JPS629366B2 - - Google Patents

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Publication number
JPS629366B2
JPS629366B2 JP56195051A JP19505181A JPS629366B2 JP S629366 B2 JPS629366 B2 JP S629366B2 JP 56195051 A JP56195051 A JP 56195051A JP 19505181 A JP19505181 A JP 19505181A JP S629366 B2 JPS629366 B2 JP S629366B2
Authority
JP
Japan
Prior art keywords
cleaning
liquid
gas
specific gravity
cleaning liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56195051A
Other languages
Japanese (ja)
Other versions
JPS5898121A (en
Inventor
Naotoshi Matsunaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP56195051A priority Critical patent/JPS5898121A/en
Publication of JPS5898121A publication Critical patent/JPS5898121A/en
Publication of JPS629366B2 publication Critical patent/JPS629366B2/ja
Granted legal-status Critical Current

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  • Treating Waste Gases (AREA)
  • Separation Of Particles Using Liquids (AREA)

Description

【発明の詳細な説明】 この発明は、被処理ガス中の有害成分と反応し
て無臭の反応生成物に変換して除去する薬剤を含
む溶液を洗浄液として循環洗浄するガス洗浄装
置、特にバツチ法にて洗浄液の更新を行うガス洗
浄装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gas cleaning device that circulates and cleans a solution containing a chemical that reacts with harmful components in a gas to be treated to convert them into odorless reaction products and remove them, and in particular a batch method. The present invention relates to a gas cleaning device that renews cleaning liquid at a gas cleaning device.

従来この種の装置として第1図に示すものがあ
つた。第1図は従来のガス洗浄装置を示すフロー
図であり、図において、1は洗浄塔、2はこの洗
浄塔内に設けられた気液接触を行わせるための充
填物層、3はこの充填物層の底に貯留される塔底
液、4および5は被処理ガスの流入方向および処
理ガスの流出方向を示す矢印、6はデミスター、
7は塔底液3を前記充填物層2上に循環させる循
環ポンプ、8は塔底液3の次亜塩素酸ナトリウム
の濃度を調節する濃度調節計、9は循環液に薬液
を注入する薬注ポンプ、10は薬液タンク、11
は薬注ポンプ9用の動力線、12は洗浄塔1へ供
給される補給水、13は塔底液3の液量を一定に
保つための液面調節計で、補給水12の補給量を
調節する。14は塔底液3のレベルゲージ、15
は信号線、16は洗浄液更新装置、17は電磁弁
18の開閉を制御するための動力線で、洗浄液更
新装置16より出力する。19は補給水12用の
電磁弁20の開閉を制御するための動力線で、同
じく洗浄液更新装置16より出力する。21は洗
浄塔1から排出されるドレンである。
A conventional device of this type is shown in FIG. FIG. 1 is a flow diagram showing a conventional gas cleaning device. In the figure, 1 is a cleaning tower, 2 is a packed layer provided in this cleaning tower for gas-liquid contact, and 3 is a packed layer for making gas-liquid contact. The bottom liquid stored at the bottom of the layer, 4 and 5 are arrows indicating the inflow direction of the gas to be treated and the outflow direction of the process gas, 6 is a demister,
7 is a circulation pump that circulates the bottom liquid 3 over the packed bed 2; 8 is a concentration controller that adjusts the concentration of sodium hypochlorite in the bottom liquid 3; and 9 is a medicine that injects a chemical into the circulating liquid. Injection pump, 10 is a chemical tank, 11
12 is a power line for the chemical dosing pump 9, 12 is makeup water supplied to the cleaning tower 1, and 13 is a liquid level controller for keeping the volume of the bottom liquid 3 constant. Adjust. 14 is a level gauge for the bottom liquid 3, 15
16 is a signal line, 16 is a cleaning liquid renewal device, and 17 is a power line for controlling the opening and closing of the electromagnetic valve 18, which is output from the cleaning liquid renewal device 16. Reference numeral 19 denotes a power line for controlling the opening and closing of the solenoid valve 20 for the make-up water 12, which is also output from the cleaning liquid renewal device 16. 21 is a drain discharged from the cleaning tower 1.

