JPS63117994A - Device for synthesizing diamond in vapor phase - Google Patents

Device for synthesizing diamond in vapor phase

Info

Publication number
JPS63117994A
JPS63117994A JP26471986A JP26471986A JPS63117994A JP S63117994 A JPS63117994 A JP S63117994A JP 26471986 A JP26471986 A JP 26471986A JP 26471986 A JP26471986 A JP 26471986A JP S63117994 A JPS63117994 A JP S63117994A
Authority
JP
Japan
Prior art keywords
substrate
diamond
reaction tube
gas
vapor phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26471986A
Other languages
Japanese (ja)
Other versions
JPH0772119B2 (en
Inventor
Koji Kobashi
宏司 小橋
Kozo Nishimura
耕造 西村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP61264719A priority Critical patent/JPH0772119B2/en
Publication of JPS63117994A publication Critical patent/JPS63117994A/en
Publication of JPH0772119B2 publication Critical patent/JPH0772119B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To reduce the cost required for the synthesis of diamond by synthesizing diamond in a vapor phase while introducing a gaseous mixture of a carbon dioxide and hydrogen into the title vapor-phase synthesis device. CONSTITUTION:The microwave transmitted from a magnetron oscillator 1 is passed through an isolator 2, power monitor 3, tuner 4, and waveguide 5 in the order described, and then projected on a substrate 7 set in a reaction tube 6 made of quartz and pierced through the waveguide 5. A metallic material such as Ta, Co, W, Mo, etc., can be used for the substrate 7, however an Si wafer is generally used as the substrate. The substrate 7 is arranged at a specified position by a holder 9 made of quartz. The gaseous mixture of the carbon dioxide and hydrogen is introduced into the reaction tube 6 from the reaction tube inlet 11 side. A specified amt. of the introduced gaseous mixture is sucked and exhausted from an exhaust port 13 side, and the inside of the reaction tube 6 is kept at a preset pressure. The substrate 7 is arranged in a plasma producing region 14, and the diamond crystal is deposited on the substrate 7 with the carbon in the gaseous mixture as the raw material.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、ダイヤモンドの気相合成法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for vapor phase synthesis of diamond.

[従来の技術] ダイヤモンドは、高硬度であることを利用して古くは切
削工具用途を中心に広く使用されてきた。一方近年では
、熱伝導度が大きいこと、不純物ドーピングにより半導
体として利用可能性があること等に着目され、前者の特
性を利用するものとしてIC(集積回路)基板のヒート
シンク(冷却用放熱器)への適用が検討され、また後者
の特性を利用するものとして半導体素子等の電子技術分
野にも応用されるに至り、ダイヤモンドを形成する為の
技術が急速に開発されつつある。
[Prior Art] Diamond has long been widely used mainly in cutting tools because of its high hardness. On the other hand, in recent years, attention has been paid to its high thermal conductivity and its potential to be used as a semiconductor by doping with impurities. The application of diamond has been studied, and the latter property has also been applied to the field of electronic technology such as semiconductor devices, and techniques for forming diamond are being rapidly developed.

ダイヤモンドの合成法としては、黒鉛を炭素原料とし、
Ni、Cr、Mn等を触媒として4〜7万気圧、 10
00〜2000℃の高温・高圧で行なう高圧法が知られ
ているが、その他気体状炭化水素を炭素原料として低圧
条件下で行なう気相合成法も開発されている。気相合成
法によるダイヤモンドの合成は、高圧法と比べてダイヤ
モンドの結晶が小さくなるという欠点が従来より指摘さ
れてきたが、上述した様な電子技術分野への応用が進め
られると、却って薄膜の形成が容易であるという利点が
着目され、有用な技術であると位置付けられている。
The synthesis method for diamond uses graphite as a carbon raw material,
40,000 to 70,000 atmospheres using Ni, Cr, Mn, etc. as a catalyst, 10
A high-pressure method is known in which synthesis is carried out at high temperatures and pressures of 00 to 2000°C, but gas phase synthesis methods have also been developed in which gaseous hydrocarbons are used as carbon raw materials and carried out under low-pressure conditions. It has been pointed out that the disadvantage of diamond synthesis using the vapor phase synthesis method is that the diamond crystals are smaller compared to the high-pressure method. The advantage that it is easy to form has attracted attention, and it is positioned as a useful technology.

