JPS629320Y2 - - Google Patents

Info

Publication number
JPS629320Y2
JPS629320Y2 JP1983069731U JP6973183U JPS629320Y2 JP S629320 Y2 JPS629320 Y2 JP S629320Y2 JP 1983069731 U JP1983069731 U JP 1983069731U JP 6973183 U JP6973183 U JP 6973183U JP S629320 Y2 JPS629320 Y2 JP S629320Y2
Authority
JP
Japan
Prior art keywords
substrate holder
anode
cathode
substrate
cylindrical shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1983069731U
Other languages
English (en)
Japanese (ja)
Other versions
JPS59178367U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6973183U priority Critical patent/JPS59178367U/ja
Publication of JPS59178367U publication Critical patent/JPS59178367U/ja
Application granted granted Critical
Publication of JPS629320Y2 publication Critical patent/JPS629320Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP6973183U 1983-05-10 1983-05-10 スパツタリング装置 Granted JPS59178367U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6973183U JPS59178367U (ja) 1983-05-10 1983-05-10 スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6973183U JPS59178367U (ja) 1983-05-10 1983-05-10 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS59178367U JPS59178367U (ja) 1984-11-29
JPS629320Y2 true JPS629320Y2 (enrdf_load_stackoverflow) 1987-03-04

Family

ID=30199883

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6973183U Granted JPS59178367U (ja) 1983-05-10 1983-05-10 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS59178367U (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007110322A1 (en) 2006-03-28 2007-10-04 Nv Bekaert Sa Sputtering apparatus
WO2007110323A1 (en) * 2006-03-28 2007-10-04 Nv Bekaert Sa Coating apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58752B2 (ja) * 1978-12-19 1983-01-07 株式会社デンソー スパツタ装置
JPS5835591B2 (ja) * 1979-01-23 1983-08-03 株式会社富士通ゼネラル スパツタリング装置
JPS592109Y2 (ja) * 1979-06-12 1984-01-20 松下電器産業株式会社 スパッタ用回転ドラム式シャッタ

Also Published As

Publication number Publication date
JPS59178367U (ja) 1984-11-29

Similar Documents

Publication Publication Date Title
US4410407A (en) Sputtering apparatus and methods
US5814195A (en) Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
US5807467A (en) In situ preclean in a PVD chamber with a biased substrate configuration
US4693805A (en) Method and apparatus for sputtering a dielectric target or for reactive sputtering
JP2000073168A (ja) 基板の多層pvd成膜装置および方法
JPH021909B2 (enrdf_load_stackoverflow)
US3644191A (en) Sputtering apparatus
US4450062A (en) Sputtering apparatus and methods
JP2021534323A (ja) 水平方向に回転する基板ガイドを備えたコーティングシステムにおいて、均一性の高いコーティングを行うための装置及び方法
JPH11269643A (ja) 成膜装置およびそれを用いた成膜方法
JPS629320Y2 (enrdf_load_stackoverflow)
JP4002317B2 (ja) プラズマスパッタ装置
JPH09302464A (ja) 高周波スパッタ装置および複合酸化物の薄膜形成方法
JPS621471B2 (enrdf_load_stackoverflow)
JPH0681146A (ja) マグネトロン型スパッタ装置
JPH06101252B2 (ja) 透明電導性金属酸化物膜の形成方法
JPS63307272A (ja) イオンビ−ムスパツタ装置
JP3706409B2 (ja) 複合酸化物薄膜の製造方法
JPH05339725A (ja) スパッタリング装置
JPH01272766A (ja) マグネトロンスパッタ操業方法
JPH11323544A (ja) スパッタ装置
JPS6333561A (ja) 薄膜形成方法
JP2744505B2 (ja) シリコンスパッタリング装置
JP2646260B2 (ja) スパッタ装置
JPH086178B2 (ja) 薄膜形成装置