次に動作について説明する。洗浄塔1内に圧送
または吸引された被処理ガスは、矢印4の方向に
充填物層2内を通過する間に、循環ポンプ7によ
り送られ噴霧され、充填物層2を流下する洗浄液
と気液接触し、被処理ガス中の有害成分等は洗浄
液中に吸収除去され、洗浄液中の薬液と反応して
無臭の反応生成物に変換される。
Next, the operation will be explained. The gas to be treated that has been pumped or sucked into the cleaning tower 1 is sent and atomized by the circulation pump 7 while passing through the packed layer 2 in the direction of the arrow 4, and is mixed with the cleaning liquid flowing down the packed layer 2. Upon contact with the liquid, harmful components in the gas to be treated are absorbed and removed by the cleaning liquid, react with the chemical solution in the cleaning liquid, and are converted into odorless reaction products.

ここで塔底液3は被処理ガスを洗浄する過程で
水分の一部が蒸発し、徐々に液量が減少するの
で、これを防止するため、液面調節計13を介し
て補給水12を注入し、常に液量を一定に保持し
ている。
Here, part of the moisture in the tower bottom liquid 3 evaporates during the process of cleaning the gas to be treated, and the liquid volume gradually decreases. To prevent this, make-up water 12 is supplied via the liquid level controller 13. The liquid volume is always maintained at a constant level.

また塔底液3中の薬剤も有害成分等を吸収除去
する過程で消失して行くので、循環ポンプ7で圧
送された洗浄液の一部を濃度調節計8に導き、塔
底液3中の次亜塩素酸ナトリウムの濃度をモニタ
ーし、薬液タンク10内の次亜塩素酸ナトリウム
原液の注入量を薬注ポンプ9の起動停止により制
御して、塔底液3の次亜塩素酸ナトリウムを一定
濃度に保持する。
In addition, since the chemicals in the bottom liquid 3 also disappear during the process of absorbing and removing harmful components, a part of the cleaning liquid pumped by the circulation pump 7 is guided to the concentration controller 8, and the next liquid in the bottom liquid 3 is The concentration of sodium chlorite is monitored, and the injection amount of sodium hypochlorite stock solution in the chemical tank 10 is controlled by starting and stopping the chemical injection pump 9, so that the sodium hypochlorite in the tower bottom liquid 3 is maintained at a constant concentration. to hold.

さてここでし尿処理場や下水処理場の各処理工
程から排出される臭気成分の洗浄除去の場合につ
いて説明する。この場合、被処理ガス中の臭気成
分、すなわちアンモニア、硫化水素、メチルメル
カプタン、硫化メチル、二硫化メチル等の各臭気
成分は、充填物層2内を通過する間に次亜塩素酸
ナトリウムを含む洗浄液と気液接触して吸収除去
されるが、この時の化学反応は次式で示される。
Now, the case of cleaning and removing odor components discharged from each treatment process of a human waste treatment plant or a sewage treatment plant will be explained. In this case, each odor component in the gas to be treated, that is, ammonia, hydrogen sulfide, methyl mercaptan, methyl sulfide, methyl disulfide, etc., contains sodium hypochlorite while passing through the packed layer 2. It is absorbed and removed by contact with the cleaning liquid, and the chemical reaction at this time is shown by the following equation.

