JPS6310106A - Multi-layered interference film filter - Google Patents
Multi-layered interference film filterInfo
- Publication number
- JPS6310106A JPS6310106A JP15486586A JP15486586A JPS6310106A JP S6310106 A JPS6310106 A JP S6310106A JP 15486586 A JP15486586 A JP 15486586A JP 15486586 A JP15486586 A JP 15486586A JP S6310106 A JPS6310106 A JP S6310106A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- film
- index film
- lambda
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 5
- 239000010408 film Substances 0.000 claims abstract 32
- 239000012788 optical film Substances 0.000 claims abstract 10
- 230000003287 optical effect Effects 0.000 claims description 16
- 238000010030 laminating Methods 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000004611 spectroscopical analysis Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Optical Filters (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野］
この発明は、被測定対象の性状を光学的に測定する光学
的測定装置に使用する多層干渉膜フィルタに関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a multilayer interference film filter used in an optical measuring device that optically measures the properties of an object to be measured.
［従来の技術］
被測定対象の厚み、水分、色あい等の性状の測定におい
て、測定波長の両側近傍に比較波長を設従来、３波長の
分光をする場合、３個のフィルタを多回転セクタに設け
、モータで回転させて分光する方法がとられていた。[Prior art] When measuring properties such as thickness, moisture content, and color tone of an object to be measured, comparison wavelengths are set near both sides of the measurement wavelength. Conventionally, when performing three-wavelength spectroscopy, three filters are arranged in multi-rotation sectors. The conventional method was to install a light source and rotate it with a motor to perform spectroscopy.
［この発明が解決しようとする問題点］しかしながら、
このように３個のフィルタを用いると装置の大型化、モ
ータの発熱等の問題点があった。[Problems to be solved by this invention] However,
When three filters are used in this manner, there are problems such as an increase in the size of the device and heat generated by the motor.
このため、比較波長の２波長の分光を、ダブルピークを
もつ多層干渉膜フィルタにより１枚のフィルタで実現す
ることにより測定系の簡素化、高精度化を図ることがで
きる。Therefore, the measurement system can be simplified and highly accurate by realizing spectroscopy of two comparison wavelengths with a single filter using a multilayer interference film filter having a double peak.
この発明の目的は、以上の点に鑑み、基準波長の両側近
傍に２つのピークをもつ多層子ｉ！Ｊｌｌｌフィルタを
提供することである。In view of the above points, it is an object of the present invention to provide a multilayer i! Jllll filter.
［問題点を解決するための手段］
１．１
！学的膜厚２／２の低屈折率膜・光学的膜厚斜／４の高
屈折率膜と低屈折率膜との交互層を少くとも１組、光学
的膜厚がλ／２の低屈折率膜を積層した多層膜で、基準
波長λの両側近傍に２つのピークをもつ多層干渉膜フィ
ルタである。[Means for solving problems] 1.1! At least one set of alternating layers of a low refractive index film with an optical thickness of 2/2, a high refractive index film with an optical thickness of /4, and a low refractive index film, and a low refractive index film with an optical thickness of λ/2. This is a multilayer interference film filter that is a multilayer film made of laminated refractive index films and has two peaks near both sides of the reference wavelength λ.
［実施例］
第１図は、この発明の一実施例を示す構成説明図である
。[Embodiment] FIG. 1 is a configuration explanatory diagram showing an embodiment of the present invention.
一般に、干渉膜フィルタは、蒸着、スパッタリング等で
高屈折率膜と低屈折率膜とを交互に積層させるもので、
高屈折率膜の材料としては、Ｑｅ。Generally, interference film filters are made by alternately laminating high refractive index films and low refractive index films by vapor deposition, sputtering, etc.
The material for the high refractive index film is Qe.
Ｓｉ 、Ｔｉ ０２ 、ｚｒ Ｏｚ 、Ｚｎ ＳＷが用
い６ｔｔ、低屈折率膜の材料としては、ｓｒ ｏ、ｓｉ
○２、ＭＱＦ２等が用いられる。Si, Ti 02 , zr Oz, Zn SW are used as 6tt, and as materials for the low refractive index film, sr o, si
○2, MQF2, etc. are used.
次に、このような高屈折率膜、低屈折率膜を用いたフィ
ルタの構成を第１図について説明する。Next, the structure of a filter using such a high refractive index film and a low refractive index film will be explained with reference to FIG.
図において、Ｓは、ガラス等の基板で、基準波長をλと
し、この基板Ｓ側より、光学的膜厚λ／４の高屈折率ａ
！１、光学的膜厚λ／４の低屈折率の交互層を少くとも
１組、光学的膜厚λ／４の高屈折率ｊ１９を積層した膜
より構成され、最外層は外部媒質に接している。In the figure, S is a substrate such as glass, the reference wavelength is λ, and a high refractive index a with an optical thickness λ/4 is observed from the substrate S side.
! 1. Consisting of at least one set of alternating layers of low refractive index with an optical thickness of λ/4 and a laminated film of high refractive index j19 with an optical thickness of λ/4, the outermost layer being in contact with the external medium. There is.
