JPS6249995B2 - - Google Patents
Info
- Publication number
- JPS6249995B2 JPS6249995B2 JP53032337A JP3233778A JPS6249995B2 JP S6249995 B2 JPS6249995 B2 JP S6249995B2 JP 53032337 A JP53032337 A JP 53032337A JP 3233778 A JP3233778 A JP 3233778A JP S6249995 B2 JPS6249995 B2 JP S6249995B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetically sensitive
- forming
- magnetoelectric transducer
- magnetoelectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Hall/Mr Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3233778A JPS54124987A (en) | 1978-03-23 | 1978-03-23 | Method of fabricating magnetron |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3233778A JPS54124987A (en) | 1978-03-23 | 1978-03-23 | Method of fabricating magnetron |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54124987A JPS54124987A (en) | 1979-09-28 |
| JPS6249995B2 true JPS6249995B2 (en, 2012) | 1987-10-22 |
Family
ID=12356126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3233778A Granted JPS54124987A (en) | 1978-03-23 | 1978-03-23 | Method of fabricating magnetron |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54124987A (en, 2012) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63237586A (ja) * | 1987-03-26 | 1988-10-04 | Agency Of Ind Science & Technol | 微小ホ−ル素子の製造方法 |
-
1978
- 1978-03-23 JP JP3233778A patent/JPS54124987A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54124987A (en) | 1979-09-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS54154289A (en) | Manufacture of thin-film transistor array | |
| JPS5948970A (ja) | 磁電変換素子 | |
| US3898359A (en) | Thin film magneto-resistors and methods of making same | |
| JPS6249995B2 (en, 2012) | ||
| US4013803A (en) | Fabrication of amorphous bubble film devices | |
| JPS6034829B2 (ja) | 磁電変換素子とその製造法 | |
| JP3207957B2 (ja) | InSb薄膜形成方法 | |
| JPS6145874B2 (en, 2012) | ||
| JP3264962B2 (ja) | 磁電変換素子の製造方法 | |
| JPS6450527A (en) | Manufacture of semiconductor device | |
| JPS60122944A (ja) | パタ−ン製造用マスクの製造方法 | |
| JPH022174A (ja) | 高分子エレクトロニクス装置の製造方法 | |
| JPS6256676B2 (en, 2012) | ||
| JP2737974B2 (ja) | インジウムアンチモン膜の製造方法 | |
| JPH0394419A (ja) | 半導体膜の形成方法 | |
| JPS6261364A (ja) | 薄膜半導体装置の製造方法 | |
| JPH0864887A (ja) | GaAsホール素子 | |
| JPS592391B2 (ja) | ジヨセフソン接合素子とその製造方法 | |
| JPH03235380A (ja) | 超伝導薄膜パターンの製造方法 | |
| JPS63113504A (ja) | 自立型光学素子の製造方法 | |
| JPH04287382A (ja) | 超電導薄膜パタンの形成方法 | |
| JPS63193581A (ja) | 抵抗制御素子 | |
| JPH01199489A (ja) | 超伝導回路の作製方法 | |
| JPS5837981A (ja) | 磁気抵抗素子およびその製法 | |
| GB1098984A (en) | A method of forming a predetermined pattern of an electrically conductive material on an electrically insulating surface |