第1図はダイヤモンド気相合成装置の一例を示す概略説
明図である。当該装置はマイクロ波を応用した技術であ
り、その概略は下記の如くである。
FIG. 1 is a schematic diagram showing an example of a diamond vapor phase synthesis apparatus. The device is a technology that applies microwaves, and its outline is as follows.

第1図において、マグネトロン発振811から発信され
たマイクロ波(2,45G Hz )は、アイソレータ
2、パワーモニタ3、チューナ4及び導波管5をこの記
載順序で導かれ、前記導波管5を貫通して設けられる石
英製の反応管6内に設置された基板7に照射される。前
記基板7としてはTa、Co、W、Mo等の金属材料が
用いられる場合もあるが、一般的にはSiウェハが用い
られ、該基板7は石英製の支持台9によって所定位置に
配置されている。そして反応管6内には反応管入口11
側から、H2ガスとCH4ガスを所定割合に混合(例え
ばCH41%−H299%)した混合ガスが約1003
 CCM (Standard CubicCenti
meters per Minute)の流量で導入さ
れる。
In FIG. 1, a microwave (2.45 GHz) emitted from a magnetron oscillation 811 is guided through an isolator 2, a power monitor 3, a tuner 4, and a waveguide 5 in the order shown. A substrate 7 placed in a quartz reaction tube 6 which is provided through it is irradiated. Although a metal material such as Ta, Co, W, or Mo may be used as the substrate 7, generally a Si wafer is used, and the substrate 7 is placed at a predetermined position by a support base 9 made of quartz. ing. Inside the reaction tube 6 is a reaction tube inlet 11.
From the side, a mixed gas of H2 gas and CH4 gas mixed at a predetermined ratio (for example, CH41%-H299%) is about 100%
CCM (Standard CubicCenti
meters per minute).

導入された混合ガスは排気口13側から所定量吸引排気
され、反応管6内は予め定めた圧力(例えば40〜50
 Torr)とされる。
A predetermined amount of the introduced mixed gas is suctioned and exhausted from the exhaust port 13 side, and the inside of the reaction tube 6 is maintained at a predetermined pressure (for example, 40 to 50
Torr).

この様にして混合ガスが供給された反応管6内にマイク
ロ波の様な振動電波(約300W)が導入されると、高
エネルギー電子によフて混合ガス成分分子が原子・イオ
ン・ラジカルに分解され、反応管6内には定常的なプラ
ズマが発生する。前記基板7はプラズマ発生領域14に
配置されており、当該基板7上には混合ガス中の炭素を
原料としてダイヤモンド結晶が析出する。そして基板7
の種類や処理条件に応じて微結晶又は薄膜等の様に異な
った形態のダイヤモンドが得られる。
When oscillating radio waves (approximately 300 W) such as microwaves are introduced into the reaction tube 6 into which the mixed gas is supplied in this way, the mixed gas component molecules are converted into atoms, ions, and radicals by high-energy electrons. It is decomposed and a steady plasma is generated in the reaction tube 6. The substrate 7 is placed in the plasma generation region 14, and diamond crystals are deposited on the substrate 7 using carbon in the mixed gas as a raw material. and board 7
Depending on the type of diamond and processing conditions, diamonds can be obtained in different forms, such as microcrystals or thin films.

第1図に示したダイヤモンド気相合成装置において、例
えば基板7としてSiウェハを用いた場合には、上述し
た処理条件で基板温度が約850℃となり、基板7上に
約0.3μm/時間の成長速度で結晶性ダイヤモンドが
析出する。尚第1図中の参照符号15はプランジャーで
あり、基板7が正確にプラズマ発生領域14の中央に位
置する様にマイクロ波の反射を調整する為のものである
In the diamond vapor phase synthesis apparatus shown in FIG. 1, if a Si wafer is used as the substrate 7, the substrate temperature will be approximately 850°C under the above-mentioned processing conditions, and a Crystalline diamond precipitates at a growth rate. Reference numeral 15 in FIG. 1 is a plunger, which is used to adjust the reflection of microwaves so that the substrate 7 is accurately located at the center of the plasma generation region 14.

