JPS6256971A - Electrophotographic sensitive material - Google Patents

Electrophotographic sensitive material

Info

Publication number
JPS6256971A
JPS6256971A JP19649585A JP19649585A JPS6256971A JP S6256971 A JPS6256971 A JP S6256971A JP 19649585 A JP19649585 A JP 19649585A JP 19649585 A JP19649585 A JP 19649585A JP S6256971 A JPS6256971 A JP S6256971A
Authority
JP
Japan
Prior art keywords
alkyl group
compound
electrophotographic
atom
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19649585A
Other languages
Japanese (ja)
Other versions
JPH0519702B2 (en
Inventor
Katsushi Kitatani
克司 北谷
Kenji Sano
佐野 健次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP19649585A priority Critical patent/JPS6256971A/en
Priority to US06/903,918 priority patent/US4663260A/en
Priority to DE3630389A priority patent/DE3630389C2/en
Publication of JPS6256971A publication Critical patent/JPS6256971A/en
Publication of JPH0519702B2 publication Critical patent/JPH0519702B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/05Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
    • G03G5/0503Inert supplements
    • G03G5/051Organic non-macromolecular compounds
    • G03G5/0514Organic non-macromolecular compounds not comprising cyclic groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/05Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
    • G03G5/0503Inert supplements
    • G03G5/051Organic non-macromolecular compounds
    • G03G5/0521Organic non-macromolecular compounds comprising one or more heterocyclic groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/06Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
    • G03G5/0664Dyes
    • G03G5/0666Dyes containing a methine or polymethine group
    • G03G5/0668Dyes containing a methine or polymethine group containing only one methine or polymethine group
    • G03G5/067Dyes containing a methine or polymethine group containing only one methine or polymethine group containing hetero rings

Abstract

PURPOSE:To obtain the titled material having a high sensitivity especially at a wavelength range of a semiconductor laser by incorporating at least one kind of the compds. shown by the formula to an organic photoconductive substance. CONSTITUTION:The titled material comprises the compd. shown by the formula to the organic photoconductive substance. In the formula, R1, R2 R4 and R5 are each a hydrogen atom or a substd. or an unsubstd. alkyl group, R3 is a hydrogen atom, a halogen atom or a substd or an unsubstd. alkyl group, R1-R5 are each a hydrogen atom or an alkyl group, and may be same to or different to each other. A and B are each an oxygen atom or a sulfur atom, X is anion. And then, the electrophotographic film used in the titled material is prepared by coating the titled material on the polyethylene terephthalate film provided a deposited film composed of an indium oxide thereon followed by drying it. Thus, the prescribed film gives the max. adsorption at a range of oscillating the laser.

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は有機光導性物質を主体とした高感度な電子写真
感光材料、特に半導体レーザーの波長領域において高感
度を示す電子写真感光材料に関する。
DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a highly sensitive electrophotographic material mainly composed of an organic photoconductive substance, and particularly to an electrophotographic material exhibiting high sensitivity in the wavelength region of a semiconductor laser.

「従来の技術」 近年半導体レーザーを光源とした電子写真システムが盛
んに開発されている。半導体レーザーはHe−NeやA
r等のガスレーザーに比べて小型かつ低コストであり、
直接変調が可能なこと等大きな利点を有しているが、発
振波長が2!θnm以上となることが多かった。従って
このシステムに用いる感光体は7j 0nm以上に吸収
を持ち、高感度を示す必要があり、各種の増感染料等の
開発が行われている。ところが一般にこのような長波長
域に吸収を持つ有機化合物は熱や湿度に対して不安定な
ものが多く、製造上、取り扱い上問題があり、さらには
それらを用いて作製した感光材料は経時変化が著しく、
長期間保存すると感光体としての機能を失ってしまうも
のが多かった。また特にピIJ IJウム系染料の場合
吸収を長波化させる目的でピIJ IJウム環に芳香族
基を導入する等構造を変化させた場合短波長域に副吸収
が生じ、透光性の電子写真フィルムに使用した場合フィ
ルムが黄色味を帯びてしまうことがあった。またこのよ
うなフィルムは光疲労が大きく、一度光にさらすと感度
を回復するまでかなりの長時間を要するものであった。
"Prior Art" In recent years, electrophotographic systems using semiconductor lasers as light sources have been actively developed. Semiconductor lasers are He-Ne and A
It is smaller and lower cost than gas lasers such as R.
It has great advantages such as direct modulation, but the oscillation wavelength is 2! It was often θnm or more. Therefore, the photoreceptor used in this system must have absorption at 7j 0 nm or more and exhibit high sensitivity, and various sensitizing dyes and the like are being developed. However, organic compounds that absorb in the long wavelength range are generally unstable with respect to heat and humidity, causing problems in manufacturing and handling, and furthermore, photosensitive materials made using them tend to deteriorate over time. is significantly,
Many of them lost their function as photoreceptors when stored for a long period of time. In addition, especially in the case of P-IJIJ-based dyes, when the structure is changed, such as by introducing an aromatic group into the P-IJIJium ring, in order to increase absorption at longer wavelengths, sub-absorption occurs in the short wavelength region, and the translucent electron When used in photographic film, the film sometimes took on a yellowish tinge. Furthermore, such films suffer from significant optical fatigue, and once exposed to light, it takes a considerable amount of time to recover the sensitivity.

「発明が解決しようとする問題点」 本発明の第一の目的は有機光導電性物質とチオピ171
Jウム化合物を含み、高い感度を有する電子写真感光材
料を提供することにある。
"Problems to be Solved by the Invention" The first object of the present invention is to
An object of the present invention is to provide an electrophotographic material containing a Jium compound and having high sensitivity.

本発明の第二の目的は熱や湿度に対して耐久性のある電
子写真感光材料を提供することにある。
A second object of the present invention is to provide an electrophotographic photosensitive material that is durable against heat and humidity.

本発明の第三の目的は半導体レーザーの発振波長領域に
主吸収を有し、高感度を示す電子写真感光材料を提供す
ることにある。
A third object of the present invention is to provide an electrophotographic material that has main absorption in the oscillation wavelength region of a semiconductor laser and exhibits high sensitivity.

本発明の第四の目的は短波長領域(4toθ〜!0θn
m )に実質上副吸収のない電子写真感光材料を提供す
ることにある。
The fourth object of the present invention is a short wavelength region (4toθ~!0θn
The object of the present invention is to provide an electrophotographic light-sensitive material having substantially no sub-absorption in (m).

