JPS6252954A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS6252954A
JPS6252954A JP60193477A JP19347785A JPS6252954A JP S6252954 A JPS6252954 A JP S6252954A JP 60193477 A JP60193477 A JP 60193477A JP 19347785 A JP19347785 A JP 19347785A JP S6252954 A JPS6252954 A JP S6252954A
Authority
JP
Japan
Prior art keywords
integrated circuit
circuit chip
chip
logic
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60193477A
Other languages
Japanese (ja)
Inventor
Toshio Sudo
須藤 俊夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60193477A priority Critical patent/JPS6252954A/en
Publication of JPS6252954A publication Critical patent/JPS6252954A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To realize high integrity as a whole by a method wherein a part which performs high speed logic operation and a buffer circuit part which needs a larger occupying area are separately composed and they are overlapped and unified. CONSTITUTION:A logic circuit in a GaAs integrated circuit chip 11 contains an output buffer which has the minimum driving capability required for exchanging signals with the external circuits. An output buffer circuit 5 and an input buffer circuit 16, which practice exchange of signals between the logic circuit in the GaAs integrated circuit chip and other circuits, are formed in an Si integrated circuit chip 12. The GaAs integrated circuit chip 11 and the Si integrated circuit chip 12 are overlapped and unified by a face-down flip chip method. The I/O terminals of the complex semiconductor device unified like this are the I/O pads 17 formed on the Si integrated circuit chip 12. The exchange of signals between the GaAs integrated circuit chip 11 and the Si integrated circuit chip 12 is performed through solder bumps 14.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は高速論理素子を実装した半導体装置に関する。[Detailed description of the invention] [Technical field of invention] The present invention relates to a semiconductor device mounted with high-speed logic elements.

(発明の技術的背景とその問題点) 最近、半導体素子の高速論理動作化に関する研究開発の
進歩がましい。特にSiに比べて電子移動度が大きいG
aAs等の化合物半導体を用いた高速論理集積回路の開
発が盛んである。GaAsを用いたMESFETや)−
IEMTによる高速メモリやゲートアレイなどが特に注
目されている。
(Technical Background of the Invention and Problems Thereof) Recently, there has been remarkable progress in research and development regarding high-speed logic operation of semiconductor devices. In particular, G has higher electron mobility than Si.
Development of high-speed logic integrated circuits using compound semiconductors such as aAs is active. MESFET using GaAs)-
High-speed memory and gate arrays based on IEMT are attracting particular attention.

しかしながらこの様なGaAs集積回路は、論理回路自
体の動作速度は非常に速く、また低消費電力化、^集積
化が可能であるものの、実際に複数個の集積回路チップ
を組合わせてシステムを構成した場合、これらの特徴を
十分に生かせないことが多い。これは集積回路内部に、
外部回路との信号授受を行うために、内部配線を駆動す
る場合に比べて数倍大きい駆動能力をもつ出力バッフ7
回路を必要とするためである。例えばGaAsMESF
ETを用いた集積回路では、内部論理ゲートの出力イン
ピーダンスは10にΩ程度であるが、外部との信号のや
りとりを行う出力バッフ7の出力インピーダンスは通常
50Ω程度まで下げるように設計される。また既存のT
TL或いはECLファミリ等と組合わせる場合には、論
理レベルを合わせるために出力バッフ7回路内に論理レ
ベル変換回路を必要とする。50Ωの出力インピーダン
スを有する出力バッフ7は10にΩ程度の出力インピー
ダンスを持つ内部ゲートよりも大きい面積を必要とし、
チップ周辺部での出力バッファ群の占有面積が内部ゲー
ト群の占有面積とほぼ同程度にまでなり、GaAs集積
回路の高集積化が妨げられる。また出力バッファは消費
電力が大きいため、GaAs1積回路の低消費電力とい
う長所が殆ど生かされなくなる。更にGaAsの熱伝導
度はSlより小さいため、実装する場合の放熱が難しい
。また出力バッファでの信@遅延が大きいため、GaA
s論理ゲートの高速性も十分に生がされなくなる。
However, in such GaAs integrated circuits, although the logic circuit itself has a very high operating speed, has low power consumption, and can be integrated, it is difficult to actually configure a system by combining multiple integrated circuit chips. In many cases, these characteristics cannot be fully utilized. This is inside the integrated circuit.
In order to exchange signals with external circuits, an output buffer 7 with a driving capacity several times larger than that when driving internal wiring is used.
This is because it requires a circuit. For example, GaAs MESF
In an integrated circuit using ET, the output impedance of the internal logic gate is about 10Ω, but the output impedance of the output buffer 7 for exchanging signals with the outside is usually designed to be lowered to about 50Ω. Also, the existing T
When combined with the TL or ECL family, a logic level conversion circuit is required within the output buffer 7 circuit to match the logic levels. An output buffer 7 with an output impedance of 50 Ω requires a larger area than an internal gate with an output impedance of the order of 10 Ω,
The area occupied by the output buffer group at the periphery of the chip becomes almost the same as the area occupied by the internal gate group, which impedes higher integration of GaAs integrated circuits. Further, since the output buffer consumes a large amount of power, the advantage of low power consumption of the GaAs single product circuit is hardly utilized. Furthermore, since the thermal conductivity of GaAs is lower than that of Sl, it is difficult to dissipate heat during mounting. Also, since the signal @ delay in the output buffer is large, GaA
The high speed of the s logic gate will not be fully utilized.

