JPS6293992A - Treatment of glass cloth - Google Patents

Treatment of glass cloth

Info

Publication number
JPS6293992A
JPS6293992A JP60234341A JP23434185A JPS6293992A JP S6293992 A JPS6293992 A JP S6293992A JP 60234341 A JP60234341 A JP 60234341A JP 23434185 A JP23434185 A JP 23434185A JP S6293992 A JPS6293992 A JP S6293992A
Authority
JP
Japan
Prior art keywords
glass cloth
glass
treatment
present
laminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60234341A
Other languages
Japanese (ja)
Other versions
JPH0632352B2 (en
Inventor
池田 盛隆
川上 尚利
徳沢 太郎
逸雄 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP60234341A priority Critical patent/JPH0632352B2/en
Publication of JPS6293992A publication Critical patent/JPS6293992A/en
Publication of JPH0632352B2 publication Critical patent/JPH0632352B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0366Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics

Landscapes

  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Reinforced Plastic Materials (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、耐熱性1寸法安定性にすぐれたプリント配線
基板を製造するためのガラスクロスの処理方法に関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for treating glass cloth for producing a printed wiring board with excellent heat resistance and one-dimensional stability.

(従来の技術)(発明が解決しようとする問題点)ガラ
スクロスを用いたプリント配線基板の製造は、ガラスク
ロスを有機シラン処理した後、エポキシ樹脂等のワニス
を含浸し、次いで5熱処理することにより半硬化状態の
、いわゆるプリプレグを製造し、引き続き所定の寸法に
裁断後、これを数枚重ねた上にさらに片面ないし両面に
銅箔を重ねて熱プレスを施して銅張り積層板を作成する
ことからスタートする。
(Prior Art) (Problem to be Solved by the Invention) Printed wiring boards using glass cloth are manufactured by treating the glass cloth with organic silane, impregnating it with varnish such as epoxy resin, and then subjecting it to heat treatment. A so-called prepreg in a semi-cured state is manufactured using the method, and after cutting it to a predetermined size, several sheets of this are stacked, and then copper foil is layered on one or both sides and heat pressed to create a copper-clad laminate. Start from that.

プリント配線基板を実装した機器は、高密度化が一段と
進み、小型化が進んでいるが、それに伴いプリント配線
基板に対する耐熱性や寸法安定性などの性能向上が強く
望まれて、きた。ガラスクロスを用いたプリント配′f
A基板の耐熱性や寸法安定性は、ガラスクロスの品質ば
かりでなく、ガラスクロスとワニスの接着性やワニスの
含浸の均一度に依存するといわれており1例えば、ワニ
スの含浸の不充分な場合には、高温下におけるブリスタ
ー(界面剥離)やミーズリング(交絡点の剥離)を起こ
すことが知られている。
Devices mounted with printed wiring boards are becoming more densely packed and smaller, and along with this, there is a strong desire to improve the performance of printed wiring boards, such as heat resistance and dimensional stability. Print arrangement using glass cloth
It is said that the heat resistance and dimensional stability of the A substrate depend not only on the quality of the glass cloth, but also on the adhesion between the glass cloth and the varnish and the uniformity of the varnish impregnation.1 For example, if the varnish impregnation is insufficient. It is known that blistering (interfacial peeling) and measling (separation at intertwined points) occur at high temperatures.

ガラ、スフロスに対するワニスの均一な含浸と接着性の
向上は、ガラスクロスをシランカップリング剤等で処理
する方法が有効であることも知られており、シランカッ
プリング剤の種類や調合条件の改良などが試みられてき
たが、いずれの方法においても未だ満足すべき結果は得
られておらず。
It is also known that treating glass cloth with a silane coupling agent is effective for uniformly impregnating varnish and improving adhesion to glass and foam, and improvements in the type of silane coupling agent and blending conditions are needed. Although various methods have been attempted, satisfactory results have not yet been obtained with any of the methods.

さらに改;q、が望まれていた。Further improvements were desired.

本発明は、このような従来技術の欠点を解消し。The present invention eliminates these drawbacks of the prior art.

ガラスクロスを用いた耐熱性と寸法安定性にすぐれたプ
リント配線基板を提供することを目的とするものである
The purpose of this invention is to provide a printed wiring board that uses glass cloth and has excellent heat resistance and dimensional stability.

(問題点を解決するための手段) 本発明者らは、このような問題点を解決するために鋭意
検討の結果1低温プラズマ処理が有効であることを見出
し1本発明に到達した。
(Means for Solving the Problems) In order to solve these problems, the inventors of the present invention have made extensive studies and found that low-temperature plasma treatment is effective, and have arrived at the present invention.