「問題点を解決するための手段」 即ち本発明者らは鋭意研究の結果有機光導電性物質と下
記一般式(I)で示される化合物を少くとも一種含有し
た電子写真感光材料により上記間  −照点な解決する
ことができた。
"Means for Solving the Problems" That is, as a result of intensive research, the present inventors solved the above problems by using an electrophotographic material containing an organic photoconductive substance and at least one compound represented by the following general formula (I). I was able to solve the problem.

一般式(I) 式中、R1+ Rz + R41Rsは水素原子、置換
もしくは未置換のアルキル基を示し、R3は水素原子、
ハロゲン原子、置換もしくは未置換のアルキル基を示す
。R1,R2、Rs lR41R5の水素原子またはア
ルキル基は、それぞれ同じものでも異っていてもよい。
General formula (I) In the formula, R1+ Rz + R41Rs represents a hydrogen atom, a substituted or unsubstituted alkyl group, R3 is a hydrogen atom,
Indicates a halogen atom or a substituted or unsubstituted alkyl group. The hydrogen atoms or alkyl groups of R1, R2, and Rs 1R41R5 may be the same or different.

A、Bは酸素原子もしくは硫黄原子を示すが同時に同じ
ものになることはない。Xはアニオンを示す。
A and B represent an oxygen atom or a sulfur atom, but they cannot be the same at the same time. X represents an anion.

なお、R1,R2、Ra lR4、Rsのアルキル基は
炭素原子数7〜72個のアルキル基が好ましく、具体的
にはメチル、エチル、n−プロピル、1so−プロピル
、n−ブチル、5ec−ブチル、tert−ブチル、n
−アミル、n−ヘキシル、n−ヘプチル、n−ノニル、
n−)’y’シル、−一エチルヘキシル、フルオロメチ
ル、クロロメチル、ブロモメチル、トリフルオロメチル
、パーフルオロアルキル、メトキシメチル、シアンメチ
ル、メチルチオメチル等を挙げることができる。
In addition, the alkyl group of R1, R2, Ra lR4, and Rs is preferably an alkyl group having 7 to 72 carbon atoms, and specifically, methyl, ethyl, n-propyl, 1so-propyl, n-butyl, 5ec-butyl. , tert-butyl, n
-amyl, n-hexyl, n-heptyl, n-nonyl,
n-)'y' syl, -1ethylhexyl, fluoromethyl, chloromethyl, bromomethyl, trifluoromethyl, perfluoroalkyl, methoxymethyl, cyanmethyl, methylthiomethyl, and the like.

またXのアニオンとして、具体的にはバークロレート、
テトラフルオロボレート、アイオダイド、クロライド、
ブロマイド、サルフェート、ノ署−アイオダイド、p−
トルエンスルホネート等を挙げることができる。
In addition, as an anion of X, specifically, verchlorate,
Tetrafluoroborate, iodide, chloride,
Bromide, sulfate, iodide, p-
Examples include toluene sulfonate.

本発明に用いる化合物においてピIJ IJウム環に導
入されているtert−ブチル基(以下、tert−B
u基で示す)は化合物の安定性を向上させかつ溶解性を
向上させる役割を担っている。
In the compound used in the present invention, a tert-butyl group (hereinafter referred to as tert-B
(denoted by the u group) plays a role in improving the stability and solubility of the compound.

またAとBを硫黄原子と酸素原子との組合せとす 。Furthermore, A and B are a combination of sulfur atoms and oxygen atoms.

ることにより吸収極大波長を7 r Onm付近へ設定
することができる。R,−R5は吸収極大波長を所望に
応じて微調整する役割を持つ。
By doing so, the absorption maximum wavelength can be set to around 7 r Onm. R and -R5 have the role of finely adjusting the absorption maximum wavelength as desired.

7 / Onm近辺に主吸収を持つピIJ 17ウム系
化合物としては特開昭j7−/41264tj号(米国
特許&、327./49号【:対応)に開示されている
トリメチンチアピリリウム色素、特開昭!ター4t/3
63号に開示されているチアピリリウム染料が知られて
いるが、いずれもチアピリリウム頂上にフェニル基を擁
し、そのため短波長域(4t00−jθQnm)に副吸
収を持つ。また前者では塗布物を溶媒蒸気にさらした場
合容易に凝集を起こし、吸収極大の変化とそれに応じた
電子写真特性の変化を引き起こす。本発明に用いる化合
物では上記tert−Bu基の効果によりこのような好
ましくない影響は生じない。
Examples of PIJ17ium-based compounds having main absorption in the vicinity of 7/Onm include the trimethinethiapyrylium dye disclosed in JP-A No. 7-/41264TJ (corresponding to U.S. Patent No. 327./49); Tokukai Akira! Tar 4t/3
Thiapyrylium dyes disclosed in No. 63 are known, but all of them have a phenyl group on the top of the thiapyrylium, and therefore have sub-absorption in a short wavelength region (4t00-jθQnm). Furthermore, in the former case, when the coated material is exposed to solvent vapor, aggregation easily occurs, causing a change in absorption maximum and a corresponding change in electrophotographic properties. Such undesirable effects do not occur in the compounds used in the present invention due to the effect of the tert-Bu group.

次に一般式(I)で示される本発明に用いる化合物の代
表例を下記に示すが本発明はこれによって限定されるも
のではない。
Next, typical examples of the compound represented by the general formula (I) used in the present invention are shown below, but the present invention is not limited thereto.

化合物−(I) 化合物−(2) α04e 化合物−(3) 1O4e 化合物−(4t) α04e 化合物=<3) 化合物−(6) αo4Fj 化合物−(2) 化合物−(?) 化合物−(ワ) のO4 化合物−(I0) 化合物−(//) 化合物−(/、2) αO4 化合物−(/3) 本発明に使用するピIJ リウム系化合物は有機光導電
体が増感される量を用いるのであって、その量は有機光
導電体の種類により異なるが概して、有機光導電体に対
して重量比で0.0/%から700%、好ましくはθ、
/チから30%の範囲である。
Compound-(I) Compound-(2) α04e Compound-(3) 1O4e Compound-(4t) α04e Compound=<3) Compound-(6) αo4Fj Compound-(2) Compound-(?) Compound-(wa) Of O4 Compound-(I0) Compound-(//) Compound-(/, 2) αO4 Compound-(/3) Since the amount of the pyridium-based compound used in the present invention is used to sensitize the organic photoconductor, The amount varies depending on the type of organic photoconductor, but in general, it is 0.0/% to 700% by weight of the organic photoconductor, preferably θ,
/H to 30%.

本発明に用いるピリリウム化合物は、例えばコ。The pyrylium compound used in the present invention is, for example, pyrylium compound.

