JPH066248B2 - XY stage - Google Patents
XY stageInfo
- Publication number
- JPH066248B2 JPH066248B2 JP60229289A JP22928985A JPH066248B2 JP H066248 B2 JPH066248 B2 JP H066248B2 JP 60229289 A JP60229289 A JP 60229289A JP 22928985 A JP22928985 A JP 22928985A JP H066248 B2 JPH066248 B2 JP H066248B2
- Authority
- JP
- Japan
- Prior art keywords
- axis
- movable
- guide
- stage
- guides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
- B23Q1/56—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/60—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/62—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
- B23Q1/621—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- A Measuring Device Byusing Mechanical Method (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
【発明の詳細な説明】 ＜産業上の利用分野＞ この発明は精密工作機，ロボット，精密測定機，半導体
製造装置等に適用し、精密な位置決めを行う移動テーブ
ル装置、所謂ＸＹステージに関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention relates to a movable table device, a so-called XY stage, which is applied to a precision machine tool, a robot, a precision measuring machine, a semiconductor manufacturing apparatus, etc. and performs precise positioning.
＜発明の概要＞ この発明は、定盤上にＸ軸方向、Ｙ軸方向に往復動する
可動ガイド、および両可動ガイドの交叉部に自在ステー
ジを配備したＸＹステージであって、Ｘ軸可動ガイドお
よびＹ軸可動ガイドをそれぞれ平行する一対の真直ガイ
ド部材にて構成し、ＸＹ何れか一方の可動ガイドの軸身
部に長孔を開設して他方の可動ガイドを直交して貫通さ
せ、その交叉部においてＸ軸，Ｙ軸方向に互いに対向し
た真直ガイド部材に対し自在ステージを支承して、両可
動ガイドの可動位置高さとステージの重心位置高さを完
全同一となすことにより、ステージの走り特性、応答性
を向上し且つ組立、調整作業の簡易化を実現したもので
ある ＜発明の背景＞ 従来この種ＸＹステージは、第４図乃至第６図に示す如
く、定盤７上にＸ軸方向、Ｙ軸方向に往復動するＸ軸可
動ガイド８ａ、Ｙ軸可動ガイド８ｂを立体交叉して配備
し、その交叉部に自在ステージ９を移動自在に支持して
いる。この自在ステージ９には、上下に変位をずらせて
直交する案内溝９１，９２を形成し、これにＸ軸可動ガ
イド８ａ、Ｙ軸可動ガイド８ｂを軸受機構９３を介して
摺動自在に軸承し、斯るステージ９のテーブル９４上
に、ウエハ駆動機構95を備えたウエハステージ９６を搭
載している。ところが、上記構造のＸＹステージでは、
自在ステージ９に対し、ＸＹ可動ガイド８ａ，８ｂが立
体交叉して貫通するため、ウエハステージ９６およびそ
の駆動機構９５、Ｌ形ミラ９７等はテーブル９４上に搭
載することが不可欠となり、従って、ＸＹ可動ガイド８
ａ，８ｂの可動位置の相違および両可動ガイドの可動位
置に対する自在ステージ９の重心位置が高位置となるこ
とによって、移動時のピッチング運動が大となり、走り
特性の劣化を招くと共に、ピッチング運動が抑まるまで
位置決め整定できないため、ステップ動作における位置
決め整定に長時間を要す不利を生じている。しかも、Ｘ
Ｙ可動ガイド８ａ，８ｂの直交調整が困難であり、特に ＸＹ可動ガイド８ａ，８ｂとステージ９との間には８個
の軸受機構９３が設けられ、各軸受機構９３は相対関係
をもつため組立て調整が複雑である。つまり、８個の軸
受機構９３を総て均等に作動すべく組立てることが困難
なため、ＸＹ可動ガイド８ａ，８ｂに対しステージ９が
不均衡に支持され、これがヨーイング、ピッチングのお
おきな原因にもなっている。更に前記各軸受機構９３の
取付け、軸受すきまの調整作業はステージ上のテーブル
９４を取外した状態で行われるため、ステージ最終使用
状態のもとで、軸受すきまを設定することが出来ない
等、多くの問題があった。<Outline of the Invention> The present invention is an XY stage in which a movable guide that reciprocates in the X-axis direction and the Y-axis direction on a surface plate and a free stage is provided at the intersection of both movable guides. And the Y-axis movable guide are formed by a pair of parallel straight guide members, and a long hole is opened in the shaft body of any one of the XY movable guides to allow the other movable guide to penetrate at a right angle, and the intersection thereof. Stage, the movable stage is supported by straight guide members that face each other in the X-axis and Y-axis directions, and the movable position height of both movable guides and the center-of-gravity position height of the stage are completely the same. , The responsiveness is improved and the assembling and adjusting work is simplified. <Background of the Invention> Conventionally, this type of XY stage has an X-axis on a surface plate 7 as shown in FIGS. 4 to 6. Direction, Y-axis direction X-axis moving guides 8a to reciprocate, and deploy solid cross the Y-axis moving guides 8b, it is movably supports the movable stage 9 to its intersection. The free stage 9 is formed with guide grooves 91 and 92 which are vertically displaced by being displaced vertically and in which the X-axis movable guide 8a and the Y-axis movable guide 8b are slidably supported via a bearing mechanism 93. A wafer stage 96 equipped with a wafer drive mechanism 95 is mounted on the table 94 of the stage 9. However, in the XY stage having the above structure,
