JPS627118A - Molecular beam epitaxy equipment - Google Patents

Abstract

PURPOSE:To make it possible to easily load and unload a substrate and a susceptor by a method wherein a cassette, which horizontally contains substrates in a vessel is moved upward and downward, and the fork of a transfer manupulator is horizontally transferred so as to give and receive a substrate between the cassette and the fork. CONSTITUTION:A substrate-loading cassette 12, which is driven upward and downward with a pinion 14 which is rotated from the outside of the rack 13 and a loading and unloading chamber 11 through a rotary introducing machine 15, is provided in the substrate load and unload chamber 11. A substrate 1 is horizontally loaded in the cassette 12 with the crystalline growth plane facing downside. Also a transfer manupulator 8 is horizontally provided in the loading and unloading chamber 11 crossing with the cassette 12, and the top of the manupulator is provided with a fork capable of horizontally loading a ring susceptor 2. Loading and unloading of the substrate 1 is made possible by the vertical movement of the cassette 12 and the horizontal movement of the foak 17.

Description

[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a single molecular beam epitaxy apparatus, and is suitable for carrying only a substrate into the apparatus at Lt#, attaching it to a nine susceptor kept inside, and performing crystal growth. This invention relates to a molecular beam epitaxy device.

[Background of the invention]

In conventional molecular beam epitaxy equipment, for example, JP-A-57-1
As described in No. 30320, the substrate and susceptor were previously integrated in the atmosphere, and then transported into the apparatus. FIGS. 6 and 7 are general examples of integrating a substrate and a susceptor.

That is, in FIG. 6, the substrate 1 is attached to the susceptor 2, which is a plate-like block made of Mo, using I/Jukum. Also, FIG. 7 shows the claw 3. The substrate 1 is mechanically fixed to the susceptor 2 using screws 4. In conventional molecular beam epitaxy equipment, these susceptors with substrates are carried into the equipment as shown in FIG. 8 to perform crystal growth. That is, a susceptor with a substrate was placed in the load lock chamber 7, and transferred to the growth chamber 5 via the analysis chamber 6 using a transfer manipulator 8.8'i, where crystal growth was performed. In such a conventional example, when removing the substrate 1 from the susceptor 2 after crystal growth, the indium was stuck and could not be removed properly, and the screws 4 were seized, making the removal work very difficult. . Also, each time the crystal growth ends, the susceptor 2
must also be taken out into the atmosphere, and the susceptor 2 must be
O and c.

was adsorbed, causing a decline in the quality of subsequent growth films. Therefore, a plan is being considered in which the susceptor 2 and the substrate 1 are attached and detached inside the device.

[Purpose of the invention]

An object of the present invention is to provide a molecular beam epitaxy apparatus in which a substrate and a susceptor can be easily attached and detached within the apparatus. - [Summary of the invention] In order to achieve the above object, a cassette for horizontally loading substrates in a tank is moved up and down, and a hawk of a transfer manifold that can horizontally load a susceptor is horizontally moved. , the board is removed from the cassette and hawk.

[Embodiments of the invention]

Examples will be described below using figures.

FIG. 1 and FIG. 2 show specific embodiments. That is, in the substrate loading/unloading chamber 11, there is a substrate loading cassette 12 which is driven up and down by a pinion 14 which is rotated via a shaft 13 and a rotary introduction device 15 from outside of the loading/unloading chamber 11.

In this cassette 12, the substrates 1 are loaded horizontally with the crystal growth surface facing downward. Further, this attachment/detachment chamber 11 has a truck/sphere manifold 8 which moves horizontally across the cassette 12, and a hawk 17 at the tip thereof which can horizontally load the ring spool 2. This cassette 12
The vertical movement of the hawk 17 and the horizontal movement of the hawk 17 allow the board 1 to be attached and detached. In addition to having this mechanism, if the apparatus is equipped with a susceptor baking chamber 22f having a heater 21'fI as shown in FIG. The inside of the substrate 1 can be re-cleaned, and a high-quality crystal film can always be grown on the substrate 1. In the figure, 9. 9; 9" is gate pulp.

10 is a molecular beam, 19 is a magnetic coupling, and 20 is a yoke.

FIG. 3 shows another specific embodiment. That is, in the loading section of the substrate loading cassette 12.