≦−ジーtert−ゾテルーダーメチルテアピリリウム
塩を等モルの/−アニリノ−3−フェニルイミノプロは
ンと反応させた後、さらに等モルの2.6−シーter
t−ブチル−グーメチルピリリウム塩と反応させること
C二よって得られる。この反応は第一段階は無水酢酸中
で第二段階は無水酢酸ナトリウム等の塩基存在下に無水
酢酸中で行うことが望ましい。第一段階目の反応におい
て無水酢酸の量は2.6−ジーter t−ブチル−弘
−メチルチアピリリウム塩/gに対し/〜20 ml。
≦-Di-tert-zoteruder methyltheapyrylium salt is reacted with an equimolar amount of /-anilino-3-phenyliminopropane, followed by a further equimolar amount of 2.6-tert.
Obtained by reaction with t-butyl-gumethylpyrylium salt C2. This reaction is preferably carried out in acetic anhydride in the first step and in acetic anhydride in the second step in the presence of a base such as anhydrous sodium acetate. In the first step reaction, the amount of acetic anhydride was ~20 ml per 2.6-di-tert-butyl-Hiro-methylthiapyrylium salt/g.

好ましくは2〜10m1lである。反応温度はlθ0、
から還流温度までで行われるが10θ0C前後が好まし
い。反応時間は7分から7時間であるが好ましくは70
分から30分である。第二段階目の反応を行うに先立っ
て中間体を単離することも可能である。中間体の単離は
第一段階目の反応混合物をエーテル等の、中間体の貧溶
媒となる有機溶媒で希釈し、中間体を晶析させればよい
。第二段階目の反応において無水酢酸ナトリウムの量は
コ。
Preferably it is 2 to 10 ml. The reaction temperature is lθ0,
to reflux temperature, preferably around 10θ0C. The reaction time is 7 minutes to 7 hours, preferably 70 minutes.
30 minutes. It is also possible to isolate the intermediate prior to carrying out the second step reaction. The intermediate can be isolated by diluting the first-stage reaction mixture with an organic solvent such as ether that is a poor solvent for the intermediate, and crystallizing the intermediate. In the second stage reaction, the amount of anhydrous sodium acetate is .

乙−ジーtert−ブチルーグーメチルピリリウム塩1
モルに対して2〜3モル相当量用いるのが好ましい。反
応時間、反応温度は第一段階の条件と同様である。
tert-butyl-g-methylpyrylium salt 1
It is preferable to use an amount equivalent to 2 to 3 moles. The reaction time and reaction temperature are the same as those in the first stage.

次に合成例による本発明(二用いるピリリウム化合物の
合成方法を示す。
Next, a method for synthesizing the pyrylium compound used in the present invention will be explained using a synthesis example.

なお2.6−シーtert−ブチル−グーメチルテアピ
リリウム塩は特開昭jt−/4tjtθ、特開昭j≦−
/4tjt/等C二記載されている方法(二より合成し
た。
In addition, 2.6-tert-butyl-gumethyltheapyrylium salt is JP-A-Shojt-/4tjtθ, JP-A-Kokai Shoj≦-
/4tjt/ etc. C2 was synthesized by the method described (2).

合成例−/ (2,イージーter t−ブチル−グーエチルピリリ
ウムパークロレートの合成) 四塩化錫(I04t、λg、0 、aamole)、塩
化ピパロイル(りj−jg4 θ、♂Omole)の混
合物中へ水冷下撹拌しながらコーメチルーコープcx−
!ニア(30、/g、0 、、aamole)を滴下反
応させた。滴下終了後/時間攪拌を続けた後、≦O%過
塩素酸6ogを含む氷水roog中へ反応混合物を激し
く攪拌しながら注ぎ、さらに7時間攪拌を続けた。析出
する固体を集め、酢酸エテル/2θmlで再結晶しコツ
4−ジーtert−ブチルーグーエチルピリリウムパー
クロレートを融点/lO−/J4t’Cの白色針状結晶
として得た。
Synthesis Example-/ (2, Easy synthesis of tert-butyl-guethylpyrylium perchlorate) In a mixture of tin tetrachloride (I04t, λg, 0, aamole) and piparoyl chloride (rij-jg4 θ, ♂ Omole) While stirring under water cooling, add Komei Coop CX-
! Nia (30,/g, 0,, aamole) was added dropwise and reacted. After the completion of the dropwise addition/hour, stirring was continued, the reaction mixture was poured into an ice-water ROOG containing 6 og of ≦0% perchloric acid with vigorous stirring, and stirring was continued for an additional 7 hours. The precipitated solid was collected and recrystallized with ethyl acetate/2θml to obtain 4-di-tert-butyl-g-ethylpyrylium perchlorate as white needle-like crystals with a melting point of /lO-/J4t'C.

(収量λり、52g 収率コ3./%)元素分析 分子
式 C15H2505α1CHα 計算値(%)7芯、/ぶ 7.1!  //、0!実験
値(チ)jl、り0 7.lt  //、0コ合成例−
2 (化合物−(=)の合成)2.6−シーtert−
ブチルーグーメチルテアピリリウムパークロレート(2
,ワgsO”θ/mole)、/−アニリノ−3−フェ
ニルイミノプロはン(2,ags O0θ/mole)
をよく混合し、無水酢酸jmJlを加えた。混合物を/
θ00Cに加熱した後70分間攪拌し、ついで合成例−
/で合成したピリリウム塩(、?、Jg、0.0/mo
le)、無水酢酸ナトリウム(/、り7g、0.0.2
4tmmol)を加えさらに30分間攪拌を続けた。室
温まで冷却した反応混合物に酢酸エチル10m1lを加
え水冷下撹拌を続けた。析出する結晶な濾取水洗乾燥し
た後酢酸エチル−エタノール3:lの混合溶媒より再結
晶し化合物−(2)を融点(分解点)23!〜23t 
0cの緑がかった金色の結晶として得た。(収量2.0
/g収率j4t、7チ) 元素分析 分子式 C32H47α105S1cHα 
  S 計算値(チ)tt、3t ♂、/タ 6./コ!、j3
実験値(%)、<4./コ♂、2!に、// タ、グ♂
合成例−3(化合物−(りの合成) −2Q0Cへ冷却したJ、4−ジーtert−ブチルー
r−ピ1:17 (<t /1mg%2mmol)の無
水THF溶液にノルマルブチルリチウム(/。
(Yield λ, 52g Yield 3./%) Elemental analysis Molecular formula C15H2505α1CHα Calculated value (%) 7 cores, /bu 7.1! //, 0! Experimental value (chi) jl, ri 0 7. lt //, 0 synthesis example-
2 (Synthesis of compound -(=)) 2.6-sheet tert-
Butyl-goomethyltheapyrylium perchlorate (2
, agsO”θ/mole), /-anilino-3-phenyliminoprohane (2,agsO0θ/mole)
were mixed well, and jmJl of acetic anhydride was added. Mixture/
After heating to θ00C and stirring for 70 minutes, synthesis example-
Pyrylium salt synthesized with / (,?, Jg, 0.0/mo
le), anhydrous sodium acetate (/, 7g, 0.0.2
4 tmmol) was added thereto, and stirring was continued for an additional 30 minutes. 10 ml of ethyl acetate was added to the reaction mixture cooled to room temperature, and stirring was continued under water cooling. The precipitated crystals were collected by filtration, washed with water, dried, and then recrystallized from a mixed solvent of ethyl acetate and ethanol (3:1) to obtain compound (2) with a melting point (decomposition point) of 23! ~23t
Obtained as greenish-gold crystals of 0c. (Yield 2.0
/g yield j4t, 7chi) Elemental analysis Molecular formula C32H47α105S1cHα
S Calculated value (ch) tt, 3t ♂, /ta 6. /Ko! ,j3
Experimental value (%), <4. / Ko♂, 2! ni, // ta, gu♂
Synthesis Example 3 (Synthesis of Compound) -N-butyllithium (/) was added to an anhydrous THF solution of J,4-di-tert-butyl-r-pi 1:17 (<t/1 mg% 2 mmol) cooled to 2Q0C.