Since the XY movable guides 8a and 8b cross the movable stage 9 in a three-dimensional manner, it is indispensable to mount the wafer stage 96, its drive mechanism 95, the L-shaped mirror 97, etc. on the table 94. Movable guide 8
The difference in the movable positions of a and 8b and the high position of the center of gravity of the free stage 9 with respect to the movable positions of both the movable guides increase the pitching motion during movement, which leads to deterioration of the running characteristics and the pitching motion. Since the positioning cannot be settled until it is suppressed, there is a disadvantage that it takes a long time to settle the positioning in the step operation. Moreover, X
It is difficult to adjust the Y movable guides 8a and 8b at right angles. In particular, eight bearing mechanisms 93 are provided between the XY movable guides 8a and 8b and the stage 9, and each bearing mechanism 93 has a relative relationship. Adjustment is complicated. That is, since it is difficult to assemble the eight bearing mechanisms 93 so as to operate all uniformly, the stage 9 is unbalancedly supported by the XY movable guides 8a and 8b, which is also a major cause of yawing and pitching. ing. Further, since the mounting of each of the bearing mechanisms 93 and the adjustment of the bearing clearance are performed with the table 94 on the stage removed, the bearing clearance cannot be set under the stage final use condition. There was a problem.
＜発明の目的＞ この発明は極めて簡単な構成によってＸＹ可動ガイドの
駆動位置高さおよびこの駆動位置高さとステージの重心
位置高さを同一高さに設定し、ステージのヨーイング，
ピッチング等を防止して走り特性、応答性を向上し且つ
組立、調整作業の簡易化を実現した新規なＸＹステージ
を提供することを目的とする。<Object of the Invention> The present invention sets the driving position height of the XY movable guide and the height of this driving position and the center of gravity position of the stage to the same height with an extremely simple structure, and the yawing of the stage
It is an object of the present invention to provide a novel XY stage that prevents pitching and the like, improves running characteristics and responsiveness, and realizes simplification of assembly and adjustment work.
＜発明の構成および効果＞ 上記の目的を達成するため、この発明では、定盤上にＸ
軸方向、Ｙ軸方向に往復動する可動ガイドおよび両可動
ガイドの交叉部に自在ステージを配備したＸＹステージ
において、Ｘ軸可動ガイドおよびＹ軸可動ガイドをそれ
ぞれ平行する一対の真直ガイド部材にて構成し、何れか
一方の可動ガイドの軸身部に長孔を形成して他方の可動
ガイドを直交して貫通させ、両可動ガイドの交叉部にお
いてＸ軸、Ｙ軸方向に互いに平行したガイド部材の対向
面を案内面として自在ステージを摺動可能に支承して成
る。<Structure and Effect of the Invention> In order to achieve the above object, in the present invention, X is formed on the surface plate.
In an XY stage having a movable guide that reciprocates in the axial direction and the Y-axis direction and a free stage arranged at the intersection of both movable guides, the X-axis movable guide and the Y-axis movable guide are configured by a pair of straight guide members that are parallel to each other. Then, a long hole is formed in the shaft portion of either one of the movable guides to penetrate the other movable guide at right angles, and at the intersection of both movable guides, the guide members parallel to each other in the X-axis and Y-axis directions are formed. The movable stage is slidably supported with the facing surface as a guide surface.