すなわら2本発明は、ガラスクロスを有機シラン処理し
2次いで、低温プラズマ処理することを特徴とするプリ
ント配線基板用ガラスクロスの処理方法に関するもので
ある。
In other words, the present invention relates to a method for treating glass cloth for printed wiring boards, which is characterized in that the glass cloth is treated with organic silane and then subjected to low-temperature plasma treatment.

以下に1本発明の詳細な説明する。The present invention will be explained in detail below.

本発明でいうガラスクロスとは、Eガラス、Cガラス、
Sガラス等、各種のガラス成分組成をもつガラス長繊維
を用いて製織された織物であり。
The glass cloth referred to in the present invention includes E glass, C glass,
It is a fabric woven using long glass fibers with various glass component compositions, such as S-glass.

平織、綾織、朱子織などの各種織物をいう。本発明で用
いられるガラス長繊維のフィラメント径は。
Refers to various types of fabrics such as plain weave, twill weave, and satin weave. What is the filament diameter of the long glass fiber used in the present invention?

数ミクロンから数十ミクロンが好ましい。本発明で用い
られるガラスクロスは、かかるガラス長繊維を複数本合
わせて得られるガラスヤーンを通常の織物製造と同様に
製経工程、糊付工程にか(jた後製織して得られるもの
である。ガラスクロスの経糸と緯糸の単位長さ当りの本
数、j7さ、単位面積当りの重量としては1日本工業規
格のR3414やアメリカ軍用規格(MIL規格)に適
合するものならばいかなるものでも使用できるが1例え
ば、クロス厚さは20ミクロンないし250ミク[マン
で。
The thickness is preferably from several microns to several tens of microns. The glass cloth used in the present invention is obtained by weaving a glass yarn obtained by combining a plurality of such long glass fibers through a warping process and a gluing process in the same manner as in ordinary textile manufacturing. Yes.The number of warps and wefts of glass cloth per unit length, j7, and weight per unit area are 1.Any material can be used as long as it complies with R3414 of the Japanese Industrial Standards and the American military standard (MIL standard). For example, the cloth thickness is 20 microns to 250 microns.

重さは1平方メートル当り30gないL300gのT・
u囲のものが望ましい。また、ガラス成分としては、無
アルカリガラスのEガラスが望ましい。
The weight is 30g per square meter, L is 300g, and T is 300g.
Preferably, the one in the u-circle. Further, as the glass component, E glass, which is a non-alkali glass, is desirable.

通常、ガラスクロスには製織に必要な有機のバインダー
や糊剤が付着しており、そのままで(よプリント基板向
のガラスクロスとして使用できないため、これらの有機
物を完全に除去する必要がある。これらの有機物を除去
する方法としては、約600°Cの炉に通したり、35
0〜400℃の炉の中ζこ回分式で数十時間処理する方
法(これらをヒートクリーニング処理という)、あるい
は糊抜の薬剤を用いる)品式処理方法等が挙げろn、る
Normally, glass cloth has organic binders and glues attached to it that are necessary for weaving, and cannot be used as is as glass cloth for printed circuit boards, so these organic substances must be completely removed. Methods for removing organic matter include passing it through a furnace at about 600°C or heating it at 35°C.
Examples include a method in which the material is treated batchwise for several tens of hours in a furnace at 0 to 400° C. (this is called a heat cleaning treatment), and a quality treatment method in which a desizing agent is used.

ヒートクリーニング処理等により有機物を除去したガラ
スクロスは、続いて、積層板用ワニスとの接着力や密着
性を向上させるために、有機シランを主成分とする表面
処理剤で処理される。本発明方法において使用する有機
シランは、一般式Rn5iX+、−n+ で表わされる
ものである。この式において、Xは任意の一価の加水分
解し得る基。
The glass cloth from which organic matter has been removed by heat cleaning or the like is then treated with a surface treatment agent containing organic silane as a main component in order to improve adhesive strength and adhesion with the varnish for laminates. The organic silane used in the method of the present invention is represented by the general formula Rn5iX+, -n+. In this formula, X is any monovalent hydrolyzable group.

