JPS6261031A - Manufacture of liquid crystal display element - Google Patents

Manufacture of liquid crystal display element

Info

Publication number
JPS6261031A
JPS6261031A JP60202405A JP20240585A JPS6261031A JP S6261031 A JPS6261031 A JP S6261031A JP 60202405 A JP60202405 A JP 60202405A JP 20240585 A JP20240585 A JP 20240585A JP S6261031 A JPS6261031 A JP S6261031A
Authority
JP
Japan
Prior art keywords
terminal
wiring
liquid crystal
crystal display
metallic wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60202405A
Other languages
Japanese (ja)
Other versions
JPH0442662B2 (en
Inventor
Takayuki Urabe
孝之 占部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP60202405A priority Critical patent/JPS6261031A/en
Publication of JPS6261031A publication Critical patent/JPS6261031A/en
Publication of JPH0442662B2 publication Critical patent/JPH0442662B2/ja
Granted legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To simplify the process forming the insulating film of a metallic wiring part formed on a substrate by forming each corresponding metallic wiring part and terminal part of a wiring pattern and connecting the metallic wiring part to the terminal part after the former is anodized. CONSTITUTION:Plural substrates of liquid crystal display elements are taken out of a large-scaled substrate 5, on which four same wiring patterns 7 composed of plural metallic wiring parts 6... and terminal parts 6a... are formed. The metallic wiring part 6 and the terminal part 6a and formed such that the terminal part 6a is separated from the metallic wiring part 6 and they can be nonconductive. All the metallic wiring parts 6 of four wiring patterns 7 are connected at end part opposite to the direction of the terminal part 6a, and taken out at a point X on one side of the large-scaled substrate 5. The wiring patterns 7... formed on said substrate 5 are anodized in an electrolytic bath with the point X as an anode. At this time, since the terminal parts 6... are not conducted, only the metallic wiring parts 6... form an insulating film.

Description

【発明の詳細な説明】 〔産業上の利用分野] 本発明は、MIM(金属−絶縁体−金属)素子を有する
液晶表示素子およびTPT (薄膜トランジスタ)付液
晶表示素子等の能動素子付液晶表示素子の製造方法に係
り、陽極酸化法を用いた液晶表示素子の製造方法に関す
るものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a liquid crystal display element with an active element, such as a liquid crystal display element having an MIM (metal-insulator-metal) element and a liquid crystal display element with a TPT (thin film transistor). The present invention relates to a method of manufacturing a liquid crystal display element using an anodic oxidation method.

〔従来技術〕[Prior art]

従来の液晶表示素子の製造方法では、例えばMIM素子
の製造工程における絶縁膜の形成は陽極酸化法により行
なわれている。ここで、仮に、金属配線部の絶縁膜をス
パッタリング或いは薄着等の方法により形成したときに
は、その絶縁膜中にピンホールが存在する場合に、金属
配線部上に形成した上部金属膜と金属配線部とが直ちに
リークされることになる。しかし、陽極酸化法にて上記
金属配線部の¥IiA縁膜を形成したときには、金属配
線部中にピンホールが存在する場合であっても、ピンホ
ールの内部にも同時に酸化膜が形成されるため、このピ
ンホール上に形成された上部電橋との間にリークが生ず
ることはなく、安定な絶縁膜を形成することができる。
In a conventional method for manufacturing a liquid crystal display element, for example, the formation of an insulating film in the manufacturing process of an MIM element is performed by an anodic oxidation method. Here, if the insulating film of the metal wiring part is formed by a method such as sputtering or thin deposition, if a pinhole exists in the insulating film, the upper metal film formed on the metal wiring part and the metal wiring part will be leaked immediately. However, when the above-mentioned IiA edge film of the metal wiring part is formed using the anodic oxidation method, even if a pinhole exists in the metal wiring part, an oxide film is also formed inside the pinhole at the same time. Therefore, no leakage occurs between the pinhole and the upper electric bridge formed over the pinhole, and a stable insulating film can be formed.

さらに、絶縁膜のパターン形成工程が省略できる等、有
効な絶縁膜形成手段であった。上記陽極酸化法により基
板上に形成された金属配線部の絶縁処理を行なう際には
、第5図に示すように、大型基板1に多数の金属配線部
2・・・から成る複数の配線パターン3・・・を形成し
、同時に処理して多数枚取りする方法を用いるのが通例
である。
Furthermore, it was an effective means for forming an insulating film, such as by omitting the step of forming a pattern for the insulating film. When insulating the metal wiring parts formed on the substrate by the above-mentioned anodic oxidation method, as shown in FIG. It is customary to form 3... and process them simultaneously to take out a large number of sheets.

