JPS6292410A - 厚膜抵抗体の製造方法 - Google Patents
厚膜抵抗体の製造方法Info
- Publication number
- JPS6292410A JPS6292410A JP60232541A JP23254185A JPS6292410A JP S6292410 A JPS6292410 A JP S6292410A JP 60232541 A JP60232541 A JP 60232541A JP 23254185 A JP23254185 A JP 23254185A JP S6292410 A JPS6292410 A JP S6292410A
- Authority
- JP
- Japan
- Prior art keywords
- thick film
- film resistor
- voltage
- resistance value
- resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 238000000034 method Methods 0.000 claims description 10
- 238000010304 firing Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000007639 printing Methods 0.000 claims description 4
- 230000006641 stabilisation Effects 0.000 claims description 2
- 238000011105 stabilization Methods 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60232541A JPS6292410A (ja) | 1985-10-18 | 1985-10-18 | 厚膜抵抗体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60232541A JPS6292410A (ja) | 1985-10-18 | 1985-10-18 | 厚膜抵抗体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6292410A true JPS6292410A (ja) | 1987-04-27 |
| JPH0553044B2 JPH0553044B2 (Direct) | 1993-08-09 |
Family
ID=16940942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60232541A Granted JPS6292410A (ja) | 1985-10-18 | 1985-10-18 | 厚膜抵抗体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6292410A (Direct) |
-
1985
- 1985-10-18 JP JP60232541A patent/JPS6292410A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0553044B2 (Direct) | 1993-08-09 |
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