JPS6257641A - Flow control device for pulverous particle flow - Google Patents

Abstract

PURPOSE:To transfer pulverous particles formed by focusing a gaseous raw material in the form of a uniform supersonic beam by providing a reducing and expanding nozzle made of an electrical insulator to a flow passage, thereby constituting a flow control device for pulverous particle flow. CONSTITUTION:A pressure difference is generated between an upper stream chamber 3 and a lower stream chamber 4 when the inside of the chamber 4 is evacuated by a vacuum pump 5 while a carrier gas dispersed and incorporated therein with the gaseous raw material is supplied into the chamber 3. The supplied carrier gas contg. the gaseous raw material, therefore, flows from the chamber 3 into the chamber 4 by swirling in the reducing and expanding nozzle 1. Since the reducing and expanding nozzle 1 is made of the electrical insulator, microwave discharge is generated between a microwave electrode 9 and the reducing and expanding nozzle 1 by positioning the microwave electrode 9 in proximity to the nozzle 1.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a flow control device for a particulate flow used as a particulate transfer stage or a spraying part. The present invention is expected to be applied to the formation of composite materials, doping, and new methods of forming fine particles.

In this specification, microparticles refer to elementary particles, molecules, Itf
l Refers to fine particles and general fine particles. here! The fi fine particles are produced using, for example, an in-gas evaporation method, a plasma evaporation method, a gas phase chemical reaction method, or a liquid reaction using a gas phase reaction. Obtained by colloidal precipitation method, solution injection pyrolysis method. a refers to fine (generally 0.5 gm or less) particles. ・General fine particles t refers to fine Rf obtained by the general f method such as mechanical crushing or precipitation precipitation treatment. A jet stream whose cross-sectional area is approximately constant in one direction, and its cross-sectional shape does not matter.

[Prior Art] Generally, fine particles are dispersed and suspended in a carrier gas and transported by the flow of the carrier gas.

Conventionally, the flow control of fine particles F accompanying the transfer of hE fine particles is 1
: This is simply done by dividing the entire flow path of the particles flowing together with the carrier gas with a pipe or a housing due to the differential pressure between the flow side and the downstream side.Therefore, the flow of particles varies in strength and weakness. However, the particles inevitably occur in a dispersed state throughout the pipe or housing that defines the flow path of the particles.

Furthermore, when spraying fine particles onto a substrate, the fine particles are jetted out together with a carrier gas through a nozzle. The nozzle used for spraying the fine particles is a wide flow pipe or a tapered nozzle, and the jet cross section of the fine particles immediately after being ejected is narrowed according to the area of the nozzle end face. However, since the jet is diffused at the exit surface of the nozzle, the flow path is merely narrowed in width and time, and the speed of the jet does not exceed the speed of sound.

On the other hand, the generation of ultrafine particles using a gas phase reaction is simply carried out by subjecting the raw material gas dispersed within the generation chamber to plasma treatment.

[Problems to be Solved by the Invention] By the way, the entire flow path of fine particles is divided by a pipe material or a casing,
If the fine particles are transported along this flow path along with the carrier gas by the differential pressure between the L flow side and the D flow side, a very high transport speed cannot be expected. In addition, it is difficult to avoid contact between the particles and the wall surfaces of the tubes and casings that define the flow path of the particles during the entire transfer section.

For this reason, there is a problem in that even if active particles are moved to their collection position, the activity tends to disappear over time or due to contact with the tube material or the wall of the casing. In addition, if the entire flow path of particles is divided by pipe material or a housing, the collection rate of transferred particles may be low due to the generation of dead spaces in the flow, and the utilization efficiency of carrier gas for particle transfer may be lowered. Also low F.

On the other hand, conventional flow tubes and tapered nozzles create a diffusion flow in which the density distribution of fine particles t in the jet flow is large. Therefore, when spraying fine particles onto a substrate, it is difficult to control uniform spraying. Furthermore, uniform spraying makes it difficult to control the area.

