JPS6245830U - - Google Patents
Info
- Publication number
- JPS6245830U JPS6245830U JP13642285U JP13642285U JPS6245830U JP S6245830 U JPS6245830 U JP S6245830U JP 13642285 U JP13642285 U JP 13642285U JP 13642285 U JP13642285 U JP 13642285U JP S6245830 U JPS6245830 U JP S6245830U
- Authority
- JP
- Japan
- Prior art keywords
- lower electrode
- exhaust port
- opened
- moves
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 2
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13642285U JPS6245830U ( ) | 1985-09-06 | 1985-09-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13642285U JPS6245830U ( ) | 1985-09-06 | 1985-09-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6245830U true JPS6245830U ( ) | 1987-03-19 |
Family
ID=31039518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13642285U Pending JPS6245830U ( ) | 1985-09-06 | 1985-09-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6245830U ( ) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015194397A1 (ja) * | 2014-06-19 | 2015-12-23 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JP2017112217A (ja) * | 2015-12-16 | 2017-06-22 | 東京エレクトロン株式会社 | プラズマ処理装置 |
-
1985
- 1985-09-06 JP JP13642285U patent/JPS6245830U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015194397A1 (ja) * | 2014-06-19 | 2015-12-23 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JP2017112217A (ja) * | 2015-12-16 | 2017-06-22 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| WO2017104442A1 (ja) * | 2015-12-16 | 2017-06-22 | 東京エレクトロン株式会社 | プラズマ処理装置 |