Microclaws 1 supporting the outer periphery of the substrate 1 at multiple locations
2a, the substrate 1 supported by the micro-claws 12a with the crystal growth surface facing downward will easily fall from the loading section because the micro-claws 12a are arranged to prevent the substrate 1 from wobbling. Never.

The outer periphery of the ring-shaped susceptor 2 placed on the balk 1 is provided with recesses 2a at positions corresponding to the minute claws 12a of the cassette 12. Since the width of this digging hole 2a is larger than the width of the minute claw 12a of the cassette 12, the cassette 1
Even if the substrate 1 and the ring-shaped susceptor 2 descend as indicated by the arrow I, the substrate 1 and the ring-shaped susceptor 2 do not collide with each other.

By moving the mechanism in the order of arrows I, I, and III, substrate 1 can be set on susceptor 2, and arrows 1',
By moving I' and I' in this order, the substrate 1t is moved from above the susceptor 2.
- can be transferred to cassette 12;

With the above configuration, is it possible to attach and detach the board 1 and susceptor 2? It can be done easily.

FIG. 4 shows still another specific example.
It is convenient for attaching and detaching boards that have a part of the outer periphery cut out. That is, the substrate 1 cut like the cut portion 1a can be loaded on the cassette 12 such that the direction of the microprotrusion 12b is uniquely determined. Also, the substrate 1 loaded in the cassette 12.

The hawk 17 is provided with a flat portion 17bi facing the outer peripheral flat surface 2b of the susceptor 2 so that the ring guides of the ring susceptor 2 are oriented in the same direction.

This allows even if the shape of the substrate 1 is not point symmetrical.

Since the directions of the substrate 1 and the susceptor 2 can be uniquely aligned, attachment and detachment work can be easily performed. Also, if this method is followed, the dug portion 2 of the ring susceptor 2 on the horn 1
It can be uniquely aligned with the minute claw 12b of the bi cassette 12, and the attachment/detachment operation can be performed more easily than in the embodiment shown in FIG.

[Brief explanation of the drawing]

1 to 5 are explanatory diagrams of embodiments of the molecular beam epitaxy apparatus of the present invention. FIG. 1 is a sectional view of one embodiment, FIG. 2 is an external view of the device, and FIG. FIG. 4 is an explanatory diagram of another embodiment, FIG. 5 is an explanatory diagram of still another embodiment, and FIGS. 6 to 8 are explanatory diagrams of a conventional apparatus. 1... Board, 2... Susceptor, 3... Mounting plate, 4
···screw. 5...Growth room, 6...Analysis room, 7...Rod lock room. 8... Transfer manipulator, 9... Gate pulp, 10... Molecular beam source, 11... Susceptor attachment/detachment chamber, 12... Cassette, 13... Rack, 14...
・Pinion. 15...Rotation introduction machine, 17...Hawk, 18...
bearing. 19... Magnetic coupling, 20... Yoke, 21... Heater for baking out, 22... Susceptor baking chamber. - Rod 30 Rod 40 b 4th rod 7th

Claims (1)

[Claims] 1. In a molecular beam epitaxy apparatus having a load lock chamber dedicated to the substrate and a mechanism for attaching and detaching the substrate and the susceptor in a vacuum chamber, the crystal plane of the substrate is used as the mechanism for attaching and detaching the substrate and the susceptor in the vacuum chamber. A cassette for substrates that can place multiple substrates facing downward, a drive mechanism that moves the cassette up and down, a substrate loading section of the cassette that can be approached by horizontal movement,
Alternatively, a molecular beam epitaxy apparatus comprising a transfer manipulator that can be passed through, and a hawk at the tip of the transfer manipulator that allows the susceptor to be loaded horizontally with the substrate loading portion facing upward. 2. In claim 1, the substrate loading portion of the cassette has microclaws that support multiple locations on the outer periphery of the substrate, and the susceptor has a notch through which the microclaws can pass. A molecular beam epitaxy device featuring: 3. In claim 1, when a substrate with a part of the circumference cut is loaded on the substrate loading section of the cassette,
The loading direction on the fork of the ring susceptor, which has a plurality of microprotrusions arranged so that the direction of the substrate is uniquely determined, and has a recessed portion having the same shape as the substrate, is determined from the loading direction of the substrate on the cassette. A molecular beam epitaxy device characterized in that guides are provided on the hawk so that they are uniquely oriented in the same direction.