JPS63107900A - Material for magneto-optical element - Google Patents
Material for magneto-optical elementInfo
- Publication number
- JPS63107900A JPS63107900A JP25376086A JP25376086A JPS63107900A JP S63107900 A JPS63107900 A JP S63107900A JP 25376086 A JP25376086 A JP 25376086A JP 25376086 A JP25376086 A JP 25376086A JP S63107900 A JPS63107900 A JP S63107900A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magneto
- substrate
- optical
- faraday rotation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000002223 garnet Substances 0.000 claims abstract description 15
- 239000013078 crystal Substances 0.000 claims abstract description 8
- 230000005291 magnetic effect Effects 0.000 claims abstract description 7
- 229910052733 gallium Inorganic materials 0.000 claims abstract 2
- 239000000203 mixture Substances 0.000 claims description 7
- 229910052742 iron Inorganic materials 0.000 abstract description 5
- 229910052727 yttrium Inorganic materials 0.000 abstract description 3
- 229910052797 bismuth Inorganic materials 0.000 abstract 1
- 238000000407 epitaxy Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- -1 bismuth-substituted iron Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007716 flux method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000005298 paramagnetic effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はファラデー回転効果を利用した光アイソレータ
、光サーキュレータ等に用いられる磁気光学素子用材料
に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a material for magneto-optical elements used in optical isolators, optical circulators, etc. that utilize the Faraday rotation effect.
半導体レーザは光応用機器や光通信の光源として広く利
用されているが、反射光が半導体レーザに戻るとレーザ
発振が不安定になるという大きな問題がある。Semiconductor lasers are widely used as light sources in optical applications and optical communications, but there is a major problem in that laser oscillation becomes unstable when reflected light returns to the semiconductor laser.
この戻り光を阻止するために光アイソレータが使用され
ている。波長1.3〜1.7μm帯ではイツトリウム・
鉄・ガーネット(YIG)のバルク単結晶波長0.8μ
m帯では常磁性ガラスが光アイソレータのファラデー回
転材料に用いられているが、素子の小型化、製作コスト
の低減化を図る上でよりファラデー回転係数の大きな材
料が望まれている。Optical isolators are used to block this returning light. In the wavelength band of 1.3 to 1.7 μm, yttrium
Bulk single crystal wavelength of iron/garnet (YIG) 0.8μ
In the m-band, paramagnetic glass is used as a Faraday rotation material for optical isolators, but a material with a larger Faraday rotation coefficient is desired in order to miniaturize the device and reduce manufacturing costs.
ファラデー回転係数の大きな材料として、旧を固溶した
ガーネットが知られている。この材料はすでに改良され
たフラックス法でバルク単結晶として製造されているが
量産化が難しいことや、素子化に際して精密加工を要す
ることなどの問題点があることから、この材料をファラ
デー回転素子に用いる限り、光アイソレータのコストを
下げることは期待できない。このため量産性に優れ、か
つ加工の容易な液相エピタキシャル(LPE)法による
ビスマス置換型鉄ガーネット厚膜作製法が検討されてい
る。Garnet with a solid solution of chloride is known as a material with a large Faraday rotation coefficient. This material has already been manufactured as a bulk single crystal using an improved flux method, but there are problems such as difficulty in mass production and the need for precision machining to create devices, so this material is used in Faraday rotary devices. As long as it is used, it cannot be expected to reduce the cost of the optical isolator. For this reason, a method for producing a bismuth-substituted iron garnet thick film using a liquid phase epitaxial (LPE) method, which is excellent in mass production and easy to process, is being considered.
例えば、第8回日本応用磁気学会学術講演概要集(19
84,11) P、31においてNdzGasO+t(
NGG)基板上に育成された(GdBi) 3 (Fe
AIGa) sO+ z厚膜が報告されている。For example, the 8th Japanese Society of Applied Magnetics Academic Lecture Abstracts (19
84,11) NdzGasO+t(
(GdBi) 3 (Fe
AIGa) sO+ z thick films have been reported.
