JPS624330A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS624330A
JPS624330A JP14379385A JP14379385A JPS624330A JP S624330 A JPS624330 A JP S624330A JP 14379385 A JP14379385 A JP 14379385A JP 14379385 A JP14379385 A JP 14379385A JP S624330 A JPS624330 A JP S624330A
Authority
JP
Japan
Prior art keywords
electrode
control electrode
semiconductor device
annular
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14379385A
Other languages
Japanese (ja)
Inventor
Takeshi Ito
武志 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14379385A priority Critical patent/JPS624330A/en
Publication of JPS624330A publication Critical patent/JPS624330A/en
Pending legal-status Critical Current

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  • Die Bonding (AREA)
  • Bipolar Transistors (AREA)
  • Thyristors (AREA)

Abstract

PURPOSE:To facilitate leading-out of a control electrode accurately by a method wherein an annular insulation plate is provided at the circumference part adjoining the part, which is contacted with an element, of a nearly annular electrode for leading out the control electrode and an insulating insertion plate is inserted above the electrode. CONSTITUTION:A nearly annular electrode 13a for leading-out is provided to connect the control electrode of a semiconductor substrate 1 to an external electrode 12. An annular insulation plate 13b is provided at the circumference part adjoining the part or the electrode 13a which is contacted with the substrate. An insulating insertion plate 19 is inserted above the electrode 13a. The contact part 13d is pressed against the control electrode of the substrate 1. With this constitution, the control electrode can be lead out easily and accurately.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、環状の制御電極を有する半導体装置における
制御電極取り出し構造の改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an improvement in a control electrode extraction structure in a semiconductor device having an annular control electrode.

〔従来の技術〕[Conventional technology]

大容量のゲートターンオフサイリスタやトランジスタに
おいては、大容量化に伴って制御用電極(ゲート又はベ
ース)に流す電流が大きくなり、最近では数10A〜数
10OAの電流を流すものも実用化されている。特に大
容量ゲートターンオフサイリスクでは、ターンオフ時に
必要なゲート逆電流が大きく、しかも瞬時に均一に電流
を流す必要があるため、ゲート・カソード間のインピー
ダンスを極力小さくする工夫がなされている。例えばゲ
ート電極の取り出し部分の形状を環状にして取り出し部
分からエミッタ領域までの距離の短縮と電流分布の均一
化、軽減が図られている。
In large-capacity gate turn-off thyristors and transistors, as the capacity increases, the current flowing through the control electrode (gate or base) increases, and recently, devices that flow a current of several tens of amperes to several tens of OA have been put into practical use. . Particularly in large-capacity gate turn-off circuits, the gate reverse current required during turn-off is large, and the current must flow instantaneously and uniformly, so efforts are made to minimize the impedance between the gate and cathode. For example, the shape of the lead-out portion of the gate electrode is annular in order to shorten the distance from the lead-out portion to the emitter region and to make the current distribution uniform and light.

第3図は従来の半導体装置の第1例を示し、これは上記
環状のゲート電極構造を有するゲートターンオフサイリ
スタのエレメントの平面パターンを示す0図中、1はエ
レメント、1aはシリコンウェハ、1bはシリコンウェ
ハ1aを支持する補強板、ICはゲート電極、1dはカ
ソード電極、le、Ifはゲートの集電電極部分である
FIG. 3 shows a first example of a conventional semiconductor device, in which 1 is an element, 1a is a silicon wafer, and 1b is a planar pattern of an element of a gate turn-off thyristor having the annular gate electrode structure. A reinforcing plate supporting the silicon wafer 1a, IC is a gate electrode, 1d is a cathode electrode, and le and If are current collecting electrode portions of the gate.

またゲート配線部分の電気抵抗を低くしてゲートに大電
流を供給する方法としては、従来ゲート取り出し用電極
をエレメントに加圧接触させる方法があり、この方法は
ゲートがエレメントの中央にあるセンターゲート構造の
サイリスクや、大容量のトランジスタ等に用いた場合非
常に有効である。
In addition, as a method of supplying a large current to the gate by lowering the electric resistance of the gate wiring part, there is a conventional method of bringing the gate extraction electrode into pressure contact with the element. It is very effective when used for structural silicon risks and large capacity transistors.