/7Mヘキサン溶液/ 、29m1l、、2 、4tm
mol)を滴下反応させた。7時間後反応混合物を6チ
過塩素酸水溶液!θmll中へ注ぎ析出する油状物質を
塩化メチレン4tomlにて抽出した。Na 2 SO
4にて乾燥した後溶媒を留去するとコ、ご−ジーter
t−ブチル−a −n−ブチルピリリウムバークロレー
トが白色固体として得られた。(収量t4t4tmg、
収率7/、/%)つぎにこのピリリウム塩を用い合成例
−一と同様の操作を行うことにより化合物−(りが緑が
かった金色の結晶として得られた。(融点2//−コ2
/ 0C(分解))本発明の改良された電子写真感光材
料は、少なくとも支持体、感光層からなる。
/7M hexane solution/ , 29ml, , 2, 4tm
mol) was dropped and reacted. After 7 hours, the reaction mixture was diluted with 6 ml of perchloric acid aqueous solution! The precipitated oily substance was extracted with 4 toml of methylene chloride. Na2SO
After drying in step 4, the solvent is distilled off and the mixture is removed.
t-Butyl-a-n-butylpyrylium verchlorate was obtained as a white solid. (Yield t4t4tmg,
Yield: 7/, /%) Next, using this pyrylium salt, the same procedure as in Synthesis Example 1 was carried out to obtain the compound -(-) as greenish gold crystals (melting point: 2//-). 2
/0C (decomposition)) The improved electrophotographic material of the present invention comprises at least a support and a photosensitive layer.

本発明において使用する支持体は導電化処理を必要とす
る。具体的な導電化処理としては、アルミニウム、金、
/9ラジューム、インジュニム等の金属を蒸着する方法
、又はIn2O3,5noz等の金属酸化物を蒸着する
方法、又は金属粉や5no2等の金属酸化物等をバイン
ダーポリマーに分散して塗布する方法、又は有機オニウ
ム塩化合物等をバインダーポリマーとともに溶解、塗布
する方法、ヨウ化鋼のアセトニトリル溶液を塗布する方
法等をあげることができる。
The support used in the present invention requires conductive treatment. Specific conductive treatments include aluminum, gold,
/9 A method of vapor-depositing a metal such as Radium or Injunim, or a method of vapor-depositing a metal oxide such as In2O3,5noz, or a method of dispersing metal powder or a metal oxide such as 5no2 in a binder polymer and applying it, or Examples include a method of dissolving and applying an organic onium salt compound together with a binder polymer, and a method of applying an acetonitrile solution of iodized steel.

本発明の電子写真感光材料に用いられる有機光導電性物
質としては、従来から知られている数多くのものを用い
ることができる。
As the organic photoconductive substance used in the electrophotographic photosensitive material of the present invention, many conventionally known organic photoconductive substances can be used.

例えば高分子のものでは次のようなものを挙げることが
できる。
Examples of polymers include the following:

(I)米国特許第3,03?、161号明細書、特公昭
74t−/θり44号公報、同412−/り2t1号公
報、同4tコー212JO号公報記載のポリビニルカル
バゾールおよびその誘導体、(2)特公昭ダ3−//ご
74を号公報、特公昭4t3−/9/り2号公報記載の
ポリビニルピレン、ポリビニルアントラセン、ポリーコ
ービニルー<t−(4t’−ジメチルアミノフェニル)
−2−フェニル−オキサゾール、ポリ−3−ビニル−N
−エチルカルバゾールなどのビニル重合体、(3)特公
昭4tJ−’/9/り3号公報記載のポリアセナフチレ
ン、ポリイソデン、アセナフチレンとスチレンの共重合
体などのような重合体、(4)%公昭!t−/394t
θ号公報などに記載のピレン−ホルムアルデヒドm脂、
ブロムピレン−ホルムアルデヒド樹脂、エチルカルバゾ
ール−ホルムアルデヒド樹脂などの縮合樹脂、(5)特
開昭74−90113号及び特開昭jt−/l/!jO
号公報に記載された各種のトリフェニルメタンポリマー
(I) U.S. Patent No. 3,03? , 161 specification, JP 74t-/θri 44, JP 412-/ri 2t1, 4t-ko 212JO, (2) JP Shoda 3-// Polyvinylpyrene, polyvinylanthracene, polycovinyl<t-(4t'-dimethylaminophenyl) described in Go No. 74 and Japanese Patent Publication No. 4t3-/9/2.
-2-phenyl-oxazole, poly-3-vinyl-N
- Vinyl polymers such as ethylcarbazole, (3) Polymers such as polyacenaphthylene, polyisodene, copolymers of acenaphthylene and styrene, etc. described in Japanese Patent Publication No. 4tJ-'/9/3, (4) % Kimiaki! t-/394t
Pyrene-formaldehyde m fat described in θ issue etc.,
Condensation resins such as brompyrene-formaldehyde resin, ethylcarbazole-formaldehyde resin, etc., (5) JP-A-74-90113 and JP-A-74-90113 and JP-A-Sho jt-/l/! jO
Various triphenylmethane polymers described in the above publication.

