JPS6258785B2 - - Google Patents
Info
- Publication number
- JPS6258785B2 JPS6258785B2 JP16463082A JP16463082A JPS6258785B2 JP S6258785 B2 JPS6258785 B2 JP S6258785B2 JP 16463082 A JP16463082 A JP 16463082A JP 16463082 A JP16463082 A JP 16463082A JP S6258785 B2 JPS6258785 B2 JP S6258785B2
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- nozzle hole
- nozzle plate
- atomizer
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 8
- 239000007788 liquid Substances 0.000 description 13
- 239000010408 film Substances 0.000 description 9
- 238000000889 atomisation Methods 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000003350 kerosene Substances 0.000 description 2
- 229910000833 kovar Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 description 1
- 239000010956 nickel silver Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Special Spraying Apparatus (AREA)
- Apparatuses For Generation Of Mechanical Vibrations (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57164630A JPS5952562A (ja) | 1982-09-20 | 1982-09-20 | 霧化器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57164630A JPS5952562A (ja) | 1982-09-20 | 1982-09-20 | 霧化器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5952562A JPS5952562A (ja) | 1984-03-27 |
| JPS6258785B2 true JPS6258785B2 (enExample) | 1987-12-08 |
Family
ID=15796847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57164630A Granted JPS5952562A (ja) | 1982-09-20 | 1982-09-20 | 霧化器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5952562A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62271505A (ja) * | 1986-05-20 | 1987-11-25 | Mitsubishi Electric Corp | 多周波共用ホ−ンアンテナ |
| US5061513A (en) * | 1990-03-30 | 1991-10-29 | Flynn Paul L | Process for depositing hard coating in a nozzle orifice |
| BR112016001153B1 (pt) * | 2013-07-22 | 2021-07-06 | Koninklijke Philips N.V. | rede para se usar na formação de gotículas de líquido em um nebulizador, nebulizador, e, método de fabricação de rede para se usar na formação de gotículas de líquido em um nebulizador |
| CN103752452A (zh) * | 2013-12-20 | 2014-04-30 | 李玉彬 | 一种复合雾化片 |
-
1982
- 1982-09-20 JP JP57164630A patent/JPS5952562A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5952562A (ja) | 1984-03-27 |
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