〔発明の目的〕[Purpose of the invention]

本発明は上記の如き問題を解決した複合構造の半導体装
置を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a semiconductor device with a composite structure that solves the above-mentioned problems.

〔発明の概要〕[Summary of the invention]

本発明にかかる半導体装置は、高速動作する論理回路を
集積した第1の集積回路チップと、前記論理回路と他の
回路との信号授受を行うバッファ回路を集積した第2の
集積回路チップとを、重ねて一体化して構成される。
A semiconductor device according to the present invention includes a first integrated circuit chip that integrates a logic circuit that operates at high speed, and a second integrated circuit chip that integrates a buffer circuit that transmits and receives signals between the logic circuit and other circuits. , are constructed by stacking and integrating.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、高速論理動作を行う部分と大きい占有
面積を必要とするバッファ回路部分を別体として構成し
て、これらを重ねて一体化することにより、バッファ回
路まで一つのチップ内に集積した場合に比べて全体とし
て高集積化が図られる。この場合、バッファ回路を集積
する第2の集積回路チップを例えば熱伝導率の高い81
基板により形成すれば、放熱性も改善される。また第2
の集積回路チップに形成するバッファ回路に論理レベル
を変換する回路を含ませることにより、第1の集積回路
チップの論理回路の設計変更をせず、第2の集積回路チ
ップの設計変更のみで種々のシステムに対応させること
ができる。
According to the present invention, by configuring a part that performs high-speed logic operations and a buffer circuit part that requires a large area as separate parts, and then stacking them and integrating them, even the buffer circuit can be integrated into one chip. Overall, higher integration can be achieved than in the case of In this case, the second integrated circuit chip on which the buffer circuit is integrated is, for example, an 81
If it is formed from a substrate, heat dissipation is also improved. Also the second
By including a logic level converting circuit in the buffer circuit formed on the integrated circuit chip, various changes can be made by simply changing the design of the second integrated circuit chip without changing the design of the logic circuit of the first integrated circuit chip. system.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の実施例を図面を参照して説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第1図は一実施例の複合型半導体装置であり、(a)は
平面図、(b)は側面図である。11は高速論理動作を
する論理回路が集積形成されたGaAs集積回路チップ
(第1の集積回路チップ)である。このGaAs集積回
路チップ11の内部ゲート13は例えば、高入出力イン
ピーダンスを有するMESFETにより構成されている
。このGaAs1積回路チップ11内の論理回路は、外
部との信号のやりとりのために最少限の駆動能力を有す
る出力バッファを含む。12はSi集積回路チップ(第
2の集積回路チップ)であり、この中にはGaAs集積
回路チップ内の論理回路と他の回路との信号のやりとり
を行うための出力バッフ7回路15、入力バッフ?回路
16が形成されている。これらバッファ回路15.16
は、GaAs集積回路チップ内の論理回路の入出力論理
レベルを、これが接続される外部回路の論理レベルに合
わせるためのレベル変換機能を有する。
FIG. 1 shows a composite semiconductor device according to one embodiment, in which (a) is a plan view and (b) is a side view. Reference numeral 11 denotes a GaAs integrated circuit chip (first integrated circuit chip) on which a logic circuit that performs high-speed logic operation is integrated. The internal gate 13 of this GaAs integrated circuit chip 11 is composed of, for example, a MESFET having high input/output impedance. The logic circuit within this GaAs single product circuit chip 11 includes an output buffer having a minimum driving ability for exchanging signals with the outside. 12 is a Si integrated circuit chip (second integrated circuit chip), which includes an output buffer 7 circuit 15 and an input buffer circuit for exchanging signals between the logic circuit in the GaAs integrated circuit chip and other circuits. ? A circuit 16 is formed. These buffer circuits 15.16
has a level conversion function for matching the input/output logic level of the logic circuit within the GaAs integrated circuit chip to the logic level of the external circuit to which it is connected.

