JPS6288526A - X-y stage - Google Patents
X-y stageInfo
- Publication number
- JPS6288526A JPS6288526A JP60229289A JP22928985A JPS6288526A JP S6288526 A JPS6288526 A JP S6288526A JP 60229289 A JP60229289 A JP 60229289A JP 22928985 A JP22928985 A JP 22928985A JP S6288526 A JPS6288526 A JP S6288526A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- guide
- movable
- axis
- height
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
- B23Q1/56—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/60—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/62—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
- B23Q1/621—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- A Measuring Device Byusing Mechanical Method (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
この発明は精密工作機、ロボット、精密測定機、半導体
製造装置等に適用し、精密な位置決めを行う移動テーブ
ル装置、所謂ＸＹステージに関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a moving table device, a so-called XY stage, which is applied to precision machine tools, robots, precision measuring machines, semiconductor manufacturing equipment, etc., and performs precise positioning.
〈発明の概要〉
この発明は、定盤上にＸ軸方向、Ｙ軸方向に往復動する
可動ガイド、および両可動ガイドの交叉部に自在ステー
ジを配備したＸＹステージであって、Ｘ軸可動ガイドお
よびＸ軸可動ガイドをそれぞれ平行する一対の真直ガイ
ド部材にて構成し、ＸＹ何れか一方の可動ガイドの軸身
部に長孔を開設して他方の可動ガイドを直交して貫通さ
せ、その交叉部においてＸ軸、Ｙ軸方向に互いに対向し
た真直ガイド部材に対し自在ステージを支承して、両可
動ガイドの可動位置高さとステージの重心位置高さを完
全同一となすことにより、ステージの走り特性、応答性
を向上し且つ組立、調整作業の簡易化を実現したもので
ある。<Summary of the Invention> The present invention provides an XY stage that includes a movable guide that reciprocates in the X-axis direction and the Y-axis direction on a surface plate, and a flexible stage provided at the intersection of both movable guides. The X-axis movable guide is constructed from a pair of parallel straight guide members, and an elongated hole is formed in the shaft body of one of the XY movable guides, and the other movable guide is passed through the other movable guide at right angles. The running characteristics of the stage are improved by supporting the flexible stage on straight guide members facing each other in the X-axis and Y-axis directions, and by making the height of the movable position of both movable guides and the height of the center of gravity of the stage completely the same. This improves responsiveness and simplifies assembly and adjustment work.
〈発明の背景〉
従来この種ＸＹステージは、第４図乃至第７図に示す如
く、定盤７上にＸ軸方向、Ｙ軸方向に往復動するＸ軸可
動ガイド８ａ、Ｙ軸可動ガイド８ｂを立体交叉して配備
し、その交叉部に自在ステージ９を移動自在に支持して
いる。この自在ステージ９には、上下に変位をずらせて
直交する案内溝９１．９２を形成し、これにＸ軸可動ガ
イド８ａ、Ｙ軸可動ガイド８ｂを軸受機構９３を介して
摺動自在に軸承し、断るステージ９のテーブル９４上に
、ウェハ駆動機構９５を備えたウェハステージ９６を搭
載している。<Background of the Invention> As shown in FIGS. 4 to 7, a conventional XY stage of this type has an X-axis movable guide 8a and a Y-axis movable guide 8b that reciprocate in the X-axis direction and the Y-axis direction on a surface plate 7. are arranged in a three-dimensional intersection, and a flexible stage 9 is movably supported at the intersection. This flexible stage 9 is formed with orthogonal guide grooves 91 and 92 that are vertically displaced, and an X-axis movable guide 8a and a Y-axis movable guide 8b are slidably supported on the guide grooves 91 and 92 via a bearing mechanism 93. , A wafer stage 96 equipped with a wafer drive mechanism 95 is mounted on the table 94 of the stage 9 .