また低分子のものでは次のようなものを挙げることがで
きる。
In addition, the following can be mentioned as low molecular weight compounds.

(6)米国特許第3//2/り7号明細書などに記載さ
れているトリアゾール誘導体、 (7)米国特許第37♂り4tQ7号明細書などに記載
されているオキサジアゾール誘導体、(8)特公昭37
−16094号公報などに記載されているイミダゾール
誘導体、 (9)米国特許第3tl!’402号、同第3♂コθり
29号、同Jj4t2j4t4を号、特公昭4t!−j
jt号、特公昭!t/−10973号、特開昭j1−9
32241号、特開昭j!−/71Oj号、特開昭jt
−411411号、特開昭!!−10r≦62号、特開
昭1!−/j乙9j3号、特開昭jd−34474号明
細書、公報などに記載のポリアリールアルカン誘導体、 α1 米国特許第3170729号、米国特許第ダコ7
/714号、特開昭1!−1106グ号、特開昭に!−
11041号、特開昭4t?−10j!32号、特開昭
!!−−j10♂4号、特開昭!ご−20061号、特
開昭!6−♂114t/、特開昭j7−+tjj4t!
号、特開昭j4t−//、2,4j7号、特開昭にj−
7+1j4t6号明細書、公報などに記載されているピ
ラゾリン誘導体およびピラゾロン誘導体、 αD 米国特許第j6114t04を号明細書、特公昭
J−/−10/θ!号、特開昭!グーt34tjj号、
特開昭!グー//θr3ぶ号、特開昭!グー//??、
2j号、特公昭4tイ一3272号、特公昭4t7−.
2r33を号明細書、公報などに記tlれているフェニ
レンジアミン誘導体、a3  米国特許3!乙74t!
θ号、特公昭4t?−31702号、西独国特許(DA
S)///Qj/♂号、米国特許第31♂0703号、
米国特許第32410397号、米国特許第3trrに
、20号、米国特許第41232/θ3号、米国特許第
ダ/7j9t/号、米国特許第410/コ376号、特
開昭!j−/4t4t2JO号、特開昭j6−1/り7
32号、特公昭j9−27!72号、特開昭J−4−2
2ダ37号明細書、公報などミニ記載されているアリー
ルアミン誘導体、α謙 米国特許3!コロ!Q/号明細
書記載のアミン置換カルコン誘導体、 α4 米国特許第3!4t2j4tt号明細書などに記
載ノN 、 N−ビカルパジル誘導体、α9 米国特許
第32!7203号明細書などに記載のオキサゾール誘
導体、 舖 特開昭jJ−4tj2j4を号公報などに記載のス
テリルアントラセン誘導体、 αD 特開昭jg−//θ/37号公報などに記載され
ているフルオレノン誘導体、 α綽 米国特許第37/7’lt2号、特開昭!クーj
り/4t3号(米国特許第4t/j09t!r7号に対
応)、特開昭!j−12063号、特開昭jj−120
44を号、特開昭jj−4t6750号、特開昭Jr!
 −?に’4ttr号、特開昭!?−7/3!O号、特
開昭j7−/4t/74tり号、特開昭77−j(t、
2Q&号明細書、公報などに開示されているヒドラゾン
誘導体、 (I9特公昭39−111414号、特開昭3!−7ハ
リθ号(米国特許41.26!、990号;二対応)、
米国特許グ、 04t7 、タグ9号公報、    −
明細書などに開示されているベンジジン誘導体などがあ
る。
(6) Triazole derivatives described in U.S. Patent No. 3/2/7, etc., (7) Oxadiazole derivatives described in U.S. Pat. 8) Special Public Service 1977
-Imidazole derivatives described in Publication No. 16094, etc. (9) US Patent No. 3tl! No. 402, No. 3♂Ko 29, No. Jj4t2j4t4, Special Public Show No.4t! −j
JT issue, Tokko Akira! t/-10973, Japanese Patent Application Publication No. Shoj1-9
No. 32241, Tokukai Shoj! -/71Oj, Tokukai Shojt
-411411, Tokukai Sho! ! -10r≦62, JP-A-1! -/jOtsu9j3, JP-A-Shojd-34474, polyarylalkane derivatives described in publications, α1 U.S. Patent No. 3170729, U.S. Patent No. DAKO 7
/ No. 714, Tokukai Sho 1! -1106g issue, Tokukaisho! −
No. 11041, Tokukai Showa 4t? -10j! No. 32, Tokukai Akira! ! --j10♂4, Tokukai Akira! Go-20061, Tokukai Sho! 6-♂114t/, Tokukai Shoj7-+tjj4t!
No., JP-A-Sho j4t-//, 2,4j-7, JP-A-Sho ni j-
Pyrazoline derivatives and pyrazolone derivatives, αD, described in US Patent No. j6114t04, Japanese Patent Publication No. J-/-10/θ! No., Tokukai Akira! Goo t34tjj issue,
Tokukai Akira! Gu//θr3bu issue, Tokukai Akira! Gu//? ? ,
2j No. 2j, Special Publication Showa 4t-1 No. 3272, Special Publication No. 4t7-.
2r33 is a phenylenediamine derivative described in the specification, gazette, etc., a3 US Patent 3! Otsu 74t!
θ issue, special public Showa 4t? -31702, West German patent (DA
S)///Qj/♂, US Patent No. 31♂0703,
US Pat. No. 3,241,0397, US Pat. No. 3trr, US Pat. j-/4t4t2JO, JP-A-Shoj6-1/ri7
No. 32, Special Publication Sho J9-27!72, Japanese Patent Publication No. Sho J-4-2
Arylamine derivatives that have been described in the specification of No. 2DA No. 37, publications, etc., αKEN US Patent 3! Koro! amine-substituted chalcone derivatives described in the specification of Q/, α4 N,N-bicalpadil derivatives described in the specification of US Patent No. 3!4t2j4tt etc., α9 oxazole derivatives described in the specification of US Patent No. 32!7203 etc.舖 Steryl anthracene derivatives described in JP-A ShojJ-4tj2j4, etc., αD Fluorenone derivatives described in JP-A Shojg-//θ/37, etc., αQ U.S. Patent No. 37/7' lt2 issue, Tokukai Akira! Kuj
ri/4t3 (corresponding to US Patent No. 4t/j09t!r7), JP-A-Sho! No. j-12063, Japanese Patent Application Publication No. Shojj-120
No. 44, Tokukai Shojj-4t6750, Tokukai Sho Jr!
−? '4ttr issue, Tokukai Akira! ? -7/3! No. O, JP-A No. 7-/4t/74-t, JP-A-77-J (t,
Hydrazone derivatives disclosed in 2Q& specification, publications, etc. (I9 Japanese Patent Publication No. 39-111414, Japanese Unexamined Patent Publication No. 39-7 Hari θ (U.S. Pat. No. 41.26!, 990; 2 correspondence),
U.S. Patent No. 04t7, Tag Publication No. 9, −
Examples include benzidine derivatives disclosed in specifications and the like.