GaAs集積回路チップ11とSi集積回路チップ12
は、フェースダウンの7リツプチツプ方式により重ねて
一体化されている。こうして一体化された複合型半導体
装置の入出力端子は、Si集積回路チップ12上に形成
された入出力バッド17である。GaAs集積回路チッ
プ11とSi集積回路チップ12間の信号のやりとりは
、半田バンプ14を介して行われる。
GaAs integrated circuit chip 11 and Si integrated circuit chip 12
are stacked and integrated using a face-down seven-lip chip method. The input/output terminals of the composite semiconductor device thus integrated are input/output pads 17 formed on the Si integrated circuit chip 12. Signals are exchanged between the GaAs integrated circuit chip 11 and the Si integrated circuit chip 12 via solder bumps 14.

第2図は、Si集積回路チップ12の出力バッフ7回路
15をECLレベルに設計した具体的な回路例を示す。
FIG. 2 shows a specific circuit example in which the output buffer 7 circuit 15 of the Si integrated circuit chip 12 is designed to the ECL level.

GaAs集積回路チップ11は前述のようにMESFE
Tを用いた高速論理回路を集積したものであり、その出
力が5i集積回路チップ12上の出力バッフ7回路15
によりECL論理レベルに変換されて外部に供給される
。入力部についても同様であり、外部からのECL論理
レベルを有する入力信号はSi集積回路チップ12上の
入力バッファ回路16によりGaAs論理回路の論理レ
ベルに変換されて、GaAs集積回路チップ11の内部
論理ゲートに入力されることになる。
The GaAs integrated circuit chip 11 is a MESFE as described above.
It is an integrated high-speed logic circuit using T, and its output is sent to the output buffer 7 circuit 15 on the 5i integrated circuit chip 12.
The signal is converted to an ECL logic level and supplied to the outside. The same goes for the input section; an external input signal having an ECL logic level is converted to the logic level of the GaAs logic circuit by the input buffer circuit 16 on the Si integrated circuit chip 12, and the internal logic of the GaAs integrated circuit chip 11 is converted to the logic level of the GaAs logic circuit. It will be entered into the gate.

この実施例によれば、高速論理動作をするGaAs集積
回路チップから占有面積の大きいバッファ回路部分を切
り離して別のチップに構成し、これらのチップを重ね合
わせて一体化しているため、いわば素子を三次元的に集
積したのと同等の効果により、高集積化が図られる。ま
た出力バッファ回路は接続されるファンアウト数に対応
して十分大きい駆動能力を有することが必要であり、こ
の部分は論理動作を行う部分に比べて大きい消費電力を
必要とする。この実施例ではこのように消費電力の大き
いバッファ回路部分を熱伝導率の高いSi基板に集積す
ることにより、論理回路部分の低消費電力性を保持した
まま、システム全体としての放熱性を良好なものとする
ことができる。
According to this embodiment, the buffer circuit portion, which occupies a large area, is separated from a GaAs integrated circuit chip that performs high-speed logic operation and is configured on a separate chip, and these chips are stacked and integrated, so that the elements can be integrated. High integration can be achieved with the same effect as three-dimensional integration. Furthermore, the output buffer circuit needs to have a sufficiently large driving capacity corresponding to the number of connected fan-outs, and this portion requires larger power consumption than the portion that performs logic operations. In this example, by integrating the buffer circuit section with high power consumption on the Si substrate with high thermal conductivity, the heat dissipation of the entire system is improved while maintaining the low power consumption of the logic circuit section. can be taken as a thing.