たとえば、高屈折率膜にＴｉ０ｚ、低屈折率膜にＳｉ
０２を用い、交互層の数を３とし、基準波長λ−１，０
μＩとすれば、第２図で示すように、基準波長λの両側
近傍に２つのピークを持つ多層干渉膜フィルタ（ダブル
ピークフィルタ）が得られる。For example, Ti0z is used as a high refractive index film, and Si is used as a low refractive index film.
02, the number of alternating layers is 3, and the reference wavelength λ-1,0
If μI, as shown in FIG. 2, a multilayer interference film filter (double peak filter) having two peaks near both sides of the reference wavelength λ is obtained.
なお、交互層の数は、１〜３位が適当である。Note that the number of alternate layers is suitably 1 to 3.
第３図は、この発明の他の実施例を示し、第１図の実施
例において、基板Ｓと多１ｉ１膜の高屈折率膜１との間
に光学的膜厚λ／４の低屈折率ｓｉｏ。FIG. 3 shows another embodiment of the present invention, in which in the embodiment of FIG. sio.
多層膜の最外層の高屈折率１１９に光学的膜厚λ／４の
低屈折率膜１１を設けている。この場合も、位となる。A low refractive index film 11 with an optical thickness of λ/4 is provided on the high refractive index 119 of the outermost layer of the multilayer film. In this case as well, it is the rank.
高屈折率膜、低屈折率膜を、以上述べたように積層させ
ることにより、基準波長の両側近傍に２つのピークをも
つ多層干渉膜フィルタ（ダブルピークフィルタ）が得ら
れ、各種光学的測定に用いることができる。By stacking high refractive index films and low refractive index films as described above, a multilayer interference film filter (double peak filter) with two peaks near both sides of the reference wavelength can be obtained, which is suitable for various optical measurements. Can be used.
第１図、第３図は、この発明の一実施例を示す構成説明
図、第２図は、この発明のフィルタの透過率特性図であ
る。1 and 3 are configuration explanatory diagrams showing one embodiment of the present invention, and FIG. 2 is a transmittance characteristic diagram of the filter of the present invention.
Claims (1)
的膜厚λ／４の低屈折率膜と高屈折率膜との交互層を少
くとも１組、光学的膜厚がλ／２の低屈折率膜、光学的
膜厚λ／４の高屈折率膜、光学的膜厚λ／２の低屈折率
膜、光学的膜厚λ／４の高屈折率膜と低屈折率膜との交
互層を少くとも１組、光学的膜厚λ／４の高屈折率膜を
積層した多層膜で、基準波長λの両側近傍に２つのピー
クをもつことを特徴とする多層干渉膜フィルタ。 ２、前記基板と多層膜との間、および多層膜の最外層に
光学的膜厚λ／４の低屈折率を設けたことを特徴とする
特許請求の範囲１項記載の多層干渉膜フィルタ。 ３、前記交互層の数を１から３としたことを特徴とする
特許請求の範囲第１項または第２項記載の多層干渉膜フ
ィルタ。[Claims] 1. From the substrate side, at least one alternate layer of a high refractive index film with an optical thickness of λ/4, a low refractive index film with an optical thickness of λ/4, and a high refractive index film. A low refractive index film with an optical thickness of λ/2, a high refractive index film with an optical thickness of λ/4, a low refractive index film with an optical thickness of λ/2, and a low refractive index film with an optical thickness of λ/4. A multilayer film consisting of at least one set of alternating layers of a high refractive index film and a low refractive index film, and a stack of high refractive index films with an optical film thickness of λ/4, and has two peaks near both sides of the reference wavelength λ. A multilayer interference film filter characterized by: 2. The multilayer interference film filter according to claim 1, characterized in that a low refractive index film having an optical thickness of λ/4 is provided between the substrate and the multilayer film and on the outermost layer of the multilayer film. 3. The multilayer interference film filter according to claim 1 or 2, wherein the number of the alternating layers is 1 to 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15486586A JPS6310106A (en) | 1986-07-01 | 1986-07-01 | Multi-layered interference film filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15486586A JPS6310106A (en) | 1986-07-01 | 1986-07-01 | Multi-layered interference film filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6310106A true JPS6310106A (en) | 1988-01-16 |
| JPH0526162B2 JPH0526162B2 (en) | 1993-04-15 |
Family
ID=15593607
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15486586A Granted JPS6310106A (en) | 1986-07-01 | 1986-07-01 | Multi-layered interference film filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6310106A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0674823A (en) * | 1992-08-27 | 1994-03-18 | Kubota Corp | Wave length calibration method for spectroscopic analyzer |
| JP2005221586A (en) * | 2004-02-03 | 2005-08-18 | Furukawa Electric Co Ltd:The | Dielectric multilayered film filter having predetermined wavelength optical characteristic, method of designing the same, designing program of the same and optical add/drop system using the dielectric multilayered film filter |
-
1986
- 1986-07-01 JP JP15486586A patent/JPS6310106A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0674823A (en) * | 1992-08-27 | 1994-03-18 | Kubota Corp | Wave length calibration method for spectroscopic analyzer |
| JP2005221586A (en) * | 2004-02-03 | 2005-08-18 | Furukawa Electric Co Ltd:The | Dielectric multilayered film filter having predetermined wavelength optical characteristic, method of designing the same, designing program of the same and optical add/drop system using the dielectric multilayered film filter |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0526162B2 (en) | 1993-04-15 |
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