JPS6295115A - Gas purifying device - Google Patents

Abstract

PURPOSE:To improve the purification efficiency of the title device by connecting the upstream side of a switching device for alternatively supplying raw gas to the downstream side of an opening and closing valve and a flow regulating valve on the upstream side of a device for alternatively supplying a regenerating gas with an auxiliary purging flow passage provided with an opening and closing valve and a flow regulating valve. CONSTITUTION:The first and the second opening and closing valve V5 and V7 are opened, regenerating H2 and the purified gas are sent to the first and the second purifying train A and B while appropriately setting the flow rate of both gases by the first and the second flow regulating valve V6 and V8, a catalyst 2a is reduced by the H2 and regenerated, and an adsorbent 3a is simultaneously regenerated by the desorption of gaseous impurities. Thereafter, the first opening and closing valve V5 is closed, only the purified gas is sent to the first and the second purifying train A and B to cool the catalyst 2a, and the waste regenerating gas is simultaneously purged to a discharge passage 10. Finally, the second opening valve V7 is closed, the third opening valve V9 is opened, only the raw gas is sent to the first and the second purifying train A and B while setting the flow rate by the third flow regulating valve V10, and the waste regenerating gas is purged.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention is characterized in that a first and a second purification line connected in parallel to a raw material gas supply line each include a built-in filler for removing impurity gas from the raw material gas. a first switching valve device for selectively supplying the raw material gas to the first and second purification lines is provided in the supply path; A second switching valve device for recovering purified gas from either one of the first and second purification lines is provided, and the regeneration gas supply path connected to the first and second purification lines is connected to the first and a third switching valve device for selectively supplying the regeneration gas to the second refining line, and a first on-off valve and a first flow control valve are provided upstream of the third switching valve device, A fourth switching valve device for taking out the regenerated exhaust gas from either one of the first and second refining lines is provided in the exhaust path of the regenerated exhaust gas connected to the first and second refining lines, and A purge flow path for sending the purified gas to the regeneration gas supply path as purge gas is provided upstream of the third switching valve device and downstream of the first on-off valve and the first flow rate control valve. A gas purification device connected to the regeneration gas supply path and provided with a second on-off valve and a second flow rate control valve in the purge flow path, specifically, purging the regeneration gas from the first and second purification lines. Regarding the improvement of means for

[Conventional technology]

Conventionally, a gas purification apparatus has been configured as shown in FIG. That is, the first to fourth switching valve devices (Vl), (V4
) as appropriate to supply the raw material gas from the supply path (4) to the first
Alternatively, the second purification line (8) or (B) is used to purify the gas and send it to the recovery line (6), and the regeneration gas from the supply line (8) and the purified gas from the purge line (11) are sent to the other purification line (8) or (B). Send to purification line (B) or (A) and fill (2a), (3
a), and then purging the purification train (B) or (A) with purified gas from the purge channel (11);
configured to take out the regenerated exhaust gas from the exhaust passage (10),
The first and second purification lines (A) or (B) were configured to alternately switch between the purification process and the regeneration process to continuously perform gas purification. In addition, the first and second flow control valves (V
6) and (V8), the supply amount of regeneration gas and purification gas can be appropriately set according to the capacity and regeneration time of purification series (B) or (A).

[Problem that the invention seeks to solve]

However, since the structure is such that the regenerated exhaust gas in the repurification series (A) and (B) is purged only with purified gas, there is a drawback that it is not possible to simultaneously improve the purification efficiency and the purity of the purified gas.

In other words, in order to improve purification efficiency, the consumption of purified gas in purging must be reduced, but as purging becomes insufficient, regeneration gas is mixed into purified gas for several hours at the beginning of the next purification process. There is a disadvantage that the purity of purified gas decreases due to contamination. Conversely, in order to improve the purity of purified gas, it is necessary to supply a sufficient amount of purified gas during purging, but there is a drawback that purification efficiency decreases due to the large amount of purified gas consumed by purging.

An object of the present invention is to make it possible to simultaneously improve purification efficiency and purity of purified gas through extremely simple and rational equipment modification.

[Means for Solving the Problems] The characteristic configuration of the present invention is that, in the raw material gas supply path, the upstream side of the first switching valve device that selectively supplies the raw material gas to the first and second purification lines; In the regeneration gas supply path, upstream of the third switching valve device that selectively supplies regeneration gas to the first and second purification lines, and downstream of the first on-off valve and the first flow rate control valve. are connected to each other by an auxiliary purge flow path that sends the raw material gas as a purge gas, and the auxiliary purge flow path is provided with a third on-off valve and a third flow rate control valve, and the second on-off valve and the second flow rate control valve are connected to The structure is such that the regenerated exhaust gas in the first and second purification lines can be purged with the purified gas from the purge flow path having the same purification flow path and the raw material gas from the auxiliary purge flow path, and its effects are as follows. It is as follows.