また高速論理集積回路の使用環境は、必ずしも同種の論
理集積回路だけではなく、ECL。
Furthermore, the environment in which high-speed logic integrated circuits are used is not necessarily limited to logic integrated circuits of the same type, but also ECL.

TTL、CMO8I!積回路等との接続を必要とするこ
とが多い。この実施例の場合、S1集積回路として構成
したバッファ回路に論理レベル変換の機能を持たせるこ
とにより、高速論理回路を集積したGaAs集積回路の
設計変更を行うことなく、Si集積回路の設計変更のみ
によって種々の外部回路への対応が可能となる。このこ
とは、GaAs集積回路が未だ81集積回路に比べて歩
留りが低いことを考慮すると、非常に大きい利点である
TTL, CMO8I! Connection with product circuits, etc. is often required. In the case of this embodiment, by providing a logic level conversion function to the buffer circuit configured as an S1 integrated circuit, only the design of the Si integrated circuit can be changed without changing the design of the GaAs integrated circuit in which high-speed logic circuits are integrated. This makes it possible to support various external circuits. This is a significant advantage considering that GaAs integrated circuits still have lower yields than 81 integrated circuits.

更にこの実施例ではGa、As集積回路チップと81集
積回路チップを、フリップチップ方式により一体化して
いる。例えばこの様な一体化はワイヤボンディングによ
っても可能であるが、この場合には高速動作時にワイヤ
のインダクタンス成分による信号波形歪みが生じたり、
ワイヤがクロストークの原因となったりする。この実施
例ではこの様な問題がなく、相互接続に必要な占有面積
も少なくて済む。
Further, in this embodiment, the Ga, As integrated circuit chip and the 81 integrated circuit chip are integrated by a flip-chip method. For example, such integration is possible by wire bonding, but in this case, signal waveform distortion may occur due to the inductance component of the wire during high-speed operation.
Wires may cause crosstalk. This embodiment does not have such problems and requires less footprint for interconnections.

なお本発明は上記した実施例に限られるものではなく、
その趣旨を逸脱しない範囲で種々変形して実施すること
ができる。例えば第1の集積回路チップとしてInPな
ど他の化合物半導体材料を用いることができ、また第2
の集積回路チップとしてはSi基板の他、第1の集積回
路チップより熱伝導率の高い半導体材料を用いた場合に
同様の効果が得られる。
Note that the present invention is not limited to the above-mentioned embodiments,
Various modifications can be made without departing from the spirit of the invention. For example, other compound semiconductor materials such as InP can be used for the first integrated circuit chip, and the second
Similar effects can be obtained when a semiconductor material having a higher thermal conductivity than that of the first integrated circuit chip is used in addition to the Si substrate as the integrated circuit chip.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)(b)は本発明の一実施例の半導体装置を
示す平面図と側面図、第2図はその内部回路構成例を示
す図である。 11・・・GaAs集積回路チップ(第1の集積回路チ
ップ)、12・・・81集積回路チップ(第2のtJ、
積回路チップ)、13・・・内部論理ゲート、14・・
・半田バンブ、15・・・出力バッフ7回路、16・・
・入力バッファ回路、17・・・入出力パッド。 出願人代理人 弁理士 鈴江武彦 第1図
1A and 1B are a plan view and a side view showing a semiconductor device according to an embodiment of the present invention, and FIG. 2 is a diagram showing an example of the internal circuit configuration thereof. 11...GaAs integrated circuit chip (first integrated circuit chip), 12...81 integrated circuit chip (second tJ,
integrated circuit chip), 13... internal logic gate, 14...
・Solder bump, 15... Output buffer 7 circuit, 16...
- Input buffer circuit, 17... input/output pad. Applicant's agent Patent attorney Takehiko Suzue Figure 1