ところが上記従来の方法では、絶縁膜形成処理の際に、
外部装置との接続部となる各金属配線部2・・・におけ
る端子部2a・・・の酸化を防止するために、ノボラッ
ク樹脂等の有機絶縁膜から成る酸化防止膜4を設ける必
要があった。このため、上記酸化防止膜4の塗布、硬化
、及び剥離工程が必要となり、工程数増加によるコスト
アップ及び生産性の低下を招来するものであった。
However, in the conventional method described above, during the insulating film formation process,
In order to prevent oxidation of the terminal portions 2a of each metal wiring portion 2, which is a connection portion with an external device, it was necessary to provide an oxidation-preventing film 4 made of an organic insulating film such as novolac resin. . Therefore, the steps of coating, curing, and peeling off the antioxidant film 4 are required, which increases the number of steps, resulting in an increase in cost and a decrease in productivity.

〔発明の目的〕[Purpose of the invention]

本発明は、上記従来の問題点を考慮してなされたもので
あって、基板上に形成された金属配線部の絶縁膜形成工
程を節略化することにより、生産性の向上及びコストダ
ウンを行なうことができる液晶表示素子の製造方法の提
供を目的とするものである。
The present invention has been made in consideration of the above conventional problems, and improves productivity and reduces costs by simplifying the process of forming an insulating film on a metal wiring portion formed on a substrate. The object of the present invention is to provide a method for manufacturing a liquid crystal display element that can be manufactured using the following methods.

〔発明の構成〕[Structure of the invention]

本発明の液晶表示素子の製造方法は、基板上に形成した
配線パターンに陽極酸化法により絶縁膜を形成する液晶
表示素子の製造方法において、配線パターンの、各々対
応する金属配線部と端子部とを非導通に形成し、上記金
属配線部を陽極酸化した後、金属配線部と端子部とを接
続し、これにより製造工程を簡素化したことを特徴とす
るものである。
The method for manufacturing a liquid crystal display element of the present invention is a method for manufacturing a liquid crystal display element in which an insulating film is formed on a wiring pattern formed on a substrate by an anodic oxidation method. The present invention is characterized in that the metal wiring portion is formed to be non-conductive, the metal wiring portion is anodized, and then the metal wiring portion and the terminal portion are connected, thereby simplifying the manufacturing process.

〔実施例〕〔Example〕

本発明の一実施例を第1図乃至第4図に基づいて以下に
説明する。
An embodiment of the present invention will be described below based on FIGS. 1 to 4.

液晶表示素子の基板は、第1図に示すような大型基板5
より多数枚取りされる。この大型基板5には多数の金属
配線部6・・・及び端子部6a・・・から成る4つの同
一の配線パターン7が形成される。
The substrate of the liquid crystal display element is a large substrate 5 as shown in FIG.
A larger number of sheets are taken. On this large substrate 5, four identical wiring patterns 7 consisting of a large number of metal wiring parts 6 and terminal parts 6a are formed.

上記金属配線部6と端子部6aは第2図に示すよ・うに
、端子部6aを金属配線部6から分離して非導通となる
ように形成される。また、上記4つの配線パターン7・
・・の全ての金属配線部6・・・は、端子部6a方向と
は反対側の端部にて各々接続され、大型基板5の1辺の
X点に取り出される。上記大型基板5に形成された配線
パターン7・・・には電解槽にて、上記X点を陽極とし
て陽極酸化が行なわれる。このときには、端子部6a・
・・には通電されないため、金属配線部6・・・にのみ
絶縁膜が形成される。上記陽極酸化処理後には、第3図
及び第4図に示すように、金属配線部6とこれに対応す
る端子部6aとの間にスパッター蒸着にて金属膜10が
形成され、上記両者の接続が行なわれる。
As shown in FIG. 2, the metal wiring portion 6 and the terminal portion 6a are formed so that the terminal portion 6a is separated from the metal wiring portion 6 so as to be non-conductive. In addition, the four wiring patterns 7 and
All the metal wiring parts 6 are connected at the end opposite to the direction of the terminal part 6a, and taken out at point X on one side of the large board 5. The wiring patterns 7 formed on the large substrate 5 are anodized in an electrolytic bath using the point X as an anode. At this time, the terminal portion 6a
Since no current is applied to the metal wiring portions 6..., the insulating film is formed only on the metal wiring portions 6.... After the anodic oxidation treatment, as shown in FIGS. 3 and 4, a metal film 10 is formed by sputter deposition between the metal wiring section 6 and the corresponding terminal section 6a to connect the two. will be carried out.