Furthermore, when ultrafine particles are generated from the source gas dispersed within the generation chamber, there is a problem in that the proportion of the source gas used to generate the ultrafine particles is small, resulting in poor utilization efficiency of the source gas.

[L stage for solving the problem] The first stage taken to solve the problem described in 1-1 is explained using Fig. 7trJ1, which is an explanatory diagram of the basic principle of the present invention. This is a particle flow control device equipped with a contraction/expansion nozzle 1 made of a body, which can make the flow of particles uniform and efficiently convert them into a beam, thereby solving the problems listed in item L.

The contracting/expanding nozzle l in the present invention is a throat section 2 whose opening area is gradually narrowed from the inlet 1a toward the middle section, and whose opening area is gradually expanded from the throat section 2 toward the outlet 1b. In Figure 1, the nozzle is
For convenience of explanation, the inflow side and outflow side of the contraction/expansion nozzle 1 are as follows.
It is connected to an upstream chamber 3 and a downstream chamber 4, each of which is a closed system. However, the inflow side and the outflow side of the contraction/expansion nozzle 1 in the present invention can be a closed system if a differential pressure can be generated between the two and the particles can be passed along with the carrier gas while being exhausted on the downstream side. It may also be an open system.

[Function] For example, as shown in FIG. 1, when a carrier gas containing a dispersed raw material gas is supplied into the upstream chamber 3 and the downstream chamber 4 is evacuated by the vacuum pump 5, the upstream chamber 3 and the downstream chamber are evacuated. room 4
A pressure difference is created between the two.

Therefore, the carrier gas containing the supplied raw material gas is J
It flows from the second flow chamber 3, passes through the contraction/expansion nozzle 1, and flows into the second flow chamber 4.

By the way, since the contraction/expansion nozzle 1 is made of an electrical insulator, if the microwave electrode 9 is positioned close to the contraction/expansion nozzle 1, microwave discharge can be generated between the microwave electrode 9 and the contraction/expansion nozzle 1. It can be carried out. Then, by the resulting plasma, the a-fine particle generation process can be performed on the raw material gas concentrated toward the contraction/expansion nozzle 1 or the source gas concentrated into the contraction/expansion nozzle l. Therefore, the utilization efficiency of the raw material gas is extremely high compared to the case where the ultrafine particle generation process is performed on the widely dispersed raw material gas. Depending on the type of fine particles t, fine particles F may be supplied together with a carrier gas and activated within the contraction/expansion nozzle l.

Further, the contraction/expansion nozzle 1 maintains the pressure P of the upstream chamber 3.

and the pressure ratio P/Po of the pressure P in the downstream chamber 4, and the ratio A/A'' between the opening surface jAA'' of the throat portion 2 and the opening area A of the outflow port 1b.
By adjusting this, the flow of particles ejected together with the carrier gas can be sped up. If the pressure ratio P / P in the second flow chamber 3 and the downstream chamber 4 is larger than the critical pressure ratio, the flow velocity of the contraction/expansion nozzle 1 becomes lower than the spitting velocity H, and the fine particles are removed together with the carrier gas. If the distribution pressure ratio of L is less than the critical pressure ratio, the flow velocity of the contraction/expansion nozzle L becomes a super-fast flow, and the fine particles (-) are ejected at an ultra-high speed along with the carrier gas. can be done.

Here, the velocity of the particle flow is U, and the sound velocity at that point is a.
, @particle-flow specific heat ratio is γ, and if we assume that the particle flow is a compressible one-dimensional flow with one adiabatic expansion, the Matzuha number M reached by the particle R is determined by the pressure Pi1 in the L flow chamber and the pressure Pi1 in the D flow chamber. pressure P
From this, it is determined by the following equation, and in particular, when P/P a is less than or equal to the critical pressure ratio, M is less than or equal to l.