又参照符号20で示されている部材はアプリケーターで
あり、冷却水を供給管21から供給しつつ排出管22か
ら排出して反応管6が過度に加熱されるのを防ぐ機能を
果たす。
A member designated by reference numeral 20 is an applicator, which functions to prevent the reaction tube 6 from being excessively heated by supplying cooling water from the supply pipe 21 and discharging it from the discharge pipe 22.

[発明が解決しようとする問題点] 第1図に示した気相合成装置における炭素原料としては
、上述したメタン(C)(4)の他、アセチレン、エチ
レン、エタン、ベンゼン等の様な炭化水素が一般的に用
いられていた。これは、上記の様な炭化水素を用いた場
合に反応室内で進行するプラズマ反応による副生成物が
、水素、炭素。
[Problems to be Solved by the Invention] In addition to the above-mentioned methane (C) (4), carbonized materials such as acetylene, ethylene, ethane, benzene, etc. Hydrogen was commonly used. This is because when the above-mentioned hydrocarbons are used, the byproducts of the plasma reaction that progresses in the reaction chamber are hydrogen and carbon.

炭化水素等に限定され、且つこれらは強い毒性や腐食性
がなく、廃ガス処理が容易であるという消極的理由から
である。
This is because they are limited to hydrocarbons and the like, and these are not highly toxic or corrosive, and are easy to treat as waste gas.

しかしながら、上述した様な炭化水素は高価とは言えな
い迄も、大量に消費できる程安価なものとは言えなかっ
た。従ってこれらの炭化水素を炭素原料として大量に用
いた場合は、原料コストが無視できないものとなってく
る。
However, although the above-mentioned hydrocarbons cannot be said to be expensive, they cannot be said to be cheap enough to be consumed in large quantities. Therefore, when these hydrocarbons are used in large quantities as carbon raw materials, the cost of raw materials becomes non-negligible.

本発明の目的は、ダイヤモンド合成する為に要する費用
を少しでも安価にできる様な気相合成法を提供すること
にある。
An object of the present invention is to provide a vapor phase synthesis method that can reduce the cost required for diamond synthesis as much as possible.

[問題点を解決する為の手段] 上記目的を達成し得た本発明とは、ダイヤモンドの気相
合成に当たり、炭素原料として二酸化炭素を用い該二酸
化炭素と水素の混合ガスを気相合成装置に導入しつつ気
相合成を行なう点に要旨を有するダイヤモンド気相合成
法である。
[Means for Solving the Problems] The present invention, which has achieved the above object, uses carbon dioxide as a carbon raw material and feeds the mixed gas of carbon dioxide and hydrogen into a vapor phase synthesis apparatus in the vapor phase synthesis of diamond. This diamond vapor phase synthesis method has the key point of performing vapor phase synthesis while introducing diamond.

[作用コ 本発明は上述の如く構成されるが、要は炭素原料として
二酸化炭素(CO2)を用いた点に最大の特徴を有する
ものである。即ち本発明者らは、炭化水素に代り得る炭
素原料で且つ炭化水素よりも安価なものがないかと種々
検討した結果、炭素原料として炭化水素よりも安価なC
o2ガスを用いた場合にも、炭化水素を用いる場合と同
様にダイヤモンドが得られることを見出し本発明を完成
したものである。
[Operations] Although the present invention is constructed as described above, the main feature is that carbon dioxide (CO2) is used as the carbon raw material. That is, as a result of various studies to find a carbon raw material that can be substituted for hydrocarbons and is cheaper than hydrocarbons, the present inventors found that C, which is cheaper than hydrocarbons, was found as a carbon raw material.
The present invention was completed by discovering that diamonds can be obtained using O2 gas in the same way as when using hydrocarbons.

