JPS6291492A - 分子線エピタキシ−装置 - Google Patents

分子線エピタキシ−装置

Info

Publication number
JPS6291492A
JPS6291492A JP23164185A JP23164185A JPS6291492A JP S6291492 A JPS6291492 A JP S6291492A JP 23164185 A JP23164185 A JP 23164185A JP 23164185 A JP23164185 A JP 23164185A JP S6291492 A JPS6291492 A JP S6291492A
Authority
JP
Japan
Prior art keywords
shutter
raw material
cell
crucible
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23164185A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0352434B2 (enrdf_load_stackoverflow
Inventor
Yoshiharu Tashiro
田代 義春
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP23164185A priority Critical patent/JPS6291492A/ja
Publication of JPS6291492A publication Critical patent/JPS6291492A/ja
Publication of JPH0352434B2 publication Critical patent/JPH0352434B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP23164185A 1985-10-16 1985-10-16 分子線エピタキシ−装置 Granted JPS6291492A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23164185A JPS6291492A (ja) 1985-10-16 1985-10-16 分子線エピタキシ−装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23164185A JPS6291492A (ja) 1985-10-16 1985-10-16 分子線エピタキシ−装置

Publications (2)

Publication Number Publication Date
JPS6291492A true JPS6291492A (ja) 1987-04-25
JPH0352434B2 JPH0352434B2 (enrdf_load_stackoverflow) 1991-08-09

Family

ID=16926679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23164185A Granted JPS6291492A (ja) 1985-10-16 1985-10-16 分子線エピタキシ−装置

Country Status (1)

Country Link
JP (1) JPS6291492A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USH2193H1 (en) * 2001-01-30 2007-07-03 The United States Of America As Represented By The Secretary Of The Air Force Method of growing homoepitaxial silicon carbide

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USH2193H1 (en) * 2001-01-30 2007-07-03 The United States Of America As Represented By The Secretary Of The Air Force Method of growing homoepitaxial silicon carbide

Also Published As

Publication number Publication date
JPH0352434B2 (enrdf_load_stackoverflow) 1991-08-09

Similar Documents

Publication Publication Date Title
JPH0462716A (ja) 結晶性炭素系薄膜およびその堆積方法
DE60025502T2 (de) Sic-einkristall und herstellungsverfahren dafür
JPS6291492A (ja) 分子線エピタキシ−装置
JP2917143B1 (ja) 単結晶SiCおよびその製造方法
Wang et al. Growth and characterization of large stoichiometric magnesium aluminate spinel single crystals
JP3231050B2 (ja) 化合物半導体の結晶成長法
JP3134415B2 (ja) 単結晶の育成方法
JPH0733303B2 (ja) 結晶成長装置
JP2622274B2 (ja) 単結晶の育成方法
JPH02254713A (ja) 分子線発生装置
JPH0255283A (ja) 酸化物単結晶の製造方法
JPH05270994A (ja) Ii−vi族単結晶の製造方法
JPH01305895A (ja) 薄膜結晶成長方法
JPH01294591A (ja) 単結晶の製造装置
Hársy et al. Heteroepitaxial overgrowth of ZnS on GaS single crystals
JPH01301580A (ja) 単結晶の製造装置
JPS63282190A (ja) 分子線結晶成長装置
JPH0238442Y2 (enrdf_load_stackoverflow)
JPH05319997A (ja) 単結晶炭化ケイ素の製造方法
JPS5886731A (ja) n型ZnSe単結晶薄膜の製造法
JP2547585B2 (ja) ZnSe単結晶の成長方法
JPH06263587A (ja) 分子線エピタキシャル成長装置
FAURIE Influence of defects in HgCdTe grown by Molecular Beam Epitaxy(MBE) on electrical devices(Final Report, 1 Jun. 1987- 31 Dec. 1990)
JPH03247588A (ja) 単結晶の育成方法
JPH01235233A (ja) 分子線エピタキシャル成長方法