ところが、上記構造のＸＹステージでは、自在ステージ
９に対し、ＸＹ可動ガイド８ａ、８ｂが立体交叉して貫
通するため、ウェハステージ９６およびその駆動機構９
５、Ｌ形ミラ９７等はテーブル９４上に搭載することが
不可欠となり、従って、ＸＹ可動ガイド３ａ、３ｂの可
動位置の相違および両可動ガイドの可動位置に対する自
在ステージ９の重心位置が高位置となることによって、
移動時のピッチング運動が大となり、走り特性の劣化を
招くと共に、ピッチング運動が抑まるまで位置決め整定
できないため、ステップ動作における位置決め整定に長
時間を要す不利を生じている。しかも、ＸＹ可動ガイド
３ａ、３ｂの直交調整が困難であり、特にＸＹ可動ガイ
ド８ａ、８ｂとステージ９との間には８個の軸受機構９
３が設けられ、各軸受機構９３は相対関係をもっため組
立て調整が複雑である。つまり、８個の軸受機構９３を
総て均等に作動すべく組立てることが困難であり、ＸＹ
可動ガイド８ａ、８ｂに対しステージ９が安定せず、こ
れがヨーイング、ピッチングの大きな原因をなしている
。更に前記各軸受機構９３の取付け、軸受すきまの調整
作業はステージ上のテーブル９４を取外した状態で行わ
れるため、テーブル９４およびウェハステージ９６、Ｌ
形ミラー９７等の搭載重量によって軸受すきまを完全同
一に設定することが出来ない等、多くの問題があった。However, in the XY stage having the above structure, since the XY movable guides 8a and 8b pass through the flexible stage 9 in a three-dimensional manner, the wafer stage 96 and its drive mechanism 9
5. It is essential to mount the L-shaped mirror 97 and the like on the table 94. Therefore, the movable positions of the XY movable guides 3a and 3b are different, and the center of gravity of the flexible stage 9 is at a high position relative to the movable positions of both movable guides. By becoming
Pitching motion during movement becomes large, leading to deterioration of running characteristics, and positioning and settling cannot be performed until the pitching motion is suppressed, resulting in the disadvantage that positioning and settling during step motion requires a long time. Moreover, it is difficult to orthogonally adjust the XY movable guides 3a and 3b, and in particular, there are eight bearing mechanisms 9 between the XY movable guides 8a and 8b and the stage 9.
3 are provided, and each bearing mechanism 93 has a relative relationship, making assembly and adjustment complicated. In other words, it is difficult to assemble all eight bearing mechanisms 93 so that they operate evenly, and
The stage 9 is not stable with respect to the movable guides 8a and 8b, and this is a major cause of yawing and pitching. Furthermore, since the installation of each bearing mechanism 93 and the adjustment of the bearing clearance are performed with the table 94 on the stage removed, the table 94 and the wafer stage 96, L
There were many problems such as the inability to set the bearing clearance to be completely the same due to the weight of the mirror 97 and the like.
〈発明の目的〉
この発明は極めて簡単な構成によってＸＹ可動ガイドの
駆動位置高さおよびこの駆動位置高さとステージの重心
位置高さを同一高さに設定し、ステージのヨーイング、
ピッチング等を防止して走り特性、応答性を向上し且つ
組立、調整作業の簡易化を実現した新規なＸＹステージ
を提供することを目的とする。<Object of the Invention> The present invention uses an extremely simple configuration to set the driving position height of the XY movable guide and the driving position height and the stage center of gravity position height to be the same height, and to reduce the yaw of the stage,
The purpose of the present invention is to provide a new XY stage that prevents pitching, etc., improves running characteristics and responsiveness, and simplifies assembly and adjustment work.
〈発明の構成および効果〉
上記の目的を達成するため、この発明では、定盤上にＸ
軸方向、Ｙ軸方向に往復動する可動ガイドおよび両可動
ガイドの交叉部に自在ステージを配備したＸＹステージ
において、Ｘ軸可動ガイドおよびＹ軸可動ガイドをそれ
ぞれ平行する一対の真直ガイド部材にて構成し、何れか
一方の可動ガイドの軸身部に長孔を形成して他方の可動
ガイドを直交して貫通させ、両可動ガイドの交叉部にお
いてＸ軸、Ｙ軸方向に互いに平行したガイド部材の対向
面を案内面として自在ステージを摺動可能に支承して成
る。<Structure and Effects of the Invention> In order to achieve the above object, the present invention provides an
In the XY stage, which has a movable guide that reciprocates in the axial and Y-axis directions and a flexible stage at the intersection of both movable guides, the X-axis movable guide and the Y-axis movable guide are each composed of a pair of parallel straight guide members. A long hole is formed in the shaft of one of the movable guides and passes through the other movable guide orthogonally, so that the guide members parallel to each other in the X-axis and Y-axis directions are formed at the intersection of both movable guides. A flexible stage is slidably supported using the opposing surface as a guide surface.