この厚膜の波長0.8μmにおけるファラデー回転係数
IMは7500deg/cm、性能指数1eFl/α(
αは光吸収係数dB/cm)は23deg/dBと優れ
た値を示している。この厚膜を用いて光アイソレーター
を作製する場合、偏光面を45度回転させるためには6
0μmの厚膜が必要となり、その際、光吸収による損失
は36χとなる。The Faraday rotation coefficient IM of this thick film at a wavelength of 0.8 μm is 7500 deg/cm, and the figure of merit 1eFl/α (
The optical absorption coefficient α (dB/cm) is an excellent value of 23 deg/dB. When making an optical isolator using this thick film, it is necessary to rotate the polarization plane by 45 degrees.
A thick film of 0 μm is required, and the loss due to light absorption is 36χ.
ところで、このような厚い膜をLPE法でガーネット基
板上に育成するに際しては、基板と膜との格子定数差を
小さくする必要がある。格子定数差が大きい場合、特に
厚膜成長においては膜中にこの格子定数差に起因する欠
陥が入りやす(なるため、良質な膜成長が阻害され膜面
ば鏡面を示せないようになる。By the way, when growing such a thick film on a garnet substrate by the LPE method, it is necessary to reduce the difference in lattice constant between the substrate and the film. When the difference in lattice constants is large, defects due to the difference in lattice constants are likely to occur in the film, especially when growing a thick film (thus, good quality film growth is inhibited and the film surface cannot exhibit a mirror surface).
上記(GdBi) s (FeAIGa) Sol を
膜においては格子定1&12.509人のNGG基板を
用いることにより、格子整合がとれ厚膜の育成が可能と
なった。In the above (GdBi) s (FeAIGa) Sol film, by using an NGG substrate with a lattice constant of 1 & 12.509, lattice matching was achieved and a thick film could be grown.
しかしながら、NGG基板は波長0.9μm以下におい
てNd’+イオンによる大きな光吸収があるため育成し
た厚膜を0.8μm帯の磁気光学材料に利用する際は基
板のNGGを研摩して完全に除去しなければならない。However, NGG substrates have large optical absorption by Nd'+ ions at wavelengths below 0.9 μm, so when using the grown thick film for magneto-optical materials in the 0.8 μm band, the NGG on the substrate must be completely removed by polishing. Must.
しかも膜厚は数十ミクロンであることから精密な加工を
要するとともに研摩で残った膜の取り扱いは極めて困難
になる。したがって0.8μm帯用0磁気光学材料の提
供を目的とする場合には、この波長域に光吸収のない基
板を使用し基板をつけたまま素子化することが望ましい
。Moreover, since the film thickness is several tens of microns, precise machining is required and the film remaining after polishing is extremely difficult to handle. Therefore, when the purpose is to provide a magneto-optical material for the 0.8 μm band, it is desirable to use a substrate that does not absorb light in this wavelength range and to fabricate the device with the substrate attached.
この目的に叶うガーネット単結晶基板で現在、工業的な
生産が可能なものには、格子定数が12.496±0.
003人の(CaGd)3(MgZrGa)sO+z
(S−GGG)と格子定数が12.383人のGdxG
asO+g (GGG)がある。Garnet single crystal substrates that meet this purpose and can currently be produced industrially have a lattice constant of 12.496±0.
003 (CaGd)3(MgZrGa)sO+z
(S-GGG) and GdxG with a lattice constant of 12.383
There is asO+g (GGG).
この5−GGG基板を用いて育成された0、8μm帯用
0磁PE法Bi置換型鉄ガーネット厚膜としては、特開
昭61−113026公報において、(Bit−X−Y
GdX Ry )+(Fe+−Jz)s、o+z (但
し、R=Lu、 Yb、 Y 、 Tm ;M=Gas
A1% Ge ; X=0.4〜0.8 、y=o
〜0.1、 Z=0〜0.1)厚膜が報告されているが
、I(lIFI・〜5500deg/cm−1eFl/
α= 〜9 deg/dBであり、実用上問題がある。A 0-magnetic PE method Bi-substituted iron garnet thick film grown using this 5-GGG substrate for the 0 and 8 μm band is described in JP-A-61-113026 (Bit-X-Y
GdX Ry)+(Fe+-Jz)s, o+z (However, R=Lu, Yb, Y, Tm; M=Gas
A1% Ge; X=0.4-0.8, y=o
~0.1, Z=0~0.1) thick films have been reported, but I(lIFI・~5500deg/cm−1eFl/
α = ~9 deg/dB, which is a practical problem.