2NH3+3NaClO→N2+3NaCl+3H2O 3H2S+6NaClO+2NaOH→ Na2SO4+6NaCl+2S+4H2O CH3SH+3NaClO+NaOH→ CH3SO3Na+3NaCl+H2O (CH32S+NaClO→(CH32SO+NaCl (CH32S2+5NaClO+2NaOH→ 2CH3SO3Na+5NaCl+H2O このようにして被処理ガス中の臭気は充填物層
2内で洗浄除去され、さらにデミスター6を通過
して同伴する洗浄液ミストを除去された後、処理
ガスとして洗浄塔1より矢印5のように排出され
る。一方洗浄液による吸収除去で生成した硫酸ナ
トリウム、メタンスルホン酸ナトリウム、ジメチ
ルスルホキシドや、上記臭気成分除去のために作
用した次亜塩素酸ナトリウムの老廃化物質である
塩化ナトリウム等は洗浄液中に残り、徐々に蓄積
されることになる。ここで洗浄液がアルカリ性で
あると、被処理ガス中の炭酸ガスも次式に従つて
吸収され、洗浄液中に炭酸塩類として蓄積され
る。
2NH 3 +3NaClO→N 2 +3NaCl+3H 2 O 3H 2 S+6NaClO+2NaOH→ Na 2 SO 4 +6NaCl+2S+4H 2 O CH 3 SH+3NaClO+NaOH→ CH 3 SO 3 Na+3NaCl+H 2 O (CH 3 ) 2 S+NaClO→(CH 3 ) 2 SO+NaCl (CH 3 ) 2S 2 +5NaClO+2NaOH→ 2CH 3 SO 3 Na + 5NaCl + H 2 O In this way, the odor in the gas to be treated is washed away in the packed layer 2, and after passing through the demister 6 and removing the accompanying cleaning liquid mist, the gas to be treated is It is discharged from the washing tower 1 as shown by the arrow 5. On the other hand, sodium sulfate, sodium methanesulfonate, dimethyl sulfoxide, which are generated by absorption and removal by the cleaning solution, and sodium chloride, which is a depleted substance of sodium hypochlorite that acts to remove the above-mentioned odor components, remain in the cleaning solution and gradually will be accumulated. Here, if the cleaning liquid is alkaline, carbon dioxide gas in the gas to be treated is also absorbed according to the following equation, and accumulated as carbonates in the cleaning liquid.

CO2+NaOH→NaHCO3 CO2+2NaOH→Na2CO3+H2O 第2図はこの種の洗浄塔の洗浄液中に見られる
代表的な反応生成物の溶解度曲線を示したもので
ある。各物質により溶解度が異なり一概にはいえ
ないが、第2図より、それぞれの成分濃度が常温
付近では8〜20(wt%)、0℃付近では4〜7
(wt%)を越えると、溶質が析出し、各部で閉塞
などのトラブルが発出することが予想される。こ
のため洗浄液の定期的な更新が必要となる。
CO 2 +NaOH→NaHCO 3 CO 2 +2NaOH→Na 2 CO 3 +H 2 O FIG. 2 shows the solubility curves of typical reaction products found in the washing liquid of this type of washing tower. Although the solubility differs depending on each substance and cannot be generalized, from Figure 2, the concentration of each component is 8 to 20 (wt%) near room temperature, and 4 to 7 (wt%) near 0℃.
(wt%), it is expected that the solute will precipitate and problems such as clogging will occur in various parts. For this reason, it is necessary to periodically renew the cleaning liquid.

従来は洗浄液の更新を行うために洗浄液更新装
置16が定期的に作動しこれを実行していた。す
なわち予めセツトされた時間に達した所で、洗浄
液更新装置16より出力された動力が動力線17
を介して電磁弁18を開き塔底液3がドレン21
より排出される。そしてこれを同時にそれまで動
力線19に通じていた動力が停止して電磁弁20
を閉じ、補給水12の給水が止まり、塔底液3の
排出を容易にする。そして塔底液3のレベルが一
定の深さまで下がつた所で、レベルゲージ14に
よりこれを検知し、信号線15により洗浄液更新
装置16に伝えて、電磁弁18を開いた動力が停
止し、逆に電磁弁20は再び動力が与えられて開
かれる。そして再び液面調節計13を介して給水
が行われ、元のレベルまで水位が上昇した所で補
給水12が止まる。このようにして、従来は塔底
液3を補給水12で希釈して洗浄液の更新を行つ
ていた。
Conventionally, the cleaning liquid renewal device 16 was operated periodically to renew the cleaning liquid. In other words, when the preset time is reached, the power output from the cleaning fluid renewal device 16 is transferred to the power line 17.
The solenoid valve 18 is opened via the column bottom liquid 3 to the drain 21.
more excreted. At the same time, the power that had been connected to the power line 19 stops and the solenoid valve 20
is closed, the supply of make-up water 12 is stopped, and the bottom liquid 3 is easily discharged. When the level of the bottom liquid 3 has fallen to a certain depth, this is detected by the level gauge 14 and transmitted to the cleaning liquid renewal device 16 via the signal line 15, and the power that opens the solenoid valve 18 is stopped. Conversely, the solenoid valve 20 is reenergized and opened. Water is then supplied again via the liquid level controller 13, and the supply of makeup water 12 is stopped when the water level rises to the original level. In this way, conventionally, the column bottom liquid 3 was diluted with makeup water 12 to renew the cleaning liquid.