上記の構成によると、この発明では、Ｘ軸可動ガイドと
Ｙ軸可動ガイドの可動位置高さ、および該可動位置高さ
とステージの重心位置高さを完全同一高さに設定できる
ため、ヨーイング或いはピッチング運動を解消し、ステ
ージの走り特性および応答性を向上し得る。しかも、Ｘ
Ｙ可動ガイドの交叉部において、Ｘ軸、Ｙ軸方向に互い
に平行した真直ガイド部材の対向面を案内面としてステ
ージを支承するため、ステージの上面ヘウエハ駆動機構
、ウェハステージ。According to the above configuration, in this invention, the movable position heights of the X-axis movable guide and the Y-axis movable guide, and the movable position heights and the center of gravity position height of the stage can be set to be completely the same height, so that yawing or pitching can be avoided. It can eliminate motion and improve the running characteristics and responsiveness of the stage. Moreover, X
At the intersection of the Y movable guides, a wafer drive mechanism and a wafer stage are mounted on the upper surface of the stage to support the stage using opposing surfaces of straight guide members parallel to each other in the X-axis and Y-axis directions as guide surfaces.
Ｌ形ミラー等を搭載した状態の侭、各軸受すきまを調整
し得、以て、組立て作業、調整作業が一段と簡易となる
。更に、平行する真直ガイド部材の両端結合部材は、Ｘ
Ｙ可動ガイドを同一寸法精度に製作できるため、生産性
２組立性が大幅に向上する等、実用上の優れた効果を有
す。The clearance between each bearing can be adjusted when an L-shaped mirror or the like is mounted, which further simplifies assembly and adjustment work. Furthermore, the connecting members at both ends of the parallel straight guide members are
Since the Y movable guide can be manufactured with the same dimensional accuracy, it has excellent practical effects, such as greatly improving productivity and ease of assembly.
〈実施例の説明〉 第１図は本発明にかかるＸＹステージの平面図を示す。<Explanation of Examples> FIG. 1 shows a plan view of an XY stage according to the present invention.
ＸＹステージの定盤１は、上面に平坦な摺動面１１を形
成し、周辺に互いに平行したＸ軸ガイド１２，１２２お
よびＹ軸ガイド１３，１３３を配備して、対向するガイ
ド間にＸ軸可動ガイド２、Ｙ軸可動ガイド３を往復摺動
可能に支持している。両可動ガイド２．３は、各々一対
の真直ガイド部材２１．３１をステージに応じて適当間
隔に平行させ、両端を連結部材２２．３２にて一体結合
している。両可動ガイド２．３の何れか一方、実施例で
はＸ軸可動ガイド３における真直ガイド部材２１．２１
の軸身部に対向した長孔２４を形成し、この長孔２４に
対しＹ軸可動ガイド３を貫通して交叉させ、ＸＹ可動ガ
イド２，３の両端は、それぞれ軸受５を介して対向する
Ｘ軸ガイド１２．１２ａ、Ｙ軸ガイド１３，１３ａに対
し摺動可能に支持すると共に、各々連結部材２２．３２
に移動子２３，３４、また、Ｘ軸ガイド、Ｙ軸ガイドに
固定子１４゜１５を構成して往復駆動装置を構成してい
る。The surface plate 1 of the XY stage has a flat sliding surface 11 formed on its upper surface, and X-axis guides 12, 122 and Y-axis guides 13, 133 that are parallel to each other are arranged around the periphery, so that the X-axis The movable guide 2 and the Y-axis movable guide 3 are supported so as to be slidable back and forth. Both movable guides 2.3 each have a pair of straight guide members 21.31 arranged in parallel at appropriate intervals depending on the stage, and both ends are integrally connected by connecting members 22.32. Either one of the two movable guides 2.3, in the embodiment, the straight guide member 21.21 in the X-axis movable guide 3
A long hole 24 is formed opposite to the shaft body of the XY movable guide 3, and the Y-axis movable guide 3 is passed through the long hole 24 and intersects with the long hole 24. The X-axis guide 12.12a and the Y-axis guides 13, 13a are slidably supported, and each connecting member 22.32
A reciprocating drive device is constructed by configuring movers 23 and 34, and stators 14 and 15 on the X-axis guide and the Y-axis guide.
前記ＸＹ可動ガイド２，３の交叉部に対し、Ｘ軸、Ｙ軸
方向に互いに平行したガイド部材２１゜２１および３１
．３１の対向面を案内面として自在ステージ４を支承し
ている。Guide members 21° 21 and 31 are parallel to each other in the X-axis and Y-axis directions with respect to the intersection of the XY movable guides 2 and 3.
．． The flexible stage 4 is supported by using the facing surface of 31 as a guide surface.