第4図は従来の半導体装置の第2例を示し、これはゲー
ト取り出し用電極をエレメントに加圧接触させる構造を
有するサイリスクの断面構造図である。図中、1はサイ
リスクエレメント、2は挿入板、3は外部陰極電極、4
はゲート取り出しリード、5は該ゲート取り・出しリー
ド4及び挿入板2を外部陰極電極3に対して位置決めす
る絶縁性支持部材、6はゲート取り出しリード4の先端
部4aを絶縁性支持部材5を介してサイリスクエレメン
ト1に加圧するバネ、7、は上記ゲート取り出しり一ド
4を外部陰極電極3と絶縁するための保護管、8は外部
陽極電極、9はサイリスクエレメント1を支持するセラ
ミック筒、10は外部陰極電極3をセラミック筒9に固
着支持するフランジ、11は外部陽極電極8をセラミッ
ク筒、9に固着支持する陽極フランジ、12は外部ゲー
ト電極である。
FIG. 4 shows a second example of a conventional semiconductor device, and is a cross-sectional structural diagram of a SIRISK having a structure in which a gate extraction electrode is brought into pressure contact with an element. In the figure, 1 is a thyrisk element, 2 is an insertion plate, 3 is an external cathode electrode, and 4
5 is an insulating support member for positioning the gate take-out lead 4 and the insertion plate 2 with respect to the external cathode electrode 3; 6 is an insulating support member 5 for connecting the tip 4a of the gate take-out lead 4; 7 is a protective tube for insulating the gate lead 4 from the external cathode electrode 3; 8 is an external anode electrode; 9 is a ceramic supporting the SIRIS element 1; 10 is a flange for firmly supporting the external cathode electrode 3 on the ceramic cylinder 9; 11 is an anode flange for firmly supporting the external anode electrode 8 on the ceramic cylinder 9; and 12 is an external gate electrode.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

この従来の第2例によるサイリスクでは、ゲート取り出
し電極に銀等の導電性の良い材料を用いており大電流の
供給に有利であるが、上記絶縁性支持部材は、アルミナ
焼結体等を用いる必要があるため寸法精度が悪く、その
ため外部陰極電極3と該絶縁性支持部材5とのクリアラ
ンス、及び該絶縁性支持部材5とゲート取り出しリード
4とのクリアランスを大きくせざるを得す、位置決め精
度が悪くなり、その結果この従来のゲート取り出し構造
は高精度な位置決めを要するゲートターンオフサイリス
タに使用するには精度上不充分な場合があった。
In this second example of the conventional SIRISK, a highly conductive material such as silver is used for the gate lead-out electrode, which is advantageous in supplying a large current, but the insulating support member is made of alumina sintered body or the like. As a result, the dimensional accuracy is poor, and the clearance between the external cathode electrode 3 and the insulating support member 5 and the clearance between the insulating support member 5 and the gate lead 4 have to be increased. As a result, this conventional gate extraction structure sometimes has insufficient accuracy for use in a gate turn-off thyristor that requires highly accurate positioning.

また、環状ゲート構造のゲートターンオフサイリスタの
場合に、上記第2例による構造を採用するには、ゲート
取り出しり一ド4のエレメント1と接触する先端部4a
を環状にする必要があるが、この環状部分を容易かつ高
精度に位置決めできる加圧接触形ゲート構造は実用化さ
れていなかった。
Further, in the case of a gate turn-off thyristor having an annular gate structure, in order to adopt the structure according to the second example, the tip portion 4a that contacts the element 1 of the gate lead 4
It is necessary to make the annular part into an annular shape, but a pressure contact type gate structure that allows easy and highly accurate positioning of this annular part has not been put into practical use.

本発明はこのような従来のゲート取り出し構造の欠点を
除去するためになされたもので、制御電極の取り出しを
容易に、かつ高精度で所定位置において行なえ、信頼性
を向上できる半導体装置を提供することを目的としてい
る。
The present invention has been made in order to eliminate the drawbacks of the conventional gate extraction structure, and provides a semiconductor device in which the control electrode can be extracted easily and precisely at a predetermined position, and the reliability can be improved. The purpose is to

〔問題点を解決するための手段〕[Means for solving problems]

この発明に係る半導体装置は、半導体基体の制御電極を
外部制御電極と接続するための略環状の制御電極取り出
し電極を設け、該制御電極取り出し電極のエレメントと
接触する部分に隣接する周辺部に環状の絶縁板を設け、
さらに上記取り出し電極本体の上面に絶縁挿入板を挿入
し、上記接触部を上記制御電極に圧接せしめるようにし
たものである。
A semiconductor device according to the present invention is provided with a substantially annular control electrode lead-out electrode for connecting a control electrode of a semiconductor substrate with an external control electrode, and a ring-shaped control electrode lead-out electrode is provided in a peripheral portion adjacent to a portion of the control electrode lead-out electrode that contacts an element. An insulating board is installed,
Furthermore, an insulating insertion plate is inserted into the upper surface of the extraction electrode main body, and the contact portion is brought into pressure contact with the control electrode.