従来のガス洗浄装置は以上のように構成されて
いるので、塔底液3の更新間隔は予め机上計算に
より予測するとともに、試運転により確認した上
で、なおかつより安全側に設定し、更新間隔を短
くする必要があつた。このため更新間隔の設定に
手間どる上に、その設定をより安全側にするた
め、不必要に薬剤を排出し、薬剤の浪費を招くと
いう欠点があつた。
Conventional gas cleaning equipment is configured as described above, so the update interval for the bottom liquid 3 can be predicted in advance through desktop calculations, confirmed through trial runs, and then set to a safer side. I needed to make it shorter. For this reason, it takes time to set the update interval, and in order to set the update interval on the safer side, medicine is discharged unnecessarily, leading to waste of medicine.

この発明は上記のような従来のものの欠点を除
去するためになされたもので、被処理ガス中の有
害成分と反応して無臭の反応生成物に変換して除
去する薬剤を含む溶液を洗浄液として循環洗浄す
るガス洗浄装置において、前記反応生成物による
洗浄液の比重の変化を検知して洗浄液の更新を行
うように、洗浄塔に塔底液の比重をモニターする
比重計を取りつけ、この比重計により塔底液比重
が設定値以上になつた所で洗浄液更新装置を働か
せることにより、容易にかつ適切に洗浄液更新が
行えるガス洗浄装置を提供することを目的として
いる。
This invention was made in order to eliminate the drawbacks of the conventional methods as described above, and uses a solution containing a chemical that reacts with harmful components in the gas to be treated and removes them by converting them into odorless reaction products as a cleaning liquid. In a gas cleaning device that performs circulating cleaning, a hydrometer is attached to the cleaning tower to monitor the specific gravity of the bottom liquid so that the cleaning liquid is updated by detecting changes in the specific gravity of the cleaning liquid due to the reaction products. It is an object of the present invention to provide a gas cleaning device that can easily and appropriately renew the cleaning fluid by operating the cleaning fluid renewal device at a point where the specific gravity of the tower bottom liquid exceeds a set value.

以下この発明の一実施例を図について説明す
る。第3図はこの発明の一実施例によるガス洗浄
装置を示すフロー図であり、図において、1ない
し21は第1図と同一または相当部分を示す。2
2は塔底液3の比重の変化をモニターするための
比重計、23はこの比重計により塔底液3が予め
設定された比重以上になつたことを検知して洗浄
液更新装置16へ伝達するための信号線である。
An embodiment of the present invention will be described below with reference to the drawings. FIG. 3 is a flowchart showing a gas cleaning apparatus according to an embodiment of the present invention, and in the figure, 1 to 21 indicate the same or corresponding parts as in FIG. 1. 2
2 is a hydrometer for monitoring changes in the specific gravity of the bottom liquid 3; 23 is a hydrometer that detects when the specific gravity of the bottom liquid 3 has exceeded a preset value and transmits the detected value to the cleaning liquid renewal device 16; This is a signal line for