これらの有機光導電性物質は、感光層中に20〜99重
量%の範囲で用いることが好ましい。
These organic photoconductive substances are preferably used in the photosensitive layer in an amount of 20 to 99% by weight.

有機光導電体が低分子化合物の場合には、適当な被膜性
を有する高分子化合物を結着剤として用いることができ
る。具体的には、ポリアミド、ポリウレタン、ポリエス
テル、エポキシ樹脂、ポリケトン、スチレン系重合体お
よび共重合体、ポリ−N−ビニルカルバゾール、ポリカ
ーボネート、ポリエステルカーボネート、ポリスルホン
、塩化ビニール樹脂、塩化ビニリデン樹脂、酢酸ビニル
樹脂、アクリル樹脂等の各種の高分子化合物を挙げるこ
とができる。有機光導電体が高分子化合物の場合には、
それ自体被膜性を有するが、必要に応じて上記の高分子
化合物を添加しても良い。
When the organic photoconductor is a low-molecular compound, a high-molecular compound having suitable film properties can be used as a binder. Specifically, polyamide, polyurethane, polyester, epoxy resin, polyketone, styrenic polymer and copolymer, poly-N-vinylcarbazole, polycarbonate, polyester carbonate, polysulfone, vinyl chloride resin, vinylidene chloride resin, vinyl acetate resin. , various polymeric compounds such as acrylic resin. When the organic photoconductor is a polymer compound,
Although it has film properties by itself, the above-mentioned polymer compound may be added if necessary.

結着剤の添加量は有機光導電体の種類により異なるが低
分子有機光導電体の場合有機光導電体に対して重量比で
jO’1s−2θθチ使用するのが望ましい。有機光導
電体が高分子の場合は/%〜よ0%使用するのが望まし
い。
The amount of the binder added varies depending on the type of organic photoconductor, but in the case of a low-molecular organic photoconductor, it is desirable to use the binder in a weight ratio of jO'1s-2θθ to the organic photoconductor. When the organic photoconductor is a polymer, it is desirable to use it in an amount of /% to 0%.

本発明の記録材料ζ二は化学増感剤を用いることができ
るが化学増感剤としては、例えばトリニトロフルオレノ
ン、クロラニル、テトラシアノエチレン等の電子吸引性
化合物、特開昭J’t!’−6!グ3り、特開昭j♂−
10コ23り等に記載の化合物等をあげることができる
A chemical sensitizer can be used in the recording material ζ2 of the present invention, and examples of the chemical sensitizer include electron-withdrawing compounds such as trinitrofluorenone, chloranil, and tetracyanoethylene; '-6! G3ri, Tokukai Shoj♂-
Examples include the compounds described in 10 and 23.

本発明の電子写真感光材料中には、必要に応じて公知の
補剤(structure agent) 、可塑剤、
染料、顔料等を、本発明の電子写真感光材料の特性を損
わない範囲で含有させることができる。
The electrophotographic material of the present invention may contain known structure agents, plasticizers,
Dyes, pigments, etc. may be contained within the range that does not impair the characteristics of the electrophotographic material of the present invention.

補強剤としてシアンエチルセルロース、ニトリルゴム、
ビスフェノールAのポリカルボネート、線状ポリエステ
ル、スチレン−ブタジェン共重合体、塩化ビニリデン−
アクリロニトリル共重合体などを用いることができる。
Cyanethyl cellulose, nitrile rubber, as reinforcing agents
Bisphenol A polycarbonate, linear polyester, styrene-butadiene copolymer, vinylidene chloride
Acrylonitrile copolymers and the like can be used.

可塑剤として塩素化ビフェニル、エポキシ樹脂、トリフ
ェニルメタン化合物、クマロン樹脂、低分子量キシレン
樹脂などを用いることができる。
As a plasticizer, chlorinated biphenyls, epoxy resins, triphenylmethane compounds, coumaron resins, low molecular weight xylene resins, etc. can be used.

本発明の電子写真感光材料には、その他に特公昭4t9
−’46263号公報に記載されているがととくの可塑
剤、特公昭67−/94t23号公報C二記載のシラン
カップリング剤、硬化触媒及び/又は架橋剤、特開昭J
−/−t!”7021号公報記載のフッ素含有界面活性
剤、特公昭17−/94t24を号公報記載のルイス酸
、および特公昭J−7−/97♂コ号公報記載の電子供
与性物質等を含有することができる。
In addition, the electrophotographic light-sensitive material of the present invention includes
- Particular plasticizers described in Japanese Patent Publication No. 46263, silane coupling agents, curing catalysts and/or crosslinking agents described in Japanese Patent Publication No. 67-/94t23, C2, Japanese Patent Application Publication No. 1983-1996
-/-t! "The fluorine-containing surfactant described in Japanese Patent Publication No. 7021, the Lewis acid described in Japanese Patent Publication No. Sho 17-/94T24, and the electron-donating substance described in Japanese Patent Publication No. Sho J-7-/97♂C, etc. I can do it.

本発明の電子写真感光材料の作成に際しては溶媒として
、ベンゼン、トルエン、キシレン、クロロベンゼン、ジ
クロロメタン、ジクロロエタン、トリクロロエタン、シ
クロヘキサノン、テトラヒドロフラン、ジオキサン等お
よびこれらの混合溶剤のうちから高分子有機光導電体、
増感色素および必要に応じて添加される成分を共に溶解
または分散する溶媒を用いることができる。
When producing the electrophotographic light-sensitive material of the present invention, a polymeric organic photoconductor, a solvent selected from benzene, toluene, xylene, chlorobenzene, dichloromethane, dichloroethane, trichloroethane, cyclohexanone, tetrahydrofuran, dioxane, etc., and a mixed solvent thereof,
A solvent that dissolves or disperses both the sensitizing dye and optionally added components can be used.

本発明による感光材料は、次の様にして得ることができ
る。
The photosensitive material according to the present invention can be obtained as follows.