[For production]

In other words, to regenerate the first or second purification line, first open the first and second on-off valves and supply a mixed gas of regeneration gas and purification gas to the first or second purification line, for example. The impurity gas removal packing in the first or second purification line can be regenerated by regenerating the deoxygenation catalyst by hydrogen reduction under high temperature.

After the regeneration is completed, close the first on-off valve and allow only the purified gas to flow into the first
Alternatively, if it is supplied to the second purification line, the regenerated exhaust gas can be purged from the first or second purification line, and the filling can be cooled.

If a large amount of raw material gas for purging is flowed while the temperature of the filling is high, the filling (catalyst, etc.) will deteriorate, so after cooling the filling, close the second on-off valve and open the third on-off valve. By supplying the raw material gas to the first or second purification line and setting the raw material gas supply amount appropriately according to the capacity of the purification line, regeneration time, etc. using the third flow rate control valve, the consumption of purified gas can be reduced. The regenerated exhaust gas in the first or second purification train can be sufficiently purged while reducing the amount to a sufficient extent. In addition, the concentration of impure gas in the raw material gas is generally extremely small, and since there are no quantitative restrictions on the raw material gas, sufficient high-speed flow can be obtained and purging can be completed in a short time. Compared to the case where purging is insufficient, when the regenerated exhaust gas is sufficiently purged with the raw material gas, the purity of the recovered purified gas can be made much higher at the beginning of the next purification process.

〔Effect of the invention〕

As a result, with a simple modification of simply adding an auxiliary purge flow path having a third on-off valve and a third flow control valve,
In addition, by using a rational method of using the raw material gas as a purge gas, the consumption of purified gas during regeneration can be sufficiently reduced, and the purity of the recovered purified gas at the beginning of the purification process can be sufficiently increased, improving purification efficiency. It has become possible to achieve both improvements in gas purification and purity of purified gas.

〔Example〕

Next, an example will be shown with reference to FIG.

A gas holder (1) that stores a raw material gas consisting of an inert gas such as nitrogen or argon mixed with a trace amount of impurity gas is equipped with a first and a second refining system each consisting of a catalyst cylinder (2) and an adsorption cylinder (3). The series (^) and (B) are connected in parallel through the raw material gas supply path (4), and the equipment (5) that consumes purified gas is connected to the recovery path (6).
) is connected to the series (A) and (B) at both ends, and a nickel-based catalyst (2a), which has the function of removing 02 in impure gas as an oxide and also adsorbing and removing CO, is connected to the catalyst tube (
2) co, co□3) lzO in the impure gas
Adsorbent such as synthetic zeolide (3a) that adsorbs and removes
is built into the adsorption tube (3).

The first switching valve device (V1) for selectively supplying raw material gas to the first and second purification lines (A) and (B) is connected to the supply path (4).
) and a second switching valve device (V2) for recovering purified gas from one of the first and second purification lines (8) and (B).
) is provided in the recovery path (6), and the first and second switching valve devices (V
By the operations of 1) and (V2), the raw material gas is purified alternately in either one of the purification lines (A) or (B), and the purified gas is sent to the consumption equipment (5). .

Hydrogen for regeneration at high temperature (300-400°C) is supplied to the air supply device (
A supply path (8) supplied from 7) and a discharge path (10) that sends regenerated exhaust gas to the exhaust equipment (9) are connected to the first and second purification lines (A) and (B). A third switching valve device (V3) for selectively supplying hydrogen for regeneration to the second refining train (8) and (B) is provided in the supply path (8), and A fourth switching valve device (V4) for taking out regenerated exhaust gas from either one of (B) to the exhaust equipment (9) is provided in the exhaust path (10), and a fourth switching valve device (V4) for taking out the regenerated exhaust gas from either one of A first on-off valve (V3) and a first flow N control valve (V6) are provided upstream of the switching valve device (V3). Further, a purge flow path (11) that sends the purified gas from the recovery path (6) to the regeneration hydrogen supply path (8) as purge gas is connected to the first purge flow path (11) on the upstream side of the third switching valve device (V3). The on-off valve (V5) and the first flow rate control valve (V6) are connected to the regeneration hydrogen supply path (8) on the downstream side, and the purge flow path (11) is connected to the second on-off valve (V7) and the first flow control valve (V6). Two flow control valves (Ve) are provided. In addition, the raw material gas supply path (
4), the upstream side of the first switching valve device (Vl), and the third switching valve device (V3) of the regeneration hydrogen supply path (8).
On the more upstream side, the first on-off valve (V5) and the first flow control valve (
V6) is connected to the downstream side via an auxiliary purge flow path (12) that sends raw material gas as a purge gas, and the third on-off valve (
V3) and a third flow rate control valve (VIO) are provided in the auxiliary purge channel (12), so that the following regeneration processes (a) to c) can be performed.

(a) Open the first and second on-off valves (V3) and (V3), and set the flow rates of hydrogen for regeneration and purified gas appropriately using the first or second flow rate control valve (V6) or (V3), respectively. and sent to the first or second purification line (A) or (B).

Then, the catalyst (2a) is reduced and regenerated with hydrogen, and the adsorbent (3a) is regenerated with impure gas underwear.