洗浄液中に生成する代表的な反応生成物のそれ
ぞれの水溶液濃度とその溶液比重の関係を第4図
に示す。第4図より明らかなように、し尿処理場
や下水処理場より排出される臭気を次亜塩素酸ナ
トリウム洗浄にて吸収除去した際に、洗浄液中に
生成する代表的な反応生成物の溶液比重は、1〜
10%の濃度範囲においてはそれぞれ直線関係にあ
り、また各成分の同一比重を示すそれぞれの水溶
液濃度は、中間値に対して±20%前後に収まるこ
とがわかる。例えば溶液比重1.04を示す水溶液濃
度の最小は炭酸ナトリウムの4.2wt%であり、溶
液比重1.04を示す水溶液濃度の最大は塩化ナトリ
ウムの6wt%である。従つてその中間値は5.1%と
なり、それぞれの水溶液濃度はその中間値5.1%
に対して±0.9wt%の濃度範囲にあることにな
る。このように同一比重を示すそれぞれの水溶液
濃度は中間値5.1wt%に対して±20%の精度範囲
中に収まる。従つてこれを利用すれば、洗浄後の
比重を計測することで溶液中の各成分の平均濃度
を知ることができ、それにより洗浄液の更新時期
を的確に知ることができる。
FIG. 4 shows the relationship between the concentration of each aqueous solution of typical reaction products produced in the cleaning solution and the specific gravity of the solution. As is clear from Figure 4, when odors discharged from human waste treatment plants and sewage treatment plants are absorbed and removed by sodium hypochlorite cleaning, the solution specific gravity of typical reaction products generated in the cleaning solution. is 1~
It can be seen that there is a linear relationship in the concentration range of 10%, and the concentrations of the respective aqueous solutions showing the same specific gravity of each component fall within about ±20% of the intermediate value. For example, the minimum aqueous solution concentration exhibiting a solution specific gravity of 1.04 is 4.2 wt% of sodium carbonate, and the maximum aqueous solution concentration exhibiting a solution specific gravity of 1.04 is 6 wt% of sodium chloride. Therefore, the intermediate value is 5.1%, and the concentration of each aqueous solution is 5.1%.
This means that the concentration range is ±0.9wt%. In this way, the concentrations of each aqueous solution showing the same specific gravity fall within the accuracy range of ±20% with respect to the intermediate value of 5.1 wt%. Therefore, by using this, it is possible to know the average concentration of each component in the solution by measuring the specific gravity after cleaning, and thereby it is possible to accurately know when to renew the cleaning liquid.

第3図において比重計22は塔底液3の溶液比
重が設定値以上になれば、それを信号線23を介
して洗浄液更新装置16へ伝達する。その入力信
号により洗浄液更新装置16は塔底液3の更新操
作を実行する。すなわち動力線19を介して電磁
弁20を閉じるとともに動力線17を介して電磁
弁18を開いて塔底液3の排出を行う。そして塔
底液3面がある一定レベルまで下がつたことをレ
ベルゲージ14により信号線15を介して検知
し、電磁弁18を閉じるとともに電磁弁20を開
いて補給水12の供給を液面調節計13を介して
行い、塔底液3の液量は元にもどる。そして塔底
液3が希釈され、次亜塩素酸ナトリウムの希薄と
なつた分は濃度調節計8の働きにより薬注して、
設定濃度まで次亜塩素酸ナトリウム濃度を上昇さ
せ、塔底液3の更新操作は完了する。
In FIG. 3, when the solution specific gravity of the tower bottom liquid 3 exceeds a set value, the hydrometer 22 transmits it to the cleaning liquid renewal device 16 via a signal line 23. In response to the input signal, the cleaning liquid renewal device 16 executes an operation for renewing the column bottom liquid 3. That is, the solenoid valve 20 is closed via the power line 19 and the solenoid valve 18 is opened via the power line 17 to discharge the bottom liquid 3. Then, when the level gauge 14 detects via the signal line 15 that the level of the bottom liquid 3 has fallen to a certain level, the solenoid valve 18 is closed and the solenoid valve 20 is opened to adjust the level of the supply of make-up water 12. 13 in total, and the liquid volume of the tower bottom liquid 3 returns to its original level. Then, the bottom liquid 3 is diluted, and the diluted sodium hypochlorite is injected by the action of the concentration controller 8.
The sodium hypochlorite concentration is increased to the set concentration, and the renewal operation of the tower bottom liquid 3 is completed.