In addition, ifMa is local temperature T and gas constant R,
It can be calculated using the following formula.

a=1; 舊'f In addition, the following relationship exists between the open volume A of the outlet 1b and the open volume A of the throat 2 and the Matsuha number M.

Therefore, the opening area ratio A/AΦ is determined according to the Matsuh number M determined from equation (1) by the pressure ratio P/P of the pressure Pa of the L flow chamber 3 and the pressure P of the downstream chamber 4, By adjusting P/P according to M determined from equation (2), the flow velocity of the particulate flow ejected from the expansion/contraction nozzle 1 can be adjusted. The velocity U of the particle flow at this time can be determined by the following equation (3).

When the pressure ratio is less than the critical pressure ratio as described above, the ejected carrier gas and particles form a uniform diffusion flow, making it possible to uniformly spray the particles over a relatively wide area at once. .

On the other hand, when the fine particles are ejected in a fixed direction together with the carrier gas as an ultra-high-speed flow as described above, the carrier gas and the particles travel straight while maintaining almost the jet cross section immediately after being ejected, and are formed into a beam. Therefore, the flow of fine particles intersected by this carrier gas is also converted into a beam, and with minimal diffusion, the particles flow through the space in the downstream chamber 4 in a spatially isolated 7g beam without interference with the wall surface of the downstream chamber 4. And it will be transported at super high speed.

For this reason, if fine particles are formed or activated in or near the contraction/expansion nozzle 1 and then transferred as a beam, they will be transferred at supersonic speed and as a spatially independent beam. By doing this, S can be collected and attached to, for example, a substrate 6L thrown into the flow chamber 4. Therefore, it becomes possible to collect the fine particles in a good active state. Also, since the fine particles are sprayed onto the substrate 6L as a beam whose jet cross section is almost constant in the flow direction, this spraying can easily cover the area. It can be controlled.

[Example] Fig. 2 is a schematic diagram of an example in which the present invention is applied to a film forming apparatus using ultrafine particles.
3 is the 1; flow chamber, 4a is the first 'F flow chamber, and 4b is the first-first flow chamber.

l: The flow chamber 3 and the first downstream chamber 4a are configured as an integrated unit, and the skimmer 7, gate valve 8, and second F flow chamber 4b, which are also unitized, are in the first downstream chamber 4a. All of them are sequentially connected to the mating tail via flanges having a common diameter (hereinafter referred to as "rr common 7 flanges") so that they can be connected and separated. The L flow chamber 3, the second flow chamber 4b, and the second flow chamber 4b are separated from the second flow chamber 3 by the exhaust system described later.
The degree of vacuum is maintained at a higher degree in stages toward the F flow chamber 4b.

J=fi, a microwave electrode 9 is attached to one side of the chamber 3 via a common flange. This microwave electrode 9 is a contraction/expansion nozzle l made of an electrical insulator.
It is made of a good electrical conductor and is used to generate microwave discharge between the The generation of ultrafine particles F by this microwave discharge is caused by the leakage and purging valve 24a.
It is preferable to carry out the process after the raw material gas supplied together with the carrier gas is focused into the contraction/expansion nozzle l. For this purpose, the tip of the pole 9 of the microwave 7 may be inserted into the reduced diameter portion of the contraction/expansion nozzle l. In this way, the contraction/expansion nozzle 1 itself can function as a generation chamber for ultrafine particles, and the apparatus can be made even more compact. However, in this case, if the microwave electrode 9 is inserted downstream of the throat 2 of the contraction/expansion nozzle l, 1i! Since the particulate flow ejected from the small enlarged nozzle 1 becomes easily disturbed, it is preferable to keep the microwave electrode 9 inserted on the l=fQ side from the throat part 2.