自在ステージ４は、前記交叉部における各ガイド部材の
案内面に対向する角筒体４１の上下に鍔壁４２，４３を
設けてなり、このステージ４を軸受部材として交叉部に
おける各ガイド部材２１．３１に摺動可能に支持すると
共に、該ステージ４の角筒体４１の内部にウェハ駆動機
構４４、この駆動機構４４の上面にウェハステージ４５
、鍔壁上にＬ形ミラー４６を配備してなるものである。The flexible stage 4 is formed by providing collar walls 42 and 43 on the upper and lower sides of a rectangular cylinder 41 facing the guide surfaces of the guide members at the intersection, and uses the stage 4 as a bearing member to support the guide members 21 and 21 at the intersection. A wafer drive mechanism 44 is mounted inside the rectangular cylinder 41 of the stage 4, and a wafer stage 45 is mounted on the upper surface of the drive mechanism 44.
, an L-shaped mirror 46 is arranged on the collar wall.
上記ステージ４は、摺動性を有す軸受材料にて構成する
も可く、或いはまた、角筒体４１および鍔壁４２，４３
に圧力空気源に連通ずる空気導孔を穿設して各ガイド部
材２１．３１および定盤ｌと対向する面に噴出口を開設
し、ステージ４自体に空気軸受を構成するも可い。尤も
別途空気軸受を取付けることも勿論可能である。The stage 4 may be made of a sliding bearing material, or may be made of a square cylinder 41 and flange walls 42, 43.
It is also possible to construct an air bearing in the stage 4 itself by drilling an air guide hole communicating with a pressurized air source and opening an ejection port on the surface facing each guide member 21, 31 and the surface plate 1. Of course, it is also possible to separately install an air bearing.
本発明は上記の如く、定盤１上に往復動可能に配備した
Ｘ軸可動ガイド２、Ｙ軸可動ガイド３を、各々平行する
一対の真直ガイド部材２１゜３１にて構成し、一方の可
動ガイド２の軸身部に長孔２４を形成して他方の可動ガ
イド３を直交して貫通させ、両可動ガイド２．３の交叉
部に対し、Ｘ軸Ｙ軸方向に互いに平行したガイド部材２
１．３１の対向面を案内面として自在ステージ４を摺動
可能に支持したから、両可動ガイド２，３の可動位置高
さとステージ４の重心位置高さを全て同一高さに設定で
きるため、ステージ走行時のヨーイング、ピッチングを
一挙に解消し、走り特性、応答性を向上し得る。しかも
、ウェハステージ４５および駆動機構４４を搭載した侭
、軸受すきまを調整できる等、構成簡易にして発明目的
を達成した効果を有す。As described above, in the present invention, the X-axis movable guide 2 and the Y-axis movable guide 3, which are arranged reciprocally on the surface plate 1, are each composed of a pair of parallel straight guide members 21 and 31, and one of the movable A long hole 24 is formed in the shaft body of the guide 2 and passes through the other movable guide 3 at right angles, and a guide member 2 is formed parallel to each other in the X- and Y-axis directions at the intersection of both movable guides 2.3.
1. Since the movable stage 4 is slidably supported using the facing surface of 31 as the guide surface, the movable position height of both movable guides 2 and 3 and the height of the center of gravity of the stage 4 can all be set to the same height. Yawing and pitching during stage running can be eliminated at once, improving running characteristics and responsiveness. In addition, the configuration of the wafer stage 45 and the drive mechanism 44 is simplified, and the bearing clearance can be adjusted, thereby achieving the object of the invention.
第１図は本発明にかかるＸＹステージの平面図、第２図
は第１図ｎ−ｎ線断面図、第３図はＩＩＩ−ＩＩＩ線断
面図、第４図は従来例の平面図、第５図はＶＩ−ＶＩ線
断面図、第６図は従来のＸＹ可動ガイドの交叉部分の斜
面図である。
１・・・・定盤 １１・・・・摺動面１２、１
２ａ・・・・Ｘ軸ガイド
１３、１３ａ・・・・Ｙ軸ガイド
２・・・・Ｘ軸可動ガイド ２４・・・・長孔２１・・
・・ガイド部材 ３・・・・Ｙ軸可動ガイド３１・・
・・ガイド部材 ４・・・・ステージ特 許 出 願
人 立石電機株式会社寸 ｌＬ 弓］ オ芝朶−
、ＸＹステー／゛°の平１石の耐ｊ１呂 →μ必−Ｖ線
婢舶呂
％
手続ネ甫゛正書く自発〉
昭和６０年１１月１４日FIG. 1 is a plan view of the XY stage according to the present invention, FIG. 2 is a sectional view taken along line nn in FIG. 1, FIG. 3 is a sectional view taken along line III-III, and FIG. FIG. 5 is a sectional view taken along the line VI-VI, and FIG. 6 is an oblique view of the intersection portion of a conventional XY movable guide. 1... Surface plate 11... Sliding surface 12, 1
2a...X-axis guide 13, 13a...Y-axis guide 2...X-axis movable guide 24...Elongated hole 21...