一方、格子定数の小さいGGG基板を用いた実用可能な
旧多量置換磁性ガーネット厚膜作製の報告はなされてい
ない。On the other hand, there has been no report on the production of a practically practicable old massively substituted magnetic garnet thick film using a GGG substrate with a small lattice constant.
本発明の目的は、0.8μm帯の波長域で透明な非磁性
ガーネット単結晶基板上に育成され、該波長域でのファ
ラデー回転角が45度以上の厚膜で、しかも優れた磁気
光学特性を示す磁気光学材料を提供することである。The object of the present invention is to provide a thick film grown on a non-magnetic garnet single crystal substrate that is transparent in the 0.8 μm wavelength range, with a Faraday rotation angle of 45 degrees or more in the wavelength range, and with excellent magneto-optical properties. An object of the present invention is to provide a magneto-optical material exhibiting the following properties.
本発明者らはこのような目的を達成すべ(鋭意検討した
結果、次のような事実を見出した。The inventors of the present invention have made the following findings as a result of intensive study to achieve such an objective.
すなわちPb0−BizOs−BzOz系の融液より、
Y2−、−yGd xBiyFes−zLzO+z(但
し、LはGa、 AI又はそれらの組合せ、X・0.2
J、4 、y=0.9〜1.3 、z=0〜0.5)を
(CaGd) :l (MgZrGa) so + z
単結晶基板上に育成したところ、膜と基板との格子定数
の整合がよいため膜表面が鏡面を呈し、しかもファラデ
ー回転係数が8000deg/cm以上、性能指数が2
0deg/dB以上の優れた特性を示す30μm以上の
厚膜が得られたのである。That is, from the Pb0-BizOs-BzOz system melt,
Y2-, -yGd xBiyFes-zLzO+z (L is Ga, AI or a combination thereof, X・0.2
J, 4, y=0.9~1.3, z=0~0.5) as (CaGd) :l (MgZrGa) so + z
When grown on a single crystal substrate, the film surface exhibited a mirror surface due to good lattice constant matching between the film and the substrate, and furthermore, the Faraday rotation coefficient was 8000 deg/cm or more, and the figure of merit was 2.
A thick film of 30 μm or more and exhibiting excellent characteristics of 0 deg/dB or more was obtained.
このBiW換型鉄ガーネットのファラデー回転係数はB
i直換量にほぼ比例して大きくなることから、できるだ
け多くのBiを固?容させたガーネット膜が好ましいが
、Biをy・1.4以上固溶させると膜の格子定数が大
きくなって基板との格子整合がとれなくなり、得られた
膜は鏡面を呈することができなくなる。The Faraday rotation coefficient of this BiW iron garnet is B
Since it increases almost in proportion to the amount of i direct conversion, it is necessary to harden as much Bi as possible. However, if Bi is dissolved in a solid solution of y 1.4 or more, the lattice constant of the film becomes large and lattice matching with the substrate cannot be achieved, and the resulting film cannot exhibit a mirror surface. .
Feをイオン半径の小さいAIやGaで置換するのは膜
との格子整合を図るのと膜の飽和磁界の大きさをコント
ロールすることが目的であるが、AIやGa置換量を増
していくとファラデー回転係数が小さくなるとか、ファ
ラデー回転係数の温度依存性が大きくなるといった問題
が生じてくるので、2・0〜0.5が好ましい。The purpose of replacing Fe with AI or Ga, which has a small ionic radius, is to achieve lattice matching with the film and to control the magnitude of the saturation magnetic field of the film, but as the amount of AI or Ga replacement increases, Since problems such as a decrease in the Faraday rotation coefficient or an increase in the temperature dependence of the Faraday rotation coefficient, a value of 2.0 to 0.5 is preferable.