尚、上記金属膜10の形成は、金属配線部6の突出部6
b上に形成する上部金属膜8と同時に形成される。この
後には、上記の上部金属膜8上に透明導電膜9を蒸着に
よりパターンニングし、以下、従来のツイストネマティ
ック液晶素子の製造方法と同様の方法により本液晶表示
素子が製造される。
Note that the formation of the metal film 10 is performed on the protrusion 6 of the metal wiring portion 6.
It is formed simultaneously with the upper metal film 8 formed on b. After this, a transparent conductive film 9 is patterned by vapor deposition on the upper metal film 8, and the present liquid crystal display element is manufactured by the same method as the manufacturing method of a conventional twisted nematic liquid crystal element.

〔発明の効果〕〔Effect of the invention〕

本発明の液晶表示素子の製造方法は、以上のように、配
線パターンの各々対応する金属配線部と端子部とを非導
通に形成し、上記金属配線部を陽極酸化した後、金属配
線部と端子部とを接続するものである。これにより、端
子部の陽極酸化を防止するために、酸化防止膜を形成す
る必要がなく、この酸化防止膜の塗布、硬化、及び剥離
工程を省略することができる。また、上記金属配線部と
端子部との接続は後の上部金属膜形成工程と同時に行な
うことができる。これにより製造工程を筒略化すること
ができ、コストダウン及び生産性の向上を行なうことが
できる等の効果を奏する。
As described above, in the method for manufacturing a liquid crystal display element of the present invention, the metal wiring portions and the terminal portions corresponding to each of the wiring patterns are formed to be non-conductive, the metal wiring portions are anodized, and then the metal wiring portions and the terminal portions are anodized. It connects to the terminal section. Thereby, there is no need to form an oxidation-preventing film to prevent anodic oxidation of the terminal portion, and the steps of coating, curing, and peeling the oxidation-preventing film can be omitted. Further, the connection between the metal wiring portion and the terminal portion can be performed simultaneously with the subsequent upper metal film forming step. This makes it possible to simplify the manufacturing process, thereby achieving effects such as cost reduction and productivity improvement.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至第4図は本発明の一実施例を示すものであっ
て、第1図は配線パターンを示す概略構成図、第2図は
第1図に示した金属配線部と端子部との拡大図、第3図
は陽極酸化後の工程を示す概略説明図、第4図は第3図
A部の拡大図、第5図は従来例の配線パターンを示す概
略構成図である。 5は大型基板、6は金属配線部、6aは端子部、7は配
線パターン、10は金属膜である。
1 to 4 show one embodiment of the present invention, in which FIG. 1 is a schematic configuration diagram showing a wiring pattern, and FIG. 2 is a diagram showing a metal wiring part and a terminal part shown in FIG. 3 is a schematic explanatory diagram showing the process after anodization, FIG. 4 is an enlarged view of section A in FIG. 3, and FIG. 5 is a schematic diagram showing the wiring pattern of a conventional example. 5 is a large substrate, 6 is a metal wiring section, 6a is a terminal section, 7 is a wiring pattern, and 10 is a metal film.

Claims (1)

【特許請求の範囲】[Claims] 1、基板上に形成した配線パターンに陽極酸化法により
絶縁膜を形成する液晶表示素子の製造方法において、配
線パターンの、各々対応する金属配線部と端子部とを非
導通に形成し、上記金属配線部を陽極酸化した後、金属
配線部と端子部とを接続することを特徴とする液晶表示
素子の製造方法。
1. In a method for manufacturing a liquid crystal display element in which an insulating film is formed on a wiring pattern formed on a substrate by an anodizing method, the corresponding metal wiring portions and terminal portions of the wiring pattern are formed to be non-conductive, and the metal 1. A method of manufacturing a liquid crystal display element, which comprises connecting a metal wiring part and a terminal part after anodizing the wiring part.
JP60202405A 1985-09-12 1985-09-12 Manufacture of liquid crystal display element Granted JPS6261031A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60202405A JPS6261031A (en) 1985-09-12 1985-09-12 Manufacture of liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60202405A JPS6261031A (en) 1985-09-12 1985-09-12 Manufacture of liquid crystal display element

Publications (2)

Publication Number Publication Date
JPS6261031A true JPS6261031A (en) 1987-03-17
JPH0442662B2 JPH0442662B2 (en) 1992-07-14

Family

ID=16456961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60202405A Granted JPS6261031A (en) 1985-09-12 1985-09-12 Manufacture of liquid crystal display element

Country Status (1)

Country Link
JP (1) JPS6261031A (en)

Also Published As

Publication number Publication date
JPH0442662B2 (en) 1992-07-14

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EXPY Cancellation because of completion of term