〔作用〕[Effect]

この発明においては、半導体基体の制御電極を外部制御
電極と接続するための略環状の制御電極取り出し電極を
設け、該制御電極取り出し電極のエレメントと接触する
部分に隣接する周辺部に環状の絶縁板を設け、さらに上
記取り出し電極本体の上面に絶縁挿入板を挿入し、上記
接触部を上記制御電極に圧接せしめるようにしたから、
制御電極の取り出しを容易に、かつ高精度で所定位置に
おいて行うことができる。
In this invention, a substantially annular control electrode lead-out electrode is provided for connecting the control electrode of the semiconductor substrate with an external control electrode, and a ring-shaped insulating plate is provided in the peripheral area adjacent to the portion of the control electrode lead-out electrode that contacts the element. is provided, and an insulating insertion plate is further inserted into the upper surface of the extraction electrode body, so that the contact portion is brought into pressure contact with the control electrode.
The control electrode can be easily and precisely taken out at a predetermined position.

(実施例〕 以下、本発明の実施例を図について説明する。(Example〕 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第1図は本発明の一実施例による大容量ゲートターンオ
フサイリスタの構造を示し、図中、1は半導体基体であ
るサイリスクエレメントであり、これの第1主面(図示
上面)には第1主電極であるカソード電極及び制御電極
であるゲート電極が形成されており、またその第2主面
(図示下面)には第2主電極であるアノード電極が形成
されている。14は上記エレメント1のカソード電極の
外周部と、第1外部主電極である外部陰極電極18との
間に挿入された外側挿入板、15はエレメント1のカソ
ード電極の内側部と外部陰極電極18との間に挿入され
た内°側挿入板である。そして該外部陰極電極18の第
1主面側には環状の保持溝18aが凹設され、該保持溝
18a内には環状のゲート取り出し電極13が上下動自
在に挿入され、該取り出し電極13はこれと保持溝18
aの底面との間に挿入されたスプリング16により図示
下方に付勢されてニレメンl−1のゲート電極に圧接し
ている。また19は上記取り出し電極と、外部陰極電極
18との絶縁をはかるためのアルミナ又はボロンナイト
ライドからなる環状の絶縁挿入板である。
FIG. 1 shows the structure of a large-capacity gate turn-off thyristor according to an embodiment of the present invention. In the figure, numeral 1 is a thyristor element which is a semiconductor substrate. A cathode electrode as a main electrode and a gate electrode as a control electrode are formed, and an anode electrode as a second main electrode is formed on the second main surface (lower surface in the drawing). 14 is an outer insertion plate inserted between the outer circumference of the cathode electrode of the element 1 and the outer cathode electrode 18 which is the first outer main electrode, and 15 is an inner part of the cathode electrode of the element 1 and the outer cathode electrode 18. This is the inner insertion plate inserted between the An annular holding groove 18a is recessed in the first main surface side of the external cathode electrode 18, and an annular gate extraction electrode 13 is inserted into the holding groove 18a so as to be vertically movable. This and retaining groove 18
It is urged downward in the figure by a spring 16 inserted between it and the bottom surface of the gate a, and is pressed into contact with the gate electrode of the elm plate 1-1. Reference numeral 19 denotes an annular insulating insertion plate made of alumina or boron nitride for insulating the extraction electrode and the external cathode electrode 18.

