JPS6277457A - 活性化ノズルを用いた蒸着法 - Google Patents
活性化ノズルを用いた蒸着法Info
- Publication number
- JPS6277457A JPS6277457A JP21518785A JP21518785A JPS6277457A JP S6277457 A JPS6277457 A JP S6277457A JP 21518785 A JP21518785 A JP 21518785A JP 21518785 A JP21518785 A JP 21518785A JP S6277457 A JPS6277457 A JP S6277457A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- power source
- voltage
- substrate
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000007740 vapor deposition Methods 0.000 title claims description 11
- 230000003213 activating effect Effects 0.000 title abstract description 4
- 238000010894 electron beam technology Methods 0.000 claims abstract description 9
- 230000004913 activation Effects 0.000 claims description 25
- 238000001704 evaporation Methods 0.000 claims description 16
- 230000008020 evaporation Effects 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 7
- 239000000758 substrate Substances 0.000 abstract description 13
- 239000002245 particle Substances 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 13
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000012495 reaction gas Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21518785A JPS6277457A (ja) | 1985-09-30 | 1985-09-30 | 活性化ノズルを用いた蒸着法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21518785A JPS6277457A (ja) | 1985-09-30 | 1985-09-30 | 活性化ノズルを用いた蒸着法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6277457A true JPS6277457A (ja) | 1987-04-09 |
| JPH0154430B2 JPH0154430B2 (enExample) | 1989-11-17 |
Family
ID=16668115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21518785A Granted JPS6277457A (ja) | 1985-09-30 | 1985-09-30 | 活性化ノズルを用いた蒸着法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6277457A (enExample) |
-
1985
- 1985-09-30 JP JP21518785A patent/JPS6277457A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0154430B2 (enExample) | 1989-11-17 |
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