The contraction/expansion nozzle l opens the inflow Dla into the upstream chamber 3 at the side end of the -Fth flow chamber 4a on the upstream chamber 3 side, and the inflow Dla is opened into the upstream chamber 3.
The outflow port 1b is opened at the upper end of the upper chamber 3, and the upper end of the upstream chamber 3 is installed through a common flange in a state where it protrudes into the upstream chamber 3. However, the contraction/expansion nozzle 1 may be installed in a state in which it projects into the first downstream chamber 4a. The direction in which the contraction/expansion nozzle 1 should be projected may be selected depending on the size, size, properties, etc. of the ultrafine particles to be transferred.

As mentioned above, as the contraction/expansion nozzle 1, the inflow r11
It is sufficient that the opening area is gradually narrowed from a to become the throat part 2, and then the opening area is gradually expanded again to become the outlet 1b. As shown, it is preferable that the inner circumferential surface near the outlet lb is substantially parallel to the central axis. This is because the flow direction of the jetted carrier gas and the MiW 1 grain Y- is influenced to some extent by the direction of the inner circumferential surface near the outlet lb, so that it is possible to make it as easy to flow as possible. However, as shown in FIG. 4(b), if the angle α of the inner peripheral surface from the throat portion 2 to the outlet 1b with respect to the central axis is set to 7° or less, preferably 5° or less, a peeling phenomenon occurs. In this case, it is not necessary to form the section L in particular, since the flow of the ejected carrier gas and ultrafine particles is maintained substantially uniformly. By omitting the formation of the parallel portion, the contraction/expansion nozzle 1 can be manufactured easily. Further, if the contraction/expansion nozzle 1 is made rectangular as shown in FIG. 4(C), carrier gas and ultrafine particles can be ejected in a slit shape.

Here, said! The Ara phenomenon is a phenomenon in which when there is a protrusion on the inner surface of the contraction/expansion nozzle 1, the boundary layer between the inside of the contraction/expansion nozzle 1 and the flowing fluid becomes large and the flow becomes non-uniform. The faster the flow, the more likely it is to occur. In order to prevent this peeling phenomenon, it is preferable that the angle α described above is made smaller as the inner surface finishing precision of the reduction and expansion nozzle l becomes smaller.
Three or more inverted triangular marks representing the surface finishing accuracy specified in the HOI, and four or more are preferred. In particular, since the peeling phenomenon in the enlarged part of the contraction/expansion nozzle 1 greatly affects the subsequent flow of the carrier gas and ultrafine particles, by determining the finishing accuracy in L with emphasis on this enlarged part, it is possible to 1 can be easily produced. Furthermore, in order to prevent the occurrence of a peeling phenomenon, the throat portion 2 must have a smooth curved surface so that the differential coefficient in the rate of change in cross-sectional area does not become ■.

Examples of electrical insulators used as materials for the contraction/expansion nozzle l include synthetic resins with electrical insulation properties such as acrylic resin, polyvinyl chloride, polyethylene, polystyrene, and polypropylene τ, ceramic materials, quartz, glass plates,
Can be widely used. This material may be selected in consideration of its non-reactivity with the generated ultrafine particles, its additivity, and its ability to release gas in a vacuum system. Furthermore, the inner surface of the contraction/expansion nozzle l can be coated with an electrically insulating material that is less likely to cause adhesion and reaction of ultrafine particles.

A specific example is polyfluoroethylene coating. can be mentioned.

The length of the contraction/expansion nozzle l can be arbitrarily determined depending on the size of the apparatus. By the way, the contraction/expansion nozzle l
When the carrier gas and ultrafine particles flow through the carrier gas, the thermal energy they possess is converted into pressure energy. In particular, when the sweat is ejected at an extremely high speed, the ripening energy becomes extremely small, resulting in a supercooled state. Therefore, if the carrier gas contains condensed components, it is also possible to actively condense them by the supercooled state, thereby forming ultrafine particles. Since the formation of ultrafine particles by this is homogeneous nucleation, it is easy to obtain homogeneous m-fine particles.In addition, in this case, in order to perform sufficient condensation, it is preferable that the contraction/expansion nozzle 1 is long.On the other hand, the above When such condensation occurs, thermal energy increases and velocity energy decreases. Therefore, in order to maintain high-speed jetting, it is preferable that the contraction/expansion nozzle 1 be short.

