JPS625229B2 - - Google Patents
Info
- Publication number
- JPS625229B2 JPS625229B2 JP57230624A JP23062482A JPS625229B2 JP S625229 B2 JPS625229 B2 JP S625229B2 JP 57230624 A JP57230624 A JP 57230624A JP 23062482 A JP23062482 A JP 23062482A JP S625229 B2 JPS625229 B2 JP S625229B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic field
- sputtering
- target
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/351—Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Sampling And Sample Adjustment (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23062482A JPS59126776A (ja) | 1982-12-28 | 1982-12-28 | スパツタ方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23062482A JPS59126776A (ja) | 1982-12-28 | 1982-12-28 | スパツタ方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59126776A JPS59126776A (ja) | 1984-07-21 |
| JPS625229B2 true JPS625229B2 (cg-RX-API-DMAC7.html) | 1987-02-03 |
Family
ID=16910687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23062482A Granted JPS59126776A (ja) | 1982-12-28 | 1982-12-28 | スパツタ方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59126776A (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62128109A (ja) * | 1985-11-29 | 1987-06-10 | Akai Electric Co Ltd | 高透磁率積層膜の製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5778123A (en) * | 1980-11-04 | 1982-05-15 | Hitachi Ltd | Manufacture of anisotropic thin magnetic film |
-
1982
- 1982-12-28 JP JP23062482A patent/JPS59126776A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59126776A (ja) | 1984-07-21 |
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