上記の構成によると、Ｘ軸可動ガイドとＹ軸可動ガイド
の駆動位置高さ、および該可動位置高さとステージの重
心位置高さを完全同一高さに設定できる。この結果、ス
テップ送り時の加速減速の際、ステージがあおり動作、
つまりピッチングを起こすことがなくなる、という大き
な効果が得られ、ステージの走り特性および応答性を向
上し得る。しかも、ＸＹ可動ガイドの交叉部において、
Ｘ軸，Ｙ軸方向に互いに平行した真直ガイド部材の対向
面を案内面としてステージを支承するため、ステージの
上面へウエハ駆動機構、ウエハステージ，Ｌ形ミラー等
を搭載した状態の侭、各軸受すきまを調整し得、以て、
組立て作業，調整作業が一段と簡易となる。更に、平行
した真直ガイドの内側寸法は、結合部材の部品長さによ
って定まり、結合部材の寸法精度を管理するだけで軸受
すきまを同一寸法精度に組立調整できるため、生産性，
組立性が大幅に向上する等、実用上の優れた効果を有
す。According to the above configuration, the driving position height of the X-axis movable guide and the Y-axis movable guide, and the movable position height and the center-of-gravity position height of the stage can be set to the same height. As a result, when accelerating and decelerating during step feed, the stage moves
That is, a great effect that pitching does not occur can be obtained, and the running characteristics and responsiveness of the stage can be improved. Moreover, at the intersection of the XY movable guide,
Since the stage is supported by using the facing surfaces of the straight guide members that are parallel to each other in the X-axis and Y-axis directions as guide surfaces, the wafer drive mechanism, the wafer stage, the L-shaped mirror, etc. are mounted on the upper surface of the stage. The clearance can be adjusted, so
Assembly work and adjustment work are much easier. Further, the inner dimension of the parallel straight guides is determined by the length of the connecting member, and the bearing clearance can be assembled and adjusted to the same dimensional accuracy simply by controlling the dimensional accuracy of the connecting member.
It has excellent practical effects such as greatly improved ease of assembly.
＜実施例の説明＞ 第１図は本発明にかかるＸＹステージの平面図を示す。<Description of Embodiments> FIG. 1 is a plan view of an XY stage according to the present invention.
ＸＹステージの定盤１は、上面に平坦な摺動面１１を形
成し、周辺に互いに平行したＸ軸ガイド１２，１２ａお
よびＹ軸ガイド１３，13aを配備して、対向するガイド
間にＸ軸可動ガイド２、Ｙ軸可動ガイド３を往復摺動可
能に支持している。両可動ガイド２，３は、各々一対の
真直ガイド部材２１，３１をステージに応じて適当間隔
に平行させ、両端を連結部材２２，32にて一体結合して
いる。両可動ガイド２，３の何れか一方、実施例ではＸ
軸可動ガイド３における真直ガイド部材２１，２１の軸
身部に対向した長孔２４を形成し、この長孔２４に対し
Ｙ軸可動ガイド３を貫通して交叉させ、ＸＹ可動ガイド
２，３の両端は、それぞれ軸受５を介して対向するＸ軸
ガイド１２，１２ａ、Ｙ軸ガイド１３，１３ａに対し摺
動可能に支持すると共に、各々連結部材２２，３２に移
動子２３，34、また、Ｘ軸ガイド、Ｙ軸ガイドに固定子
１４，１５を構成して往復駆動装置を構成している。前
記ＸＹ可動ガイド２，３の交叉部に対し、Ｘ軸、Ｙ軸方
向に互いに平行したガイド部材21，２１および３１，３
１の対向面を案内面として自在ステージ４を支承してい
る。The surface plate 1 of the XY stage has a flat sliding surface 11 formed on the upper surface, and X-axis guides 12 and 12a and Y-axis guides 13 and 13a that are parallel to each other are provided on the periphery, and the X-axis guides are provided between opposing guides. The movable guide 2 and the Y-axis movable guide 3 are supported so that they can slide back and forth. Each of the movable guides 2 and 3 has a pair of straight guide members 21 and 31 arranged in parallel at appropriate intervals according to the stage, and both ends thereof are integrally connected by connecting members 22 and 32. Either one of the two movable guides 2 and 3, X in the embodiment
A long hole 24 facing the shaft body of the straight guide members 21, 21 in the shaft movable guide 3 is formed, and the Y-axis movable guide 3 is passed through and crossed with the long hole 24, so that the XY movable guides 2, 3 Both ends slidably support the X-axis guides 12 and 12a and the Y-axis guides 13 and 13a, which are opposed to each other via the bearings 5, respectively, and the connecting members 22 and 32 respectively move the movers 23 and 34, and the X-axis guides. The shaft guide and the Y-axis guide are provided with the stators 14 and 15 to form a reciprocating drive device. Guide members 21, 21 and 31, 3 which are parallel to each other in the X-axis and Y-axis directions with respect to the intersection of the XY movable guides 2, 3.