例えば、ハロゲン原子、アルコキシ基およびアシロ−1
−シ基であり、nは1〜3である。nが1あるいは2に
おいては、Xは互いに同一のものでも異なっていてもよ
い。また、Rは少なくとも炭素原子を一つ有する基であ
り、炭素原子に結合する水素原子は、アミノ基、エボー
1−シ基、メルカプト基およびビニル基等の反応性を有
する基で置換されていてもよい。また1本発明で使用す
る有機シランは、二種以」二を混合して使用してもよい
For example, halogen atoms, alkoxy groups and acylo-1
- is a group, and n is 1-3. When n is 1 or 2, X may be the same or different. Further, R is a group having at least one carbon atom, and the hydrogen atom bonded to the carbon atom is substituted with a reactive group such as an amino group, an ebor-1-cy group, a mercapto group, or a vinyl group. Good too. Furthermore, two or more organic silanes used in the present invention may be used in combination.

前記一般式で表わされる代表的な有機シランとしては2
例えば、γ−グリンドオキシブロビルトリメトキシシラ
ン、r−メルカプトプロピルトリメトキシシラン、T−
アミノプロピルトリエトキシシラン、N−β−(アミノ
エチル)−γ−−1ミノプロピルトリメトキシシラン、
N−β−(1)−ビニルベンジルアミノエy−ル)−γ
 −アミツブ[]ピルトリメトキシシラン、r−(フェ
ニルアミ7))プロピルトリメトキシシラン、フェニル
トリメトキシシランおよびメチルトリメ!−キシシラン
等が挙げられる。
Typical organic silanes represented by the above general formula include 2
For example, γ-glyndoxybrobyltrimethoxysilane, r-mercaptopropyltrimethoxysilane, T-
Aminopropyltriethoxysilane, N-β-(aminoethyl)-γ-1minopropyltrimethoxysilane,
N-β-(1)-vinylbenzylaminoethyl)-γ
- Amitub[]pyrtrimethoxysilane, r-(phenylami7))propyltrimethoxysilane, phenyltrimethoxysilane and methyltrimethoxysilane! -Xysilane and the like.

これらの有機シランは1通常水溶液またはアルコール類
、ケトン類、グリコールエーテル類等の有機溶剤と水と
の混合溶液として、0゜01〜5重量%程度の?心変に
調整して使用される。
These organic silanes are usually prepared as an aqueous solution or a mixed solution of water and an organic solvent such as alcohols, ketones, glycol ethers, etc. at a concentration of about 0.01 to 5% by weight. It is used by adjusting the mind.

有機シランを主成分とする表面処理剤をガラスクロスに
適用する方法としては、浸漬法、噴霧法2ガス化法など
任意の公知の方法が採用できる。一般に多用される浸漬
法では2例えば、室温に近い温度でガラスクロスを有機
シラン溶液へ数秒間浸ン貴した後、マングルで糸交り。
As a method for applying a surface treatment agent containing organic silane as a main component to the glass cloth, any known method such as a dipping method, a spraying method, or a gasification method can be employed. In the commonly used dipping method, for example, a glass cloth is immersed in an organic silane solution for several seconds at a temperature close to room temperature, and then twisted with a mangle.

続いて80〜180℃で数分間乾燥キユアリングするこ
とにより、有機シランが0.01〜2重量%程度付与さ
れたガラスクロスを得る。
Subsequently, dry curing is performed at 80 to 180° C. for several minutes to obtain a glass cloth to which approximately 0.01 to 2% by weight of organic silane is added.

本発明方法では2 この有機シラン処理したガラスクロ
スにさらに低温プラズマ処理を施す。低、ユプラズマ処
理条件としては、一般に公知の処理条件が採用される。
In the method of the present invention, the organic silane-treated glass cloth is further subjected to low-temperature plasma treatment. Generally known treatment conditions are employed as the low and high plasma treatment conditions.

例えば、温度としては室温〜百敗十度、圧力としては0
.1〜l torr、周波数としては数〜数十メガヘル
ツ、電極単位面積当りの出力としては0.1〜]、 O
kiv/ cIA、処理時間としては数秒〜散十分の範
囲が好ましい。
For example, the temperature is room temperature to 100 degrees, and the pressure is 0.
.. 1 to l torr, frequency from several to several tens of megahertz, output per unit area of electrode from 0.1 to], O
kiv/cIA, the processing time is preferably in the range of several seconds to several minutes.

この低温プラズマ処理は9回分式でも連続式でも行える
This low-temperature plasma treatment can be performed either in 9 batches or continuously.

本発明の方法で得られたガラスクロスは、ワニス含浸後
、乾燥、キュアしてプリプレグし1次いで、プレスして
プリント配線板用の積層板に加工される。
The glass cloth obtained by the method of the present invention is impregnated with varnish, dried, cured, prepregged, and then pressed to be processed into a laminate for printed wiring boards.