感光材料とするには、光導電性物質、本発明のピリリウ
ム系色素及び必要に応じて添加される成分を所望の割合
で溶剤に溶解あるいは分散せしめて、導電性支持体上に
塗布、乾燥するか、上記成分を導電性支持体上に溶融塗
布、あるいは感光性薄膜を溶液から、または溶融押し出
し法等で作成し、自己支持性フィルムとすることができ
る。また塗布(=あたっては塗布溶液中に公知の塗布用
界面活性剤を含有させることができる。
To prepare a photosensitive material, a photoconductive substance, the pyrylium dye of the present invention, and optionally added components are dissolved or dispersed in a solvent in a desired ratio, coated on a conductive support, and dried. Alternatively, a self-supporting film can be obtained by melt-coating the above-mentioned components onto a conductive support, or by preparing a photosensitive thin film from a solution or by a melt-extrusion method. Furthermore, for coating, a known coating surfactant may be included in the coating solution.

本発明の電子写真感光材料は表面保護層を有することが
できる。
The electrophotographic material of the present invention may have a surface protective layer.

表面保護層としては微粒子を含有する結着樹脂の層が例
示できる。用いられる結着樹脂としては、ポリエステル
カーボネート、ポリスルホン、ポリエーテル、ポリエス
テル、ポリカーボネート、ポリアミド、ポリイミド、ポ
リウレタン、アクリル酸エステル重合体及び共重合体、
メタクリル酸エステル重合体及び共重合体、スチレン系
樹脂、ポリビニルアセタール、ポリビニルカルバゾール
、塩化ビニル系樹脂、塩化ビニリデン系樹脂、塩素化ポ
リオレフィン、酢酸ビニル系樹脂、アルキッド樹脂、キ
シレン樹脂、ケント樹脂、セルロース類があるが、これ
に限定されるものではない。これら樹脂は、単独又は2
種以上併用して使用することができる。
An example of the surface protective layer is a layer of a binder resin containing fine particles. Binder resins used include polyester carbonate, polysulfone, polyether, polyester, polycarbonate, polyamide, polyimide, polyurethane, acrylic ester polymers and copolymers,
Methacrylic acid ester polymers and copolymers, styrene resins, polyvinyl acetals, polyvinyl carbazole, vinyl chloride resins, vinylidene chloride resins, chlorinated polyolefins, vinyl acetate resins, alkyd resins, xylene resins, Kent resins, celluloses However, it is not limited to this. These resins may be used alone or in combination.
More than one species can be used in combination.

微粒子としては各種の微粒子を用いることができる。例
えばシリカ、炭酸カルシューム、マイカ、クレー、ボロ
ンナイトライド等の無機絶縁性微粒子、酸化チタン、酸
化アルミニウム、酸化マグネシューム、酸化亜鉛、二酸
化スズ、酸化ビスマス等の金属酸化物、ステアリン酸亜
鉛、ステアリン酸カルシューム、ラウリン酸亜鉛等の長
鎖有機酸金属塩、ポリプロピレン、ポリエチレン、ポリ
アミド、ポリフッ化ビニリデン、ポリテトラフルオロエ
チレン等の有機微粒子等をあげることができるが、これ
に限定されるものでない。これらの微粒子のうち、%に
容易に分散できるシリカ、酸化アルミニウム、酸化チタ
ンを好ましく用いることができる。
Various types of fine particles can be used as the fine particles. For example, inorganic insulating fine particles such as silica, calcium carbonate, mica, clay, and boron nitride, metal oxides such as titanium oxide, aluminum oxide, magnesium oxide, zinc oxide, tin dioxide, and bismuth oxide, zinc stearate, and calcium stearate. Examples include, but are not limited to, long-chain organic acid metal salts such as zinc laurate, organic fine particles such as polypropylene, polyethylene, polyamide, polyvinylidene fluoride, and polytetrafluoroethylene. Among these fine particles, silica, aluminum oxide, and titanium oxide, which can be easily dispersed in 10%, can be preferably used.

本発明の電子写真感光材料は必要に応じて、支持体と感
光層との間、あるいは感光層と表面保護層の間に、各種
目的(たとえば接着の改良等)のために、中間層を設け
ても良い。
In the electrophotographic material of the present invention, an intermediate layer may be provided between the support and the photosensitive layer or between the photosensitive layer and the surface protective layer for various purposes (for example, to improve adhesion), if necessary. It's okay.

本発明の電子写真感光材料は、その背面にすべり性、帯
電性、耐ブロッキング性、アンチノ・レーション性等の
緒特性を改良するための層を設けてもよい。
The electrophotographic material of the present invention may be provided with a layer on its back surface for improving properties such as slip properties, charging properties, anti-blocking properties, and antinolation properties.

「実施例」 以下に本発明の実施例を示すが、本発明は、これに限定
されるものではない。
"Example" Examples of the present invention are shown below, but the present invention is not limited thereto.

実施例/ N 、 N’−ジフェニル−N 、 N’−ビス(3−
メチルフェニル) −(/ 、 /’−ビフェニル〕 −ダ、4t′−ジアミン      0.Jg本発明の
化合物−(=)      、2.rtrng(txl
o−amole) ポリカーボネート (商品名「パンライトに/、? θ0」帝人■製)        0.7g線状ポリエ
ステル樹脂 (商品名「バイロン200」 東洋紡績■製)        θ、θ/gぶ4tm 
g ジクロロメタン            3mlジクロ
ロエタン            1ml上記組成の感
光液を調製し、ついでワイヤー、F−を用いて酸化イン
ジウムの蒸着膜を有する厚さ700μmのポリエチレン
テレフタレートフィルム上に塗布、乾燥した。厚さ?、
7μmの光導電層を有する電子写真フィルムが得られた
。このフィルムは第7図に示すようC:半導体レーザー
の発振領域内(2/♂nm )に吸収極大を有し、短波
長域(4tθθ〜jQ0nm)の吸収は実質上問題とな
らないものであった。
Example/N,N'-diphenyl-N,N'-bis(3-
methylphenyl) -(/, /'-biphenyl] -da,4t'-diamine 0.Jg Compound of the present invention -(=), 2.rtrng(txl
o-amole) Polycarbonate (Product name: "Panlite/? θ0" manufactured by Teijin ■) 0.7g linear polyester resin (Product name: "Byron 200" manufactured by Toyobo ■) θ, θ/gbu 4tm
g dichloromethane 3 ml dichloroethane 1 ml A photosensitive solution having the above composition was prepared, and then coated on a 700 μm thick polyethylene terephthalate film having a vapor-deposited indium oxide film using a wire, F-, and dried. thickness? ,
An electrophotographic film with a 7 μm photoconductive layer was obtained. As shown in Figure 7, this film had an absorption maximum within the C: semiconductor laser oscillation region (2/♂nm), and the absorption in the short wavelength range (4tθθ~jQ0nm) was practically not a problem. .

