JPS6258140B2 - - Google Patents

Info

Publication number
JPS6258140B2
JPS6258140B2 JP15891378A JP15891378A JPS6258140B2 JP S6258140 B2 JPS6258140 B2 JP S6258140B2 JP 15891378 A JP15891378 A JP 15891378A JP 15891378 A JP15891378 A JP 15891378A JP S6258140 B2 JPS6258140 B2 JP S6258140B2
Authority
JP
Japan
Prior art keywords
scanning
mark
electron beam
size
mark detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15891378A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5583233A (en
Inventor
Junichi Kai
Nobuyuki Yasutake
Tooru Funayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP15891378A priority Critical patent/JPS5583233A/ja
Publication of JPS5583233A publication Critical patent/JPS5583233A/ja
Publication of JPS6258140B2 publication Critical patent/JPS6258140B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP15891378A 1978-12-20 1978-12-20 Electron beam scanning method for mark detection Granted JPS5583233A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15891378A JPS5583233A (en) 1978-12-20 1978-12-20 Electron beam scanning method for mark detection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15891378A JPS5583233A (en) 1978-12-20 1978-12-20 Electron beam scanning method for mark detection

Publications (2)

Publication Number Publication Date
JPS5583233A JPS5583233A (en) 1980-06-23
JPS6258140B2 true JPS6258140B2 (zh) 1987-12-04

Family

ID=15682076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15891378A Granted JPS5583233A (en) 1978-12-20 1978-12-20 Electron beam scanning method for mark detection

Country Status (1)

Country Link
JP (1) JPS5583233A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5870554U (ja) * 1981-11-09 1983-05-13 トヨタ自動車株式会社 ダンパプ−リ
JPS58102524A (ja) * 1981-12-14 1983-06-18 Fujitsu Ltd 電子ビ−ム露光装置の位置合せ方法
JPS58151041A (ja) * 1982-03-03 1983-09-08 Toshiba Corp リダンダンシ−装置
JPH079874B2 (ja) * 1985-03-15 1995-02-01 株式会社東芝 電子ビ−ム描画方法

Also Published As

Publication number Publication date
JPS5583233A (en) 1980-06-23

Similar Documents

Publication Publication Date Title
US4264711A (en) Method of compensating for proximity effects in electron-beam lithography
US6566655B1 (en) Multi-beam SEM for sidewall imaging
US4503334A (en) Method of using an electron beam
JPS6258140B2 (zh)
JP3737656B2 (ja) 荷電ビーム露光方法
JP3064375B2 (ja) 電子線描画装置及びその調整法
US4737646A (en) Method of using an electron beam
JPS622116A (ja) 形状測定方法
JPS6246976B2 (zh)
US3428872A (en) Body comprising a mark for indirect detection of an objective part and method of detecting the position of said objective part
JP2701764B2 (ja) 荷電粒子ビームの寸法測定装置および測定方法
JPH0663729B2 (ja) 位置検出装置
JPH0147892B2 (zh)
JPS6244406B2 (zh)
JPH03266444A (ja) 電子ビームを用いた測定装置におけるパタン検出方法および寸法測定方法
JPS62274540A (ja) 荷電ビ−ム装置のビ−ムアライメント方法
JPH0527834B2 (zh)
JPH0817696A (ja) 電子ビーム露光方法
JP3617223B2 (ja) アライメント方法
JP2758979B2 (ja) マーク位置検出方法
JPS61292844A (ja) イオンビ−ム形状の測定方法
JPH03190119A (ja) マーク検出方法
JPH03189776A (ja) マーク検出方法
JPS6142409B2 (zh)
JPH05134047A (ja) 荷電粒子ビーム径の測定方法