Bi霞換ガーネット膜を育成するための融液組成を溶液
混合物の相対モル比(Rパラメーター)で示すと第1表
のとおりである。Table 1 shows the melt composition for growing a Bi haze-exchanged garnet film in terms of the relative molar ratio (R parameter) of the solution mixture.
第1表 溶融混合物の相対モル比 以下に実施例をあげて説明する。Table 1 Relative molar ratio of molten mixture Examples will be described below.
なお、ファラデー回転係数1□□□及び光吸収係数αは
いずれも波長0.78μmでの測定結果である。Note that the Faraday rotation coefficient 1□□□ and the light absorption coefficient α are both measurement results at a wavelength of 0.78 μm.
実施例1
第2表の実施例1に示す組成の融液に、格子定数12.
496人の(CaGd) x (MgZrGa) sO
t z基板を750 ”Cで90分間浸すことにより、
厚みが45μmのYl、5Gdo、 Ji l+ zF
ea、 1A1o、 z(L を膜を育成した。膜の格
子定数は12.498人であり、基板との格子定数差に
よる欠陥は観察されず鏡面を呈した。Example 1 A melt having the composition shown in Example 1 in Table 2 was given a lattice constant of 12.
496 (CaGd) x (MgZrGa) sO
By soaking the tz substrate at 750"C for 90 minutes,
Yl with a thickness of 45 μm, 5Gdo, Ji l+ zF
A film was grown using ea, 1A1o, z(L). The lattice constant of the film was 12.498, and no defects due to the difference in lattice constant with the substrate were observed, and a mirror surface was observed.
この膜のファラデー回転係数1川は11 、700de
g/cm、光吸収係数αは478dB/cm 、磁気光
学性能指数!印/αは24.5deg/dBとなり、磁
気光学素子用材料として極めて優れた特性を示した。The Faraday rotation coefficient of this film is 11,700 de
g/cm, optical absorption coefficient α is 478 dB/cm, magneto-optical figure of merit! The mark/α was 24.5 deg/dB, indicating extremely excellent properties as a material for magneto-optical elements.
実施例2
第2表の実施例2に示す組成の融液に、(CaGd)s
(MgZrGa)so+z基板を760°Cで120分
間浸すことにより、厚みが60 p mのYl、 tG
do、 Ji 1. oFe4.qGa6+1012膜
を育成した。膜の格子定数は12.493人であり、基
板との格子定数差による欠陥は観察されず鏡面を呈した
。Example 2 (CaGd)s was added to the melt having the composition shown in Example 2 in Table 2.
By soaking the (MgZrGa)so+z substrate at 760 °C for 120 min, Yl, tG with a thickness of 60 pm was obtained.
do, Ji 1. oFe4. A qGa6+1012 film was grown. The lattice constant of the film was 12.493, and no defects due to the difference in lattice constant with the substrate were observed, and the film exhibited a mirror surface.
この場合、Iは10,200deg/cm、 cr=
440dB/cm。In this case, I is 10,200deg/cm, cr=
440dB/cm.
IEI、t/α・23.2deg/dBとなり、磁気光
学素子用材料として極めて優れた特性を示した。The IEI was t/α·23.2 deg/dB, showing extremely excellent properties as a material for magneto-optical elements.
次にこの厚膜のアイソレーション(逆方向損失と順方向
損失の比)測定を試みた。Next, we attempted to measure the isolation (ratio of reverse loss to forward loss) of this thick film.
即ち、基板両面に育成された膜のうち、片方の膜を研摩
により除去し残った方の膜をファラデー回転角として4
5度をなすように化学エツチングにより厚膜調整を行い
、次いで膜面及び基板面それぞれに反射防止膜を施し、
グラントムソンプリズム及ヒSm−Co磁石を用いてア
イソレーションを測定した。That is, among the films grown on both sides of the substrate, one film is removed by polishing and the remaining film is set to a Faraday rotation angle of 4.