Pressure ratio P/P of pressure PO in upstream chamber 3 and pressure P in downstream chamber 4
By appropriately adjusting the relationship between O and the ratio A/A'' of the opening area A of the throat portion 2 and the opening area of the outlet 1b, and allowing the ultrafine particles to flow through the contraction/expansion nozzle 1, The carrier gas containing .

The skimmer 7 is installed in the first downstream chamber 4a so that the second downstream chamber 4b can maintain a sufficiently higher degree of vacuum than the first downstream chamber 4a.
This is to enable adjustment of the opening area between the first downstream chamber 4b and the second downstream chamber 4b. Specifically, as shown in FIG. 5, two adjustment plates 11.11' each having dogleg-shaped cutouts 10 and 10' can be slid past each other with their cutouts 10.10' facing each other. It has been established in This adjustment plate 11° 11' can be slid from the outside, and allows the beam to pass through depending on the shape of the two cutout sections 10 and 10', and maintains a certain degree of vacuum in the second downstream chamber. The degree of opening can be adjusted as desired. Note that the shapes of the notches 1G and 10' of the skimmer 7 and the adjustment plates 11 and 11' may be semicircular or other shapes other than the shape shown in the drawings.

The gate valve 8 has a weir-shaped valve body 13 that is raised and lowered by turning a handle 12, and is open when the beam is traveling. By closing this gate valve 8, the unit in the second downstream chamber 4b can be replaced while maintaining the degree of vacuum in the upstream chamber 3 and the second downstream chamber 4a. In addition, in the apparatus of this embodiment, the ultrafine particles are collected in the first downstream chamber 4b, but if the gate valve 8 is a pole valve etc., it is possible to collect the ultrafine particles in the first downstream chamber 4b. By replacing the first FFI, chamber 4b unit with this pole valve,
This has the advantage that the unit can be replaced without the risk of rapid oxidation.

In the second downstream chamber 4b, a base body 6 is located which receives and collects the ultrafine particles transferred as a beam and collects them in an L&film state. This base body 6 is attached to the first downstream chamber 4b via a common flange, and is attached to a base body holder 18 at the tip of a slide shaft 15 that is slid by a cylinder 14. A shutter 17 is located on the front side of the base 6, so that the beam can be blocked whenever necessary. Moreover, the substrate holder 16 is.

The substrate 6 can be heated or cooled to achieve optimum temperature conditions for collecting ultrafine particles.

In addition, as shown in the figure, a glass window 18 is attached to each of the flow chamber 3 and the first downstream chamber 4b at 1:F through a common flange, so that the inside can be observed.

Although not shown, the upstream chamber 3 and the first downstream chamber 4
Similar glass windows (similar to 18 in the figure) are attached to the front and rear of the a and second downstream chambers via common flanges. By removing these glass windows 18, various measuring devices, load lock chamber caps, and weighing devices can be installed via a common flange.

Next, the exhaust system in this embodiment will be explained.

"The second flow chamber 3 is connected to the main valve 2 via the pressure regulating valve 19.
Connected to 0a. The first downstream chamber 4a is directly connected to the main valve 20a, and this main valve 20a
is connected to the vacuum pump 5a. The second F flow chamber 4b is connected to the main valve 20b.

Furthermore, this main valve 20b is connected to a vacuum pump 5b. Note that 21a and 21b are connected to a valve 22a immediately upstream of the main valves 20a and 20b, respectively.
, 22b and an auxiliary valve 23a.