Claims (5)

【特許請求の範囲】[Claims] (1)高速動作する論理回路を集積した第1の集積回路
チップと、前記論理回路と他の回路との信号授受を行う
バッファ回路を集積した第2の集積回路チップとを重ね
て一体化して構成したことを特徴とする半導体装置。
(1) A first integrated circuit chip that integrates a logic circuit that operates at high speed and a second integrated circuit chip that integrates a buffer circuit that exchanges signals between the logic circuit and other circuits are stacked and integrated. A semiconductor device characterized by comprising:
(2)第1の集積回路チップはGaAs基板を用いて構
成されている特許請求の範囲第1項記載の半導体装置。
(2) The semiconductor device according to claim 1, wherein the first integrated circuit chip is constructed using a GaAs substrate.
(3)第2の集積回路チップはSi基板を用いて構成さ
れている特許請求の範囲第1項記載の半導体装置。
(3) The semiconductor device according to claim 1, wherein the second integrated circuit chip is constructed using a Si substrate.
(4)第2の集積回路チップのバッファ回路は、第1の
集積回路チップの論理回路が接続される他の回路との論
理レベルを合わせるレベル変換回路を含む特許請求の範
囲第1項記載の半導体装置。
(4) The buffer circuit of the second integrated circuit chip includes a level conversion circuit that matches the logic level of another circuit to which the logic circuit of the first integrated circuit chip is connected. Semiconductor equipment.
(5)第1の集積回路チップと第2の集積回路チップは
フェースダウンのフリップチップ方式により一体化され
ている特許請求の範囲第1項記載の半導体装置。
(5) The semiconductor device according to claim 1, wherein the first integrated circuit chip and the second integrated circuit chip are integrated by a face-down flip-chip method.
JP60193477A 1985-09-02 1985-09-02 Semiconductor device Pending JPS6252954A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60193477A JPS6252954A (en) 1985-09-02 1985-09-02 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60193477A JPS6252954A (en) 1985-09-02 1985-09-02 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS6252954A true JPS6252954A (en) 1987-03-07

Family

ID=16308669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60193477A Pending JPS6252954A (en) 1985-09-02 1985-09-02 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS6252954A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7411232B2 (en) 2004-07-16 2008-08-12 Matsushita Electric Industrial Co., Ltd. Semiconductor photodetecting device and method of manufacturing the same
JP2012231129A (en) * 2011-04-11 2012-11-22 Internatl Rectifier Corp Laminated composite device having group iii-v transistor and group iv diode
JP2013211548A (en) * 2012-03-15 2013-10-10 Internatl Rectifier Corp Group iii-v and group iv composite switch
US8987833B2 (en) 2011-04-11 2015-03-24 International Rectifier Corporation Stacked composite device including a group III-V transistor and a group IV lateral transistor
US9343440B2 (en) 2011-04-11 2016-05-17 Infineon Technologies Americas Corp. Stacked composite device including a group III-V transistor and a group IV vertical transistor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60150660A (en) * 1984-01-17 1985-08-08 Mitsubishi Electric Corp Semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60150660A (en) * 1984-01-17 1985-08-08 Mitsubishi Electric Corp Semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7411232B2 (en) 2004-07-16 2008-08-12 Matsushita Electric Industrial Co., Ltd. Semiconductor photodetecting device and method of manufacturing the same
JP2012231129A (en) * 2011-04-11 2012-11-22 Internatl Rectifier Corp Laminated composite device having group iii-v transistor and group iv diode
US8987833B2 (en) 2011-04-11 2015-03-24 International Rectifier Corporation Stacked composite device including a group III-V transistor and a group IV lateral transistor
US9343440B2 (en) 2011-04-11 2016-05-17 Infineon Technologies Americas Corp. Stacked composite device including a group III-V transistor and a group IV vertical transistor
JP2013211548A (en) * 2012-03-15 2013-10-10 Internatl Rectifier Corp Group iii-v and group iv composite switch
US9362267B2 (en) 2012-03-15 2016-06-07 Infineon Technologies Americas Corp. Group III-V and group IV composite switch

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