After that, close the first on-off valve (V3), send only the purified gas to the first or second purification line (^) or (B), cool the catalyst (2a), and send the regenerated exhaust gas to the exhaust path ( 10
).

9→Finally, close the second on-off valve (V3) and open the third on-off valve (V3) to transfer only the raw material gas to the third flow rate control valve (
The flow rate is set appropriately at Vlo) and sent to the first or second purification line (8) or (B), and the regenerated exhaust gas is sufficiently purged.

〔Example〕

In the gas purification equipment shown in Fig. 1, in the next purification process, the supply amount of regeneration hydrogen and purified gas is kept constant, and purge with raw material gas is performed (invention) and purge is not performed (conventional). When the hydrogen concentration in the recovered purified gas was investigated, the results shown in the table below were obtained.

From the above results, it is clear that the apparatus of the present invention can significantly reduce the impurity gas level by 4 degrees.

[Another example]

Next, another embodiment will be described.

The type of raw material gas can be changed as appropriate, and the supply source of the raw material gas and the purpose and destination of the purified gas are not limited.

The specific configuration of the first and second purification lines (A) and (B) is as follows:
It can be selected as appropriate depending on the type of raw material gas and impure gas, and for example, only one of the catalyst cylinder (2) and adsorption cylinder (3) described above may be provided. In addition, catalyst (2a) and adsorbent (3a)
Instead, suitable substances for removing impurity gas can be used, and these are collectively referred to as fillers (2a) and (3a).

Instead of hydrogen for regeneration, an appropriate gas suitable for the fillers (2a), (3a) and impure gas can be used, and these are collectively referred to as regeneration gas. Furthermore, the treatment method for the regenerated exhaust gas does not matter.

The first to fourth switching valve devices (Vl) to V3), the first to third on-off valves (Vs), (V?), (V
q), first to third flow ff13J1 control valve (Vl3),
(Vll), (VIO) 17) The specific configuration and operation configuration can be changed appropriately, and preferably, the first and second purification series (A) and (B) are
The structure is configured so that each can be switched to a refining process and a regeneration process, and the regeneration processing form can be changed.

[Brief explanation of drawings]

FIG. 1 is a flow sheet showing an example of the present invention,
FIG. 2 is a flow sheet of a conventional example. (2a), (3a)...Filling, (4)・
..... Raw material gas supply path, (6) ..... Purified gas recovery path, (8) ..... Regeneration gas supply path, (10) ....・Regeneration exhaust gas exhaust path, (11
)...Purge channel, (12)...Auxiliary purge channel, (A)...First purification series, (
B)...Second purification series, (V3)...
First switching valve device, (Vz) River...Second switching valve device, (
V3)...Third switching valve device, (V4)...
...Fourth switching valve device, (V5)...First on-off valve, (V6)...First flow control valve, (V7) River...
...Second on-off valve, (V8)...Second flow control valve, (V3)...Third on-off valve, (Vl.)...
...Third flow control valve.

Claims (1)

[Claims] The first and second purification lines (A) and (B) connected in parallel to the raw material gas supply path (4) each have built-in fillers (2a) and (3a) for removing impurity gas from the raw material gas. , the first switching valve device (V_1) for selectively supplying the raw material gas to the first and second refining lines (A) and (B) is connected to the supply path (4).
), the first and second purification lines (A) and (B)
A second switching valve device (V_2) for recovering purified gas from either of the first and second purification lines (A) and (B) is installed in the purified gas recovery path (6) connected to the purified gas recovery path (6). A regeneration gas supply line (8) connected to the first and second purification lines (A) and (B) is provided with a regeneration gas supply line (8) connected to the first and second purification lines (A) and (B). A third switching valve device (V_3) for selectively supplying gas is provided, and a first on-off valve (V_5) and a first flow control valve (V_6) are located upstream of the third switching valve device (V_3). and the first
And the regenerated exhaust gas is taken out from either one of the first and second refining lines (A) and (B) to the regenerated exhaust gas discharge path (10) connected to the second refining lines (A) and (B). A fourth switching valve device (V_4) is provided for switching the purified gas from the recovery path (6) to the regeneration gas supply path (8).
A purge flow path (11) to be sent as purge gas to is arranged upstream of the third switching valve device (V_3) and downstream of the first on-off valve (V_5) and the first flow rate control valve (V_6). connected to the regeneration gas supply path (8) at
A gas purification device in which the purge flow path (11) is provided with a second on-off valve (V_7) and a second flow rate control valve (V_8), wherein the first switching valve of the raw material gas supply path (4) is provided. The upstream side of the valve device (V_1) and the regeneration gas supply path (
8), on the upstream side of the third switching valve device (V_3), the first on-off valve (V_5) and the first flow control valve (V_6).
) to the downstream side through an auxiliary purge channel (12) that sends the raw material gas as a purge gas, and a third on-off valve (V_9) and a third flow rate control valve are connected to the auxiliary purge channel (12). A gas purification device equipped with (V_1_0).