第2図は上記ゲート取り出し電極の構造を示す断面図で
ある。図中、13aはゲート取り出し電極13の取り出
し電極本体である環状金属部、13dは上記環状金属部
13aの下面全周に沿って突設されたエレメントlとの
接触部、13Cは環状金属部13aのロウ付部13eに
ロウ付された制御リード部であるワイヤ部、13bは上
記接触部の周囲にロウ付部13fにロウ付された環状の
絶縁板である。
FIG. 2 is a sectional view showing the structure of the gate lead-out electrode. In the figure, 13a is a ring-shaped metal part which is the main body of the gate lead-out electrode 13, 13d is a contact part with the element l protruding along the entire lower surface of the ring-shaped metal part 13a, and 13C is a ring-shaped metal part 13a. The wire portion 13b, which is a control lead portion, is brazed to the brazed portion 13e and is an annular insulating plate brazed to the brazed portion 13f around the contact portion.

次に上記ゲート取り出し電極13の製造方法を説明する
Next, a method of manufacturing the gate lead-out electrode 13 will be explained.

(1)  まず環状金属部13aを所望の精度にて切削
加工して形成し、表面に銀メブキを5〜10μm行い、
しか、る後水素中で30〜60分間メッキ界面のアニー
ルを行う。
(1) First, the annular metal part 13a is formed by cutting with the desired precision, and the surface is coated with silver to a thickness of 5 to 10 μm.
However, after that, the plating interface is annealed in hydrogen for 30 to 60 minutes.

(2)  次にアニールの完了した環状金属部13aの
ロー付部13eにワイヤ部13Cをロー付し、さらにア
ルミナ又はボロンナイトライド製の環状の絶縁板13b
を上記環状金属部13aのエレメントとの接触部周辺に
ロー付部13fにてロー付すると、所期のゲート取り出
し電極13が得られる。ここでワイヤ部13cの材質は
純11 (99,99%)とし、ロー付は銀銅ロウを用
いて水素中で行なう。
(2) Next, the wire portion 13C is brazed to the brazed portion 13e of the annealed annular metal portion 13a, and then the annular insulating plate 13b made of alumina or boron nitride
By brazing the annular metal portion 13a around the contact portion with the element at the brazing portion 13f, the desired gate lead-out electrode 13 is obtained. Here, the material of the wire portion 13c is pure 11 (99.99%), and brazing is performed in hydrogen using silver-copper solder.

次に作用効果について説明する。Next, the effects will be explained.

本実施例のゲートターンオフサイリスクでは、環状金属
部13aの断面積が大きいので、該環状金属部13aの
電気抵抗が極めて小さく、また、ワイヤ部13Cの線径
も充分に大きいので、ゲート取り出し電掘13の電位降
下を極めて小さくすることができ、そのため電流分布の
均一性も向上でき、その結果ゲートターンオフサイリス
タの遮断簡力を向上することができる。また外側、内側
挿入板14.15は各々ゲート取り出し電極13の絶縁
板13bの外周壁面、内周壁面によって位置決めされる
ので、組立作業性が極めてよい。そしてまたゲート取り
出し電極本体13aは環状絶縁板13bと環状の絶縁挿
入板19により外部陰極電極18と絶縁されている。
In the gate turn-off scissor of this embodiment, the cross-sectional area of the annular metal part 13a is large, so the electrical resistance of the annular metal part 13a is extremely small, and the wire diameter of the wire part 13C is also sufficiently large, so the gate extraction voltage is The potential drop in the trench 13 can be made extremely small, and therefore the uniformity of current distribution can be improved, and as a result, the switching power of the gate turn-off thyristor can be improved. Furthermore, since the outer and inner insertion plates 14 and 15 are positioned by the outer and inner wall surfaces of the insulating plate 13b of the gate extraction electrode 13, respectively, the assembly workability is extremely high. Further, the gate lead-out electrode body 13a is insulated from the external cathode electrode 18 by an annular insulating plate 13b and an annular insulating insertion plate 19.

また本実施例のゲート取り出し電極13は従来のゲート
圧接構造における絶縁性支持部材とゲート取り出し用ワ
イヤとの両方の機能を兼ね備えており、従って従来のよ
うなこれらを係合させる作業も不要となり、作業性を向
上できると同時に、本実施例では寸法精度の高い環状金
属部13a及び環状絶縁板13bにより、取り出し電極
13の位置決め精度が支配されるので、従来問題であっ
た位置決め精度も極めて良好となる。
In addition, the gate extraction electrode 13 of this embodiment has the functions of both the insulating support member and the gate extraction wire in the conventional gate press-contact structure, so there is no need for the conventional work of engaging these. In addition to improving workability, in this embodiment, the positioning accuracy of the extraction electrode 13 is controlled by the annular metal part 13a and the annular insulating plate 13b, which have high dimensional accuracy, so the positioning accuracy, which was a problem in the past, is also improved. Become.