洗浄液更新装置16は比重計22より信号線2
3を介して入力を一度得た後は、一通り更新操作
が完了する時間を経過しなければ、再度比重計2
2よりの信号を入力しないような保護回路を設け
ておき、補給水12の供給がスムーズに行えるよ
うな回路構成を持たせるのが望ましい。
The cleaning liquid renewal device 16 is connected to the signal line 2 from the hydrometer 22.
Once the input has been obtained via 3, if the time to complete the update operation has not elapsed, the hydrometer 2 is input again.
It is desirable to provide a protection circuit that prevents input of signals from 2 and to have a circuit configuration that allows smooth supply of make-up water 12.

なお上記実施例では洗浄液として次亜塩素酸ナ
トリウムを用いる洗浄装置について説明したが、
これに限定されるものではなく、他の薬液を用い
るガス洗浄装置、例えば硫酸、塩酸、水酸化ナト
リウム、過酸化水素、過マンガン酸カリウム、亜
塩素酸ナトリウム、次亜臭素酸ナトリウム、チオ
硫酸ナトリウム等の薬剤を一種以上含む水溶液を
洗浄液とするガス洗浄装置に適用してもよく、上
記実施例と同様の効果を奏する。
Note that in the above embodiment, a cleaning device using sodium hypochlorite as the cleaning liquid was explained.
Gas cleaning equipment using other chemical solutions including, but not limited to, sulfuric acid, hydrochloric acid, sodium hydroxide, hydrogen peroxide, potassium permanganate, sodium chlorite, sodium hypobromite, sodium thiosulfate The present invention may also be applied to a gas cleaning device using an aqueous solution containing one or more chemicals such as the above as a cleaning liquid, and the same effects as those of the above embodiments can be obtained.

また、上記実施例では塔底液3の溶液比重を自
動計測する方式で説明したが、人手により溶液比
重を計測し、その結果により洗浄液更新装置16
を手動で働かせてもよく、上記と同様な効果を奏
する。
Further, in the above embodiment, the solution specific gravity of the tower bottom liquid 3 is automatically measured.
may be operated manually, with the same effect as above.

