JPS63100829U - - Google Patents
Info
- Publication number
- JPS63100829U JPS63100829U JP19565486U JP19565486U JPS63100829U JP S63100829 U JPS63100829 U JP S63100829U JP 19565486 U JP19565486 U JP 19565486U JP 19565486 U JP19565486 U JP 19565486U JP S63100829 U JPS63100829 U JP S63100829U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- section
- liquid
- processing
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims 3
- 239000007921 spray Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Description
第１図は本考案による装置の概略図、第２図は
液切り部の詳細図、第３図は従来装置の概略図、
第４図は従来の液切り部の詳細図である。
１……処理部、２……液切り部、３……洗浄部
、４……乾燥部、５……試料、６……搬送ベルト
、７……供給源、８〜１１……ノズル、１２……
試料上の処理液、１３……絞りロール。
FIG. 1 is a schematic diagram of the device according to the present invention, FIG. 2 is a detailed diagram of the liquid draining section, and FIG. 3 is a schematic diagram of the conventional device.
FIG. 4 is a detailed view of a conventional liquid draining section. DESCRIPTION OF SYMBOLS 1... Processing section, 2... Liquid draining section, 3... Washing section, 4... Drying section, 5... Sample, 6... Transport belt, 7... Supply source, 8-11... Nozzle, 12 ……
Processing liquid on sample, 13... Squeezing roll.
Claims (1)
処理部と、試料上の処理液を除去する液切り部と
、液切り部に気体を噴射するノズルと、洗浄液に
よつて試料を洗浄する洗浄部と、試料に付着した
洗浄液を除去する乾燥部とを有し、試料を搬送す
る搬送ベルトを試料の進行方向に傾斜させたこと
を特徴とする処理装置。 A processing section that performs processing by spraying processing liquid onto the sample from a nozzle, a liquid draining section that removes the processing liquid from the sample, a nozzle that sprays gas into the liquid draining section, and a cleaning section that cleans the sample with cleaning liquid. What is claimed is: 1. A processing apparatus comprising: a drying section for removing cleaning liquid adhering to a sample, and a conveyor belt for conveying the sample is inclined in the direction in which the sample travels.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19565486U JPS63100829U (en) | 1986-12-19 | 1986-12-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19565486U JPS63100829U (en) | 1986-12-19 | 1986-12-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63100829U true JPS63100829U (en) | 1988-06-30 |
Family
ID=31153736
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19565486U Pending JPS63100829U (en) | 1986-12-19 | 1986-12-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63100829U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003068694A (en) * | 2001-08-28 | 2003-03-07 | Fujikoshi Mach Corp | Wafer-cleaning apparatus and wafer-bonding apparatus |
-
1986
- 1986-12-19 JP JP19565486U patent/JPS63100829U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003068694A (en) * | 2001-08-28 | 2003-03-07 | Fujikoshi Mach Corp | Wafer-cleaning apparatus and wafer-bonding apparatus |
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