一方従来の技術で述べた様に炭素原料としてCH4ガス
を用いた場合には、CH4ガスはH2ガスによって希釈
されているが、このH2ガスはダイヤモンドと同時に発
生するグラファイト等の非ダイヤモンド性物質を除去す
る作用を発揮するものとして利用されていた。即ち、H
2ガスがプラズマ中で分解して生じる原子状水素はダイ
ヤモンドよりもグラファイトと結合し易く、気相合成の
際にダイヤモンドと同時に発生するグラファイトは前記
原子状水素によってエツチング除去される。−力木発明
においては、H2ガスはそのまま必要とされ、炭素原料
としてのCo2ガスはH2ガスによって希釈されて気相
合成装置に導入される。尚C02ガスとH2ガスの混合
割合は何ら限定するものではないが、H2ガス量が少な
すぎると(相対的にCが多すぎると)グラファイト等の
非ダイヤモンド性物質が発生し易くなるので、その点を
考慮するとCO2/H2は0.001〜0.5程度であ
るのが好ましい。
On the other hand, when CH4 gas is used as a carbon raw material as described in the conventional technology, CH4 gas is diluted with H2 gas, but this H2 gas contains non-diamond materials such as graphite that are generated at the same time as diamond. It was used for its removal effect. That is, H
Atomic hydrogen produced by the decomposition of the two gases in plasma is more likely to bond with graphite than with diamond, and the graphite produced simultaneously with diamond during vapor phase synthesis is etched away by the atomic hydrogen. - In the power tree invention, H2 gas is required as is, and Co2 gas as a carbon raw material is diluted with H2 gas and introduced into the vapor phase synthesis apparatus. The mixing ratio of C02 gas and H2 gas is not limited in any way, but if the amount of H2 gas is too small (relatively too much C), non-diamond substances such as graphite will be likely to be generated. Considering this point, it is preferable that CO2/H2 is about 0.001 to 0.5.

本発明は上述した様に炭素原料としてCo2ガスを用い
るものであるが、このC02ガスを気相合成装置の水素
プラズマ霊囲気中に導入すると、002分子の分解によ
ってCが生じ、このCがダイヤモンドの成長に寄与する
ものである。更に好ましいことには、炭素原料としてC
02ガスを用いた場合には、CO2の分解によって生じ
た酸素原子・イオン種は非ダイヤモンド性物質との反応
性が高く、従来の場合よりも更に効率的に非ダイヤモン
ド性物質の除去が達成されるという効果をも有する。
As mentioned above, the present invention uses Co2 gas as a carbon raw material. When this CO2 gas is introduced into the hydrogen plasma atmosphere of a vapor phase synthesis apparatus, C is produced by the decomposition of 002 molecules, and this C is used to form diamonds. This will contribute to the growth of More preferably, C as the carbon raw material
When using 02 gas, the oxygen atoms and ion species generated by the decomposition of CO2 are highly reactive with non-diamond substances, and non-diamond substances can be removed more efficiently than in the conventional case. It also has the effect of

尚本発明方法を実施するに当たっては、格別の装置を別
途設ける必要はなく、基本的には前記第1図に示した装
置を用いればよい。即ち第1図に示した様な装置におい
て、cH4+H2の混合ガスの代りに、所定の割合に混
合したco2+H2混合ガスを用い、該混合ガスを反応
管6に導入しつつ気相合成を行なう様にすればよい。
In carrying out the method of the present invention, there is no need to separately provide any special equipment, and basically the equipment shown in FIG. 1 may be used. That is, in the apparatus shown in FIG. 1, instead of the mixed gas of cH4 + H2, a mixed gas of CO2 + H2 mixed at a predetermined ratio is used, and while the mixed gas is introduced into the reaction tube 6, gas phase synthesis is performed. do it.

[実施例] 第1図に示した装置を用い、本発明方法を実施した。[Example] The method of the present invention was carried out using the apparatus shown in FIG.

