布・キュアしである厚さ300μのスチール基板上に乾
燥後の厚さが950μ(基板を含む)になるように塗布
した。次いで、これを60°Cのオーブンに4時間入れ
て溶剤を除去した。Next, this photosensitive composition was coated onto a 300 μm thick steel substrate on which an epoxy adhesive had been applied and cured in advance so that the thickness after drying was 950 μm (including the substrate). This was then placed in a 60°C oven for 4 hours to remove the solvent.
jqられた版材および現像廃液には、はとんど臭気がな
いことが確認された。また画像再現性にも問題のないこ
とが確認された。印刷テストの結果も良好であった。It was confirmed that there was almost no odor in the processed plate material and developing waste solution. It was also confirmed that there was no problem in image reproducibility. The results of the printing test were also good.
比較例1
実施例1において、チオグリセリン1重量部を添加せず
にその他は全く同様にして感光性樹脂組成物溶液を調整
した。この溶液は、強い刺激臭を持つものであった。Comparative Example 1 A photosensitive resin composition solution was prepared in the same manner as in Example 1 except that 1 part by weight of thioglycerin was not added. This solution had a strong pungent odor.
この感光性樹脂組成物を、実施例1と同様の条件で版材
に形成した。得られた版材と現像廃液は、かなりの臭気
をもつものであった。This photosensitive resin composition was formed into a plate material under the same conditions as in Example 1. The obtained plate material and developer waste had a considerable odor.
以上の結果から、チオグリセリンの添加は、感光性組成
物および版材の臭気を著しく軽減することが判明した。From the above results, it was found that the addition of thioglycerin significantly reduced the odor of the photosensitive composition and plate material.
実施例2
メトキシメチル化率30モル%のN−メトキシメチル化
6−ナイロン100Iff1部をエタノール/水=80
/20 (重量比)の混合溶剤120重口部に80°C
で加温溶解した。これにグリシジルメタクリレートを3
重量部り口えて、so’cで1時間反応させてナイロン
の末端に二重結合を導入した。次いで光重合性七ツマと
してグリセロールジメタクリレート70重量部、可塑剤
としてN−ブチルベンゼンスルホンアミド25虫口部、
n−ドデシルチオール0.2重量部、光増感剤としてベ
ンゾインエチルエーテル2重量部を添加して十分に混合
した。このようにして得られた感光性樹脂組成物溶液は
、はとんど臭気のしないものでおった。Example 2 1 part of N-methoxymethylated 6-nylon 100Iff with a methoxymethylation rate of 30 mol% was mixed with ethanol/water = 80
/20 (weight ratio) mixed solvent 120 at 80°C
Dissolved by heating. Add 3 glycidyl methacrylate to this
A double bond was introduced into the end of the nylon by weighing parts by weight and reacting with SO'C for 1 hour. Next, 70 parts by weight of glycerol dimethacrylate as a photopolymerizable pot, 25 parts by weight of N-butylbenzenesulfonamide as a plasticizer,
0.2 parts by weight of n-dodecylthiol and 2 parts by weight of benzoin ethyl ether as a photosensitizer were added and thoroughly mixed. The photosensitive resin composition solution thus obtained was almost odorless.
この溶液を予めポリエステル系の接着剤が塗布・キュア
しである厚さ200μのポリエステルフィルム上に乾燥
後の厚ざく基板を含む)が700μとなるように流延し
た。その後、60℃のオーブンに3時間入れて溶媒を除
去した。この版材はほとんど無臭でおり、感光特性も良
好であることが確認された。また印刷テス1〜でも良好
な結果を得ることができた。This solution was cast onto a polyester film having a thickness of 200 μm, which had been previously coated with a polyester adhesive and cured, so that the thickness (including the thick substrate after drying) would be 700 μm. Thereafter, the mixture was placed in an oven at 60° C. for 3 hours to remove the solvent. It was confirmed that this plate material was almost odorless and had good photosensitive properties. Also, good results were obtained in printing tests 1 to 1.
比較例2
実施例2でn−ドデシルチオールを添加せず、それ以外
は全く同一条件で感光性樹脂組成物溶液を調製した。こ
の溶液は、強い刺激臭をもつものでめった。Comparative Example 2 A photosensitive resin composition solution was prepared under the same conditions as in Example 2 except that n-dodecylthiol was not added. This solution had a strong pungent odor.