次に得られた電子写真フィルムを複写紙試験装置sp−
gコ/(川口電機■製)を用いて、スタチック方式によ
り+7.7kVでコロナ帯電し、7 r r nmの単
色光で露光し電子写真特性を調べた。
Next, the obtained electrophotographic film was tested using a copying paper tester sp-
Using gco/(manufactured by Kawaguchi Denki ■), the sample was statically charged with a corona at +7.7 kV and exposed to monochromatic light of 7 r r nm to examine its electrophotographic properties.

特性の電荷保持力は、コロナ帯電した後暗所で6θ秒後
に電位を測定し、初期電位の残存率(%)を求めた。
The characteristic charge retention ability was determined by measuring the potential 6θ seconds after corona charging in a dark place and determining the residual rate (%) of the initial potential.

また感度として、露光前の電位が光減衰して//コにな
る露光量(Eso)と//10(=なる露光量(E9G
)を求めた。
In addition, the sensitivity is the exposure amount (Eso) where the potential before exposure becomes //10 (=) due to optical attenuation and the exposure amount (E9G
) was sought.

電荷保持力は90%と良好な値を示し、感度は電界強度
θ、71X/θ6■/cmにおいて?!erg/cm2
(E51))jヲ/lHg7cm2(E90)と極めて
高感度なものであった。
The charge retention power shows a good value of 90%, and the sensitivity is at electric field strength θ, 71X/θ6■/cm? ! erg/cm2
(E51)) jwo/lHg7cm2 (E90), which was extremely sensitive.

また光源としてタングステン光(4tlux)を用いた
場合も電荷保持カタO%E 5cl 261ux−se
c。
Also, when using tungsten light (4 tlux) as a light source, the charge retention catalyst O%E 5cl 261ux-se
c.

Eg□’/ 7.2 /ux−sec (電界強度0.
7!×106 V / cm )と良好な値を示した。
Eg□'/7.2/ux-sec (electric field strength 0.
7! ×106 V/cm), which was a good value.

次に上記電子写真フィルムを!0°c、zo4RHの条
件下にIO週間放置した後吸収極大、電子写真特性を調
べたところ、はとんど変化が認められなかりた。
Next, use the above electrophotographic film! After being left at 0°C and zo4RH for IO weeks, absorption maximum and electrophotographic properties were examined, and almost no change was observed.

実施例コ 本発明の化合物−(I) 、 (j) 、 (4t)を
用い実施例−/と同様の操作を行ってそれぞれ電子写真
    −フィルムを得た。各フィルムの吸収極大、電
子写真特性についての結果を第7表C二示す。
Example Using the compounds (I), (j), and (4t) of the present invention, electrophotographic films were obtained by carrying out the same operations as in Example. The results regarding absorption maximum and electrophotographic properties of each film are shown in Table 7C-2.

第1表より明らかなようにこれらのフィルムはいずれも
半導体レーザーの発振領域内に囁収極大を持ち、良好な
電子写真感度を有している。つぎにこれらのフィルムを
jo ’C,tro%RHの条件下に70週間放置した
後上記諸特性を測定したところ第1表とほとんど変化が
なかった。
As is clear from Table 1, all of these films have a small absorption maximum within the oscillation region of the semiconductor laser and have good electrophotographic sensitivity. Next, these films were left for 70 weeks under the conditions of jo'C and tro%RH, and the above-mentioned properties were measured, and there were almost no changes from those shown in Table 1.

【図面の簡単な説明】 第7図は実施例/の電子写真フィルムの可視〜近赤外領
域の吸収スはクトルを示す。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 7 shows the absorption spectrum of the electrophotographic film of Example/in the visible to near infrared region.

Claims (1)

【特許請求の範囲】 有機光導電性物質と、下記一般式( I )で示される化
合物の少くとも一種以上とを含有することを特徴とする
電子写真感光材料。 一般式( I ) ▲数式、化学式、表等があります▼ 式中、R_1、R_2、R_4、R_5は水素原子、置
換もしくは未置換のアルキル基を示し、R_3は水素原
子、ハロゲン原子、置換もしくは未置換のアルキル基を
示す。R_1、R_2、R_3、R_4、R_5の水素
原子またはアルキル基は、それぞれ同じものでも異つて
いてもよい。A、Bは酸素原子もしくは硫黄原子を示す
が同時に同じものになることはない。Xはアニオンを示
す。
[Scope of Claims] An electrophotographic light-sensitive material comprising an organic photoconductive substance and at least one compound represented by the following general formula (I). General formula (I) ▲There are numerical formulas, chemical formulas, tables, etc.▼ In the formula, R_1, R_2, R_4, R_5 represent a hydrogen atom, a substituted or unsubstituted alkyl group, and R_3 represents a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group. Indicates a substituted alkyl group. The hydrogen atoms or alkyl groups of R_1, R_2, R_3, R_4, and R_5 may be the same or different. A and B represent an oxygen atom or a sulfur atom, but they cannot be the same at the same time. X represents an anion.
JP19649585A 1985-09-05 1985-09-05 Electrophotographic sensitive material Granted JPS6256971A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP19649585A JPS6256971A (en) 1985-09-05 1985-09-05 Electrophotographic sensitive material
US06/903,918 US4663260A (en) 1985-09-05 1986-09-05 Electrophotographic light-sensitive material comprising organic photoconductor and pyrylium sensitizer
DE3630389A DE3630389C2 (en) 1985-09-05 1986-09-05 Electrophotographic light-sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19649585A JPS6256971A (en) 1985-09-05 1985-09-05 Electrophotographic sensitive material

Publications (2)

Publication Number Publication Date
JPS6256971A true JPS6256971A (en) 1987-03-12
JPH0519702B2 JPH0519702B2 (en) 1993-03-17

Family

ID=16358719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19649585A Granted JPS6256971A (en) 1985-09-05 1985-09-05 Electrophotographic sensitive material

Country Status (1)

Country Link
JP (1) JPS6256971A (en)

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JP5699112B2 (en) 2012-07-27 2015-04-08 富士フイルム株式会社 Planographic printing plate precursor and plate making method
JP5955454B2 (en) 2013-03-14 2016-07-20 富士フイルム株式会社 Concentration method and recycling method of plate making waste liquid
KR102420769B1 (en) 2018-09-20 2022-07-14 후지필름 가부시키가이샤 Curable composition, cured film, infrared transmission filter, laminated body, solid-state image sensor, sensor, and pattern formation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6808857B2 (en) 2001-05-21 2004-10-26 Kodak Polychrome Graphics Llc Negative-working photosensitive composition and negative-working photosensitive lithographic printing plate

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