以上のように、この発明によれば、洗浄液の比
重を計測して洗浄液更新を行うようにしたので、
従来装置のように不必要に洗浄液を排出すること
がなくなり、また洗浄除去対象成分が予期以上に
濃厚となつて、反応生成物が蓄積し、結晶析出に
よりトラブルを引き起こすようなことがなくな
る。さらに補給水も最少量に維持できるため省エ
ネルギーにも役立つなどの効果がある。
As described above, according to the present invention, since the cleaning liquid is updated by measuring the specific gravity of the cleaning liquid,
Unlike conventional devices, cleaning liquid is not discharged unnecessarily, and the components to be cleaned and removed become more concentrated than expected, reaction products accumulate, and troubles due to crystal precipitation are eliminated. Additionally, the amount of supplementary water can be kept to a minimum, which helps save energy.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のガス洗浄装置を示すフロー図、
第2図はし尿臭や下水臭を次亜塩素酸ナトリウム
洗浄した場合に洗浄液中に蓄積する反応生成物の
溶解度曲線図、第3図はこの発明の一実施例によ
るガス洗浄装置を示すフロー図、第4図は上記洗
浄液中に蓄積する反応生成物の水溶液濃度と溶液
比重の関係曲線図である。 図中、1は洗浄塔、2は充填物層、3は塔底
液、4は被処理ガスの流入方向を示す矢印、5は
処理ガスの流出方向を示す矢印、6はデミスタ
ー、7は循環ポンプ、8は濃度調節計、9は薬注
ポンプ、10は薬液タンク、11,17,19は
動力線、12は補給水、13は液面調節計、14
はレベルゲージ、15,23は信号線、16は洗
浄液更新装置、18,20は電磁弁、21はドレ
ン、22は比重計である。なお、図中、同一符号
は同一または相当部分を示す。
Figure 1 is a flow diagram showing a conventional gas cleaning device.
Figure 2 is a solubility curve diagram of reaction products that accumulate in the cleaning solution when sodium hypochlorite is cleaned to remove human waste and sewage odors, and Figure 3 is a flow diagram showing a gas cleaning device according to an embodiment of the present invention. , FIG. 4 is a relationship curve diagram between the aqueous solution concentration of the reaction product accumulated in the cleaning liquid and the solution specific gravity. In the figure, 1 is a cleaning tower, 2 is a packed bed, 3 is a bottom liquid, 4 is an arrow showing the inflow direction of the gas to be treated, 5 is an arrow showing the outflow direction of the gas to be treated, 6 is a demister, and 7 is a circulation Pump, 8 is a concentration controller, 9 is a chemical injection pump, 10 is a chemical tank, 11, 17, 19 are power lines, 12 is makeup water, 13 is a liquid level controller, 14
1 is a level gauge, 15 and 23 are signal lines, 16 is a washing liquid renewal device, 18 and 20 are electromagnetic valves, 21 is a drain, and 22 is a hydrometer. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】 1 被処理ガス中の有害成分と反応して無臭の反
応生成物に変換して除去する薬剤を含む溶液を洗
浄液として循環洗浄するガス洗浄装置において、
前記反応生成物による洗浄液の比重の変化を検知
して洗浄液の更新を行う洗浄液更新装置を備えた
ことを特徴とするガス洗浄装置。 2 洗浄液の比重の変化を検知する比重計と、比
重の変化の検知により自動的に洗浄液の更新を行
う洗浄液更新装置を備えたことを特徴とする特許
請求の範囲第1項記載のガス洗浄装置。 3 洗浄液は次亜塩素酸ナトリウム、硫酸、塩
酸、水酸化ナトリウム、過酸化水素、過マンガン
酸カリウム、亜塩素酸ナトリウム、次亜臭素酸ナ
トリウム、およびチオ硫酸ナトリウムから選ばれ
る薬剤を一種以上含む水溶液であることを特徴と
する特許請求の範囲第1項または第2項記載のガ
ス洗浄装置。
[Scope of Claims] 1. A gas cleaning device that circulates and cleans, as a cleaning liquid, a solution containing a chemical that reacts with harmful components in the gas to be treated and removes them by converting them into odorless reaction products,
A gas cleaning device comprising a cleaning liquid renewal device that detects a change in the specific gravity of the cleaning liquid due to the reaction product and renews the cleaning liquid. 2. The gas cleaning device according to claim 1, comprising a hydrometer that detects a change in the specific gravity of the cleaning fluid, and a cleaning fluid renewal device that automatically renews the cleaning fluid by detecting the change in the specific gravity. . 3. The cleaning solution is an aqueous solution containing one or more agents selected from sodium hypochlorite, sulfuric acid, hydrochloric acid, sodium hydroxide, hydrogen peroxide, potassium permanganate, sodium chlorite, sodium hypobromite, and sodium thiosulfate. A gas cleaning device according to claim 1 or 2, characterized in that:
JP56195051A 1981-12-03 1981-12-03 Gas washing apparatus Granted JPS5898121A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56195051A JPS5898121A (en) 1981-12-03 1981-12-03 Gas washing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56195051A JPS5898121A (en) 1981-12-03 1981-12-03 Gas washing apparatus

Publications (2)

Publication Number Publication Date
JPS5898121A JPS5898121A (en) 1983-06-10
JPS629366B2 true JPS629366B2 (en) 1987-02-27

Family

ID=16334725

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56195051A Granted JPS5898121A (en) 1981-12-03 1981-12-03 Gas washing apparatus

Country Status (1)

Country Link
JP (1) JPS5898121A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101588857A (en) * 2007-02-26 2009-11-25 三菱化学株式会社 Method for neutralization of carbonyl chloride
NL2001538C2 (en) * 2008-04-29 2009-10-30 Haaring Beheer B V H Air washer for removing ammonia from ammonia contaminated air produced in intensive livestock stables, has controller to open valve for supplying washing fluid if current value of mass-related parameter exceeds predetermined limit
JP5693295B2 (en) * 2011-02-28 2015-04-01 三菱重工業株式会社 CO2 recovery device and operation control method of CO2 recovery device
JP7214346B2 (en) * 2018-01-10 2023-01-30 株式会社ジャパンエンジンコーポレーション water treatment equipment

Also Published As

Publication number Publication date
JPS5898121A (en) 1983-06-10

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