(実施例) 次に本発明を実施例によって説明するが2本発明におけ
る各性能評価は次の方法によって行った(1)寸法安定
性 JIS  C−6486によって評価した。
(Example) Next, the present invention will be described with reference to Examples.2 Performance evaluations of the present invention were carried out by the following methods: (1) Dimensional stability was evaluated according to JIS C-6486.

(2)含浸性 トリアセテ−1−フィルムを張ったガラス仮にガラスク
ロスを置き、このガラスクロスにエポキシ樹脂を載・仕
てから3分後の透過光の強さと、空試験の透過光の強さ
を測定し、−(一式で算出される透過度により評価した
(2) Glass coated with impregnable triacetate-1 film Temporarily place a glass cloth, and measure the intensity of transmitted light 3 minutes after placing and covering the epoxy resin on this glass cloth, and the intensity of transmitted light in a blank test. was measured and evaluated by the transmittance calculated from the set of -(.

(3)耐熱性 積層板を常圧で煮沸2L  260 ’Cの半田浴槽に
30秒間浸漬し、取り出した後の積層板−の界面ヱリ離
(ブリスター)、ガーうスフロスの交絡点の剥離(ミー
ズリング)を調べ、 21)1tllの発生する煮沸時
間を耐熱保持時間とする。
(3) Immerse the heat-resistant laminate in a boiling 2L 260'C solder bath at normal pressure for 30 seconds, and after taking it out, the interface between the laminate and the laminate will peel (blister), and the intertwined points of the gar floss will peel off ( 21) The boiling time for which 1 tll is generated is the heat resistance retention time.

試験片は50龍×501とする。The test piece is 50×501.

実施例1 ヒートクリーニング処理を施したガラスクロス(経糸G
751)0 I Z、緯糸G751)0 I Z ;経
糸密度44本/1ン、緯糸密度33本/;ン)を用意し
Example 1 Glass cloth subjected to heat cleaning treatment (warp G
751) 0 I Z, weft G751) 0 I Z ; warp density 44/1 inch, weft density 33/;

アミノシランO61重星%水溶液に浸漬後、ガラスクロ
スioom’u部に対して水)容液30重債部になるよ
うにマングルで均一に絞った。続いて、熱風乾燥機で1
50°Cにて2分間乾燥キユアリングし、アミノシラン
処理ガラスクロスを得た。
After immersing it in an aqueous solution of aminosilane O61%, it was squeezed uniformly with a mangle so that the volume of the solution was 30 parts by weight per part of the glass cloth. Next, dry in a hot air dryer.
Dry curing was performed at 50°C for 2 minutes to obtain an aminosilane-treated glass cloth.

次に、このガラスクロスを並行平型電極を内部に設置し
た真空容器内に入れ、真空ポンプで排気残圧して1. 
OLorrの真空度とし、  13.56MIIz(7
)高周波電源よりマツチング回路を通して電極に高周波
を0.5 kw/ clの出力で印加し、低温プラズマ
を発生させて1分間処理し、プラズマ処理クロスを得た
。次に、この低温プラズマ処理したガラスクロスにNE
MA規格のFR−4組成のエポキシ樹脂を含浸し、エポ
キシ樹脂45重量部、ガラスクロス55重盟部からなる
プリプレグを作成した。
Next, this glass cloth was placed in a vacuum container with parallel flat electrodes installed inside, and the residual pressure was evacuated using a vacuum pump.
The degree of vacuum is OLorr, 13.56 MIIz (7
) A high frequency wave was applied to the electrodes through a matching circuit from a high frequency power source at an output of 0.5 kW/cl to generate low temperature plasma, which was treated for 1 minute to obtain a plasma treated cloth. Next, NE was applied to this low-temperature plasma-treated glass cloth.
A prepreg consisting of 45 parts by weight of epoxy resin and 55 parts of glass cloth was prepared by impregnating it with an epoxy resin having a composition of FR-4 according to the MA standard.

このプリプレグを8枚重ねて、170”cで1時間加圧
成形して積層板を作成した。次いで、得られた積層板で
耐熱性と寸法安定性を測定した。その結果を第1表に示
した。
A laminate was created by stacking 8 sheets of this prepreg and press-forming at 170"c for 1 hour.Then, the heat resistance and dimensional stability of the obtained laminate were measured.The results are shown in Table 1. Indicated.