...Guide member 3...Y-axis movable guide 31...
...Guide member 4...Stage patent Applicant: Tateishi Electric Co., Ltd.
, XY stay/゛°'s flat stone resistance j1ro →μ necessary-V line smuggler% Procedures ゛Spontaneous writing〉November 14, 1985
Claims (2)
に各々平行配備された一対のＸ軸ガイドおよびＹ軸ガイ
ドと、平行する一対の真直ガイド部材を有し両端を対向
するＸ軸ガイドに往復動可能に支持したＸ軸可動ガイド
と、軸身部に互いに対向して長孔を形成した平行する一
対の真直ガイド部材を有し、前記Ｘ軸可動ガイドに対し
長孔を貫通させ両端をＹ軸ガイドに往復動可能に支持し
たＹ軸可動ガイドと、両可動ガイドの交叉部においてＸ
軸、Ｙ軸方向に互いに平行したガイド部材に摺動可能に
支持された自在ステージとを具備して成るＸＹステージ
。(1) A surface plate with a sliding surface formed on the top surface, a pair of X-axis guides and a Y-axis guide arranged parallel to each other around the surface plate, and a pair of parallel straight guide members, with both ends facing each other. The X-axis movable guide is reciprocally supported by the X-axis movable guide, and a pair of parallel straight guide members each having a long hole facing each other in the shaft body are formed. At the intersection of both movable guides,
An XY stage comprising a flexible stage slidably supported by guide members parallel to each other in the axial and Y-axis directions.
、および、両可動ガイドの可動位置高さと自在ステージ
の重心位置高さが同一高さに設定されている特許請求の
範囲第１項記載のＸＹステージ。(2) The movable position height of the X-axis movable guide and the Y-axis movable guide, and the movable position height of both movable guides and the center of gravity position height of the flexible stage are set to the same height. XY stage as described in section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60229289A JPH066248B2 (en) | 1985-10-14 | 1985-10-14 | XY stage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60229289A JPH066248B2 (en) | 1985-10-14 | 1985-10-14 | XY stage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6288526A true JPS6288526A (en) | 1987-04-23 |
| JPH066248B2 JPH066248B2 (en) | 1994-01-26 |
Family
ID=16889788
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60229289A Expired - Lifetime JPH066248B2 (en) | 1985-10-14 | 1985-10-14 | XY stage |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH066248B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0443831A2 (en) * | 1990-02-21 | 1991-08-28 | Canon Kabushiki Kaisha | Motion guiding device |
| JPH0488801U (en) * | 1990-06-25 | 1992-08-03 | ||
| US5228358A (en) * | 1990-02-21 | 1993-07-20 | Canon Kabushiki Kaisha | Motion guiding device |
| US6965426B2 (en) | 2002-10-29 | 2005-11-15 | Canon Kabushiki Kaisha | Positioning system and exposure apparatus having the same |
| EP3550262A1 (en) * | 2015-01-13 | 2019-10-09 | Kabushiki Kaisha Topcon | Surveying instrument |
| EP2221668B1 (en) * | 2009-02-24 | 2021-04-14 | ASML Netherlands B.V. | Lithographic apparatus and positioning assembly |
-
1985
- 1985-10-14 JP JP60229289A patent/JPH066248B2/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0443831A2 (en) * | 1990-02-21 | 1991-08-28 | Canon Kabushiki Kaisha | Motion guiding device |
| US5228358A (en) * | 1990-02-21 | 1993-07-20 | Canon Kabushiki Kaisha | Motion guiding device |
| JPH0488801U (en) * | 1990-06-25 | 1992-08-03 | ||
| US6965426B2 (en) | 2002-10-29 | 2005-11-15 | Canon Kabushiki Kaisha | Positioning system and exposure apparatus having the same |
| EP2221668B1 (en) * | 2009-02-24 | 2021-04-14 | ASML Netherlands B.V. | Lithographic apparatus and positioning assembly |
| EP3550262A1 (en) * | 2015-01-13 | 2019-10-09 | Kabushiki Kaisha Topcon | Surveying instrument |
| US10690497B2 (en) | 2015-01-13 | 2020-06-23 | Kabushiki Kaisha Topcon | Surveying instrument including a reflective prism mounted on a movable part |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH066248B2 (en) | 1994-01-26 |
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