なお、上記実施例では、ゲートターンオフサイリスクに
ついて述べたが、本発明は環状の制御電極を有する大容
量の半導体装置、例えば大電力トランジスタやゲート補
助ターンオフサイリスタ等についても通用でき、同様の
効果をもたらすことができる。さらに本発明は環状の制
御電極を取り出すための構造だけではなく、従来のセン
ターゲート構造のゲート取り出し電極についても適用で
き、このようにすれば作業性及び位置決め精度を向上で
きる。
In the above embodiment, the gate turn-off thyristor was described, but the present invention can also be applied to large-capacity semiconductor devices having annular control electrodes, such as high-power transistors and gate-assisted turn-off thyristors, and similar effects can be obtained. can bring. Further, the present invention can be applied not only to a structure for taking out an annular control electrode, but also to a gate taking-out electrode of a conventional center gate structure, and in this way, workability and positioning accuracy can be improved.

〔発明の効果〕 以上のように本発明に係る半導体装置によれば、半導体
基体の制御電極を外部制御電極に接続する略環状の制御
電極取り出し電極を設け、該制御電極取り出し電極のエ
レメントと接触する部分に隣接する周辺部に環状の絶縁
板を設け、さらに上記取り出し電極本体の上面に絶縁挿
入板を挿入し、上記接触部を上記制御電極に圧接せしめ
るようにしたので、環状ゲートを有する半導体基体に対
し、極めて高精度で信頼性が高く、作業性の良いゲート
取り出し構造が得られる効果がある。
[Effects of the Invention] As described above, according to the semiconductor device of the present invention, a substantially annular control electrode extraction electrode is provided that connects the control electrode of the semiconductor substrate to an external control electrode, and the control electrode extraction electrode is in contact with an element of the control electrode extraction electrode. An annular insulating plate is provided on the periphery adjacent to the area where the gate is connected, and an insulating inserting plate is inserted into the upper surface of the extraction electrode body so that the contact area is brought into pressure contact with the control electrode. This has the effect of providing a gate extraction structure with extremely high precision, high reliability, and good workability for the base body.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例による半導体装置(ゲートタ
ーンオフサイリスタ)の断面図、第2図は上記実施例の
ゲート取り出し電極の構造を示す断面図、第3図は従来
の環状ゲート構造を有するゲートターンオフサイリスク
のカソード・ゲートパターンを示す平面図、第4図は従
来のセンターゲート加圧方式のサイリスタの構造を示す
断面図である。 12・・・外部制御電極、13・・・制御電極取り出し
電極、13a・・・取り出し電極本体(環状金属部)、
13b・・・環状絶縁板、13c・・・制御リード部、
13d・・・接触部、16・・・スプリング、19・・
・環状の絶縁挿入板、1・・・半導体基体(エレメント
)。 なお図中同一符号は同−又は相当部分を示す。
FIG. 1 is a sectional view of a semiconductor device (gate turn-off thyristor) according to an embodiment of the present invention, FIG. 2 is a sectional view showing the structure of the gate lead-out electrode of the above embodiment, and FIG. 3 is a sectional view of a conventional annular gate structure. FIG. 4 is a plan view showing a cathode/gate pattern of a gate turn-off thyristor having a gate turn-off type, and FIG. 4 is a sectional view showing the structure of a conventional center gate pressurizing type thyristor. 12... External control electrode, 13... Control electrode take-out electrode, 13a... Take-out electrode body (ring-shaped metal part),
13b... Annular insulating plate, 13c... Control lead part,
13d...Contact part, 16...Spring, 19...
- Annular insulating insertion plate, 1... semiconductor substrate (element). Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (8)