The movable stage 4 is supported with the facing surface of 1 as a guide surface.
自在ステージ４は、前記交叉部における各ガイド部材の
案内面に対向する角筒体４１の上下に鍔壁４２，４３を
設けてなり、このステージ４を軸受部材として交叉部に
おける各ガイド部材２１，３１に摺動可能に支持すると
共に、該ステージ４の角筒体４１の内部にウエハ駆動機
構４４、この駆動機構４４の上面にウエハステージ４
５、鍔壁上にＬ形ミラー４６を配備してなるものであ
る。The movable stage 4 is provided with flange walls 42 and 43 above and below a rectangular tubular body 41 facing the guide surface of each guide member in the intersection, and the stage 4 is used as a bearing member in each guide member 21 in the intersection. 31 is slidably supported, and a wafer drive mechanism 44 is provided inside the rectangular tube 41 of the stage 4, and the wafer stage 4 is provided on the upper surface of the drive mechanism 44.
5. The L-shaped mirror 46 is provided on the collar wall.
上記ステージ４は、摺動性を有す軸受材料にて構成する
も可く、或いはまた、角筒体４１および鍔壁４２，４３
に圧力空気源に連通する空気導孔を穿設して各ガイド部
材２１，３１および定盤と対向する面に噴出口を開設
し、ステージ４自体に空気軸受を構成するも可い。尤も
別途空気軸受を取付けることも勿論可能である。本実施
例では上記の如く、定盤１上に往復動可能に配備したＸ
軸可動ガイド２、Ｙ軸可動ガイド３を、各々平行する一
対の真直ガイド部材２１，３１にて構成し、一方の可動
ガイド２の軸身部に長孔２４を形成して他方の可動ガイ
ド３を直交して貫通させ、両可動ガイド２，３の交叉部
に対し、Ｘ軸Ｙ軸方向に互いに平行したガイド部材２
１，３１の対向面を案内面として自在ステージ４を摺動
可能に支持したから、両可動ガイド２，３の可動位置高
さとステージ４の重心位置高さを全て同一高さに設定で
きるため、ステージ走行時のピッチングを一挙に解消
し、走り特性、応答性を向上し得る。しかも、ウエハス
テージ４５および駆動機構４４を搭載した侭、軸受すき
まを調整できる等、構成簡易にして発明目的を達成した
効果を有す。The stage 4 may be made of a bearing material having slidability, or alternatively, the rectangular tubular body 41 and the collar walls 42, 43.
It is also possible to form an air guide hole communicating with the pressurized air source in the above and to form a jet port on the surface facing the guide members 21 and 31 and the surface plate, and to configure an air bearing on the stage 4 itself. However, it is of course possible to attach a separate air bearing. In this embodiment, as described above, the X reciprocally arranged on the surface plate 1 is provided.
The shaft movable guide 2 and the Y-axis movable guide 3 are constituted by a pair of straight guide members 21 and 31 that are parallel to each other, and a long hole 24 is formed in the shaft body portion of one movable guide 2 to form the other movable guide 3. The guide members 2 which are perpendicular to each other and are parallel to each other in the X-axis and Y-axis directions with respect to the intersection of the movable guides 2 and 3.
Since the movable stage 4 is slidably supported by using the facing surfaces of 1, 31 as guide surfaces, the movable position heights of both movable guides 2 and 3 and the center of gravity position height of the stage 4 can all be set to the same height. Pitching when driving on stage can be eliminated at once, improving running characteristics and responsiveness. In addition, there is an effect that the object of the invention is achieved by simplifying the structure such as the case on which the wafer stage 45 and the drive mechanism 44 are mounted and the bearing clearance can be adjusted.