1-flow chamber 3. with a vacuum pump connected to the vacuum pump 5a via 23b; First f flow chamber 4a and second flow chamber 4b
This is to conduct an internal check. In addition, 24a to 24h are each chamber 3, 4a, 4b and pump 5a, 5b,
These are leak and purge valves 21a and 21b.

First, the interference valves 21a and 21b and the pressure regulating valve 1
8, the upstream chamber 3, the first and second r flow chambers 4a, 4
0 The irregularities in b are performed using the vacuum pumps 20a and 20b.
Next, the auxiliary valves 23a, 23b and the main valves 20a, 2 are closed.
0b is opened and the vacuum pumps 5a and 5b are used to create a 1-minute vacuum in the upstream chamber 3, the first downstream chambers 4a and 4b. At this time, by adjusting the opening degree of the pressure control valve 19, the degree of vacuum in the first 'Fm chamber 4a is made higher than that in the upstream chamber 3, then the carrier gas and raw material gas are passed, and then In order to increase the degree of vacuum in the second downstream chamber 4b,
Adjust with skimmer 7. This adjustment is performed using main valve 20.
This can also be done by adjusting the opening degree of b. The chambers 3, 4a, and 4b are controlled to maintain a constant degree of vacuum throughout the formation of ultrafine particles and the film forming operation by beam injection. This control may be r-movement, but each chamber 3, 4
Detect the pressure in a, 4b, and operate the pressure regulating valve 19, main valve 20a, ')nh based on this detected pressure.
This may be done by dynamically controlling the opening and closing of the fan 17-7'''g.Also, the carrier gas and fine particles supplied to the upstream chamber 3 are directly transferred to the downstream side via the contraction/expansion nozzle l. If the exhaust gas during transfer is 1,
It is possible to carry out the process only on the downstream side, that is, the first and second downstream chambers 4a and 4b.

The vacuum degree L may be controlled by separately providing vacuum pumps 5a for the upstream chamber 3 and the first 'F flow chamber 4d for each chamber 3 and 4a.However, in this embodiment, As shown in FIG.
Even if there is some pulsation in the vacuum pump 5d, it is easy to maintain a constant pressure difference between the two, which has the advantage of making it easy to maintain a constant flow condition that is susceptible to fluctuations in this differential pressure.

The suction by the vacuum pumps 5a, 5b is preferably performed from the L side, especially in the first and first downstream chambers 4a, 4b. By suctioning from above, the descent of the beam due to gravity can be suppressed to some extent. can do.

Although the apparatus according to this embodiment is as described above, the following modifications are possible.

First, the contraction/expansion nozzle l can be tilted to the left or right or scanned at constant intervals, and can also be configured to form a film over a wide range. This tilting and scanning is especially advantageous when combined with the rectangular nozzle shown in FIG. 4(c).

It is also possible to form the contraction/expansion nozzle l from a transparent material and irradiate the flow with light having various wavelengths such as ultraviolet, infrared, and laser light. It is also possible to provide a plurality of contraction/expansion nozzles l to generate a plurality of beams at once. In particular, when a plurality of contraction/expansion nozzles 1 are provided, by connecting each to an independent upstream chamber 3, beams of different particles can be run simultaneously, and different particles can be layered or mixed and collected. It is also possible to form new particles by collision of different particles by crossing the beams.

The base body 6 is held in a moat that can be moved vertically and horizontally or in a rotating part,
It is also possible to receive the beam over a wide range. Further, by winding up the base body 6 into a roll and sending it out one after another so as to receive the beam, a long base body 6 can also be treated with fine particles. Furthermore, the treatment with fine particles may be performed while rotating the drum-shaped base 6.

In this embodiment, the generation chamber 3, the first downstream chamber 4a, and the second downstream chamber 4b are constructed, but the second downstream chamber 4b may be omitted, or a third chamber may be provided on the F-stream side of the second downstream chamber.