【特許請求の範囲】[Claims] (1)その第1、第2主面に第1、第2主電極を、かつ
第1主面に制御電極を有する半導体基体と、該半導体基
体の第1、第2主電極に電気的に接続して上記第1、第
2主面に配設された第1、第2外部主電極と、 上記半導体基体の制御電極に接続されるべき外部制御電
極と、 上記制御電極を上記外部制御電極に接続する制御電極取
り出し電極とを備えた半導体装置において、 上記制御電極取り出し電極はその下面に接触部を、該接
触部の周辺部に環状の絶縁板を有する略環状の取り出し
電極本体と、上記外部制御電極に接続された制御リード
部とからなるものであり、上記取り出し電極本体の上面
に環状の絶縁挿入板を具備し、 上記取り出し電極本体はその接触部にて上記半導体基体
の制御電極に圧接されていることを特徴とする半導体装
置。
(1) A semiconductor substrate having first and second main electrodes on its first and second main surfaces and a control electrode on its first main surface, and electrically connected to the first and second main electrodes of the semiconductor substrate. first and second external main electrodes connected to each other and arranged on the first and second main surfaces; an external control electrode to be connected to the control electrode of the semiconductor substrate; In a semiconductor device, the control electrode lead-out electrode has a substantially annular lead-out electrode main body having a contact portion on its lower surface and an annular insulating plate around the contact portion; A control lead part connected to an external control electrode is provided, and an annular insulating insertion plate is provided on the upper surface of the lead-out electrode body, and the lead-out electrode body connects to the control electrode of the semiconductor substrate at its contact part. A semiconductor device characterized by being pressure-welded.
(2)上記取り出し電極本体の上記制御電極への圧接は
、上記第1外部主電極に凹設された環状の保持溝に上記
取り出し電極本体とともに挿入されたスプリングによっ
てなされていることを特徴とする特許請求の範囲第1項
記載の半導体装置。
(2) Pressure contact of the extraction electrode body to the control electrode is achieved by a spring inserted together with the extraction electrode body into an annular holding groove recessed in the first external main electrode. A semiconductor device according to claim 1.
(3)上記接触部は、上記取り出し電極本体の全周に沿
う環状のものであることを特徴とする特許請求の範囲第
1項又は第2項記載の半導体装置。
(3) The semiconductor device according to claim 1 or 2, wherein the contact portion is annular along the entire circumference of the extraction electrode main body.
(4)上記接触部は、上記取り出し電極本体の全周に沿
って配設された複数の円弧状部からなることを特徴とす
る特許請求の範囲第1項又は第2項記載の半導体装置。
(4) The semiconductor device according to claim 1 or 2, wherein the contact portion comprises a plurality of arcuate portions arranged along the entire circumference of the extraction electrode main body.
(5)上記接触部は、その表面に銀又は金メッキが施さ
れていることを特徴とする特許請求の範囲第1項ないし
第4項のいずれかに記載の半導体装置。
(5) The semiconductor device according to any one of claims 1 to 4, wherein the surface of the contact portion is plated with silver or gold.
(6)上記制御電極取り出し電極は、銅又はアルミニウ
ムを主成分とする電気良導体を用いて形成されているこ
とを特徴とする特許請求の範囲第1項ないし第5項のい
ずれかに記載の半導体装置。
(6) The semiconductor according to any one of claims 1 to 5, wherein the control electrode extraction electrode is formed using a good electrical conductor whose main component is copper or aluminum. Device.
(7)上記絶縁挿入板は酸化アルミニウム又はボロンナ
イトライドを主成分とする絶縁性物質の焼結生成物から
なるものであることを特徴とする特許請求の範囲第1項
ないし第6項のいずれかに記記載の半導体装置。
(7) The insulating insert plate is made of a sintered product of an insulating material whose main component is aluminum oxide or boron nitride. A semiconductor device according to claim 1.
(8)上記取り出し電極本体の環状の絶縁板は、上記取
り出し電極本体にロー付けにより固定されていることを
特徴とする特許請求の範囲第1項ないし第7項のいずれ
かに記載の半導体装置。
(8) The semiconductor device according to any one of claims 1 to 7, wherein the annular insulating plate of the extraction electrode body is fixed to the extraction electrode body by brazing. .
JP14379385A 1985-06-28 1985-06-28 Semiconductor device Pending JPS624330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14379385A JPS624330A (en) 1985-06-28 1985-06-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14379385A JPS624330A (en) 1985-06-28 1985-06-28 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS624330A true JPS624330A (en) 1987-01-10

Family

ID=15347116

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14379385A Pending JPS624330A (en) 1985-06-28 1985-06-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS624330A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055633A (en) * 1983-09-07 1985-03-30 Hitachi Ltd Semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055633A (en) * 1983-09-07 1985-03-30 Hitachi Ltd Semiconductor device

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