JPS6291288A - Method for treating waste water having fine particles suspended therein - Google Patents
Method for treating waste water having fine particles suspended thereinInfo
- Publication number
- JPS6291288A JPS6291288A JP22950885A JP22950885A JPS6291288A JP S6291288 A JPS6291288 A JP S6291288A JP 22950885 A JP22950885 A JP 22950885A JP 22950885 A JP22950885 A JP 22950885A JP S6291288 A JPS6291288 A JP S6291288A
- Authority
- JP
- Japan
- Prior art keywords
- added
- fine particles
- sio2
- raw liquid
- polymer flocculant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【発明の詳細な説明】
(イ)技術分野
本発明は、微細粒子が懸濁する排水を処理する方法に関
するもので、゛特に半導体製造工程等から排出される微
細なSiO2(硅酸)粒子を処理することに特徴のある
ものである。Detailed Description of the Invention (a) Technical field The present invention relates to a method for treating wastewater in which fine particles are suspended, and in particular, it relates to a method for treating wastewater in which fine particles are suspended. It is characterized by its processing.
(ロ)従来技術
近年、半導体産業の発展と共に、この製造工程において
モノシラン等のシランガスを使用する機会が多くなり、
それに伴ってそのガス処理が問題となり、燃焼等により
SiO2として固定し、これを水洗によって排液として
処理するのが通常である。(b) Prior art In recent years, with the development of the semiconductor industry, opportunities to use silane gas such as monosilane in this manufacturing process have increased.
As a result, processing of the gas becomes a problem, and it is common practice to fix it as SiO2 by combustion or the like, and to treat it as a waste liquid by washing with water.
この場合、排液中のSiO□は非常に微細な形態であり
、これを処理する方法としては、硫酸バンドを添加して
共沈させる方法が良く知られているが、充分な除去率を
得るまでに至っていないのが現状である。In this case, the SiO The current situation is that this has not yet been achieved.
(ハ)発明の構成
本発明は、上述のような従来法における問題を解決した
新規な微細粒子含有排水の処理方法を提供するものであ
る。(C) Structure of the Invention The present invention provides a novel method for treating wastewater containing fine particles, which solves the problems of the conventional methods as described above.
即ち、本発明は微細粒子g、濁濁水水処理するに際し、
まず原液のpHを微酸性に調整した後、#粉を添加して
撹拌し、次いでアルカリ剤を添加してpHを調整した後
、高分子凝集剤を添加して固液分離することを特徴とす
るものである。That is, in the present invention, when treating fine particles g and turbid water,
First, the pH of the stock solution is adjusted to slightly acidic, then # powder is added and stirred, then an alkaline agent is added to adjust the pH, and a polymer flocculant is added to perform solid-liquid separation. It is something to do.
更に良好な形態としては、例えばSiO□等の微細粒子
が懸濁する排水のpH1e*酸性(pH4以下好ましく
は2〜4)に調整した後、鉄粉を添加して一定時間撹拌
し1次いでアルカリ剤にてpHをアルカリ側好ましくは
8〜10調整し、エアレーションや撹拌等の酸化処理を
施した後、高分子凝集剤を添加して固液分離するもので
、これにより液中のSingはほとんど除去される。For a better form, for example, after adjusting the pH of the wastewater to 1e* acidic (pH 4 or less, preferably 2 to 4) in which fine particles such as SiO After adjusting the pH to an alkaline side, preferably 8 to 10, using an agent and performing oxidation treatment such as aeration and stirring, a polymer flocculant is added to perform solid-liquid separation, which eliminates almost all Sing in the liquid. removed.
本発明において、鉄粉の5iC)2に対する挙動は充分
には解明されていないが、鉄粉自体が酸により溶解し、
活性度を有する水酸化鉄によりSiO2を吸着し、アル
カリ側において高分子凝集剤と反応して、充分に共沈す
るものと思われる。In the present invention, although the behavior of iron powder toward 5iC)2 has not been fully elucidated, the iron powder itself is dissolved by acid,
It is thought that SiO2 is adsorbed by active iron hydroxide and reacts with a polymer flocculant on the alkali side, resulting in sufficient co-precipitation.
以下に本発明法を実施例をもって詳細に説明する。The method of the present invention will be explained in detail below using examples.
(ニ)実施例
実施例
半導体製造工程から排出されたSiO2を1000mg
/i含有する排水lfLに鉱酸を添加してpH3,0と
し、この排水に鉄粉を10g添加して3分間撹拌した後
、NaOHを添加してpH8,2にし、エアレーソヨン
した後、高分子凝集剤としてポリアクリルアミド(ノニ
オン系)を10g7文添加して30秒間撹拌した。その
後、3分間静置して固液分離を行った。(d) Example Example 1000 mg of SiO2 discharged from the semiconductor manufacturing process
Mineral acid was added to the wastewater lfL containing /i to adjust the pH to 3.0, 10g of iron powder was added to this wastewater, the mixture was stirred for 3 minutes, NaOH was added to adjust the pH to 8.2, and after aeration, polymer 7 g of polyacrylamide (nonionic) was added as a flocculant and stirred for 30 seconds. Thereafter, the mixture was allowed to stand for 3 minutes to perform solid-liquid separation.
5戸液中のSiO2を分析した結果は2mg/文であっ
た。The result of analyzing SiO2 in the five-door solution was 2 mg/liter.