次に、この溶液を使用して実施例2と同一の方法で版材
を作成した。得られた版材には、かなりの刺激臭が残っ
ていた。Next, a plate material was prepared in the same manner as in Example 2 using this solution. The obtained plate material had a considerable pungent odor remaining.
[発明の効果]
本発明に係る感光性樹脂組成物は、上述のごとく溝成し
たので、感光特性や印刷適性を良好に保持しながら、感
光性樹脂版材の臭気を著しく軽減させることができると
いう顕著な実用効果を奏するものである。[Effects of the Invention] Since the photosensitive resin composition according to the present invention has the grooves as described above, it is possible to significantly reduce the odor of the photosensitive resin plate material while maintaining good photosensitive characteristics and printability. This has a remarkable practical effect.
Claims (1)
とを特徴とする感光性樹脂組成物。 (a)バインダとしての基体樹脂100重量部 (b)末端にエチレン性二重結合を有し、沸点が150
℃以上の光重合性不飽和化合物20〜200重量部 (c)分子量が50〜2,000で、末端に−SH基を
有する化合物0.01〜10重量部[Scope of Claims] A photosensitive resin composition comprising at least the following components (a) to (c). (a) 100 parts by weight of base resin as a binder (b) Has an ethylenic double bond at the end and has a boiling point of 150
20 to 200 parts by weight of a photopolymerizable unsaturated compound with a molecular weight of 50 to 2,000 and a terminal -SH group (0.01 to 10 parts by weight)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61262664A JPH0658532B2 (en) | 1986-11-06 | 1986-11-06 | Photosensitive resin composition for printing plate material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61262664A JPH0658532B2 (en) | 1986-11-06 | 1986-11-06 | Photosensitive resin composition for printing plate material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63118150A true JPS63118150A (en) | 1988-05-23 |
JPH0658532B2 JPH0658532B2 (en) | 1994-08-03 |
Family
ID=17378901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61262664A Expired - Fee Related JPH0658532B2 (en) | 1986-11-06 | 1986-11-06 | Photosensitive resin composition for printing plate material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0658532B2 (en) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3479185A (en) * | 1965-06-03 | 1969-11-18 | Du Pont | Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers |
JPS4954018A (en) * | 1972-07-31 | 1974-05-25 | ||
JPS53702A (en) * | 1975-12-23 | 1978-01-06 | Dynachem Corp | Adhesion promoting agent for polymerized film |
JPS5757082A (en) * | 1980-09-24 | 1982-04-06 | Ricoh Co Ltd | Conversion method for picture element density |
JPS5941444A (en) * | 1982-08-31 | 1984-03-07 | Seiko Epson Corp | Decorative sintered hard alloy |
JPS59142258A (en) * | 1983-02-04 | 1984-08-15 | Sony Corp | Photo-curable paint composition |
JPS6028291A (en) * | 1983-07-26 | 1985-02-13 | Mitsubishi Electric Corp | Semiconductor laser element |
-
1986
- 1986-11-06 JP JP61262664A patent/JPH0658532B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3479185A (en) * | 1965-06-03 | 1969-11-18 | Du Pont | Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers |
JPS4954018A (en) * | 1972-07-31 | 1974-05-25 | ||
JPS53702A (en) * | 1975-12-23 | 1978-01-06 | Dynachem Corp | Adhesion promoting agent for polymerized film |
JPS5757082A (en) * | 1980-09-24 | 1982-04-06 | Ricoh Co Ltd | Conversion method for picture element density |
JPS5941444A (en) * | 1982-08-31 | 1984-03-07 | Seiko Epson Corp | Decorative sintered hard alloy |
JPS59142258A (en) * | 1983-02-04 | 1984-08-15 | Sony Corp | Photo-curable paint composition |
JPS6028291A (en) * | 1983-07-26 | 1985-02-13 | Mitsubishi Electric Corp | Semiconductor laser element |
Also Published As
Publication number | Publication date |
---|---|
JPH0658532B2 (en) | 1994-08-03 |
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