比較例1 実施例1の低温プラズマ処理工程を除いた積層[反を作
成し、実施例1と同じ項目を測定した。測定結果を第1
表に示す。
Comparative Example 1 A laminated fabric was prepared except for the low-temperature plasma treatment step of Example 1, and the same items as in Example 1 were measured. Measurement results first
Shown in the table.

第1表から明らかなように2本発明によるガラスクロス
は従来のガラスクロスに比べてワニスの含浸性が良好で
あり、このガラスクロスを使用した積層板は、従来のガ
ラスクロスを使用した積層板に比べ耐熱性1寸法安定性
が明らかに向上した。
As is clear from Table 1, the glass cloth according to the present invention has better varnish impregnation properties than the conventional glass cloth, and the laminate using this glass cloth is different from the laminate using the conventional glass cloth. The heat resistance and one-dimensional stability were clearly improved compared to the above.

実施例2.3 実施例1のアミノシランをエポキシシラン(実施例2)
、あるいはグリシドキシシラン(実施例3)に代えた以
外は実施例1と同じ条件で処理して積層板を得た。測定
結果を第2表に示す。
Example 2.3 The aminosilane of Example 1 was replaced with epoxysilane (Example 2)
Alternatively, a laminate was obtained by processing under the same conditions as in Example 1 except that glycidoxysilane (Example 3) was used instead. The measurement results are shown in Table 2.

比較例2.3 比較例1のアミノシランをエポキシシラン(比較例2)
、あるいはグリシドキシシラン(比較例3)に代えた以
外は比較例1と同し条件で処理して積層板を得た。測定
結果を第2表に示す。
Comparative Example 2.3 The aminosilane of Comparative Example 1 was replaced with epoxysilane (Comparative Example 2)
Alternatively, a laminate was obtained by processing under the same conditions as in Comparative Example 1 except that glycidoxysilane (Comparative Example 3) was used instead. The measurement results are shown in Table 2.

第2表から明らかなように、シランカップリング剤を代
えてもワニスの含浸性が向上し、成形加工後の積層板の
酎2!り性1寸法安定性が向トしていることが判る。
As is clear from Table 2, even if the silane coupling agent is changed, the impregnability of the varnish is improved, and the laminate plate after molding is improved. It can be seen that the one-dimensional stability is improved.

(発明の効果) 本発明の方法によれば5ガラスクロスへのワニスの含浸
性が向上することにより、プリント配線基板としての耐
熱性2寸法安定性が向上する。
(Effects of the Invention) According to the method of the present invention, the impregnating property of the glass cloth with varnish is improved, thereby improving the heat resistance and two-dimensional stability of the printed wiring board.

Claims (1)

【特許請求の範囲】[Claims] (1)ガラスクロスを有機シラン処理し、次いで低温プ
ラズマ処理することを特徴とするプリント配線基板用ガ
ラスクロスの処理方法。
(1) A method for treating glass cloth for printed wiring boards, which comprises treating the glass cloth with organic silane and then subjecting it to low-temperature plasma treatment.
JP60234341A 1985-10-18 1985-10-18 Glass cloth processing method Expired - Lifetime JPH0632352B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60234341A JPH0632352B2 (en) 1985-10-18 1985-10-18 Glass cloth processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60234341A JPH0632352B2 (en) 1985-10-18 1985-10-18 Glass cloth processing method

Publications (2)

Publication Number Publication Date
JPS6293992A true JPS6293992A (en) 1987-04-30
JPH0632352B2 JPH0632352B2 (en) 1994-04-27

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP60234341A Expired - Lifetime JPH0632352B2 (en) 1985-10-18 1985-10-18 Glass cloth processing method

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JP (1) JPH0632352B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016033951A (en) * 2014-07-31 2016-03-10 信越化学工業株式会社 Sealing material with support base material, sealed semiconductor element mounting substrate, sealed semiconductor element formation wafer, semiconductor device, and method of manufacturing semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4971264A (en) * 1972-11-15 1974-07-10
JPS5887363A (en) * 1981-11-20 1983-05-25 ユニチカ株式会社 Refining of fiber product

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4971264A (en) * 1972-11-15 1974-07-10
JPS5887363A (en) * 1981-11-20 1983-05-25 ユニチカ株式会社 Refining of fiber product

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016033951A (en) * 2014-07-31 2016-03-10 信越化学工業株式会社 Sealing material with support base material, sealed semiconductor element mounting substrate, sealed semiconductor element formation wafer, semiconductor device, and method of manufacturing semiconductor device

Also Published As

Publication number Publication date
JPH0632352B2 (en) 1994-04-27

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