Co2ガスを10容量%となる様にH2ガスで希釈した
混合ガスを用い、第1図に示した反応管6に供給して気
相合成に供した。混合ガスの流量は11005CCとし
、反応管6の内圧は4゜Torrに保ち、マイクロ波の
出力を350Wとした。基板7としては0.5mm厚の
S i (111)  ウェハを騎μmのダイヤモンド
ペーストで1時間研摩したものを用い(20xlOmm
)、プランジャー15の調節によって基板7がプラズマ
発生領域14のほぼ中央になる様にした。尚装置運転中
の基板温度は830℃であった。
A mixed gas prepared by diluting Co2 gas with H2 gas to 10% by volume was supplied to the reaction tube 6 shown in FIG. 1 for gas phase synthesis. The flow rate of the mixed gas was 11,005 cc, the internal pressure of the reaction tube 6 was maintained at 4° Torr, and the output of the microwave was 350 W. As the substrate 7, a 0.5 mm thick S i (111) wafer polished for 1 hour with diamond paste of 10 μm (20×10 mm) was used.
), the plunger 15 was adjusted so that the substrate 7 was located approximately at the center of the plasma generation region 14. The substrate temperature during operation of the apparatus was 830°C.

この様にして合成反応を7時間行なった後に、Si基板
表面を走査型電子顕微鏡(SEM。
After performing the synthesis reaction in this manner for 7 hours, the surface of the Si substrate was examined using a scanning electron microscope (SEM).

Scanning  Electron  Micro
scope)で観察したところ、基板7上に約2μm厚
のダイヤモンド薄膜が成長しているのが確認された。
Scanning Electron Micro
When observed with a scope), it was confirmed that a diamond thin film with a thickness of about 2 μm had grown on the substrate 7.

[発明の効果コ 以上述べた如く本発明によれば、炭素原料としてCo2
ガスを用いることによって、より安価にダイヤモンドが
得られる様になった。
[Effects of the invention] As described above, according to the present invention, CO2 is used as a carbon raw material.
By using gas, it became possible to obtain diamonds at a lower cost.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はダイヤモンド気相合成装置の例を示す概略説明
図である。 1・・・マグネトロン発振機 5・・・導波管     6・・・反応管7・・・基板
      14・・・プラズマ発生領域15・・・プ
ランジャー 第1図
FIG. 1 is a schematic explanatory diagram showing an example of a diamond vapor phase synthesis apparatus. 1... Magnetron oscillator 5... Waveguide 6... Reaction tube 7... Substrate 14... Plasma generation region 15... Plunger Fig. 1

Claims (1)

【特許請求の範囲】[Claims] ダイヤモンドの気相合成に当たり、炭素原料として二酸
化炭素を用い、該二酸化炭素と水素の混合ガスを気相合
成装置に導入しつつ気相合成を行なうことを特徴とする
ダイヤモンドの気相合成法。
A method for vapor phase synthesis of diamond, characterized in that carbon dioxide is used as a carbon raw material, and gas phase synthesis is carried out while introducing a mixed gas of carbon dioxide and hydrogen into a vapor phase synthesis apparatus.
JP61264719A 1986-11-05 1986-11-05 Gas phase synthesis of diamond Expired - Lifetime JPH0772119B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61264719A JPH0772119B2 (en) 1986-11-05 1986-11-05 Gas phase synthesis of diamond

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61264719A JPH0772119B2 (en) 1986-11-05 1986-11-05 Gas phase synthesis of diamond

Publications (2)

Publication Number Publication Date
JPS63117994A true JPS63117994A (en) 1988-05-21
JPH0772119B2 JPH0772119B2 (en) 1995-08-02

Family

ID=17407231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61264719A Expired - Lifetime JPH0772119B2 (en) 1986-11-05 1986-11-05 Gas phase synthesis of diamond

Country Status (1)

Country Link
JP (1) JPH0772119B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5258206A (en) * 1989-01-13 1993-11-02 Idemitsu Petrochemical Co., Ltd. Method and apparatus for producing diamond thin films

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62265198A (en) * 1986-05-14 1987-11-18 Hitachi Ltd Method for synthesizing diamond

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62265198A (en) * 1986-05-14 1987-11-18 Hitachi Ltd Method for synthesizing diamond

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5258206A (en) * 1989-01-13 1993-11-02 Idemitsu Petrochemical Co., Ltd. Method and apparatus for producing diamond thin films

Also Published As

Publication number Publication date
JPH0772119B2 (en) 1995-08-02

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