Fourth...downstream chambers can also be connected. Further, by pressurizing the upstream chamber 3, the first flow chamber 4a can be made into an open system, and by reducing the pressure in the first downstream chamber 4a, the upstream chamber 3 can be made into an open system. In particular, like an autoclave, the upstream chamber 3 can be pressurized and the first downstream chamber 4a and below can be depressurized.

Fine particles can also be obtained by providing a valve for opening and closing the contraction/expansion nozzle 1 and intermittently opening and closing a two-legged valve while temporarily storing raw material gas and carrier gas in the upstream chamber 3 side. If the L valve is opened and closed in synchronization with the energy-applied gas on the F flow side including the throat part 2 of the contraction/expansion nozzle L, the load on the exhaust system can be greatly reduced, and the raw material gas can be used effectively. It is possible to obtain a pulsed particle flow while achieving Note that, under the same exhaust conditions, the intermittent opening and closing described in L has the advantage of easily maintaining a high vacuum on the F flow side.

In addition, by arranging multiple contraction/expansion nozzles 1 in series and adjusting the pressure ratio between the flow side and the downstream side, the beam speed can be maintained, and each chamber can be made spherical to reduce dead space. It is also possible to prevent the occurrence as much as possible.

In the above embodiment, ultrafine particles are generated in the contraction/expansion nozzle 1, but the fine particles are supplied together with a carrier gas into the contraction/expansion nozzle 1 to activate them within the contraction/expansion nozzle 1. It's okay.

[Effects of the Invention] According to the present invention, the fine particles generated by focusing the raw material gas can be directly transferred as a uniformly dispersed beam at a speed of a K, so that the raw material gas can be used efficiently. At the same time, the fine particles t can be transported spatially independently and at ultra high speed. Therefore, the active particles can be reliably transported as they are to the collection position, and by controlling the beam irradiation surface, the spraying area can be accurately controlled. In addition, it becomes a focused ultra-high-speed parallel flow called a beam, and when it is made into a beam, thermal energy is converted to kinetic energy, and the particles in the beam become frozen, so we can create a new reaction field that utilizes these. I have high hopes for what I will achieve. Furthermore, according to the flow control device of the present invention, since the fluid is in the frozen state, the microscopic state of molecules in the fluid is defined.

It is also possible to handle transitions from one state to another. In other words, chemical reactions in the gas phase can be performed using a new method in which various energy levels of one molecule are defined and energy corresponding to the levels is applied. In addition, by providing a field for energy exchange different from the conventional one, it is also possible to easily create an intermolecular compound formed by relatively weak intermolecular forces such as hydrogen bonds and van der Waals bonds.

[Brief explanation of the drawing]

Fig. 1 is an explanatory diagram of the basic KJTt+ of the present invention, Fig. 2 is a schematic diagram showing an example of applying the present invention to a film forming apparatus using ultrafine particles, and Fig. 3 (a) to (c). 4(a) to 4(c) are diagrams each showing an example of the shape of a contraction/expansion nozzle, and FIG. 5 is an explanatory diagram of a skimmer. ■ = contraction/expansion nozzle, la two-wave inlet 1b two outlet, 2: throat, 3: L flow chamber, 4: downstream chamber,
4d: second downstream chamber, 4b: second downstream chamber, 5, 5a, 5b: vacuum pump,
6: Base, 7: Skimmer, 8: Gate valve, 9: Microwave electrode, 10.10': Notch, 11, 11':
Adjustment plate, 12: Handle, 13: Valve body, 14 Niji cylinder, 15 Ni slide shaft, 16 Two base holder, 17: Shutter, 18 Ni glass window, 19: Pressure adjustment valve, 20a, 20b: Main valve, 21a, 21b + pressure reduction pump. 22a, 22b: Arabiki valve, 23a, 23b: Auxiliary valve, 24a to 24h: Leak and purge valve.

Claims (1)

[Claims] 1) A flow control device for a particle flow, characterized in that a contraction/expansion nozzle made of an electrical insulator is provided in a flow path.