比較例1
上記実施例と同一の排水19.に、鉄粉を添加すること
なく、NaOHを添加してpHを約8に調整し、3分間
撹拌したのち高分子凝集剤(ポリアクリルアミド)を1
0mg/u添加して再び30秒間撹拌後、3分間静置し
て固液分離を行ない、5戸液中のSiO2を分析した。Comparative Example 1 Same wastewater as in the above example 19. The pH was adjusted to about 8 by adding NaOH without adding iron powder, and after stirring for 3 minutes, 1 liter of polymer flocculant (polyacrylamide) was added.
After adding 0 mg/u and stirring again for 30 seconds, the mixture was allowed to stand for 3 minutes to perform solid-liquid separation, and the SiO2 in the liquid was analyzed.
その結果、SiO2は98C)og/JLであり、はと
んど除去されなかった。As a result, SiO2 was 98C)og/JL and was hardly removed.
比較例2
上記実施例と同一の排水1Mに、鉄粉を添加することな
く、NaOHを添加してpHを約8に調整し、3分間撹
拌したのち高分子凝集剤として硫酸バンドを1%の割合
で添加して再び30秒間撹拌後、3分間静置して固液分
離を行ない、液中のSiO2を分析した。Comparative Example 2 To 1M of the same wastewater as in the above example, without adding iron powder, NaOH was added to adjust the pH to about 8, and after stirring for 3 minutes, 1% of sulfuric acid was added as a polymer flocculant. The mixture was added at the same ratio, stirred again for 30 seconds, left to stand for 3 minutes, solid-liquid separation was performed, and SiO2 in the liquid was analyzed.
その結果SiO2は450 mg/見であり、更に;戸
液中に懸濁粒子が残存していることが確認された。As a result, the SiO2 content was 450 mg/ml, and it was further confirmed that suspended particles remained in the solution.
(ホ)発明の効果
以上の如く、本発明法によれば従来の各種処理法では不
適当であった微細粒子懸濁排水を低コストで完全に処理
できる利点がある。(e) Effects of the Invention As described above, the method of the present invention has the advantage of being able to completely treat fine particle suspended wastewater at low cost, which was inappropriate for various conventional treatment methods.
特 許 出 願 人 同和鉱業株式会社・ 1Patent applicant: Dowa Mining Co., Ltd. 1
Claims (2)
性に調整した後、鉄粉を添加して撹拌し、次いでアルカ
リ剤によりpHを調整した後高分子凝集剤を添加して固
液分離することを特徴とする微細粒子懸濁排水の処理方
法。(1) When treating fine particle suspended wastewater, after adjusting the pH to slightly acidic, iron powder is added and stirred, then after adjusting the pH with an alkaline agent, a polymer flocculant is added to solidify the liquid. A method for treating fine particle suspended wastewater, characterized by separating it.
SiO_2である特許請求の範囲第1項記載の微細粒子
懸濁排水の処理方法。(2) The method for treating fine particle suspended wastewater according to claim 1, wherein the fine particles are SiO_2 discharged from a semiconductor manufacturing process or the like.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22950885A JPS6291288A (en) | 1985-10-15 | 1985-10-15 | Method for treating waste water having fine particles suspended therein |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22950885A JPS6291288A (en) | 1985-10-15 | 1985-10-15 | Method for treating waste water having fine particles suspended therein |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6291288A true JPS6291288A (en) | 1987-04-25 |
JPH0454508B2 JPH0454508B2 (en) | 1992-08-31 |
Family
ID=16893272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22950885A Granted JPS6291288A (en) | 1985-10-15 | 1985-10-15 | Method for treating waste water having fine particles suspended therein |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6291288A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2800367A1 (en) * | 1999-11-03 | 2001-05-04 | Air Liquide Electronics Sys | PROCESS FOR REMOVING SOLID PARTICLES, IN PARTICULAR SILICA AND / OR ALUMINA FROM AQUEOUS EFFLUENTS |
WO2001085619A1 (en) * | 2000-05-10 | 2001-11-15 | Infineon Technologies Ag | Method for the purification of effluent water from chip production |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5016351A (en) * | 1973-06-01 | 1975-02-20 | ||
JPS5136757A (en) * | 1974-09-09 | 1976-03-27 | Lion Fat Oil Co Ltd | Gyoshuchindenhoho |
-
1985
- 1985-10-15 JP JP22950885A patent/JPS6291288A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5016351A (en) * | 1973-06-01 | 1975-02-20 | ||
JPS5136757A (en) * | 1974-09-09 | 1976-03-27 | Lion Fat Oil Co Ltd | Gyoshuchindenhoho |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2800367A1 (en) * | 1999-11-03 | 2001-05-04 | Air Liquide Electronics Sys | PROCESS FOR REMOVING SOLID PARTICLES, IN PARTICULAR SILICA AND / OR ALUMINA FROM AQUEOUS EFFLUENTS |
EP1097906A1 (en) * | 1999-11-03 | 2001-05-09 | Air Liquide Electronics Systems | Process for eliminating solid particles, especially silicon and /or aluminium particles, from aqueous effluents |
WO2001085619A1 (en) * | 2000-05-10 | 2001-11-15 | Infineon Technologies Ag | Method for the purification of effluent water from chip production |
Also Published As
Publication number | Publication date |
---|---|
JPH0454508B2 (en) | 1992-08-31 |
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Legal Events
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R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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EXPY | Cancellation because of completion of term |