第１図は本発明の一実施例にかかるＸＹステージの平面
図、第２図は第１図II−II線断面図、第３図はIII−III
線断面図、第４図は従来例の平面図、第５図はVI−VI線
断面図、第６図は従来のＸＹ可動ガイドの交叉部分の斜
面図である。 １‥‥定盤 11‥‥摺動面 12，12a‥‥Ｘ軸ガイド 13，13a‥‥Ｙ軸ガイド ２‥‥Ｘ軸可動ガイド 24‥‥長孔 21‥‥ガイド部材 ３‥‥Ｙ軸可動ガイド 31‥‥ガイド部材 ４‥‥ステージ1 is a plan view of an XY stage according to an embodiment of the present invention, FIG. 2 is a sectional view taken along line II-II in FIG. 1, and FIG. 3 is III-III.
FIG. 4 is a plan view of a conventional example, FIG. 5 is a sectional view taken along line VI-VI, and FIG. 6 is a perspective view of a crossing portion of a conventional XY movable guide. 1 ... Surface plate 11 ... Sliding surface 12, 12a ... X-axis guide 13, 13a ... Y-axis guide 2 ... X-axis movable guide 24 ... Long hole 21 ... Guide member 3 ... Y-axis movable Guide 31 ··· Guide member 4 ··· Stage
Claims (2)
の周辺に各々平行配備された一対のＸ軸ガイドおよびＹ
軸ガイドと、平行する一対の真直ガイド部材を有し両端
を対向するＸ軸ガイドに往復動可能に支持したＸ軸可動
ガイドと、軸身部に互いに対向して長孔を形成した平行
する一対の真直ガイド部材を有し、前記Ｘ軸可動ガイド
に対し長孔を貫通させ両端をＹ軸ガイドに往復動可能に
支持したＹ軸可動ガイドと、両可動ガイドの交叉部にお
いてＸ軸，Ｙ軸方向に互いに平行したガイド部材に摺動
可能に支持された自在ステージとを具備して成るＸＹス
テージ。1. A surface plate having a sliding surface on its upper surface, and a pair of X-axis guides and a Y arranged parallel to each other around the surface plate.
A shaft guide, an X-axis movable guide having a pair of parallel straight guide members supported at both ends by reciprocating X-axis guides, and a pair of parallel parallel shaft members facing each other to form elongated holes. And a Y-axis movable guide that has a straight guide member and penetrates an elongated hole through the X-axis movable guide and has both ends reciprocally supported by the Y-axis guide, and the X-axis and Y-axis at the intersection of both movable guides. An XY stage including a free stage slidably supported by guide members parallel to each other in the direction.
置高さ、および、両可動ガイドの可動位置高さと自在ス
テージの重心位置高さが同一高さに設定されている特許
請求の範囲第１項記載のＸＹステージ。2. The movable position heights of the X-axis movable guide and the Y-axis movable guide, and the movable position heights of both movable guides and the center of gravity position of the universal stage are set to the same height. The XY stage according to the first item.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60229289A JPH066248B2 (en) | 1985-10-14 | 1985-10-14 | XY stage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60229289A JPH066248B2 (en) | 1985-10-14 | 1985-10-14 | XY stage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6288526A JPS6288526A (en) | 1987-04-23 |
| JPH066248B2 true JPH066248B2 (en) | 1994-01-26 |
Family
ID=16889788
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60229289A Expired - Lifetime JPH066248B2 (en) | 1985-10-14 | 1985-10-14 | XY stage |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH066248B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5228358A (en) * | 1990-02-21 | 1993-07-20 | Canon Kabushiki Kaisha | Motion guiding device |
| JP3031940B2 (en) * | 1990-02-21 | 2000-04-10 | キヤノン株式会社 | Travel guide device |
| DE9007052U1 (en) * | 1990-06-25 | 1990-08-30 | Fa. Carl Zeiss, 7920 Heidenheim, De | |
| JP2004152902A (en) | 2002-10-29 | 2004-05-27 | Canon Inc | Positioning device |
| EP2221668B1 (en) * | 2009-02-24 | 2021-04-14 | ASML Netherlands B.V. | Lithographic apparatus and positioning assembly |
| JP6456149B2 (en) * | 2015-01-13 | 2019-01-23 | 株式会社トプコン | Surveying equipment |
-
1985
- 1985-10-14 JP JP60229289A patent/JPH066248B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6288526A (en) | 1987-04-23 |
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