A thick film is adjusted by chemical etching so that it forms a 5 degree angle, and then an anti-reflection film is applied to each of the film surface and the substrate surface.
Isolation was measured using a Glan-Thompson prism and a Hi-Sm-Co magnet.
その結果、アイソレーションとして35dBと極めて良
好な値を得た。As a result, an extremely good isolation value of 35 dB was obtained.
実施例1及び2の厚膜育成条件においては基板を融液に
浸す時間をさらに長くすることにより、さらに厚みを増
すことが可能である。Under the thick film growth conditions of Examples 1 and 2, it is possible to further increase the thickness by further increasing the time during which the substrate is immersed in the melt.
比較例1
第2表の比較例1の融液に(CaGd) x (MgZ
rGa) s。Comparative Example 1 In the melt of Comparative Example 1 in Table 2, (CaGd) x (MgZ
rGa) s.
、2基板を770℃で60分間浸すことにより、厚みが
52μmのGd2. aBi +、 oFe4. s^
lo、ffi膜を育成した。膜の格子定数は12.51
2人であり、基板との不整合による欠陥が多数見られた
。, 2 substrates were immersed at 770°C for 60 minutes to form a Gd2. aBi +, oFe4. s^
lo and ffi membranes were grown. The lattice constant of the film is 12.51
There were two people involved, and many defects were observed due to misalignment with the substrate.
第2表 ビスマス匝換鉄ガーネット膜育成のための融液
組成
〔発明の効果〕
本発明によれば、LPE法により、透明な非磁性ガーネ
ット基板上に、厚膜が30,17m以上で表面が鏡面を
呈し、ファラデー回転角が8000deg/cm以上、
性能指数が20deg/dB以上の高性能ビスマス置換
型鉄ガーネット厚膜が得られる。Table 2 Melt composition for growing bismuth-converted iron garnet film [Effects of the invention] According to the present invention, a thick film of 30.17 m or more and a surface roughness of 30. Exhibits a mirror surface and has a Faraday rotation angle of 8000 deg/cm or more,
A high-performance bismuth-substituted iron garnet thick film with a figure of merit of 20 deg/dB or more can be obtained.
本発明の材料は0.8μm帯の波長域における光アイソ
レータや光サーキュレータなどの磁気光学素子用材料と
して好適である。The material of the present invention is suitable as a material for magneto-optical elements such as optical isolators and optical circulators in the 0.8 μm wavelength range.
特許出願人 三菱瓦斯化学株式会社 代理人 弁理士 小 堀 貞 文 手続補正占(自発) 昭和62年 1月 5日Patent applicant: Mitsubishi Gas Chemical Co., Ltd. Agent: Patent Attorney Sadafumi Kohori Procedural correction divination (voluntary) January 5, 1986
Claims (1)
rGa)_5O_1_2単結晶基板上に育成された30
μm以上の厚みをもつ磁性ガーネットからなり、その組
成式がY_3_−_x_−_yGd_xBi_yFe_
5_−_2L_2O_1_2 (但し、LはGa、Al又はそれらの組合せ、x=0.
2〜0.4、y=0.9〜1.3、z=0〜0.5) であることを特徴とする0.8μm帯波長域用磁気光学
素子材料[Claims] (CaGd)_3(MgZ
rGa)_5O_1_2 30 grown on a single crystal substrate
It is made of magnetic garnet with a thickness of μm or more, and its composition formula is Y_3_-_x_-_yGd_xBi_yFe_
5_-_2L_2O_1_2 (L is Ga, Al, or a combination thereof, x=0.
2 to 0.4, y = 0.9 to 1.3, z = 0 to 0.5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25376086A JPS63107900A (en) | 1986-10-27 | 1986-10-27 | Material for magneto-optical element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25376086A JPS63107900A (en) | 1986-10-27 | 1986-10-27 | Material for magneto-optical element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63107900A true JPS63107900A (en) | 1988-05-12 |
Family
ID=17255760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25376086A Pending JPS63107900A (en) | 1986-10-27 | 1986-10-27 | Material for magneto-optical element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63107900A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63291028A (en) * | 1987-05-25 | 1988-11-28 | Furukawa Electric Co Ltd:The | Farady element |
EP0345759A2 (en) * | 1988-06-10 | 1989-12-13 | Matsushita Electric Industrial Co., Ltd. | A magnetic field measurement apparatus |
JPH0222619A (en) * | 1988-07-11 | 1990-01-25 | Nec Corp | Optical isolator and its production |
EP0415668A2 (en) * | 1989-08-29 | 1991-03-06 | Ngk Insulators, Ltd. | High sensitivity optical magnetic field sensors |
CN111187064A (en) * | 2020-01-13 | 2020-05-22 | 横店集团东磁股份有限公司 | High-stability garnet microwave ferrite magnetic sheet and preparation method thereof |
JP2021021830A (en) * | 2019-07-26 | 2021-02-18 | 京セラ株式会社 | Isolator and optical transmitter |
-
1986
- 1986-10-27 JP JP25376086A patent/JPS63107900A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63291028A (en) * | 1987-05-25 | 1988-11-28 | Furukawa Electric Co Ltd:The | Farady element |
EP0345759A2 (en) * | 1988-06-10 | 1989-12-13 | Matsushita Electric Industrial Co., Ltd. | A magnetic field measurement apparatus |
JPH01312483A (en) * | 1988-06-10 | 1989-12-18 | Matsushita Electric Ind Co Ltd | Magnetic field measuring apparatus |
JPH0222619A (en) * | 1988-07-11 | 1990-01-25 | Nec Corp | Optical isolator and its production |
EP0415668A2 (en) * | 1989-08-29 | 1991-03-06 | Ngk Insulators, Ltd. | High sensitivity optical magnetic field sensors |
US5140156A (en) * | 1989-08-29 | 1992-08-18 | Ngk Insulators, Ltd. | High sensitivity optical magnetic field sensors having a magnetooptical garnet-type ferrite polycrystal |
JP2021021830A (en) * | 2019-07-26 | 2021-02-18 | 京セラ株式会社 | Isolator and optical transmitter |
CN111187064A (en) * | 2020-01-13 | 2020-05-22 | 横店集团东磁股份有限公司 | High-stability garnet microwave ferrite magnetic sheet and preparation method thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS63107900A (en) | Material for magneto-optical element | |
EP0330500B1 (en) | Magneto-optic garnet | |
JPS61113026A (en) | Medium for magnetooptic element | |
JPS62143893A (en) | Growth of magneto-optical crystal | |
JPS61292613A (en) | Faraday rotor and its production | |
EP0338859B1 (en) | Faraday rotator | |
JP2924282B2 (en) | Magneto-optical material, method of manufacturing the same, and optical element using the same | |
JP2867736B2 (en) | Magneto-optical material, method of manufacturing the same, and optical element using the same | |
JPH0642026B2 (en) | Magneto-optical element material | |
JPH111394A (en) | Unsaturated bismuth substituted rare-earth iron garnet monocrystal film | |
JPH02131216A (en) | Magneto-optical element material | |
JPS63112500A (en) | Liquid epitaxial film growth method for garnet | |
JPS6278194A (en) | Magneto-optical garnet single crystal film and method of growing same | |
JPH03242620A (en) | Magneto-optical material | |
JPS62138397A (en) | Magnetic garnet material for magneto-optical element | |
JPS62138396A (en) | Magnetic garnet material for magneto-optical element | |
JP2843433B2 (en) | Bi-substituted magnetic garnet and magneto-optical element | |
Whitcomb et al. | Fabrication of thin film magnetic garnet structures for intra‐cavity laser applications | |
JPS59141495A (en) | Growth of thick film of garnet single crystal | |
JPS63233098A (en) | Method for growing bismuth garnet crystal | |
JPH0933870A (en) | Faraday rotator with low saturation magnetic field | |
JPS62194222A (en) | Magnetooptic element material | |
JPH11100300A (en) | Bismuth-substituted garnet material and its production | |
JPS5957990A (en) | Method for growing liquid phase epitaxial thick film of garnet | |
JPS61205698A (en) | Magnetooptical material |